Reactor for continuous coating of glass
    31.
    发明授权
    Reactor for continuous coating of glass 失效
    玻璃连续涂层反应器

    公开(公告)号:US4524718A

    公开(公告)日:1985-06-25

    申请号:US521675

    申请日:1983-08-10

    申请人: Roy G. Gordon

    发明人: Roy G. Gordon

    IPC分类号: C03C17/22 C23C16/34 C23C13/10

    摘要: Apparatus for continuous of mixing two reactants in proximity to an object upon which a reaction product is to be coated continuously and uniformly means is provided for maintaining reactants from premature contact. The reactant-feed holes are placed at a distance above the surface to be coated to optimize the combination of manufacturing practicality and the precision with which the holes can be economically formed.

    摘要翻译: 用于连续地将两种反应物连续地混合在反应产物将被连续地均匀涂覆的物体附近的装置用于保持反应物过早接触。 反应物供给孔被放置在待涂覆表面上方的距离处,以优化制造实用性和可以经济地形成孔的精度的组合。

    Non-iridescent glass structures
    33.
    发明授权

    公开(公告)号:US4419386A

    公开(公告)日:1983-12-06

    申请号:US412599

    申请日:1982-08-30

    申请人: Roy G. Gordon

    发明人: Roy G. Gordon

    IPC分类号: C03C17/34 G02B5/20 C03C17/23

    摘要: This disclosure describes transparent glass window structures of the type bearing a coating of infra-red reflective material which is advantageously less than about 0.85 microns in thickness and wherein the observance of iridescence resulting from such a reflective coating is markedly reduced by provision of a very thin coating system beneath said infra-red reflective coating. The thin coating system forms means to reflect and refract light to interfere with the observation of iridescence. A particular advantage of the invention is the ability of the thin coating system to be coated in a fraction of time presently required to coat anti-iridescent interlayers of the prior art.

    Electrically conductive, infrared reflective, transparent coatings of
stannic oxide
    34.
    发明授权
    Electrically conductive, infrared reflective, transparent coatings of stannic oxide 失效
    导电,红外反射,透明氧化锡涂层

    公开(公告)号:US4265974A

    公开(公告)日:1981-05-05

    申请号:US28502

    申请日:1979-04-09

    申请人: Roy G. Gordon

    发明人: Roy G. Gordon

    摘要: Electrically-conductive films of tin oxide are prepared by a novel process utilizing gaseous chemical compounds which react to form a tin-fluorine bond at a temperature which is (1) high enough so that the newly-created tin-fluorine bond-bearing molecule remains in the vapor phase; and (2) low enough so that oxidation of the molecule occurs only after the indicated re-arrangement. Films prepared by the process of the invention are characterized by surface resistances as low as 1 ohm per square when the film thickness is as thin as about a micron. These films are also characterized by extremely good reflectance of infrared radiation.

    摘要翻译: 氧化锡的导电膜通过利用在(1)足够高的温度下反应形成锡 - 氟键的气态化合物的新方法制备,使得新生成的含有锡 - 氟键的分子保持 在气相中 和(2)足够低,使得仅在所述重新排列之后才发生分子的氧化。 通过本发明的方法制备的薄膜的特征在于当薄膜厚度为约一微米时,表面电阻低至1欧姆/平方厘米。 这些膜的特征还在于红外辐射的反射率非常好。

    Deposition method for coating glass and the like
    35.
    发明授权
    Deposition method for coating glass and the like 失效
    镀膜玻璃等的沉积方法

    公开(公告)号:US4206252A

    公开(公告)日:1980-06-03

    申请号:US884432

    申请日:1978-03-08

    申请人: Roy G. Gordon

    发明人: Roy G. Gordon

    摘要: This disclosure describes transparent glass window structures of the type bearing a first coating of infra-red reflective material which is advantageously less than about 0.85 microns in thickness and wherein the observance of iridescence resulting from such a first coating is markedly reduced by provision of a layer of continuously varying refractive index between the glass and the coating, such that the refractive index increases continuously from the glass to the first coating, thereby preventing the observation of iridescence. The invention also encompasses simple processes for providing such windows. A particular advantage of the invention is its efficacy with clear and lightly tinted glasses wherein the problem of iridescent color has had its greatest commercial impact.

    摘要翻译: 本公开描述了类型的透明玻璃窗结构,其具有红外反射材料的第一涂层,其有利地小于约0.85微米厚,并且其中由这样的第一涂层产生的虹彩的观察通过提供层 在玻璃和涂层之间连续变化的折射率,使得折射率从玻璃到第一涂层连续地增加,从而防止了虹彩的观察。 本发明还包括用于提供这种窗口的简单过程。 本发明的一个特别优点在于其清晰和轻质着色的眼镜的功效,其中彩虹色的问题具有最大的商业影响。

    ATOMIC LAYER DEPOSITION USING METAL AMIDINATES
    38.
    发明申请
    ATOMIC LAYER DEPOSITION USING METAL AMIDINATES 有权
    使用金属氨基酸的原子层沉积

    公开(公告)号:US20100092667A1

    公开(公告)日:2010-04-15

    申请号:US12496499

    申请日:2009-07-01

    摘要: Metal films are deposited with uniform thickness and excellent step coverage. Copper metal films were deposited on heated substrates by the reaction of alternating doses of copper(I) NN′-diispropylacetamidinate vapor and hydrogen gas. Cobalt metal films were deposited on heated substrates b the reaction of alternating doses of cobalt(II) bis(N,N′-diispropylacetamidinate) vapor and hydrogen gas. Nitrides and oxides of these metals can be formed by replacing the hydrogen with ammonia or water vapor, respectively. The films have very uniform thickness and excellent step coverage in narrow holes. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices.

    摘要翻译: 金属膜以均匀的厚度沉积并具有优异的台阶覆盖率。 通过交替剂量的铜(I)NN'-二丙基乙酰胺化物蒸气和氢气的反应,将铜金属膜沉积在加热的基底上。 将钴金属膜沉积在加热的基底上,b交替剂量的双(N,N'-二异丙基乙酰胺基)钴(II)蒸气和氢气的反应。 这些金属的氮化物和氧化物可以通过分别用氨或水蒸汽代替氢来形成。 薄膜具有非常均匀的厚度,并且在窄孔中具有优异的台阶覆盖率。 合适的应用包括微电子学中的电互连和磁信息存储设备中的磁阻层。

    ATOMIC LAYER DEPOSITION USING METAL AMIDINATES
    39.
    发明申请
    ATOMIC LAYER DEPOSITION USING METAL AMIDINATES 有权
    使用金属氨基酸的原子层沉积

    公开(公告)号:US20090291208A1

    公开(公告)日:2009-11-26

    申请号:US12535324

    申请日:2009-08-04

    摘要: Metal films are deposited with uniform thickness and excellent step coverage. Copper metal films were deposited on heated substrates by the reaction of alternating doses of copper(I) NN′-diispropylacetamidinate vapor and hydrogen gas. Cobalt metal films were deposited on heated substrates b the reaction of alternating doses of cobalt(II) bis(N,N′-diispropylacetamidinate) vapor and hydrogen gas. Nitrides and oxides of these metals can be formed by replacing the hydrogen with ammonia or water vapor, respectively. The films have very uniform thickness and excellent step coverage in narrow holes. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices.

    摘要翻译: 金属膜以均匀的厚度沉积并具有优异的台阶覆盖率。 通过交替剂量的铜(I)NN'-二丙基乙酰胺化物蒸气和氢气的反应,将铜金属膜沉积在加热的基底上。 将钴金属膜沉积在加热的基底上,b交替剂量的双(N,N'-二异丙基乙酰胺基)钴(II)蒸气和氢气的反应。 这些金属的氮化物和氧化物可以通过分别用氨或水蒸汽代替氢来形成。 薄膜具有非常均匀的厚度,并且在窄孔中具有优异的台阶覆盖率。 合适的应用包括微电子学中的电互连和磁信息存储设备中的磁阻层。