Composite device and program
    32.
    发明授权

    公开(公告)号:US12099587B2

    公开(公告)日:2024-09-24

    申请号:US17627422

    申请日:2020-07-13

    CPC classification number: G06F21/32 G06V40/13 G06V40/1365

    Abstract: A composite device with a high security level is provided. A composite device capable of inhibiting unauthorized use favorably is provided. The composite device includes a control portion, a detection portion, an authentication portion, and a memory portion. The detection portion has a function of detecting a touch and a function of obtaining first fingerprint data of a finger touching the detection portion. The authentication portion has a function of executing user authentication processing. The memory portion has a function of retaining second fingerprint data registered in advance. The control portion has a function of bringing a system into an unlocked state when the authentication portion authenticates a user and a function of comparing the first fingerprint data obtained by the detection portion and the second fingerprint data when the detection portion detects a touch, and bringing the system into a locked state in the case where those data do not match.

    Semiconductor device
    34.
    发明授权

    公开(公告)号:US12074223B2

    公开(公告)日:2024-08-27

    申请号:US17182270

    申请日:2021-02-23

    Inventor: Shunpei Yamazaki

    CPC classification number: H01L29/7869 H01L29/1054 H01L29/78696

    Abstract: A transistor including an oxide semiconductor layer can have stable electrical characteristics. In addition, a highly reliable semiconductor device including the transistor is provided. A semiconductor device includes a multi-layer film including an oxide layer and an oxide semiconductor layer, a gate insulating film in contact with the multi-layer film, and a gate electrode overlapping with the multi-layer film with the gate insulating film provided therebetween. In the semiconductor device, the oxide semiconductor layer contains indium, the oxide semiconductor layer is in contact with the oxide layer, and the oxide layer contains indium and has a larger energy gap than the oxide semiconductor layer.

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