公开(公告)号：US10083998B2

公开(公告)日：2018-09-25

申请号：US15491279

申请日：2017-04-19

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Bo Shim ,  Jun-Gi Kim ,  Yong-Jun Park ,  Yang-Ho Jung ,  Jin-Ho Ju

IPC: H01L27/14 ,  H01L27/12 ,  G03F1/38 ,  G03F1/22

CPC classification number: H01L27/1288 ,  G03F1/22 ,  G03F1/38 ,  H01L27/124

Abstract: An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

公开(公告)号：US10018906B2

公开(公告)日：2018-07-10

申请号：US15018771

申请日：2016-02-08

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Bo Shim ,  Dong-Hyun Yu ,  Jin-Ho Ju

IPC: G03F1/50 ,  H01L27/12 ,  G03F1/00 ,  H01L21/027 ,  H01L21/311 ,  H01L29/66 ,  H01L21/32 ,  H01L51/05

CPC classification number: G03F1/50 ,  G03F1/00 ,  H01L21/0274 ,  H01L21/31144 ,  H01L21/32 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1248 ,  H01L27/1259 ,  H01L29/66757 ,  H01L51/0541 ,  H01L51/0545

Abstract: A display device includes a substrate including a first region and a second region, a gate line and a data line on the substrate, a thin film transistor on the substrate, being connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, wherein the second region has a second contact hole of which an area is larger than that of a first contact hole of the first region.

公开(公告)号：US20170371238A1

公开(公告)日：2017-12-28

申请号：US15699955

申请日：2017-09-08

Applicant: SAMSUNG DISPLAY CO., LTD. ,  INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY

Inventor： Yong Son ,  Min Kang ,  Bong-Yeon Kim ,  Hyun-Joo Lee ,  Hyang-Shik Kong ,  Jin-Ho Ju ,  Kyoung-Sik Kim ,  Seung-Hwa Baek

IPC: G03F1/26 ,  G03F1/50 ,  G03F1/32

CPC classification number: G03F1/26 ,  G03F1/32 ,  G03F1/50

Abstract: A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.

公开(公告)号：US09778558B2

公开(公告)日：2017-10-03

申请号：US14752415

申请日：2015-06-26

Applicant: SAMSUNG DISPLAY CO., LTD. ,  INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY

Inventor： Yong Son ,  Min Kang ,  Bong-Yeon Kim ,  Hyun-Joo Lee ,  Hyang-Shik Kong ,  Jin-Ho Ju ,  Kyoung-Sik Kim ,  Seung-Hwa Baek

IPC: G03F1/26 ,  G03F1/50 ,  G03F1/32

CPC classification number: G03F1/26 ,  G03F1/32 ,  G03F1/50

Abstract: A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.

公开(公告)号：US09759968B2

公开(公告)日：2017-09-12

申请号：US14576123

申请日：2014-12-18

Applicant: Samsung Display Co., Ltd.

Inventor： Ki-Hyun Cho ,  Sung-Kyun Park ,  Ji-Hyun Kim ,  Jeong-Min Park ,  Jung-Soo Lee ,  Jun Chun ,  Jin-Ho Ju

IPC: G02F1/1362 ,  H01L29/786 ,  H01L29/66

CPC classification number: G02F1/136227 ,  G02F2001/136231 ,  G02F2001/136236 ,  H01L29/66969 ,  H01L29/78606 ,  H01L29/7869

Abstract: A thin film transistor substrate includes a gate electrode on a base substrate, an active pattern on the gate electrode, a source electrode on a first end of the active pattern, a drain electrode on a second end of the active pattern, an organic insulation layer on the source electrode and the drain electrode, and a transparent electrode contacting the drain electrode through a contact opening in the organic insulation layer. The drain electrode is spaced from the source electrode. The organic insulation layer includes a first thickness portion around the contact opening and a second thickness portion adjacent to the first thickness portion. The second thickness portion has a thickness greater than that of the first thickness portion.

公开(公告)号：US20170221937A1

公开(公告)日：2017-08-03

申请号：US15491279

申请日：2017-04-19

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Bo Shim ,  Jung-Gi Kim ,  Yong-Jun Park ,  Yang-Ho Jung ,  Jin-Ho Ju

IPC: H01L27/12 ,  G03F1/38 ,  G03F1/22

CPC classification number: H01L27/1288 ,  G03F1/22 ,  G03F1/38 ,  H01L27/124

Abstract: An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

公开(公告)号：US09575405B2

公开(公告)日：2017-02-21

申请号：US14678743

申请日：2015-04-03

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jun-Hyuk Woo ,  Jeong-Won Kim ,  Kwang-Woo Park ,  Dong-Eon Lee ,  Seung-Bo Shim ,  Jin-Ho Ju

IPC: G03F1/38 ,  G03F1/58 ,  G03F1/80 ,  G03F1/54 ,  G03F7/00

CPC classification number: G03F1/38 ,  G03F1/54 ,  G03F1/58 ,  G03F1/80 ,  G03F7/0007

Abstract: A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.

Abstract translation: 光掩模包括透明基板和掩模图案。 掩模图案设置在透明基板上。 掩模图案包括用于遮挡光的阻挡部分和用于透射光的透射部分。 传送部分与阻挡部分相邻。 阻挡部分包括第一阻挡层，光引导层和第二阻挡层。 第一阻挡层设置在透明基板上。 第一阻挡层透射光的一部分。 第一阻挡层包括多个阻挡图案，包括第一阻挡材料。 光引导层设置在第一阻挡层上。 光导层将光的透射部分引导到光导层的侧表面。 第二阻挡层反射光的透射部分。

公开(公告)号：US09293475B2

公开(公告)日：2016-03-22

申请号：US14316523

申请日：2014-06-26

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Bo Shim ,  Dong-Hyun Yu ,  Jin-Ho Ju

IPC: H01L27/12 ,  G03F1/00 ,  H01L21/027 ,  H01L21/311 ,  H01L29/66 ,  H01L21/32 ,  H01L51/05

CPC classification number: G03F1/50 ,  G03F1/00 ,  H01L21/0274 ,  H01L21/31144 ,  H01L21/32 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1248 ,  H01L27/1259 ,  H01L29/66757 ,  H01L51/0541 ,  H01L51/0545

Abstract: A display device includes a substrate including a first region and a second region, a gate line and a data line on the substrate, a thin film transistor on the substrate, being connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, wherein the second region has a second contact hole of which an area is larger than that of a first contact hole of the first region.

Abstract translation: 一种显示装置，包括：基板，包括第一区域和第二区域;基板上的栅极线和数据线;基板上的薄膜晶体管，连接到栅极线和数据线，以及连接有像素电极的像素电极 到所述薄膜晶体管，其中所述第二区域具有第二接触孔，所述第二接触孔的面积大于所述第一区域的第一接触孔的面积。

公开(公告)号：US20150228732A1

公开(公告)日：2015-08-13

申请号：US14576123

申请日：2014-12-18

Applicant: Samsung Display Co., Ltd.

Inventor： Ki-Hyun Cho ,  Sung-Kyun Park ,  Ji-Hyun Kim ,  Jeong-Min Park ,  Jung-Soo Lee ,  Jun Chun ,  Jin-Ho Ju

IPC: H01L29/40 ,  H01L29/417 ,  G02F1/1333 ,  G02F1/1368 ,  G02F1/1362 ,  H01L29/786 ,  H01L29/66

CPC classification number: G02F1/136227 ,  G02F2001/136231 ,  G02F2001/136236 ,  H01L29/66969 ,  H01L29/78606 ,  H01L29/7869

Abstract: A thin film transistor substrate includes a gate electrode on a base substrate, an active pattern on the gate electrode, a source electrode on a first end of the active pattern, a drain electrode on a second end of the active pattern, an organic insulation layer on the source electrode and the drain electrode, and a transparent electrode contacting the drain electrode through a contact opening in the organic insulation layer. The drain electrode is spaced from the source electrode. The organic insulation layer includes a first thickness portion around the contact opening and a second thickness portion adjacent to the first thickness portion. The second thickness portion has a thickness greater than that of the first thickness portion.

Abstract translation: 薄膜晶体管基板包括在基底基板上的栅极电极，栅电极上的有源图案，有源图案的第一端上的源电极，有源图案的第二端上的漏电极，有机图案的第二端上的有机绝缘层 在源电极和漏电极上，以及透明电极，通过有机绝缘层中的接触开口与漏电极接触。 漏电极与源电极间隔开。 有机绝缘层包括围绕接触开口的第一厚度部分和与第一厚度部分相邻的第二厚度部分。 第二厚度部分的厚度大于第一厚度部分的厚度。

公开(公告)号：US08911926B2

公开(公告)日：2014-12-16

申请号：US13857554

申请日：2013-04-05

Applicant: Samsung Display Co., Ltd.

Inventor： Jeong-Won Kim ,  Min Kang ,  Bong-Yeon Kim ,  Jin-Ho Ju ,  Dong-Min Kim ,  Tae-Gyun Kim ,  Joo-Kyoung Park ,  Chul-Won Park ,  Jun-Hyuk Woo ,  Won-Young Lee ,  Hyun-Joo Lee ,  Eun Jeagal

IPC: G03C1/52 ,  G03F7/022 ,  G03F7/00 ,  B21B27/10 ,  B05D3/10 ,  B21B45/02

CPC classification number: G03F7/022 ,  B05D3/107 ,  B21B27/10 ,  B21B45/02 ,  G03F7/00 ,  G03F7/0045 ,  G03F7/40

Abstract: A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.

Abstract translation: 公开了一种形成金属图案的方法。 在该方法中，在基底基板上形成金属层。 将光致抗蚀剂组合物涂覆在金属层上以形成涂层。 光致抗蚀剂组合物包括粘合剂树脂，光敏剂，巯基丙酸化合物和溶剂。 涂层被曝光。 部分去除涂层以形成光致抗蚀剂图案。 通过使用光致抗蚀剂图案作为掩模来对金属层进行构图。