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公开(公告)号：US20100090132A1
公开(公告)日：2010-04-15
申请号：US12559977
申请日：2009-09-15
申请人： Akira ENDO , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Akira ENDO , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21K5/00
摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。
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公开(公告)号：US20100078579A1
公开(公告)日：2010-04-01
申请号：US12566170
申请日：2009-09-24
申请人： Akira Endo , Shinji Nagai , Kouji Kakizaki , Osamu Wakabayashi , Yoshifumi Ueno
发明人： Akira Endo , Shinji Nagai , Kouji Kakizaki , Osamu Wakabayashi , Yoshifumi Ueno
IPC分类号： G21K5/00
摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.
摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。
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公开(公告)号：US20080095209A1
公开(公告)日：2008-04-24
申请号：US11903111
申请日：2007-09-19
申请人： Osamu Wakabayashi , Tsukasa Hori , Takanobu Ishihara , Shinji Nagai , Hakaru Mizoguchi , Kouji Kakizaki
发明人： Osamu Wakabayashi , Tsukasa Hori , Takanobu Ishihara , Shinji Nagai , Hakaru Mizoguchi , Kouji Kakizaki
IPC分类号： H01S3/22
CPC分类号： H01S3/2333 , H01S3/005 , H01S3/036 , H01S3/0384 , H01S3/0385 , H01S3/073 , H01S3/08009 , H01S3/08045 , H01S3/09702 , H01S3/0971 , H01S3/1055 , H01S3/1305 , H01S3/225 , H01S3/2251 , H01S3/2316 , H01S3/2366
摘要： A high efficiency injection device 4, which injects oscillation stage laser light into an optical stable resonator of an amplification stage laser 20, is provided. A discharge electrode 1a is disposed in an oscillation stage laser 10, and is connected to a 12 kHz power supply 15 for discharging the discharge electrode 1a, and also a plurality of pairs of discharge electrodes 2a, 2b are disposed within the optical stable resonator of the amplification stage laser 20, and are connected to 6 kHz power supplies 25a, 25b for discharging the respective electrode pairs 2a, 2b. Discharge voltages are applied alternately to the two pairs of electrodes 2a, 2b in synchronization with the injected light to cause discharge.
摘要翻译： 提供了将振荡级激光注入到放大级激光器20的光稳定谐振器中的高效率注入装置4。 放电电极1a设置在振荡级激光器10中，并且连接到用于放电放电电极1a的12kHz电源15，并且多对放电电极2a，2b布置在 放大级激光器20的光稳定谐振器，并且连接到用于对各个电极对2a，2b进行放电的6kHz电源25a，25b。 与注入的光同步地将放电电压交替地施加到两对电极2a，2b，以引起放电。
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34.发明授权公开(公告)号：US08525140B2
公开(公告)日：2013-09-03
申请号：US13494466
申请日：2012-06-12
申请人： Tooru Abe , Osamu Wakabayashi
发明人： Tooru Abe , Osamu Wakabayashi
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a first optical system and a second optical system. The chamber has an inlet for introducing a laser beam thereinto. The target supply unit supplies a target material to a region inside the chamber. The first optical system focuses the laser beam in the region. The guide beam output device outputs a guide beam. The second optical system directs the guide beam such that an axis of a beam path of the guide beam substantially coincides with an axis of a beam path of the laser beam and such that the guide beam enters the focusing optical system through the region.
摘要翻译： 用于利用激光装置操作的室装置包括室，目标供应单元，第一光学系统和第二光学系统。 该室具有用于将激光束引入其中的入口。 目标供应单元将目标材料供应到室内的区域。 第一光学系统将激光束聚焦在该区域中。 引导光束输出装置输出引导光束。 第二光学系统引导引导光束，使得引导光束的光束路径的轴线基本上与激光束的光束路径的轴线重合，并且使得引导光束通过该区域进入聚焦光学系统。
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35.发明申请公开(公告)号：US20130026393A1
公开(公告)日：2013-01-31
申请号：US13494466
申请日：2012-06-12
申请人： Tooru ABE , Osamu Wakabayashi
发明人： Tooru ABE , Osamu Wakabayashi
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a first optical system and a second optical system. The chamber has an inlet for introducing a laser beam thereinto. The target supply unit supplies a target material to a region inside the chamber. The first optical system focuses the laser beam in the region. The guide beam output device outputs a guide beam. The second optical system directs the guide beam such that an axis of a beam path of the guide beam substantially coincides with an axis of a beam path of the laser beam and such that the guide beam enters the focusing optical system through the region.
摘要翻译： 用于利用激光装置操作的室装置包括室，目标供应单元，第一光学系统和第二光学系统。 该室具有用于将激光束引入其中的入口。 目标供应单元将目标材料供应到室内的区域。 第一光学系统将激光束聚焦在该区域中。 引导光束输出装置输出引导光束。 第二光学系统引导引导光束，使得引导光束的光束路径的轴线基本上与激光束的光束路径的轴线重合，并且使得引导光束通过该区域进入聚焦光学系统。
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公开(公告)号：US09647415B2
公开(公告)日：2017-05-09
申请号：US14602208
申请日：2015-01-21
CPC分类号： H01S3/09702 , H01S3/0014 , H01S3/08009 , H01S3/09705 , H01S3/0971 , H01S3/2366
摘要： A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.
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公开(公告)号：US09257809B2
公开(公告)日：2016-02-09
申请号：US13401734
申请日：2012-02-21
CPC分类号： H01S3/03 , G03F7/70025 , H01S3/036 , H01S3/134 , H01S3/2316 , H01S3/2366
摘要： A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus.
摘要翻译： 用于曝光装置的激光装置可以包括：MOPA型或MOPO型激光装置，其包括种子激光器和至少一个气体放电泵浦放大器级，其接收来自种子激光器的输出光作为输入，放大光， 并输出放大的光; 以及激光气体控制装置中的至少一个，所述激光气体控制装置至少根据所要求的能量来改变所述放大器级中的激光气体的总压力，激光电源控制装置至少改变放大器级中的放电电极的泵浦强度 根据所述要求的能量，在来自所述激光装置的激光输出光的能量将根据来自曝光装置的请求而不连续地改变的情况下。
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公开(公告)号：US09046651B2
公开(公告)日：2015-06-02
申请号：US13696528
申请日：2011-12-29
CPC分类号： G02B7/181 , G02B5/0891 , G02B5/10 , G03F7/70033 , G03F7/70175
摘要： A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
摘要翻译： 反射镜装置可以包括：反射镜，包括基板，在基板的第一表面上的反射膜，以及在基板的第二表面上的多个第一突起; 多个用于分别支撑多个第一突起的支撑部分，每个支撑部分具有形成在其中的槽，用于引导第一突起; 以及多个夹具，用于分别将多个第一突起抵靠在多个支撑部分中的相应凹槽上。
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39.发明授权Laser apparatus, extreme ultraviolet light generation system including the laser apparatus, and method for controlling the laser apparatus 有权激光装置，包括激光装置的极紫外光发生系统和用于控制激光装置的方法公开(公告)号：US08811436B2
公开(公告)日：2014-08-19
申请号：US13696497
申请日：2012-02-08
申请人： Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
发明人： Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
IPC分类号： H01S3/13
CPC分类号： H01S3/10046 , G03F7/70025 , G03F7/70033 , H01S3/0085 , H01S3/09702 , H01S3/10007 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S5/4025 , H05G2/005 , H05G2/008
摘要： A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier disposed in a beam path of the laser beam from the master oscillator, at least one power source for applying a high-frequency voltage to the at least one amplifier, and a controller for varying the high-frequency voltage to be applied to the at least one amplifier from the at least one power source.
摘要翻译： 激光装置可以包括主振荡器，其被配置为输出激光束，至少一个放大器，设置在来自主振荡器的激光束的光束路径中，至少一个电源，用于将至少一个高频电压 放大器和控制器，用于改变要从至少一个电源施加到至少一个放大器的高频电压。
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公开(公告)号：US08804780B2
公开(公告)日：2014-08-12
申请号：US11822126
申请日：2007-07-02
CPC分类号： G03F7/2006 , H01S3/08036 , H01S3/106 , H01S3/137 , H01S3/139 , H01S3/225
摘要： An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.
摘要翻译： 对于多个窄带激光装置共有的谱线宽度，预先设定上限和下限。 当交付或进行维护时，使窄带激光装置激光振荡，以便在用作半导体曝光的光源之前检测其光谱线宽度。 调整设置在窄带激光装置中的谱线宽度调节单元，使得谱线宽度呈现上限和下限之间的值。 本发明能够抑制激光装置的制造时的机器差异引起的E95带宽等的频谱线宽度的变化，或者通过更换或维护激光装置，能够抑制由半导体形成的集成电路图案的质量 曝光工具可以稳定。
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