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    Plasma-assisted gas production
    32.
    发明授权
    Plasma-assisted gas production 失效
    等离子体辅助天然气生产

    公开(公告)号：US07497922B2

    公开(公告)日：2009-03-03

    申请号：US10513220

    申请日：2003-05-07

    Applicant: Satyendra Kumar ,  Devendra Kumar

    Inventor： Satyendra Kumar ,  Devendra Kumar

    IPC: H05H1/00

    CPC classification number: C01B3/342 ,  B01J19/088 ,  B01J19/126 ,  B01J2219/0809 ,  B01J2219/083 ,  B01J2219/0835 ,  B01J2219/0869 ,  B01J2219/0886 ,  B01J2219/0892 ,  C01B2203/04 ,  C01B2203/0861 ,  C01B2203/1041 ,  H05H1/46 ,  H05H2001/4607

    Abstract: Methods and apparatus are provided for plasma-assisted gas production. In one embodiment, a gas, which includes at least one atomic or molecular species, can flow into a cavity (305). The gas can be subjected to electromagnetic radiation having a frequency less than about 333 GHz (optionally in the presence of a plasma catalyst) such that a plasma (310) forms in the cavity (305). A filter (315) capable of passing the atomic or molecular species, but preventing others from passing, can be in fluid communication with the cavity (305). In this way, the selected species can be extracted and collected, for storage or immediate use.

    Abstract translation: 提供了等离子体辅助气体生产的方法和装置。 在一个实施方案中，包括至少一种原子或分子种类的气体可以流入空腔（305）。 气体可以经受频率小于约333GHz的电磁辐射（任选在存在等离子体催化剂的情况下），使得在空腔（305）中形成等离子体（310）。 能够使原子或分子物质通过但防止其他物质通过的过滤器（315）可以与空腔（305）流体连通。 以这种方式，可以提取和收集所选择的物种，用于储存或立即使用。

    Plasma-assisted formation of carbon structures
    33.
    发明授权
    Plasma-assisted formation of carbon structures 失效
    等离子体辅助形成碳结构

    公开(公告)号：US07445817B2

    公开(公告)日：2008-11-04

    申请号：US10513309

    申请日：2003-05-07

    Applicant: Satyendra Kumar ,  Devendra Kumar

    Inventor： Satyendra Kumar ,  Devendra Kumar

    IPC: H05H1/24

    CPC classification number: B82Y10/00 ,  H05H1/46 ,  H05H2001/4607

    Abstract: Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for synthesizing carbon structures. In one embodiment, a method is provided for synthesizing a carbon structure including forming a plasma by subjecting a gas to electromagnetic radiation in the presence of a plasma catalyst and adding at least one carbonaceous material to the plasma to grow the carbon structures on a substrate. Various types of plasma catalysts are also provided.

    Abstract translation: 提供了用于点燃，调节和维持用于合成碳结构的等离子体的方法和装置。 在一个实施方案中，提供了一种用于合成碳结构的方法，包括通过在等离子体催化剂存在下对气体进行电磁辐射而形成等离子体，并向等离子体中加入至少一种碳质材料以使基底上的碳结构生长。 还提供了各种类型的等离子体催化剂。

    Plasma-assisted melting
    35.
    发明授权
    Plasma-assisted melting 失效
    等离子体辅助熔化

    公开(公告)号：US07189940B2

    公开(公告)日：2007-03-13

    申请号：US10449600

    申请日：2003-06-02

    Applicant: Satyendra Kumar ,  Devendra Kumar

    Inventor： Satyendra Kumar ,  Devendra Kumar

    IPC: B23K10/00

    CPC classification number: C21B13/125 ,  C21C5/5205 ,  C22B4/005 ,  C22B4/08 ,  C22B9/226 ,  F27D7/06 ,  F27D99/0006 ,  F27D2099/0026 ,  H01J37/32009 ,  H01J37/32192 ,  H01J37/32366 ,  H01J2237/0206 ,  H01J2237/33 ,  H01J2237/336 ,  H01J2237/338 ,  H05B6/6402 ,  H05B6/78 ,  H05B6/784 ,  H05H1/46 ,  H05H2001/4607 ,  Y02P10/214 ,  Y02P10/216 ,  Y10S588/90

    Abstract: Apparatus and methods for plasma-assisted melting are provided. In one embodiment, a plasma-assisted melting method can include: (1) adding a solid to a melting region, (2) forming a plasma in a cavity by subjecting a gas to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, wherein the cavity has a wall, (3) sustaining the plasma in the cavity such that energy from the plasma passes through the wall into the melting region and melts the solid into a liquid, and (4) collecting the liquid. Solids that can be melted consistent with this invention can include metals, such as metal ore and scrap metal. Various plasma catalysts are also provided.

    Abstract translation: 提供了等离子体辅助熔化的装置和方法。 在一个实施方案中，等离子体辅助熔化方法可以包括：（1）向熔融区域添加固体，（2）通过使气体在频率小于约333GHz的电磁辐射下在空腔中形成等离子体 存在等离子体催化剂，其中空腔具有壁，（3）在空腔中维持等离子体，使得来自等离子体的能量通过壁进入熔融区域并将固体熔融成液体，以及（4）收集 液体。 可以熔融的与本发明一致的固体可以包括金属，例如金属矿和废金属。 还提供了各种等离子体催化剂。

    Surface cleaning and sterilization
    36.
    发明申请
    Surface cleaning and sterilization 失效
    表面清洗灭菌

    公开(公告)号：US20060237400A1

    公开(公告)日：2006-10-26

    申请号：US11384126

    申请日：2006-03-17

    Applicant: Satyendra Kumar ,  Devendra Kumar ,  Dominique Tasch ,  Raimund Stroebel

    Inventor： Satyendra Kumar ,  Devendra Kumar ,  Dominique Tasch ,  Raimund Stroebel

    IPC: B23K9/02 ,  B23K9/00

    CPC classification number: H05H1/46 ,  H05H2001/4607

    Abstract: Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. Such treatments include cleaning and sterilizing parts. In some embodiments, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequency between about 1 MHz and about 333 GHz in the presence of a plasma catalyst. A part can be cleaned by, for example, inserting hydrogen into the plasma and exposing the part to the hydrogen-enriched plasma. A part can be sterilized by heating the part with the plasma.

    Abstract translation: 提供了用于点燃，调节和维持用于各种等离子体处理和处理的等离子体的方法和装置。 这些处理包括清洁和消毒部件。 在一些实施例中，等离子体通过使多模式处理腔中的气体在等离子体催化剂的存在下具有在约1MHz和约333GHz之间的频率的电磁辐射来点燃。 可以通过例如将氢插入等离子体中并将该部分暴露于富氢等离子体来清洁部件。 可以通过用等离子体加热部件来消毒零件。

    Plasma-assisted enhanced coating
    37.
    发明申请
    Plasma-assisted enhanced coating 失效
    等离子体辅助增强涂层

    公开(公告)号：US20060078675A1

    公开(公告)日：2006-04-13

    申请号：US10513393

    申请日：2003-05-07

    Applicant: Devendra Kumar ,  Satyendra Kumar

    Inventor： Devendra Kumar ,  Satyendra Kumar

    IPC: H05H1/24 ,  B05D3/00 ,  B05C5/02

    CPC classification number: B05B7/226 ,  B05B7/22 ,  B05D1/62 ,  C23C14/04 ,  C23C14/32 ,  C23C16/04 ,  C23C16/50 ,  H05H1/46 ,  H05H2001/4607

    Abstract: Methods and apparatus are provided for igniting, modulating, and sustaining a plasma (615) for coating objects (250). In one embodiment, a method of coating a surface of an object (250) includes forming a plasma (615) in a cavity (230) by subjecting a gas to electromagnetic radiation in the presence of a plasma catalyst (240) and adding at least one coating material (510) to the plasma (615) by energizing the material (510) with, for example, a laser (500). The material (510) is allowed to deposit on the surface of the object (250) to form a coating. Various types of plasma (240) catalysts are also provided.

    Abstract translation: 提供了用于点燃，调节和维持用于涂覆物体的等离子体（615）（250）的方法和装置。 在一个实施例中，涂覆物体（250）的表面的方法包括通过在等离子体催化剂（240）的存在下对气体进行电磁辐射而形成等离子体（615），并且至少加入 通过用例如激光（500）激发材料（510）将一个涂层材料（510）提供到等离子体（615）。 允许材料（510）沉积在物体（250）的表面上以形成涂层。 还提供了各种类型的等离子体（240）催化剂。

    Plasma-assisted doping
    38.
    发明申请
    Plasma-assisted doping 失效
    等离子体辅助掺杂

    公开(公告)号：US20060063361A1

    公开(公告)日：2006-03-23

    申请号：US10513397

    申请日：2003-05-07

    Applicant: Satyendra Kumar ,  Devendra Kumar

    Inventor： Satyendra Kumar ,  Devendra Kumar

    IPC: H01L21/26 ,  H01L21/42

    CPC classification number: H01L21/2236 ,  H01J37/32339 ,  H01J37/32412 ,  H05B6/806

    Abstract: Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various doping processes. In one embodiment, a substrate (250) can be doped by forming a plasma (610) in a cavity (285) by subjecting a gas to an amount of electromagnetic radiation in the presence of a plasma catalyst (240) and adding at least one dopant material to the plasma. The material is then allowed to penetrate into the substrate. Various active and passive catalysts are provided.

    Abstract translation: 提供了用于点燃，调制和维持用于各种掺杂过程的等离子体的方法和装置。 在一个实施例中，可以通过在等离子体催化剂（240）的存在下使气体经受一定量的电磁辐射而在空腔（285）中形成等离子体（610）来掺杂衬底（250），并且添加至少一个 掺杂剂材料。 然后使材料渗入基材。 提供了各种主动和被动催化剂。

    Laser phase transformation and ion implantation in metals
    40.
    发明授权
    Laser phase transformation and ion implantation in metals 失效
    金属中的激光相变和离子注入

    公开(公告)号：US06454877B1

    公开(公告)日：2002-09-24

    申请号：US09582607

    申请日：2000-06-28

    Applicant: Devendra Kumar ,  Satyendra Kumar ,  Michael L. Dougherty

    Inventor： Devendra Kumar ,  Satyendra Kumar ,  Michael L. Dougherty

    IPC: B23K2614

    CPC classification number: C23C8/28 ,  C23C8/02 ,  C23C8/20 ,  C23C8/36 ,  C23C16/26 ,  C23C16/483

    Abstract: A method and apparatus are provided for treating the surface of a metal body through phase transformation, ion implantation, and/or diffusion and to form new phases of metallic materials. The method and apparatus have been shown to be particularly useful to improve the hardness and corrosion resistance of ferrous and non-ferrous metals. Generally, the method comprises irradiating a portion of the metal body (18) with a laser (12), and directing a stream of gas (22) onto the same portion of the metal body simultaneously with and preferably for a duration after the laser is turned off. Preferably, the laser (12) is a carbon dioxide laser operated in a pulsed mode to control heating of the metal (18). The gas (22) is preferably carbon dioxide to quickly cool the metal when the laser is off, and to provide carbon atoms for deposition onto the body. The entire process may be carried out in an environment at atmospheric pressure, obviating the need for a vacuum chamber or pressure controlled furnace or similar apparatus. After treatment, the hardness and corrosion resistance of at least a ferrous body are dramatically increased. Advantageously, both sides of a thin metal body, such as a metal tube, may be simultaneously treated. Further, a new, highly oxygenated, hard and extremely corrosion resistant metal phase may be created.

    Abstract translation: 提供一种通过相变，离子注入和/或扩散来处理金属体表面并形成金属材料的新相的方法和装置。 已经显示该方法和装置对于提高黑色金属和有色金属的硬度和耐腐蚀性是特别有用的。 通常，该方法包括用激光器（12）照射金属体（18）的一部分，并且在激光器之后的持续时间内同时优选地将气流（22）引导到金属体的相同部分上 关掉。 优选地，激光器（12）是以脉冲模式操作以控制金属（18）的加热的二氧化碳激光器。 气体（22）优选为二氧化碳，以在激光关闭时快速冷却金属，并提供碳原子用于沉积到体上。 整个过程可以在大气压的环境中进行，从而避免了对真空室或压力控制炉或类似装置的需要。 处理后，至少铁质的硬度和耐腐蚀性显着提高。 有利地，可以同时处理诸如金属管的薄金属体的两侧。 此外，可以产生新的，高氧化的，硬的和极耐腐蚀的金属相。

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