公开(公告)号：US20070053154A1

公开(公告)日：2007-03-08

申请号：US11261620

申请日：2005-10-31

申请人： Hiroshi Fukuda ,  Hitoshi Matsushima

发明人： Hiroshi Fukuda ,  Hitoshi Matsushima

IPC分类号： G06F1/20

CPC分类号： G11B33/022 ,  G11B33/12 ,  G11B33/1406 ,  G11B33/144

摘要： A disk array apparatus including a rack-shaped basic frame, and a plurality of disk boxes that can be inserted into and pulled out of the basic frame depth-wise. Each disk box has: disk drive connectors for connecting a plurality of disk drives arranged in a matrix on a platter substrate, which is the bottom face of the disk box, roughly parallel to the depth direction of the basic frame; and a cooling module for cooling the disk drives. The disk box is a hermetically sealed structure.

摘要翻译： 一种盘阵列装置，包括一个齿条基本框架，以及可以在基本框架中深入插入和拉出的多个盘盒。 每个磁盘盒具有：用于将布置在矩阵中的多个磁盘驱动器连接器的磁盘驱动器连接器，该多个磁盘驱动器布置在盘片基板上，该盘片基板是磁盘盒的底面，大致平行于基本框架的深度方向; 以及用于冷却磁盘驱动器的冷却模块。 磁盘盒是密封结构。

公开(公告)号：US20060284519A1

公开(公告)日：2006-12-21

申请号：US11341655

申请日：2006-01-30

申请人： Shinichiro Umemura ,  Takashi Azuma ,  Tatsuya Nagata ,  Hiroshi Fukuda ,  Toshiyuki Mine ,  Syuntaro Machida

发明人： Shinichiro Umemura ,  Takashi Azuma ,  Tatsuya Nagata ,  Hiroshi Fukuda ,  Toshiyuki Mine ,  Syuntaro Machida

IPC分类号： H01L41/00

CPC分类号： B06B1/0292

摘要： The present invention aims to stabilize sound-electricity conversion characteristics of a diaphragm-type sound-electricity conversion device as well as to decrease the noise level of an ultrasonic diagnostic apparatus using the sound-electricity conversion device. The sound-electricity conversion device is configured by a capacitor cell including a lower electrode formed on a silicon substrate and an upper electrode over the lower electrode, the lower and upper electrodes sandwiching a cavity. An electrode short-circuit prevention film is formed on the upper electrode on the cavity side. The electrode short-circuit prevention film is formed of a material with an electrical time constant shorter than 1 second and longer than 10 microseconds, such as silicon nitride containing a stoichiometrically excessive amount of silicon. As a result, the electrode short-circuit prevention film has small electric conductivity, and thus it is made possible to prevent the film from being charged with electric charge and to avoid the drift of the electric charge. Consequently, the sound-electricity conversion characteristics of the sound-electricity conversion device stabilize, and further the sound noise level of the ultrasonic diagnostic apparatus decreases.

摘要翻译： 本发明旨在稳定隔膜式声电转换装置的声电转换特性，并且降低使用声电转换装置的超声波诊断装置的噪声水平。 声电转换装置由包括形成在硅基板上的下电极和下电极上的上电极的电容器单元构成，下电极和上电极夹着空腔。 在空腔侧的上部电极上形成电极短路防止膜。 电极短路防止膜由电气时间常数短于1秒且长于10微秒的材料形成，例如含有化学计量过量的硅的氮化硅。 结果，电极短路防止膜具有小的导电性，因此可以防止膜被充电并避免电荷的漂移。 因此，声电转换装置的声电转换特性稳定，超声波诊断装置的声音噪声水平进一步降低。

公开(公告)号：US20060275888A1

公开(公告)日：2006-12-07

申请号：US10552115

申请日：2004-04-08

申请人： Hiroki Hibino ,  Hiroshi Fukuda ,  Kiminobu Numata ,  Hiroyuki Machida ,  Tomoyuki Kinoshita ,  Kenji Nakamura

发明人： Hiroki Hibino ,  Hiroshi Fukuda ,  Kiminobu Numata ,  Hiroyuki Machida ,  Tomoyuki Kinoshita ,  Kenji Nakamura

IPC分类号： C12M1/36

CPC分类号： C12M41/14 ,  C12M23/50 ,  C12M41/48

摘要： There are provided a culture treatment apparatus and an automatic culture apparatus capable of taking quick and appropriate action even if there is a change in the state of a space where cells stored in a container, such as a culture vessel, for the automatic culture apparatus are subjected to predetermined treatment. The culture treatment apparatus includes a treatment section for applying predetermined treatment to cells stored in an openable container for the automatic culture apparatus in a partitioned space; a detection section for detecting a predetermined state of the space, the detection section being in the space or in the vicinity of the space; and a control section for controlling the treatment section to close the container if the detection section detects the predetermined state with the container opened.

摘要翻译： 提供了一种培养处理装置和自动培养装置，即使存储在诸如培养容器的容器中的细胞的自动培养装置的空间的状态发生变化，也能够采取快速和适当的动作 进行预定处理。 培养处理装置包括处理部，用于对分配空间中的自动培养装置的开放容器中储存的细胞进行规定处理; 检测部，用于检测所述空间的预定状态，所述检测部位于所述空间的空间或附近; 以及控制部分，用于如果检测部分在容器打开时检测到预定状态，则控制处理部分关闭容器。

公开(公告)号：US20060036409A1

公开(公告)日：2006-02-16

申请号：US11185852

申请日：2005-07-21

申请人： Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Hiroki Kawada ,  Tatsuya Maeda

发明人： Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Hiroki Kawada ,  Tatsuya Maeda

IPC分类号： G06F17/00

CPC分类号： G01B15/08 ,  G01N23/2251 ,  G03F7/70625 ,  H01J2237/223 ,  H01J2237/2817

摘要： Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates a components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.

摘要翻译： 设备提取在制造设备时需要评估的空间频率的组件，或者在细线图案上分析材料或工艺的边缘粗糙度并将其显示为索引。 设备在足够长的区域上获取边缘粗糙度的数据，对与操作者在功率谱上设置的空间频率区域相对应的分量进行积分，并将其显示在长度测量SEM上。 或者，设备对足够长的区域的边缘粗糙度数据进行分割，通过进行基于理论计算的统计处理和拟合来计算与任意检查区域相对应的长周期粗糙度和短周期粗糙度，并将其显示在长度测量 SEM。

公开(公告)号：US06833309B2

公开(公告)日：2004-12-21

申请号：US10832392

申请日：2004-04-27

申请人： Hiroshi Fukuda

发明人： Hiroshi Fukuda

IPC分类号： H01L2176

CPC分类号： H01L23/544 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2924/0002 ,  Y10S438/975 ,  H01L2924/00

摘要： Upon formation of semiconductor micro patterns, an interlayer alignment error occurs due to asymmetry of each alignment mark. Prior to alignment of a mask with a wafer, the asymmetry of each alignment mark is measured according to the principle of a scatterometry, and the alignment is performed in consideration of the result of measurement to execute exposure. Thus, high-accuracy alignment can be carried out without sacrificing throughput, and the performance of a semiconductor device is improved. Further, manufacturing yields can be enhanced and a reduction in cost can be realized.

公开(公告)号：US06787459B2

公开(公告)日：2004-09-07

申请号：US10294700

申请日：2002-11-15

申请人： Akemi Moniwa ,  Takuya Hagiwara ,  Keitaro Katabuchi ,  Hiroshi Fukuda ,  Mineko Adachi

发明人： Akemi Moniwa ,  Takuya Hagiwara ,  Keitaro Katabuchi ,  Hiroshi Fukuda ,  Mineko Adachi

IPC分类号： H01C2144

CPC分类号： G03F1/70 ,  G03F1/26 ,  Y10S438/942

摘要： There is provided a method of fabricating a semiconductor device whereby fine patterns are formed with high dimensional accuracy by means of multiple exposures, using a phase shift mask and a trim mask. Phases are periodically assigned to shifter patterns within a given range from patterns generated with the phase shift mask, respectively.

摘要翻译： 提供一种制造半导体器件的方法，由此通过使用相移掩模和修剪掩模，通过多次曝光以高尺寸精度形成精细图案。 相位分别定期地分配给给定范围内的移相器图案，从用相移掩模生成的图案。

公开(公告)号：US06780781B2

公开(公告)日：2004-08-24

申请号：US10445068

申请日：2003-05-27

申请人： Takahiro Odaka ,  Toshihiko Tanaka ,  Takashi Hattori ,  Hiroshi Fukuda

发明人： Takahiro Odaka ,  Toshihiko Tanaka ,  Takashi Hattori ,  Hiroshi Fukuda

IPC分类号： H01L21302

CPC分类号： G03F1/32 ,  G03F1/56 ,  G03F7/405 ,  H01L21/76802 ,  Y10S438/942 ,  Y10S438/945 ,  Y10S438/947 ,  Y10S438/948 ,  Y10S438/949

摘要： A method for manufacturing an electronic device is provided. In one example of the method, the method prevents deformation of a resist mask caused by the irradiation of exposure light. The resist mask has a resist as an opaque element, and can afford mask patterns undergoing little change even with an increase in the number of wafers subjected to exposure processing. The resist mask maintains a high dimensional accuracy. A photomask pattern is formed using as an opaque element a resist comprising a base resin and Si incorporated therein or a resist with a metal such as Si incorporated thereby by a silylation process, to improve the resistance to active oxygen. The deformation of a resist opaque pattern in a photomask is prevented. The dimensional accuracy of patterns transferred onto a Si wafer is improved in repeated use of the photomask.

摘要翻译： 提供了一种用于制造电子设备的方法。 在该方法的一个示例中，该方法防止由曝光光的照射引起的抗蚀剂掩模的变形。 抗蚀剂掩模具有作为不透明元素的抗蚀剂，并且即使随着经受曝光处理的晶片数量的增加，也可以提供几乎没有变化的掩模图案。 抗蚀剂掩模保持高尺寸精度。 使用作为不透明元件的抗蚀剂形成光掩模图案，该抗蚀剂包含掺入其中的基础树脂和Si，或通过甲硅烷基化方法掺入其中的诸如Si的金属的抗蚀剂，以提高对活性氧的耐受性。 防止光掩模中的抗蚀剂不透明图案的变形。 转移到Si晶片上的图案的尺寸精度在光掩模的重复使用中得到改善。

公开(公告)号：US06624876B2

公开(公告)日：2003-09-23

申请号：US09740936

申请日：2000-12-21

申请人： Hiroshi Fukuda ,  Takashi Ebato

发明人： Hiroshi Fukuda ,  Takashi Ebato

IPC分类号： G03B2900

CPC分类号： G03B27/73

摘要： A printer prints a calibration pattern on a leading end portion of a roll of recording paper when the recording paper is loaded in the printer. A cutter cuts the leading end portion off the recording sheet so as to make an end edge rectangular to side edges of the recording sheet. A photometric device measures densities of the printed calibration pattern, and a system controller derives correction values for correcting density or color from the measured densities. After the calibration process, an image is printed in an image recording area on the recording paper following the leading end portion. For a printer that prints an image on a cut sheet recording paper, a calibration pattern is printed on a margin outside an image recording area. After densities of the calibration pattern are measured, the margin with the calibration pattern is cut off the recording paper.

摘要翻译： 当记录纸被装载到打印机中时，打印机将标记图案打印在一卷记录纸的前端部分上。 切割器将记录片材的前端部分切割成使得端部边缘与记录片材的侧边缘成矩形。 测光装置测量印刷校准图案的密度，并且系统控制器从测量的密度获得用于校正密度或颜色的校正值。 在校准处理之后，在跟随前端部分的记录纸上的图像记录区域中打印图像。 对于在切纸记录纸上打印图像的打印机，在图像记录区域外的边缘上印刷校准图案。 在测量校准图案的密度之后，用记录纸切断校准图案的余量。

公开(公告)号：US06533477B2

公开(公告)日：2003-03-18

申请号：US09775625

申请日：2001-02-05

申请人： Hiroshi Fukuda

发明人： Hiroshi Fukuda

IPC分类号： B41J2315

CPC分类号： B41J2/355

摘要： There is disclosed a thermosensitive line printer, wherein a heating element array of a thermal head is pressed on a thermosensitive recording paper at a distance L2 from a nipping position by a pair of conveyer rollers, and is driven to record an image frame line by line from a print starting end, as the recording paper is conveyed by the conveyer rollers in a direction from the thermal head to the conveyer rollers. Based on image data of an upper zone of an image frame that is to be recorded around the distance L2 from the print starting end if the image frame is recorded from its top side, an image analyzer calculates a first estimation value that represents conspicuousness of potential density deviation in the upper zone that could be caused by a thermal deformation of the thermosensitive recording paper at the print starting end if the image frame is recorded from the top side. The image analyzer calculates a second estimation value based on image data of a lower zone that is to be located at the distance L2 from the print starting end if the image frame is recorded from its bottom side. If the first estimation value is smaller than the second estimation value, the image frame is recorded from the top side, and vise versa.

摘要翻译： 公开了一种热敏线打印机，其中热敏头的加热元件阵列通过一对输送辊以与夹持位置L2的距离压在热敏记录纸上，并被驱动以逐行记录图像帧 因为记录纸由输送辊沿从热敏头到输送辊的方向传送。 如果从其顶侧记录图像帧，则基于要从打印开始端到达距离L2周围的图像帧的上部区域的图像数据，图像分析器计算表示潜在的显着性的第一估计值 如果从顶侧记录图像帧，则可能由热敏记录纸在打印开始端的热变形引起的上区域中的浓度偏差。 如果从其底侧记录图像帧，则图像分析器基于将位于距离打印开始端的距离L2的下区域的图像数据来计算第二估计值。 如果第一估计值小于第二估计值，则从顶侧记录图像帧，反之亦然。

公开(公告)号：US5879576A

公开(公告)日：1999-03-09

申请号：US852291

申请日：1997-05-07

申请人： Kenya Wada ,  Kazuhiko Gonmori ,  Hisayoshi Ichikawa ,  Nobuo Morita ,  Hiroshi Fukuda

发明人： Kenya Wada ,  Kazuhiko Gonmori ,  Hisayoshi Ichikawa ,  Nobuo Morita ,  Hiroshi Fukuda

IPC分类号： B05C11/08 ,  G03F7/30 ,  H01L21/00 ,  H01L21/687 ,  B44C1/22

CPC分类号： H01L21/6715 ,  B05C11/08 ,  G03F7/3021 ,  H01L21/67023 ,  H01L21/67051 ,  H01L21/68721 ,  H01L21/6875 ,  H01L21/68778

摘要： Method and apparatus for processing substrates through a number of wet treatments. A substrate is set on a substrate rotating means for rotation in a horizontal face-up position, within a housing which is open on its top side. By a treating liquid feed means having a treating liquid feed nozzle member, at least one kind of treating liquid is supplied onto upper surfaces of the substrate being rotated by the substrate rotating means. The treating liquid feed nozzle member is supported on a movable arm for displacement to and from an operative position vertically confronting the substrate and a receded standby position away from the substrate on the substrate rotating means. Located face to face with lower surfaces of the substrate is a nozzle means which supplies a fluid to the lower side of the substrate.

摘要翻译： 通过多次湿处理处理基材的方法和装置。 基板被设置在基板旋转装置上，用于在水平面向上的位置，在其顶侧开口的壳体内旋转。 通过具有处理液体供给喷嘴构件的处理液体进料装置，至少一种处理液体被供给到通过基板旋转装置旋转的基板的上表面上。 处理液体供给喷嘴构件被支撑在可移动臂上，用于位于与基板垂直相对的操作位置和离开基板旋转装置上的基板的后退待机位置。 与基板的下表面面对面地设置有向基板的下侧供给流体的喷嘴装置。