公开(公告)号：US07017978B2

公开(公告)日：2006-03-28

申请号：US10507587

申请日：2003-03-28

申请人： Takeshi Murakami ,  Taku Fukuyama ,  Takaharu Okada

发明人： Takeshi Murakami ,  Taku Fukuyama ,  Takaharu Okada

IPC分类号： B60N3/06 ,  B60R21/04

CPC分类号： B60R21/04 ,  B60N3/066 ,  B60R2021/0046 ,  B60R2021/0414

摘要： The present invention the related to a shock absorption pad for a vehicle for protecting occupant's lower legs. The shock absorption pad according to the present invention on which an occupant's foot is placed is attached on a surface of a toe board. The shock absorption pad includes a first shock absorption layer provided on the occupant's foot-placing side for absorbing an impact generated in a boundary region at which an energy absorption load of a vehicle body becomes different in a deformation process of the vehicle body at a vehicle crash, and a second shock absorption part provided on the toe board's side for absorbing an impact generated in a region in which the energy absorption load is high.

摘要翻译： 本发明涉及一种用于保护乘客的小腿的车辆用减震垫。 在脚趾板的表面上安装有放置乘员脚部的本发明的减震垫。 减震垫包括设置在乘客脚部放置侧的第一减震层，用于吸收车辆在车辆的变形过程中在车体的能量吸收负载变得不同的边界区域中产生的冲击 以及在脚趾板侧设置的第二减震部，用于吸收能量吸收负荷高的区域产生的冲击。

公开(公告)号：US06992290B2

公开(公告)日：2006-01-31

申请号：US09985317

申请日：2001-11-02

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

公开(公告)号：US20050287396A1

公开(公告)日：2005-12-29

申请号：US11166158

申请日：2005-06-27

申请人： Tetsuo Nakamura ,  Tatsuya Igarashi ,  Takeshi Murakami ,  Masayuki Mishima

发明人： Tetsuo Nakamura ,  Tatsuya Igarashi ,  Takeshi Murakami ,  Masayuki Mishima

IPC分类号： C09K11/06 ,  H01L51/00 ,  H01L51/50 ,  H05B33/14

CPC分类号： C09K11/06 ,  C09K2211/1029 ,  C09K2211/185 ,  H01L51/006 ,  H01L51/007 ,  H01L51/0071 ,  H01L51/0085 ,  H01L51/5012 ,  H05B33/14 ,  Y10S428/917

摘要： An organic electroluminescent device and a method for producing the same, the organic electroluminescent device including a luminescent layer produced by a vapor-deposition method disposed between a pair of electrodes, the luminescent layer containing at least one host material and at least one metal complex including a partial structure represented by formula (I): wherein M represents a metal atom, R1, R2 and R4 to R8 each independently represent a hydrogen atom or a substituent, and R3 represents a group represented by formula (II), an alkoxy group or an aryloxy group: wherein R11 to R13 each independently represent a hydrogen atom or a substituent, provided that at least two of them each independently represent an alkyl group or an aryl group.

摘要翻译： 一种有机电致发光器件及其制造方法，所述有机电致发光器件包括通过设置在一对电极之间的气相沉积法产生的发光层，所述发光层含有至少一种主体材料和至少一种金属络合物，所述金属络合物包括 由式（I）表示的部分结构：其中M表示金属原子，R 1，R 2和R 4与R SUP > 8 各自独立地表示氢原子或取代基，R 3表示由式（II）表示的基团，烷氧基或芳氧基：其中R 11 R 13各自独立地表示氢原子或取代基，条件是它们中的至少两个各自独立地表示烷基或芳基。

公开(公告)号：US20050263715A1

公开(公告)日：2005-12-01

申请号：US11136668

申请日：2005-05-25

申请人： Mamoru Nakasuji ,  Tohru Satake ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

发明人： Mamoru Nakasuji ,  Tohru Satake ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

IPC分类号： H01J37/141 ,  H01J37/28

CPC分类号： H01J37/141 ,  H01J2237/1534 ,  H01J2237/28

摘要： An electron beam system or a method for manufacturing a device using the electron beam system in which an electron beam can be irradiated at a high current density and a ratio of transmittance of a secondary electron beam of an image projecting optical system can be improved and which can be compact in size. The surface of the sample S is divided into plural stripe regions which in turn are divided into rectangle-shaped main fields. The main field is further divided into plural square-shaped subfields. The irradiation with the electron beams and the formation of a two-dimensional image are repeated in a unit of the subfields. A magnetic gap formed by the inner and outer magnetic poles of the objective lens is formed on the side of the sample, and an outer side surface and an inner side surface of each of the inner magnetic pole and the outer magnetic pole, respectively, forming the magnetic gap have each part of a conical shape with a convex having an angle of 45° or greater with respect to the optical axis.

摘要翻译： 可以提高电子束系统或使用其中以高电流密度照射电子束并且可以提高图像投影光学系统的二次电子束的透射率的电子束系统的装置的方法，并且哪些 可以紧凑的尺寸。 样品S的表面被分成多个条纹区域，其又分成矩形主场。 主场进一步分为多个方形子场。 以子场为单位重复照射电子束和形成二维图像。 在物体侧形成由物镜的内，外磁极形成的磁隙，分别形成内磁极和外磁极的外侧面和内侧面，形成 磁隙具有相对于光轴具有45°或更大角度的凸起的圆锥形状的每一部分。

公开(公告)号：US20050223761A1

公开(公告)日：2005-10-13

申请号：US11096879

申请日：2005-04-01

申请人： Masanari Okuno ,  Takeshi Murakami ,  Mitsuo Murakami

发明人： Masanari Okuno ,  Takeshi Murakami ,  Mitsuo Murakami

IPC分类号： B60R25/021 ,  B60R25/0215 ,  B62D1/18 ,  B62D1/19 ,  B60R25/02

CPC分类号： B60R25/0211 ,  Y10T70/5664

摘要： A steering lock device including a sleeve assembly, a rear shaft rotated when a steering wheel is operated, and a lock bar for locking the steering shaft when engaged with a seat member fixed to the rear shaft. A sleeve assembly including an outer sleeve and an inner sleeve is shortened when the outer sleeve moves along the inner sleeve. The distal portion of the lock bar includes a slope that is abut against an open end of the inner sleeve. When the open end pushes the slope, the lock bar smoothly moves away from the steering shaft.

摘要翻译： 一种转向锁定装置，包括套筒组件，当操作方向盘时旋转的后轴;以及锁定杆，用于当与固定到后轴的座椅构件接合时锁定转向轴。 当外套筒沿着内套筒移动时，包括外套筒和内套筒的套筒组件被缩短。 锁杆的远侧部分包括抵靠内套筒的开口端的斜面。 当开口端推动斜坡时，锁杆平稳地离开转向轴。

公开(公告)号：US20050211925A1

公开(公告)日：2005-09-29

申请号：US11037093

申请日：2005-01-19

申请人： Mamoru Nakasuji ,  Takao Kato ,  Tohru Satake ,  Kenji Terao ,  Takeshi Murakami ,  Nobuharu Noji

发明人： Mamoru Nakasuji ,  Takao Kato ,  Tohru Satake ,  Kenji Terao ,  Takeshi Murakami ,  Nobuharu Noji

IPC分类号： B23K15/00 ,  G03F1/72 ,  G03F1/74 ,  G21K5/10 ,  G21K7/00 ,  H01J37/08 ,  H01J37/18 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC分类号： H01J37/18 ,  H01J2237/188 ,  H01J2237/31744

摘要： An object of the present invention is to provide a sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method, which can reduce an edge roughness in a repaired pattern and also can provide the repairing of a sample by applying an electron beam-assisted etching or an electron beam-assisted deposition. There is provided a sample repairing method comprising: (a) a step of focussing an electron beam by an objective lens to irradiate a sample: (b) a step of supplying a reactive gas onto an electron beam irradiated surface of said sample: (c) a step of selectively scanning a pattern to be repaired on said sample with the electron beam so as to repair said pattern by applying an etching or a deposition; and (d) a step of providing a continuous exhausting operation by means of a differential exhaust system arranged in said objective lens so as to prevent the reactive gas supplied onto said electron beam irradiated surface from flowing toward an electron gun side.

摘要翻译： 本发明的目的是提供一种使用相同方法的样品修复装置，样品修复方法和装置制造方法，其可以减少修复图案中的边缘粗糙度，并且还可以通过应用 电子束辅助蚀刻或电子束辅助沉积。 提供了一种样品修复方法，包括：（a）通过物镜聚焦电子束以照射样品的步骤：（b）将反应性气体供应到所述样品的电子束照射表面上的步骤：（c ）通过电子束选择性地扫描所述样品上要修复的图案以通过施加蚀刻或沉积来修复所述图案的步骤; 以及（d）通过布置在所述物镜中的差动排气系统提供连续排气操作以防止供应到所述电子束照射表面上的反应性气体朝向电子枪侧流动的步骤。

公开(公告)号：US20050158653A1

公开(公告)日：2005-07-21

申请号：US10511396

申请日：2003-04-17

申请人： Masahiro Hatakeyama ,  Kenji Watanabe ,  Takeshi Murakami ,  Tohru Satake ,  Nobuharu Noji

发明人： Masahiro Hatakeyama ,  Kenji Watanabe ,  Takeshi Murakami ,  Tohru Satake ,  Nobuharu Noji

IPC分类号： G01N23/225 ,  G03F7/16 ,  H01L21/66 ,  G03C1/492

CPC分类号： G03F7/162 ,  G01N23/225 ,  H01J37/285 ,  H01J2237/204 ,  H01J2237/2812 ,  H01J2237/2814 ,  H01J2237/2855 ,  H01J2237/2857

摘要： The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the sample. In the surface inspection method of the present invention, a resistive film having an arbitrarily determined thickness t1 is first coated on a surface of a sample. Thereafter, a part of the resistive film having the arbitrarily determined thickness t1 is dissolved in a solvent, to thereby reduce the thickness of the resistive film to a desired level. This enables precise control of a value of resistance of the resistive film and suppresses distortion of an image to be detected.

摘要翻译： 本发明提供了一种表面检查方法和装置，用于检查表面上涂覆有电阻膜的样品的表面，并且将光束照射到其上涂覆有电阻膜的表面，从而进行 样品表面。 在本发明的表面检查方法中，首先将具有任意确定的厚度t 1的电阻膜涂覆在样品的表面上。 此后，将具有任意确定的厚度t 1的电阻膜的一部分溶解在溶剂中，从而将电阻膜的厚度减小到期望的水平。 这能够精确地控制电阻膜的电阻值并抑制要检测的图像的失真。

公开(公告)号：US20050135057A1

公开(公告)日：2005-06-23

申请号：US10902548

申请日：2004-07-29

申请人： Daisuke Mihara ,  Takeshi Murakami ,  Hiroyuki Mochizuki

发明人： Daisuke Mihara ,  Takeshi Murakami ,  Hiroyuki Mochizuki

IPC分类号： F16F15/08 ,  G06F1/16 ,  G06F1/18 ,  G11B33/02 ,  G11B33/08 ,  G11B33/12 ,  G11B33/14 ,  H05K7/12 ,  H05K7/00 ,  H05K5/00

CPC分类号： G11B33/126 ,  G06F1/1616 ,  G06F1/1658 ,  G06F1/181 ,  G11B33/128

摘要： An apparatus for mounting includes a first buffer fixing piece for arranging a first buffer unit to a first hard disk drive (HDD), a holding frame for holding the first HDD that is integrated with the first buffer fixing piece, and for fixing a control board, a second buffer fixing piece for arranging a second buffer unit to a second HDD, and for arranging the second HDD away from a palm rest, and a holding case that holds the second HDD, and is connected to the holding frame.

摘要翻译： 一种用于安装的装置包括用于将第一缓冲单元布置到第一硬盘驱动器（HDD）的第一缓冲固定件，用于保持与第一缓冲固定件集成的第一HDD的固定框架，以及用于固定控制板 第二缓冲固定片，用于将第二缓冲单元布置到第二HDD，并将第二HDD布置在离开掌托的位置;以及保持盒，其保持第二HDD，并连接到保持框。

公开(公告)号：US06855929B2

公开(公告)日：2005-02-15

申请号：US09985324

申请日：2001-11-02

申请人： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

发明人： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC分类号： G01N23/225 ,  G01Q30/02 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  G01N23/00 ,  G21K7/00

CPC分类号： H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

摘要： A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1 maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

摘要翻译： 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到在检查室中保持真空的检查室23-1中; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US5821948A

公开(公告)日：1998-10-13

申请号：US289589

申请日：1994-08-15

申请人： Yasuhisa Kawamoto ,  Takeshi Murakami ,  Suzuki Ryuichi

发明人： Yasuhisa Kawamoto ,  Takeshi Murakami ,  Suzuki Ryuichi

IPC分类号： G06F3/153 ,  G09G5/00 ,  G09G5/395

CPC分类号： G09G5/395

摘要： An image processing circuit includes input terminals receiving image data as a first number of bits, a memory selectively storing the image data received at the input terminals and outputting the image data stored therein as a second number of bits, which is an integer multiple of the first number of bits, in response to a write signal which is synchronized to a memory clock signal, and a shift register selectively and in succession storing the image data output from the memory and outputting the image data stored therein as a third number of bits in response to a video clock signal which has a second frequency which is different from the first frequency of the memory clock signal and wherein the second number of bits is greater than the third number of bits.

摘要翻译： 图像处理电路包括：接收图像数据作为第一位数的输入端;存储器，选择性地存储在输入端接收到的图像数据，并输出存储在其中的图像数据，作为第二位数， 第一位数，响应于与存储器时钟信号同步的写入信号，以及移位寄存器，选择性地并且相继地存储从存储器输出的图像数据，并将存储在其中的图像数据作为第三位数输出 响应于具有与存储器时钟信号的第一频率不同的第二频率的视频时钟信号，并且其中第二位数大于第三位数。