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公开(公告)号:US09085046B2
公开(公告)日:2015-07-21
申请号:US13366728
申请日:2012-02-06
申请人: Keiji Nomaru
发明人: Keiji Nomaru
IPC分类号: B23K26/16 , B23K26/06 , B23K26/067
CPC分类号: B23K26/40 , B23K26/0626 , B23K26/064 , B23K26/0643 , B23K26/0652 , B23K26/067 , B23K2103/50
摘要: A laser beam applying mechanism has a power adjusting unit provided between a laser beam oscillator and a focusing lens. The power adjusting unit includes a half-wave plate, a prism having a first polarization beam splitter film and a second polarization beam splitter film. The optical path is adjusted by a piezoelectric actuator opposed to the first polarization beam splitter film, and a polarized light components synthesizer opposed to the second polarization beam splitter film generates a phase difference (β) between an S polarized light component and a P polarized light component. The phase difference (β) between the S polarized light component and the P polarized light component of the laser beam obtained by the polarized light components synthesizer is in the range of 0° to 180°.
摘要翻译: 激光束施加机构具有设置在激光束振荡器和聚焦透镜之间的功率调节单元。 功率调整单元包括半波片,具有第一偏振分束膜和第二偏振分束膜的棱镜。 通过与第一偏振分束膜相对的压电致动器调节光路,与第二偏振分束膜相对的偏振光分量合成器在S偏振光分量和P偏振光分量膜之间产生相位差(& bgr) 光分量。 由偏振光分量合成器获得的S偏振光分量和激光束的P偏振光分量之间的相位差(&bgr)在0°至180°的范围内。
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公开(公告)号:US20120312793A1
公开(公告)日:2012-12-13
申请号:US13494745
申请日:2012-06-12
申请人: Keiji Nomaru
发明人: Keiji Nomaru
IPC分类号: B23K26/02
CPC分类号: B23K26/0006 , B23K26/046 , B23K26/0648 , B23K26/0853 , B23K26/53 , B23K2103/56
摘要: A laser processing apparatus including a pulsed laser oscillator for oscillating a pulsed laser beam, a focusing objective lens for focusing the pulsed laser beam, and a varifocal lens provided between the pulsed laser oscillator and the focusing objective lens. The varifocal lens has a piezoelectric device to change its focal length according to the period of radio-frequency waves produced by the piezoelectric device. A repetition frequency adjusting unit is connected to the pulsed laser oscillator, and a radio-frequency current frequency adjusting unit is connected to the piezoelectric device. The laser processing apparatus further includes a controller for controlling the repetition frequency adjusting unit and the radio-frequency current frequency adjusting unit so as to produce a phase difference between the repetition frequency of the pulsed laser beam and the frequency of the radio-frequency current to be applied to the piezoelectric device of the varifocal lens.
摘要翻译: 一种激光加工装置,包括用于振荡脉冲激光束的脉冲激光振荡器,用于聚焦脉冲激光束的聚焦物镜和设置在脉冲激光振荡器和聚焦物镜之间的变焦透镜。 变焦透镜具有根据由压电器件产生的射频周期来改变其焦距的压电器件。 重复频率调整单元连接到脉冲激光振荡器,并且射频电流频率调节单元连接到压电器件。 激光处理装置还包括控制器,用于控制重复频率调整单元和射频电流频率调节单元,以产生脉冲激光束的重复频率与射频电流的频率之间的相位差 应用于变焦透镜的压电元件。
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公开(公告)号:US20120103952A1
公开(公告)日:2012-05-03
申请号:US13281984
申请日:2011-10-26
申请人: Keiji Nomaru
发明人: Keiji Nomaru
IPC分类号: B23K26/06
CPC分类号: B23K26/02 , B23K26/06 , B23K26/0624 , B23K26/0853 , B23K26/0876 , B23K26/364 , B23K26/40 , B23K37/0211 , B23K2101/40 , B23K2103/50 , H01L21/268 , H01S3/00
摘要: An optical transmitting unit transmits a pulsed laser beam oscillated by a pulsed laser beam oscillator to a focusing unit in a laser processing apparatus. A wavelength band expanding unit expands the wavelength band of the pulsed laser beam, and a pulse width expanding unit increases the pulse width of the expanded pulsed laser beam. A focusing lens focuses the expanded pulsed laser beam. An optical fiber transmits the focused pulsed laser beam through a collimating lens and a pulse width compressing unit compresses the pulse width of the collimated pulsed laser beam to restore the original pulse width for transmission.
摘要翻译: 光发射单元将由脉冲激光束振荡器振荡的脉冲激光束发射到激光加工设备中的聚焦单元。 波长带扩展单元扩大脉冲激光束的波长带,并且脉冲宽度扩展单元增加扩展脉冲激光束的脉冲宽度。 聚焦透镜聚焦扩展的脉冲激光束。 光纤通过准直透镜传输聚焦的脉冲激光束,并且脉冲宽度压缩单元压缩准直脉冲激光束的脉冲宽度以恢复原始脉冲宽度以进行传输。
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公开(公告)号:US07544587B2
公开(公告)日:2009-06-09
申请号:US11650503
申请日:2007-01-08
申请人: Yosuke Watanabe , Keiji Nomaru , Nobumori Ogoshi , Koichi Mitani , Taizo Kise , Kohei Matsumoto , Tatsuya Inaoka , Masaru Nakamura
发明人: Yosuke Watanabe , Keiji Nomaru , Nobumori Ogoshi , Koichi Mitani , Taizo Kise , Kohei Matsumoto , Tatsuya Inaoka , Masaru Nakamura
IPC分类号: H01L21/301
CPC分类号: B26F3/002 , B23K26/40 , B23K2103/50 , B26D7/10 , B28D5/0011 , B28D5/0052 , Y10T225/325
摘要: A method of dividing, along lattice pattern-like dividing lines, a wafer which has the lattice pattern-like dividing lines and a polymer film on the front surface of a substrate and is processed to allow for division along the dividing lines, the method comprising a frame holding step for putting the wafer on the surface of an adhesive tape mounted on an annular frame; a wafer cooling step for cooling the wafer that is affixed to the surface of the adhesive tape mounted on the annular frame; and a diving step for dividing the wafer along the dividing lines by expanding the adhesive tape to which the cooled wafer is affixed.
摘要翻译: 沿着格子状分割线将具有格子状分割线的晶片和在基板的前表面上的聚合物膜分割的方法,其被处理以允许沿着分割线分割,所述方法包括 框架保持步骤,用于将晶片放置在安装在环形框架上的胶带的表面上; 用于冷却固定到安装在环形框架上的胶带的表面的晶片的晶片冷却步骤; 以及用于通过使粘附有冷却晶片的粘合带膨胀而沿着分割线分割晶片的潜水步骤。
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公开(公告)号:US07428062B2
公开(公告)日:2008-09-23
申请号:US12006530
申请日:2008-01-03
申请人: Keiji Nomaru
发明人: Keiji Nomaru
CPC分类号: G01B11/14 , B23K26/03 , B23K26/032 , B23K26/034 , B23K26/046 , B23K26/048 , B23K26/0853 , G01B11/0608 , G01B2210/50 , H01L21/67253
摘要: An apparatus for measuring the height of a work held by a chuck table provided in a machining apparatus, including: a white light source for emitting a white beam of light; a chromatic aberration lens for condensing the white beam emitted from the white light source; a beam splitter which is disposed between the white light source and the chromatic aberration lens and by which a reflected beam of the white beam irradiating the work therewith is split; a first condenser lens for condensing the reflected beam split by the beam splitter; a diffraction grating by which the reflected beam condensed by the first condenser lens is converted into a diffracted beam; a second condenser lens for condensing the diffracted beam diffracted by the diffraction grating; and a wavelength detecting unit for detecting the wavelength of the diffracted beam condensed by the second condenser lens.
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公开(公告)号:US20080204748A1
公开(公告)日:2008-08-28
申请号:US12028470
申请日:2008-02-08
申请人: Keiji Nomaru , Taiki Sawabe
发明人: Keiji Nomaru , Taiki Sawabe
IPC分类号: G01J3/12
CPC分类号: G01B11/0608 , B23K26/04 , B23K26/046 , B23K26/0853 , G01B2210/50
摘要: A measuring device for measuring the height of a workpiece held on a chuck table provided in a processing machine. The measuring device includes a white light source for emitting white light, an acousto-optic deflecting unit for separating the white light emitted from the white light source to produce a flux of diffracted light and for swinging the flux of the diffracted light over a predetermined angular range by applying a voltage, a pinhole mask for passing light having a part of the wavelengths of the diffracted light produced by the acousto-optic deflecting unit, and a chromatic aberration lens for focusing the light passed through the pinhole mask and for applying the focused light to the workpiece held on the chuck table.
摘要翻译: 一种用于测量保持在设置在加工机器中的卡盘台上的工件的高度的测量装置。 测量装置包括用于发射白光的白光源,声光偏转单元,用于分离从白光源发射的白光,以产生衍射光束,并将衍射光的光束摆动在预定角度 通过施加电压的范围,用于通过具有由声光偏转单元产生的衍射光的一部分波长的光的针孔掩模和用于聚焦通过针孔掩模的光并用于施加聚焦的色差透镜 光照到卡盘上的工件。
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公开(公告)号:US20080180697A1
公开(公告)日:2008-07-31
申请号:US12002038
申请日:2007-12-14
申请人: Taiki Sawabe , Keiji Nomaru
发明人: Taiki Sawabe , Keiji Nomaru
IPC分类号: G01B11/06
CPC分类号: G01B11/0625 , B23K26/048 , B23K26/0861 , B23K2101/40
摘要: A measuring instrument for a wafer for measuring the thickness of a wafer held on a chuck table using a laser beam includes a condenser for condensing and irradiating the laser beam on the wafer held on the chuck table, a light reception unit for receiving reflected light of the laser beam irradiated upon the wafer, a convergence light point changing unit for changing the convergence light point of the laser beam, and a control unit for measuring the thickness of the wafer based on a change signal from the convergence light point changing unit and a light reception signal from the light reception unit. The control unit stores a thickness control map. The control unit controls an angle adjustment actuator, provided for adjusting the installation angle of a pair of mirrors, to change the installation angle and detects two peaks of the light amount based on the reception signal from the light reception unit.
摘要翻译: 用于测量使用激光束保持在卡盘台上的晶片的厚度的晶片测量仪器包括用于在保持在卡盘台上的晶片上聚集和照射激光束的聚光器,用于接收反射光的反射光的光接收单元 照射在晶片上的激光束,用于改变激光束的会聚光点的会聚光点改变单元和用于根据来自会聚光点改变单元的变化信号测量晶片的厚度的控制单元,以及 来自光接收单元的光接收信号。 控制单元存储厚度控制图。 控制单元控制角度调节致动器,用于调节一对反射镜的安装角度,以改变安装角度,并根据来自光接收单元的接收信号检测光量的两个峰值。
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公开(公告)号:US20080061042A1
公开(公告)日:2008-03-13
申请号:US11899452
申请日:2007-09-06
申请人: Keiji Nomaru
发明人: Keiji Nomaru
IPC分类号: B23K26/38 , B23K26/073
CPC分类号: B23K26/073 , B23K26/0622 , B23K26/066 , B23K26/082 , B23K26/389
摘要: A laser beam machining system including a chuck table for holding a work, and a laser beam irradiation unit for irradiating the work held on the chuck table with a laser beam, wherein the laser beam irradiation unit includes: a pulsed laser beam oscillator for oscillating a pulsed laser beam; a condenser for condensing the pulsed laser beam oscillated from the pulsed laser beam oscillator; a laser beam scanning unit disposed between the pulsed laser beam oscillator and the condenser and operative to deflect the pulsed laser beam to be inputted to the condenser; and a laser beam reshaping unit which ids disposed between the pulsed laser beam oscillator and the laser beam scanning unit and by which the energy distribution of the pulsed laser beam oscillated from the pulsed laser beam oscillator is reshaped into a top hat shape.
摘要翻译: 一种激光束加工系统,包括:用于保持工件的卡盘台;激光束照射单元,用于用激光束照射夹持台上的作业,其中所述激光束照射单元包括:脉冲激光束振荡器, 脉冲激光束; 用于聚集从脉冲激光束振荡器振荡的脉冲激光束的聚光器; 激光束扫描单元,设置在所述脉冲激光束振荡器和所述冷凝器之间,并且可操作以使要输入到所述冷凝器的所述脉冲激光束偏转; 以及激光束整形单元,其设置在脉冲激光束振荡器和激光束扫描单元之间,并且脉冲激光束从脉冲激光束振荡器振荡的能量分布重新形成顶帽形状。
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公开(公告)号:US09289853B2
公开(公告)日:2016-03-22
申请号:US13536236
申请日:2012-06-28
申请人: Keiji Nomaru
发明人: Keiji Nomaru
IPC分类号: B23K26/364 , B23K26/073 , B23K26/08 , B23K26/40
CPC分类号: B23K26/073 , B23K26/0853 , B23K26/0869 , B23K26/364 , B23K26/40 , B23K2103/50
摘要: A laser beam applying apparatus includes a laser beam oscillating unit, a focusing lens, and a diffractive optic element provided between the laser beam oscillating unit and the focusing lens for defining the spot shape of the laser beam oscillated by the laser beam oscillating unit. A zeroth-order light removing unit removes zeroth-order light emerging from the diffractive optic element and leaves first-order light whose spot shape has been defined by the diffractive optic element and the focusing lens. A first prism has an incident surface and an emergent surface inclined with respect to the incident surface. A second prism has a zeroth-order light reflecting surface for reflecting the zeroth-order light and a first-order light emerging surface from which the first-order light emerges. A damper absorbs the zeroth-order light reflected on the zeroth-order light reflecting surface of the second prism.
摘要翻译: 激光束施加装置包括激光束振荡单元,聚焦透镜和设置在激光束振荡单元和聚焦透镜之间的衍射光学元件,用于限定由激光束振荡单元振荡的激光束的斑点形状。 零级光去除单元去除从衍射光学元件出射的零级光,并留下其点形状由衍射光学元件和聚焦透镜限定的一阶光。 第一棱镜具有入射表面和相对于入射表面倾斜的出射表面。 第二棱镜具有用于反射零级光的第零级光反射表面和一阶光出射的一级光出射表面。 阻尼器吸收在第二棱镜的零级光反射表面上反射的零级光。
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公开(公告)号:US08766137B2
公开(公告)日:2014-07-01
申请号:US13281984
申请日:2011-10-26
申请人: Keiji Nomaru
发明人: Keiji Nomaru
CPC分类号: B23K26/02 , B23K26/06 , B23K26/0624 , B23K26/0853 , B23K26/0876 , B23K26/364 , B23K26/40 , B23K37/0211 , B23K2101/40 , B23K2103/50 , H01L21/268 , H01S3/00
摘要: An optical transmitting unit transmits a pulsed laser beam oscillated by a pulsed laser beam oscillator to a focusing unit in a laser processing apparatus. A wavelength band expanding unit expands the wavelength band of the pulsed laser beam, and a pulse width expanding unit increases the pulse width of the expanded pulsed laser beam. A focusing lens focuses the expanded pulsed laser beam. An optical fiber transmits the focused pulsed laser beam through a collimating lens and a pulse width compressing unit compresses the pulse width of the collimated pulsed laser beam to restore the original pulse width for transmission.
摘要翻译: 光发射单元将由脉冲激光束振荡器振荡的脉冲激光束发射到激光加工设备中的聚焦单元。 波长带扩展单元扩大脉冲激光束的波长带,并且脉冲宽度扩展单元增加扩展脉冲激光束的脉冲宽度。 聚焦透镜聚焦扩展的脉冲激光束。 光纤通过准直透镜传输聚焦的脉冲激光束,并且脉冲宽度压缩单元压缩准直脉冲激光束的脉冲宽度以恢复原始脉冲宽度以进行传输。
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