公开(公告)号：US09620161B2

公开(公告)日：2017-04-11

申请号：US14824995

申请日：2015-04-16

Applicant: Seagate Technology LLC

Inventor： Shuaigang Xiao ,  David S. Kuo ,  XiaoMin Yang ,  Kim Y. Lee ,  Yautzong Hsu ,  Koichi Wago

IPC: G11B5/74 ,  G11B5/596 ,  G11B5/84

CPC classification number: G11B5/59638 ,  G11B5/59655 ,  G11B5/746 ,  G11B5/84 ,  G11B5/855 ,  G11B20/1217 ,  G11B2020/1281

Abstract: Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.

公开(公告)号：US20160265119A1

公开(公告)日：2016-09-15

申请号：US15163214

申请日：2016-05-24

Applicant: Seagate Technology LLC

Inventor： Michael R. Feldbaum ,  Koichi Wago ,  Gennady Gauzner ,  Kim Y. Lee ,  David S. Kuo

IPC: C23F1/00 ,  G03F7/20

CPC classification number: C23F1/00 ,  B29C33/3842 ,  B29D17/00 ,  B29K2101/00 ,  B29K2909/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/09 ,  G03F7/2002 ,  G11B5/855 ,  Y10T428/24802 ,  Y10T428/24851 ,  Y10T428/24917

Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

公开(公告)号：US20160181102A1

公开(公告)日：2016-06-23

申请号：US15055303

申请日：2016-02-26

Applicant: Seagate Technology LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Yautzong Hsu ,  Zhaoning Yu ,  Kim Y. Lee ,  David S. Kuo

IPC: H01L21/033

CPC classification number: H01L21/0338 ,  G03F7/0002 ,  G11B5/746 ,  H01L21/0332 ,  H01L21/0335 ,  H01L21/0337

Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.

公开(公告)号：US09370907B2

公开(公告)日：2016-06-21

申请号：US14221165

申请日：2014-03-20

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Michael R. Feldbaum ,  Koichi Wago ,  Gennady Gauzner ,  Kim Y. Lee ,  David S. Kuo

IPC: H01L27/12 ,  B29D17/00 ,  B29C33/38 ,  G03F7/00 ,  G11B5/855 ,  B29K101/00

CPC classification number: C23F1/00 ,  B29C33/3842 ,  B29D17/00 ,  B29K2101/00 ,  B29K2909/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/09 ,  G03F7/2002 ,  G11B5/855 ,  Y10T428/24802 ,  Y10T428/24851 ,  Y10T428/24917

Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

Abstract translation: 本文提供了一种包括基板的装置; 覆盖衬底的蚀刻停止层，其中蚀刻停止层基本上抵抗蚀刻条件; 以及覆盖在蚀刻停止层上的图案层，其中所述图案化层对于蚀刻条件基本不稳定，并且其中所述图案化层包括多个特征，所述特征包括高特征密度区域和低特征密度区域之间的基本一致的特征轮廓。

公开(公告)号：US20160069929A1

公开(公告)日：2016-03-10

申请号：US14783403

申请日：2013-04-17

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Gennady Gauzner ,  Zhaoning Yu ,  Nobuo Kurataka ,  David S. Kuo ,  Kim Y. Lee ,  Yautzong Hsu ,  Hong Ying Wang

IPC: G01Q40/02 ,  G01N21/01 ,  H01J37/26

CPC classification number: G01Q40/02 ,  G01N21/01 ,  G01N2201/13 ,  G01Q40/00 ,  G03F7/0002 ,  H01J37/261 ,  H01J37/263 ,  H01J2237/2602 ,  H01J2237/2826

Abstract: Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.

Abstract translation: 本文提供的装置包括基板; 功能层，其中所述功能层具有分析装置的工件的成分特征; 以及配置成校准分析装置的预定特征。 本文还提供了一种装置，包括覆盖衬底的功能层; 以及用于校准配置成测量工件表面的分析装置的预定特征，其中所述功能层具有类似于所述工件的组成。 本文还提供了一种方法，包括向分析装置提供具有功能层的光刻校准标准，其中功能层具有分析装置的工件的成分特征; 向与分析仪器连接的计算机提供校准标准规格; 并根据校准标准读数和校准标准规格校准分析仪器。

公开(公告)号：US20140127533A1

公开(公告)日：2014-05-08

申请号：US14154018

申请日：2014-01-13

Applicant: Seagate Technology LLC

Inventor： Shuaigang Xiao ,  Thomas Young Chang ,  Yingguo Peng ,  David S. Kuo ,  Kaizhong Gao ,  Thomas P. Nolan ,  Ganping Ju

IPC: G11B5/73 ,  G11B5/84

CPC classification number: G11B5/7325 ,  G11B5/84 ,  G11B5/855

Abstract: A perpendicular magnetic media includes a substrate, a patterned template, a seed layer and a magnetic layer. The patterned template is formed on the substrate and includes a plurality of growth sites that are evenly spaced apart from each other. The seed layer is formed over the patterned template and the exposed areas of the substrate. Magnetic material is sputter deposited onto the seed layer with one grain of the magnetic material nucleated over each of the growth sites. The grain size distribution of the magnetic material is reduced by controlling the locations of the growth sites which optimizes the performance of the perpendicular magnetic media.

Abstract translation: 垂直磁性介质包括衬底，图案化模板，种子层和磁性层。 图案化模板形成在基板上并且包括彼此均匀间隔开的多个生长位点。 种子层形成在图案化模板和基板的暴露区域上。 将磁性材料溅射沉积到种子层上，其中一颗磁性材料成核在每个生长位点上。 通过控制优化垂直磁性介质性能的生长部位的位置来减小磁性材料的粒度分布。

公开(公告)号：US11732295B2

公开(公告)日：2023-08-22

申请号：US17137837

申请日：2020-12-30

Applicant: Seagate Technology LLC

Inventor： Xiaomin Yang ,  ShuaiGang Xiao ,  David S. Kuo ,  Koichi Wago ,  Thomas Young Chang

IPC: G03F7/40 ,  G03F7/004 ,  C12Q1/6869 ,  C12M1/34 ,  B82Y15/00

CPC classification number: C12Q1/6869 ,  C12M1/34 ,  B82Y15/00 ,  C12Q2563/159 ,  C12Q1/6869 ,  C12Q2565/607 ,  C12Q2565/629

Abstract: Apparatus and methods relating to DNA sequencing are provided. In one embodiment, a DNA sequencing device includes a nanochannel having a width that is approximately 0.3 nm to approximately 20 nm. A pair of electrodes having portions exposed to the nanochannel may form a tunneling current electrode (TCE) with an electrode gap of approximately 0.1 nm to approximately 2 nm, and more particularly about 0.3 nm to about 1 nm. In one embodiment, at least one of the pair of electrodes is formed as a suspended electrode. An actuator may be associated with the suspended electrode to displace it relative to the other electrode. In various embodiments, the nanochannel and/or the electrodes may be formed using thermal reflow processes to reduce the size of such features.

公开(公告)号：US11542552B2

公开(公告)日：2023-01-03

申请号：US16909827

申请日：2020-06-23

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Kim Yang Lee ,  Thomas Young Chang ,  David S. Kuo ,  ShuaiGang Xiao ,  Xiaomin Yang ,  Koichi Wago

IPC: B81C1/00 ,  B01L3/00 ,  G01N27/327 ,  C12Q1/6869 ,  G01N27/447

Abstract: A DNA sequencing device and related methods, wherein the device includes a substrate, a nanochannel formed in the substrate, a first electrode positioned on a first side of the nanochannel, and a second electrode. The second electrode is positioned on a second side of the nanochannel opposite the first electrode and is spaced apart from the first electrode to form an electrode gap that is exposed in the nanochannel. At least a portion of first electrode is movable relative to the second electrode to decrease a size of the electrode gap.

公开(公告)号：US11320397B2

公开(公告)日：2022-05-03

申请号：US16940486

申请日：2020-07-28

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Thomas Young Chang ,  David S. Kuo ,  Kim Yang Lee ,  Koichi Wago

IPC: G01N27/447 ,  B01L3/00 ,  G01N33/487 ,  C12Q1/6869 ,  B82Y15/00 ,  B82Y30/00

Abstract: A DNA sequencing device, and related method, which include an electrode and a plurality of spaced apart alignment structures. The electrode defines an electrode gap, the electrode being operable to detect a change in tunneling current as a DNA strand passes through the electrode gap. The plurality of spaced apart alignment structures are arranged to position nucleotides of the DNA strand in a predetermined orientation as the DNA strand passes through the electrode gap.

公开(公告)号：US10889857B2

公开(公告)日：2021-01-12

申请号：US15886533

申请日：2018-02-01

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Xiaomin Yang ,  ShuaiGang Xiao ,  David S. Kuo ,  Koichi Wago ,  Thomas Young Chang

IPC: C12Q1/6869 ,  B82Y15/00 ,  C12M1/34

Abstract: Apparatus and methods relating to DNA sequencing are provided. In one embodiment, a DNA sequencing device includes a nanochannel having a width that is approximately 0.3 nm to approximately 20 nm. A pair of electrodes having portions exposed to the nanochannel may form a tunneling current electrode (TCE) with an electrode gap of approximately 0.1 nm to approximately 2 nm, and more particularly about 0.3 nm to about 1 nm. In one embodiment, at least one of the pair of electrodes is formed as a suspended electrode. An actuator may be associated with the suspended electrode to displace it relative to the other electrode. In various embodiments, the nanochannel and/or the electrodes may be formed using thermal reflow processes to reduce the size of such features.