Lottery game card having a Sudoku-themed game
    31.
    发明申请
    Lottery game card having a Sudoku-themed game 审中-公开
    彩票游戏卡有一个Sudoku主题游戏

    公开(公告)号:US20070187888A1

    公开(公告)日:2007-08-16

    申请号:US11605835

    申请日:2006-11-29

    IPC分类号: A63B71/00

    CPC分类号: A63F3/0665 A63F2003/0418

    摘要: A lottery game card for playing a Sudoku-themed game is disclosed. The lottery game card includes a plurality of squares arranged in rows and columns, each square having a symbol. Selected squares are covered with a removable material. The lottery game card also includes a plurality of prize indicators, each prize indicator being associated with a predefined pattern of squares. Upon removing of covered squares by a player, if symbols in the plurality of squares match a predefined pattern, the player wins a prize associated with the predefined pattern.

    摘要翻译: 披露了一款玩数独主题游戏的彩票游戏卡。 彩票游戏卡包括以行和列排列的多个正方形,每个正方形具有符号。 所选正方形覆盖有可拆卸材料。 彩票游戏卡还包括多个奖励指标,每个奖金指示符与预定义的正方形相关联。 在移除玩家的覆盖方块的情况下,如果多个正方形中的符号与预定义的模式匹配,则玩家赢得与预定模式相关联的奖品。

    System and Method for Automatically Mounting a Pellicle Assembly on a Photomask
    32.
    发明申请
    System and Method for Automatically Mounting a Pellicle Assembly on a Photomask 失效
    用于在光掩模上自动安装防护薄膜组件的系统和方法

    公开(公告)号:US20060227314A1

    公开(公告)日:2006-10-12

    申请号:US11278481

    申请日:2006-04-03

    IPC分类号: G03B27/62

    CPC分类号: G03F7/70983 G03F1/64

    摘要: A system and method for automatically mounting a pellicle assembly on a photomask are disclosed. The method includes loading a photomask into a mounting apparatus and loading a pellicle assembly into a back plate of the mounting apparatus opposite the photomask. The back plate includes at least one load cell that measures a force applied by the mounting apparatus to the photomask and the pellicle assembly. The measured force associated with the at least one load cell is received and the pellicle assembly is mounted on the photomask to create a photomask assembly if the measured force is greater than or approximately equal to a minimum force.

    摘要翻译: 公开了一种用于将防护薄膜组件自动安装在光掩模上的系统和方法。 该方法包括将光掩模加载到安装设备中,并将防护薄膜组件装载到与光掩模相对的安装设备的背板中。 背板包括至少一个称重传感器,其测量由安装设备施加到光掩模和防护薄膜组件的力。 如果测量的力大于或近似等于最小力,则接收与所述至少一个称重传感器相关联的测量的力并且防护薄膜组件安装在光掩模上以产生光掩模组件。

    Apparatus and method for writing data to mirrored storage using multiple tasks working in parallel
    34.
    发明申请
    Apparatus and method for writing data to mirrored storage using multiple tasks working in parallel 有权
    使用并行工作的多个任务向镜像存储器写入数据的装置和方法

    公开(公告)号:US20050071584A1

    公开(公告)日:2005-03-31

    申请号:US10671035

    申请日:2003-09-25

    CPC分类号: G06F12/1441 G06F11/2056

    摘要: An apparatus and method provides the capability of mirroring storage from a primary system to a mirrored system in a way that uses parallelism in the mirrored system to maximize the efficiency of writing data to the mirrored storage for operations that do not conflict while serializing operations that do conflict. The mirroring of the present invention is “logical mirroring”, which does not require identical disk drives, and which supports mirroring between geographically remote locations to protect against catastrophic site failure. Parallelism is achieved in the mirrored system by dividing the virtual address space into multiple ranges, and by assigning a group of tasks to each range. When an operation is received on the mirrored system, the virtual address range that the operation affects is determined, and the operation is then delegated to the task group that corresponds to the affected virtual address range. By dividing the virtual address space into ranges, tasks in different ranges (i.e., in different task groups) may execute in parallel without any threat of conflict, and even tasks within the same range may execute in parallel if they operate in different portions of the range.

    摘要翻译: 一种装置和方法提供将存储从主系统镜像到镜像系统的能力,其方法是使用镜像系统中的并行性来最大限度地提高将数据写入镜像存储器的效率,以用于在串行化操作时不冲突的操作 冲突。 本发明的镜像是“逻辑镜像”,其不需要相同的磁盘驱动器,并且其支持在地理上偏远的位置之间的镜像,以防止灾难性的站点故障。 通过将虚拟地址空间划分为多个范围,并通过为每个范围分配一组任务,在镜像系统中实现并行化。 当在镜像系统上接收到操作时,确定操作影响的虚拟地址范围,然后将该操作委派给与受影响的虚拟地址范围对应的任务组。 通过将虚拟地址空间划分为范围,不同范围内的任务(即,在不同的任务组中)可以并行执行,而不会产生任何冲突的威胁,如果在相同范围内的任务可以并行执行,如果它们在 范围。

    PLASMA-ASSISTED MOCVD FABRICATION OF P-TYPE GROUP III-NITRIDE MATERIALS
    36.
    发明申请
    PLASMA-ASSISTED MOCVD FABRICATION OF P-TYPE GROUP III-NITRIDE MATERIALS 审中-公开
    P型III型氮化物材料的等离子体辅助MOCVD制造

    公开(公告)号:US20120258580A1

    公开(公告)日:2012-10-11

    申请号:US13413009

    申请日:2012-03-06

    摘要: The plasma-assisted metal-organic chemical vapor deposition (MOCVD) fabrication of a p-type group III-nitride material is described. For example, a method of fabricating a p-type group III-nitride material includes generating a nitrogen-based plasma. A nitrogen-containing species from the nitrogen-based plasma is reacted with a group III precursor and a p-type dopant precursor in a metal-organic chemical vapor deposition (MOCVD) chamber. A group III-nitride layer including p-type dopants is then formed above a substrate.

    摘要翻译: 描述了p型III族氮化物材料的等离子体辅助金属 - 有机化学气相沉积(MOCVD)制造。 例如,制造p型III族氮化物材料的方法包括生成氮基等离子体。 来自氮基等离子体的含氮物质与金属有机化学气相沉积(MOCVD)室中的III族前体和p型掺杂剂前体反应。 然后在衬底上形成包括p型掺杂剂的III族氮化物层。

    METHOD FOR IN-SITU CLEANING OF DEPOSITION SYSTEMS
    37.
    发明申请
    METHOD FOR IN-SITU CLEANING OF DEPOSITION SYSTEMS 审中-公开
    沉积物系统的现场清洁方法

    公开(公告)号:US20110079251A1

    公开(公告)日:2011-04-07

    申请号:US12749087

    申请日:2010-03-29

    IPC分类号: B08B5/00

    CPC分类号: C23C16/4405

    摘要: A method for in-situ cleaning of a deposition system is disclosed. The method includes providing a deposition system with portions of the deposition system deposited with at least a group III element or a compound of a group III element. Halogen containing fluid is introduced into the deposition system. The halogen containing fluid is permitted to react with the group III element to form a halide. The halide in solid state is converted to a gaseous state. The halide in gaseous state is purged out of the deposition system.

    摘要翻译: 公开了一种用于原位清洗沉积系统的方法。 该方法包括为沉积系统提供沉积有至少III族元素或III族元素的化合物的沉积系统的部分。 将含卤素的流体引入沉积系统。 允许含卤素的流体与III族元素反应形成卤化物。 固态卤化物转化为气态。 气态卤化物从沉积系统中排出。

    DECONTAMINATION OF MOCVD CHAMBER USING NH3 PURGE AFTER IN-SITU CLEANING
    38.
    发明申请
    DECONTAMINATION OF MOCVD CHAMBER USING NH3 PURGE AFTER IN-SITU CLEANING 审中-公开
    在现场清洁后使用NH3净化的MOCVD室的去除

    公开(公告)号:US20100273291A1

    公开(公告)日:2010-10-28

    申请号:US12731030

    申请日:2010-03-24

    IPC分类号: H01L51/40

    摘要: Embodiments of the present invention generally relate to methods and apparatus for removing unwanted deposition build-up from one more interior surfaces of a substrate processing chamber after a substrate is processed in a chamber to form, for example, Group III-V materials by metal-organic chemical vapor deposition (MOCVD) deposition processes and/or hydride vapor phase epitaxial (HVPE) deposition processes. In one embodiment, a method for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber is provided. The method comprises depositing one or more Group III containing layers over a substrate disposed in the substrate processing chamber, transferring the substrate out of the substrate processing chamber, and pulsing a halogen containing gas into the substrate processing chamber to remove at least a portion of the unwanted deposition build-up from one or more interior surfaces of the substrate processing chamber.

    摘要翻译: 本发明的实施方案一般涉及用于在衬底在腔室中处理以形成例如III-V族材料之后,从衬底处理室的多个内表面去除不想要的沉积积累的方法和装置, 有机化学气相沉积(MOCVD)沉积工艺和/或氢化物气相外延(HVPE)沉积工艺。 在一个实施例中,提供了从衬底处理室的一个或多个内表面去除不想要的沉积积聚的方法。 该方法包括在设置在衬底处理室中的衬底上沉积一个或多个含III族的层,将衬底转移到衬底处理室之外,并将含卤素的气体脉冲到衬底处理室中以去除至少一部分 从衬底处理室的一个或多个内表面积聚不需要的沉积物。