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公开(公告)号：US08109751B2
公开(公告)日：2012-02-07
申请号：US11774244
申请日：2007-07-06
IPC分类号： B28B11/08
CPC分类号： B29C43/021 , B29C43/003 , B29C43/58 , B29C2043/025 , B29C2043/3634 , B29C2043/5808 , B29L2011/0016 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： There is provided an imprint device for transferring a fine pattern to a material to form a patterned material. The device comprises a stamper having the fine pattern thereon, and a pressure distribution mechanism. The stamper is pressed against the material, and the pressure distribution mechanism provides a nonuniform pressure distribution in a patterned region of the patterned material, while the stamper is in contact with the material. There are provided an imprint device and a microstructure transfer method, by which it is possible to sufficiently spread a resin or other material for forming a pattern layer between a stamper and a patterned material with a lower pressure so as not to damage the stamper or the patterned material, and to form a pattern formation layer having the uniform thickness on the patterned material.
摘要翻译： 提供了用于将精细图案转印到材料以形成图案化材料的压印装置。 该装置包括其上具有精细图案的压模和压力分布机构。 压模被压在材料上，并且压力分配机构在图案化材料的图案化区域中提供不均匀的压力分布，同时压模与材料接触。 提供了压印装置和微结构转印方法，通过该方法可以在压模和图案化材料之间以较低压力充分地铺展树脂或其它材料以形成图案层，以便不损坏压模或 并且在图案化材料上形成具有均匀厚度的图案形成层。
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公开(公告)号：US20110171431A1
公开(公告)日：2011-07-14
申请号：US13002209
申请日：2009-06-18
申请人： Masahiko Ogino , Takashi Ando , Miho Sasaki , Akihiro Miyauchi
发明人： Masahiko Ogino , Takashi Ando , Miho Sasaki , Akihiro Miyauchi
CPC分类号： G03F7/0002 , B81C99/009 , B82Y10/00 , B82Y40/00 , Y10T428/24612
摘要： Provided is a fine structure which allows the formation of a highly accurate metallic replica mold. The structure is resistant to breakage even in the presence of foreign particles or bumps and causes a smaller transfer failure region even when applied to an undulating object to be transferred. Also provided is a stamper for imprinting, which conforms to local bumps of a substrate to be transferred, causes, if any, a smaller pattern transfer failure region, and has satisfactory durability.The fine structure includes a supporting member; and a pattern layer having a fine asperity pattern formed on a surface thereof. The pattern layer is made from a resin through curing of a resin composition containing a cationic-polymerization catalyst and two or more organic components having different functional groups, and the supporting member and the pattern layer each transmit light having a wavelength of 365 nm or longer. The stamper for imprinting includes a base layer; a buffer layer; and a pattern layer having a fine asperity geometry formed on a surface thereof. The stamper is adopted to transferring of the asperity geometry to a surface of an object to be transferred by contacting the pattern layer with the object to be transferred. The buffer layer is arranged on another surface of the pattern layer opposite to the surface on which the asperity geometry is formed, and the base layer is arranged on another surface of the buffer layer opposite to the surface on which the pattern layer is arranged. The buffer layer has a Young's modulus lower than the Young's modulus of the pattern layer, and the base layer has a Young's modulus higher than the Young's modulus of the buffer layer.
摘要翻译： 提供了允许形成高精度金属复制模具的精细结构。 即使在外来颗粒或凸起的存在下，该结构也能够破裂，并且即使当应用于待转移的起伏物体时也会导致较小的转印失效区域。 还提供了一种用于压印的压模，其符合要转印的基板的局部凸起，导致更小的图案转印失效区域，并且具有令人满意的耐久性。 精细结构包括支撑构件; 以及在其表面上形成有微细凹凸图案的图案层。 图案层由树脂通过固化含有阳离子聚合催化剂和两种或更多种具有不同官能团的有机组分的树脂组合物制成，并且支撑构件和图案层各自透射波长为365nm或更长的光 。 用于压印的压模包括基层; 缓冲层; 以及在其表面上形成有细微凹凸几何图案的图案层。 采用压模，通过使图案层与要被转印的物体接触，将凹凸几何图形转印到待转印物体的表面上。 缓冲层布置在与形成有凹凸几何形状的表面相对的图案层的另一表面上，并且基底层布置在与布置有图案层的表面相对的缓冲层的另一个表面上。 缓冲层的杨氏模量低于图案层的杨氏模量，基底层的杨氏模量高于缓冲层的杨氏模量。
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33.发明申请公开(公告)号：US20090243126A1
公开(公告)日：2009-10-01
申请号：US12388573
申请日：2009-02-19
申请人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Akihiro Miyauchi
发明人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Akihiro Miyauchi
CPC分类号： B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B7/263
摘要： A method of imprinting a microstructure comprising: contacting a stamper comprising a pattern layer with the microstructure of the order of from micrometers to nanometers in one face of the pattern layer and a substrate supporting the pattern layer with an imprinting member having a deformable layer to which the microstructure is imprinted, wherein the pattern layer is supported on a round surface having a prescribed radius of curvature of the substrate, the center of the round surface protruding towards the rear face of the pattern layer; causing the deformable layer on the imprinting member; and separating the stamper from the cured deformable layer.
摘要翻译： 一种压印微结构的方法，包括：将包含图案层的压模与图案层的一个表面中的微米级至数毫米级的微结构接触;以及支撑图案层的基板，其具有可变形层的压印构件， 印刷微结构，其中图案层被支撑在具有规定的基底曲率半径的圆形表面上，圆形表面的中心朝向图案层的背面突出; 使压印构件上的可变形层产生; 以及将所述压模与所述固化的可变形层分离。
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公开(公告)号：US20080028953A1
公开(公告)日：2008-02-07
申请号：US11833284
申请日：2007-08-03
CPC分类号： G11B7/263 , B29C33/303 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/043 , B29C2043/3602 , B29C2043/3634 , B29C2043/5833 , B29L2011/0075 , B29L2017/005 , B29L2031/756
摘要： In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
摘要翻译： 为了允许高精度地对准被转印物体与压模之间的相对位置，而不在被转移物体中提供对准图案，提供了一种图案转印方法，包括：当调节压模与 检测被转移对象的至少两个以上边缘位置的步骤，并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。
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35.发明申请Methods of fabricating nano-scale and micro-scale mold for nano-imprint, and mold usage on nano-imprinting equipment 审中-公开制造纳米压印纳米尺度和微尺度模具的方法以及纳米压印设备上的模具使用公开(公告)号：US20060258163A1
公开(公告)日：2006-11-16
申请号：US11354029
申请日：2006-02-15
申请人： Kenya Ohashi , Akihiro Miyauchi , Masahiko Ogino
发明人： Kenya Ohashi , Akihiro Miyauchi , Masahiko Ogino
IPC分类号： H01L21/302
CPC分类号： G03F7/0002 , B81C1/0046 , B81C99/009 , B82Y10/00 , B82Y40/00 , G11B5/855
摘要： To provide a metal mold excellent in the mold-release characteristic and the transfer accuracy in a nano-imprint method. By controlling the thickness of a metal oxide film formed in the face of a release agent and a mold, the adhesive amount of the release agent layer formed in the outer layer thereof is adjusted, thereby forming a mold excellent in the mold-release characteristic. The present invention also relates to methods of fabricating molds for nano-imprint, and mold usage on nano-imprinting equipment.
摘要翻译： 提供在纳米压印方法中脱模特性和转印精度优异的金属模具。 通过控制在脱模剂和模具的表面形成的金属氧化物膜的厚度，调节在其外层中形成的脱模剂层的粘合量，从而形成脱模特性优异的模具。 本发明还涉及在纳米压印设备上制造用于纳米压印的模具和模具使用的方法。
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36.发明授权Fine metal structure, process for producing the same, fine metal mold and device 失效精细金属结构，制造方法，精细金属模具及装置公开(公告)号：US08741380B2
公开(公告)日：2014-06-03
申请号：US12859802
申请日：2010-08-20
CPC分类号： B29C33/3842 , B29C33/424 , B81B2203/0361 , B81C1/00111 , B81C1/00206 , B81C99/0085 , B81C99/009 , B81C2201/034 , B82Y10/00 , B82Y40/00 , C23C18/1608 , C23C18/1651 , C23C18/1653 , C23C18/1657 , C23C18/1689 , C23C18/208 , C23C18/42 , G03F7/0002 , H01J1/304 , H01J9/025 , Y10T428/12389 , Y10T428/12993
摘要： A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.
摘要翻译： 精细的金属结构，其表面具有高强度，高精度和大纵横比的微喷射体; 以及没有缺陷的金属微细结构的制造方法。 提供了具有微喷射体的表面的细金属结构，其特征在于，微喷射体具有10纳米至10微米的最小厚度或最小直径，并且微喷射体的最小厚度或最小直径（D）与高度 的微喷射体（H）H / D大于1.还提供了一种制造精细金属结构的方法，其特征在于，在其表面上提供具有细凹凸图案的基板，将分子无电镀催化剂 然后进行无电解电镀，从而形成具有凹凸图案的金属层，并将金属层与基板分离，从而获得配备有经过上述凹凸图案的反转传送的表面的精细金属结构。
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公开(公告)号：US08632714B2
公开(公告)日：2014-01-21
申请号：US13526708
申请日：2012-06-19
CPC分类号： B81C1/0046
摘要： A mold and a pattern transfer method using the same for a nanoprinting technology. The mold can be released from a substrate accurately and easily. The mold, which is used for forming a fine pattern on a substrate using a press machine, comprises a release mechanism.
摘要翻译： 用于纳米印刷技术的模具和图案转印方法。 模具可以准确而容易地从基材上脱模。 使用压制机在基板上形成精细图案的模具包括释放机构。
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公开(公告)号：US08133418B2
公开(公告)日：2012-03-13
申请号：US11833284
申请日：2007-08-03
IPC分类号： B29C45/76
CPC分类号： G11B7/263 , B29C33/303 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/043 , B29C2043/3602 , B29C2043/3634 , B29C2043/5833 , B29L2011/0075 , B29L2017/005 , B29L2031/756
摘要： In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
摘要翻译： 为了允许高精度地对准被转印物体与压模之间的相对位置，而不在被转移物体中提供对准图案，提供了一种图案转印方法，包括：当调节压模和 检测被转移对象的至少两个以上边缘位置的步骤，并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。
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公开(公告)号：US07520742B2
公开(公告)日：2009-04-21
申请号：US10801579
申请日：2004-03-17
CPC分类号： B82Y10/00 , B29C33/58 , B29C37/0067 , B29C37/0075 , B29C59/022 , B29C59/025 , B29C2059/023 , B82Y40/00 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/82 , G11B5/84 , H05K3/12 , Y10S977/887
摘要： A pillar with a high aspect ratio is transferred by a nanoprinting method. In order to form a fine structure on a substrate, a nanoprinting apparatus heats and presses the substrate and a mold with a fine concave-convex pattern formed thereon, the mold having a mechanism for transferring and applying a mold-releasing agent. A method for transferring a fine structure using the aforementioned nanoprinting apparatus.
摘要翻译： 通过纳米印刷法转移具有高纵横比的支柱。 为了在基板上形成精细结构，纳米印刷装置加热并压制基板和形成有细凹凸图案的模具，该模具具有用于转印和施加脱模剂的机构。 使用上述纳米印刷装置转印精细结构的方法。
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公开(公告)号：US20080229948A1
公开(公告)日：2008-09-25
申请号：US12019839
申请日：2008-01-25
申请人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Hideaki Kataho , Akihiro Miyauchi , Kosuke Kuwabara
发明人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Hideaki Kataho , Akihiro Miyauchi , Kosuke Kuwabara
IPC分类号： B41F1/40
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint device transfers a micropattern created on a stamper onto a material to be transferred, by bringing the stamper and the material to be transferred into contact with each other. The imprint device has a flow passage for discharging a fluid to a rear surface of the stamper or the material to be transferred, to thereby bend the stamper or the material to be transferred.
摘要翻译： 压印装置通过使压模和被转印材料彼此接触来将形成在压模上的微图案转印到待转印的材料上。 压印装置具有用于将流体排放到压模的后表面或待转印的材料的流动通道，从而弯曲压模或要转印的材料。
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