Optical component array having adjustable curvature
    31.
    发明授权
    Optical component array having adjustable curvature 有权
    具有可调曲率的光学元件阵列

    公开(公告)号:US09442285B2

    公开(公告)日:2016-09-13

    申请号:US13349336

    申请日:2012-01-12

    申请人: John A. Rogers

    发明人: John A. Rogers

    摘要: Provided are devices, and related methods, for controlling curvature of an array of optical components on, embedded, or partially embedded in, a deformable substrate. The array of optical components, in an aspect, comprises a deformable substrate having a contact surface and an array of mechanically interconnected optical components supported by the contact surface. An actuator is operably connected to the contact surface, wherein the actuator variably controls a curvature of said contact surface. The contact surface may have a curvature that spans concave to convex, which is tunable. In an aspect, the array of optical components is part of an optical device, such as a camera with a continuously adjustable zoom whose focus is maintained by adjusting a photodetector array curvature. In an aspect, the method is adjusting the curvature of a substrate that supports the array of optical components by applying a force to the substrate.

    摘要翻译: 提供了用于控制可变形衬底上,嵌入或部分嵌入在可变形衬底中的光学部件阵列的曲率的装置和相关方法。 在一个方面,光学部件阵列包括具有接触表面的可变形基底和由接触表面支撑的机械互连的光学部件的阵列。 致动器可操作地连接到接触表面,其中致动器可变地控制所述接触表面的曲率。 接触表面可以具有从凹到凸的曲率,这是可调的。 在一个方面,光学部件阵列是光学装置的一部分,例如具有连续可调变焦的照相机,其焦点通过调节光电检测器阵列曲率来保持。 一方面,该方法是通过向衬底施加力来调节支撑光学部件阵列的衬底的曲率。

    Printing transferable components using microstructured elastomeric surfaces with pressure modulated reversible adhesion
    32.
    发明授权
    Printing transferable components using microstructured elastomeric surfaces with pressure modulated reversible adhesion 有权
    使用具有压力调节的可逆粘合的微结构弹性体表面印刷可转印部件

    公开(公告)号:US09412727B2

    公开(公告)日:2016-08-09

    申请号:US13237375

    申请日:2011-09-20

    摘要: In a method of printing a transferable component, a stamp including an elastomeric post having three-dimensional relief features protruding from a surface thereof is pressed against a component on a donor substrate with a first pressure that is sufficient to mechanically deform the relief features and a region of the post between the relief features to contact the component over a first contact area. The stamp is retracted from the donor substrate such that the component is adhered to the stamp. The stamp including the component adhered thereto is pressed against a receiving substrate with a second pressure that is less than the first pressure to contact the component over a second contact area that is smaller than the first contact area. The stamp is then retracted from the receiving substrate to delaminate the component from the stamp and print the component onto the receiving substrate. Related apparatus and stamps are also discussed.

    摘要翻译: 在印刷可转印部件的方法中,包括具有从其表面突出的三维浮雕特征的弹性体柱的印模被压制在供体基板上的部件上,该第一压力足以使浮雕特征机械地变形,并且 位于浮雕特征之间的柱的区域,以在第一接触区域上接触部件。 印模从供体基板缩回,使得该部件粘附到印模上。 包括附着在其上的部件的印模被压在接受基板上,第二压力小于在小于第一接触面积的第二接触面积上接触部件的第一压力。 然后将印模从接收基板缩回以从印模分离该部件并将该部件打印到接收基板上。 还讨论了相关装置和邮票。

    METHOD OF ENHANCING PERFORMANCE IN BROILER CHICKENS
    34.
    发明申请
    METHOD OF ENHANCING PERFORMANCE IN BROILER CHICKENS 审中-公开
    增强肉鸡性能的方法

    公开(公告)号:US20130310367A1

    公开(公告)日:2013-11-21

    申请号:US13896475

    申请日:2013-05-17

    申请人: John A. Rogers

    发明人: John A. Rogers

    IPC分类号: A61K31/55

    摘要: A method of enhancing the performance of chicken comprising administering zilpaterol to the chicken wherein the concentration of zilpaterol is from about 1 ppm to about 13 ppm and is administered every day for a period of about 7 to about 21 days.

    摘要翻译: 一种提高鸡的表现的方法,其包括给予齐伐他醇至鸡,其中齐勒特罗的浓度为约1ppm至约13ppm,并且每天施用约7至约21天的时间。

    Swept source OCT apparatus
    36.
    发明授权
    Swept source OCT apparatus 有权
    扫频源OCT装置

    公开(公告)号:US08442284B2

    公开(公告)日:2013-05-14

    申请号:US12092504

    申请日:2006-10-31

    IPC分类号: G06K9/00

    CPC分类号: A61B3/102 G01N21/4795

    摘要: A method of performing spectral OCT imaging on a target involves repeatedly scanning said target along a transverse scanning line with an object beam derived from an OCT interferometer having a narrowband source. The wavelength of the narrowband source is modulated over a range of wavelengths at a rate that is slow relative to the rate of scanning the target. The object beam returned from the target is detected to produce a set of data obtained from multiple scans along said scanning line over the entire range of wavelengths. The data is then processed to extract an OCT image (typically a B-scan) of the target containing depth information.

    摘要翻译: 在目标上进行光谱OCT成像的方法涉及用具有窄带源的OCT干涉仪衍生的物体光束沿着横向扫描线重复扫描所述目标。 窄带源的波长以相对于扫描目标的速率较慢的速率在波长范围内进行调制。 检测从目标物返回的目标光束,以产生在整个波长范围内沿着扫描线从多次扫描获得的一组数据。 然后处理数据以提取包含深度信息的目标的OCT图像(通常为B扫描)。

    Methods and devices for fabricating three-dimensional nanoscale structures
    40.
    发明授权
    Methods and devices for fabricating three-dimensional nanoscale structures 有权
    制造三维纳米尺度结构的方法和装置

    公开(公告)号:US07704684B2

    公开(公告)日:2010-04-27

    申请号:US11001689

    申请日:2004-12-01

    IPC分类号: G03F7/00

    摘要: The present invention provides methods and devices for fabricating 3D structures and patterns of 3D structures on substrate surfaces, including symmetrical and asymmetrical patterns of 3D structures. Methods of the present invention provide a means of fabricating 3D structures having accurately selected physical dimensions, including lateral and vertical dimensions ranging from 10s of nanometers to 1000s of nanometers. In one aspect, methods are provided using a mask element comprising a conformable, elastomeric phase mask capable of establishing conformal contact with a radiation sensitive material undergoing photoprocessing. In another aspect, the temporal and/or spatial coherence of electromagnetic radiation using for photoprocessing is selected to fabricate complex structures having nanoscale features that do not extend entirely through the thickness of the structure fabricated.

    摘要翻译: 本发明提供了用于在衬底表面上制造3D结构的3D结构和图案的方法和装置,包括3D结构的对称和非对称图案。 本发明的方法提供了一种制造具有精确选择的物理尺寸的3D结构的方法,包括从10纳米到1000纳米的横向和垂直尺寸。 在一个方面,使用掩模元件提供方法,所述掩模元件包括能够与正在进行光刻处理的辐射敏感材料形成保形接触的适形的弹性体相位掩模。 在另一方面,选择用于光处理的电磁辐射的时间和/或空间相干性来制造具有纳米尺度特征的复杂结构,其不完全延伸通过制造的结构的厚度。