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公开(公告)号:US11569342B2
公开(公告)日:2023-01-31
申请号:US16820549
申请日:2020-03-16
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Poornika Fernandes , Luigi Colombo , Haowen Bu
IPC: H01L49/02 , C23C16/455 , H01L21/677 , H01G4/018 , H03M1/12
Abstract: In a described example, a method for forming a capacitor includes: forming a capacitor first plate over a non-conductive substrate; flowing ammonia and nitrogen gas into a plasma enhanced chemical vapor deposition (PECVD) chamber containing the non-conductive substrate; stabilizing a pressure and a temperature in the PECVD chamber; turning on radio frequency high frequency (RF-HF) power to the PECVD chamber; pretreating the capacitor first plate for at least 60 seconds; depositing a capacitor dielectric on the capacitor first plate; and depositing a capacitor second plate on the capacitor dielectric.
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公开(公告)号:US11370662B2
公开(公告)日:2022-06-28
申请号:US16230070
申请日:2018-12-21
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Luigi Colombo , Nazila Dadvand , Benjamin Stassen Cook , Archana Venugopal
IPC: C01B21/064 , C23C16/34 , C23C18/32 , C23C18/16 , C23C18/36 , C23C18/28 , C23C18/30 , C23C18/20 , G03F1/60 , G03F1/20 , C23C18/38 , C23C18/42
Abstract: A microstructure comprises a plurality of interconnected units wherein the units are formed of hexagonal boron nitride (h-BN) tubes. The graphene tubes may be formed by photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice, removing unpolymerized monomer, coating the polymer microlattice with a metal, removing the polymer microlattice to leave a metal microlattice, depositing an h-BN precursor on the metal microlattice, converting the h-BN precursor to h-BN, and removing the metal microlattice.
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公开(公告)号:US10529641B2
公开(公告)日:2020-01-07
申请号:US15361390
申请日:2016-11-26
Applicant: Texas Instruments Incorporated
Inventor: Archana Venugopal , Benjamin Stassen Cook , Luigi Colombo , Robert Reid Doering
IPC: H01L23/367 , H01L21/768 , H01L23/373 , H01L23/522
Abstract: An integrated circuit has a thermal routing structure above a top interconnect level. The top interconnect level includes interconnects connected to lower interconnect levels, and does not include bond pads, probe pads, input/output pads, or a redistribution layer to bump bond pads. The thermal routing structure extends over a portion, but not all, of a plane of the integrated circuit containing the top interconnect level. The thermal routing structure includes a layer of nanoparticles in which adjacent nanoparticles are attached to each other. The layer of nanoparticles is free of an organic binder material. The thermal routing structure has a thermal conductivity higher than the metal in the top interconnect level. The layer of nanoparticles is formed by an additive process.
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公开(公告)号:US10468324B2
公开(公告)日:2019-11-05
申请号:US15183896
申请日:2016-06-16
Applicant: Texas Instruments Incorporated
Inventor: Archana Venugopal , Marie Denison , Luigi Colombo , Sameer Pendharkar
IPC: H01L23/373 , H01L23/367 , H01L23/522 , H01L23/48 , H01L23/532 , H01L21/768 , H01L23/528 , H01L21/48 , H01L21/02 , H01L23/00
Abstract: A microelectronic device includes a heat spreader layer on an electrode of a component and a metal interconnect on the heat spreader layer. The heat spreader layer is disposed above a top surface of a substrate of the semiconductor device. The heat spreader layer is 100 nanometers to 3 microns thick, has an in-plane thermal conductivity of at least 150 watts/meter-° K, and an electrical resistivity less than 100 micro-ohm-centimeters.
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公开(公告)号:US20190273166A1
公开(公告)日:2019-09-05
申请号:US15910817
申请日:2018-03-02
Applicant: Texas Instruments Incorporated
Inventor: Archana Venugopal , Luigi Colombo
IPC: H01L29/786 , H01L29/16 , H01L29/20 , H01L29/267 , H01L29/49 , H01L29/45 , H01L29/66 , H01L21/02
Abstract: A microelectronic device includes a gated graphene component. The gated graphene component has a graphitic layer containing one or more layers of graphene. The graphitic layer has a channel region, a first contact region adjacent to the channel region and a second contact region adjacent to the channel region. A patterned hexagonal boron nitride (hBN) layer is disposed on the graphitic layer above the channel region. A gate is located over the patterned hBN layer above the channel region. A first connection is disposed on the graphitic layer in the first contact region, and a second connection is disposed on the graphitic layer in the second contact region. The patterned hBN layer does not extend completely under the first connection or under the second connection. A method of forming the gated graphene component in the microelectronic device is disclosed.
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公开(公告)号:US10304967B1
公开(公告)日:2019-05-28
申请号:US15910854
申请日:2018-03-02
Applicant: Texas Instruments Incorporated
Inventor: Archana Venugopal , Luigi Colombo , Arup Polley
IPC: H01L31/0312 , H01L29/786 , H01L29/20 , H01L29/267 , H01L29/49 , H01L29/45 , H01L29/66 , H01L21/02 , H01L21/8258 , H01L27/092 , H01L29/16
Abstract: A microelectronic device includes a gated graphene component over a semiconductor material. The gated graphene component includes a graphitic layer having at least one layer of graphene. The graphitic layer has a channel region, a first connection and a second connection make electrical connections to the graphitic layer adjacent to the channel region. The graphitic layer is isolated from the semiconductor material. A backgate region having a first conductivity type is disposed in the semiconductor material under the channel region. A first contact field region and a second contact field region are disposed in the semiconductor material under the first connection and the second connection, respectively. At least one of the first contact field region and the second contact field region has a second, opposite, conductivity type. A method of forming the gated graphene component in the microelectronic device with a transistor is disclosed.
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公开(公告)号:US10256188B2
公开(公告)日:2019-04-09
申请号:US15361401
申请日:2016-11-26
Applicant: Texas Instruments Incorporated
Inventor: Archana Venugopal , Benjamin Stassen Cook , Luigi Colombo , Robert Reid Doering
IPC: H01L27/08 , H01L23/528 , H01L23/522 , H01L23/532 , H01L23/31 , H01L23/48 , H01L21/768 , H01L21/3205 , H01L21/288 , H01L21/285 , H01L21/324 , H01L21/3105 , H01L23/367 , H01L23/373
Abstract: An integrated circuit has a substrate and an interconnect region disposed on the substrate. The interconnect region includes a plurality of interconnect levels. Each interconnect level includes interconnects in dielectric material. The integrated circuit includes a graphitic via in the interconnect region. The graphitic via vertically connects a first interconnect in a first interconnect level to a second interconnect in a second, higher, interconnect level. The graphitic via includes a cohered nanoparticle film of nanoparticles in which adjacent nanoparticles cohere to each other, and a layer of graphitic material disposed on the cohered nanoparticle film. The nanoparticles include one or more metals suitable for catalysis of the graphitic material. The cohered nanoparticle film is formed by a method which includes an additive process. The graphitic via is electrically coupled to an active component of the integrated circuit.
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公开(公告)号:US20180308696A1
公开(公告)日:2018-10-25
申请号:US15496814
申请日:2017-04-25
Applicant: Texas Instruments Incorporated
Inventor: Luigi Colombo , Archana Venugopal
IPC: H01L21/04 , H01L29/16 , H01L29/786 , H01L29/45
CPC classification number: H01L21/043 , H01L29/1606 , H01L29/45 , H01L29/78618 , H01L29/78684
Abstract: An electronic device has a graphene layer having one or more atomic layers of graphene, with low resistance contacts that includes a carbon-doped metal layer directly on the graphene layer. The electronic device is formed by forming a carbon-doped metal layer on a substrate layer of the electronic device. The carbon-doped metal layer is subsequently heated to a temperature above which carbon in the carbon-doped metal layer becomes mobile, and subsequently cooled. The carbon in the carbon-doped metal forms the graphene layer under the carbon-doped metal layer and over the substrate layer. The carbon-doped metal layer is removed from an area outside of a contact area, leaving the carbon-doped metal in the contact area to provide a contact layer to the graphene layer.
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公开(公告)号:US10069065B2
公开(公告)日:2018-09-04
申请号:US14676233
申请日:2015-04-01
Applicant: Texas Instruments Incorporated
Inventor: Arup Polley , Archana Venugopal , Robert Reid Doering , Luigi Colombo
Abstract: Graphene Hall sensors, magnetic sensor systems and methods for sensing a magnetic field using an adjustable gate voltage to adapt the Hall sensor magnetic field sensitivity according to a control input for environmental or process compensation and/or real-time adaptation for balancing power consumption and minimum detectable field performance. The graphene Hall sensor gate voltage can be modulated and the sensor output signal can be demodulated to combat flicker or other low frequency noise. Also, graphene Hall sensors can be provided with capacitive coupled contacts for reliable low impedance AC coupling to instrumentation amplifiers or other circuits using integral capacitance.
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公开(公告)号:US10001529B2
公开(公告)日:2018-06-19
申请号:US14936631
申请日:2015-11-09
Applicant: Texas Instruments Incorporated
Inventor: Arup Polley , Archana Venugopal , Luigi Colombo , Robert R. Doering
CPC classification number: G01R33/07 , G01R33/0029 , G01R33/0041 , G01R33/075 , G01R33/1284 , H01L43/04 , H01L43/06 , H01L43/10
Abstract: A Graphene Hall sensor (GHS) is provided with a modulated gate bias signal in which the modulated gate bias signal alternates at a modulation frequency between a first voltage that produces a first conductivity state in the GHS and a second voltage that produces approximately a same second conductivity state in the GHS. A bias current is provided through a first axis of the GHS. A resultant output voltage signal is provided across a second axis of the Hall sensor that includes a modulated Hall voltage and an offset voltage, in which the Hall voltage is modulated at the modulation frequency. An amplitude of the Hall voltage that does not include the offset voltage is extracted from the resultant output voltage signal.
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