公开(公告)号：US20160103050A1

公开(公告)日：2016-04-14

申请号：US14510330

申请日：2014-10-09

Applicant: Caterpillar Inc.

Inventor： Jacob P. Fabrizius ,  Trent A. Simpson ,  Robert E. Sharp ,  Benjamin J. Rasmussen ,  Jarrod D. Moss

IPC: G01N3/56 ,  G01B11/22 ,  G01M15/04

CPC classification number: G01N3/56 ,  G01B11/22 ,  G01M5/0033 ,  G01M15/02 ,  G01M15/042 ,  G01N21/9515 ,  G01N2201/103

Abstract: A method of determining wear of a worn surface of a machine component includes providing a scanning device at a distance from the worn surface. The method also includes moving at least one of the scanning device and the worn surface relative to the other and generating a set of data points via the scanning device. Each data point of the set of data points is indicative of a depth of a corresponding point on the worn surface relative to a reference plane. The method further includes determining a maximum depth of the worn surface based on the set of data points and comparing the maximum depth to a reference value to determine a next step in a remanufacturing process of the machine component.

Abstract translation: 确定机器部件的磨损表面的磨损的方法包括提供距磨损表面一定距离的扫描装置。 该方法还包括相对于另一扫描装置和磨损表面中的至少一个移动并经由扫描装置产生一组数据点。 数据点集合中的每个数据点表示磨损表面上相对于参考平面的对应点的深度。 该方法还包括基于该组数据点确定磨损表面的最大深度，并将最大深度与参考值进行比较，以确定机器部件的再制造过程中的下一步骤。

公开(公告)号：US20160097727A1

公开(公告)日：2016-04-07

申请号：US14506321

申请日：2014-10-03

Applicant: KLA-Tencor Corporation

Inventor： Jijen Vazhaeparambil ,  Guoheng Zhao ,  Daniel Kavaldjiev ,  Anatoly Romanovsky ,  Ivan Maleev ,  Christian Wolters ,  Stephen Biellak ,  Bret Whiteside ,  Donald Pettibone ,  Yung-Ho Alex Chuang ,  David W. Shortt

IPC: G01N21/88 ,  G06T7/00 ,  G01N21/95

CPC classification number: G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8887 ,  G01N2021/8896 ,  G01N2201/06113 ,  G01N2201/103 ,  G01N2201/12 ,  G06T7/0004 ,  G06T2207/10004 ,  G06T2207/30148

Abstract: A wafer scanning system includes imaging collection optics to reduce the effective spot size. Smaller spot size decreases the number of photons scattered by the surface proportionally to the area of the spot. Air scatter is also reduced. TDI is used to produce a wafer image based on a plurality of image signals integrated over the direction of linear motion of the wafer. An illumination system floods the wafer with light, and the task of creating the spot is allocated to the imaging collection optics.

Abstract translation: 晶片扫描系统包括成像采集光学器件以减少有效光斑尺寸。 较小的斑点尺寸使得表面散射的光子数量与斑点的面积成比例地减小。 空气散射也减少。 TDI用于基于在晶片的线性运动方向上积分的多个图像信号产生晶片图像。 照明系统用光淹没晶片，创建光斑的任务被分配给成像采集光学元件。

公开(公告)号：US09116132B2

公开(公告)日：2015-08-25

申请号：US14532989

申请日：2014-11-04

Applicant: KLA-Tencor Corporation

Inventor： Christian Wolters ,  Juergen Reich

IPC: G01N21/95 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/103

Abstract: A surface scanning wafer inspection system with independently adjustable scan pitch and associated methods of operation are presented. The scan pitch may be adjusted independently from an illumination area on the surface of a wafer. In some embodiments, scan pitch is adjusted while the illumination area remains constant. For example, defect sensitivity is adjusted by adjusting the rate of translation of a wafer relative to the rate of rotation of the wafer without additional optical adjustments. In some examples, the scan pitch is adjusted to achieve a desired defect sensitivity over an entire wafer. In other examples, the scan pitch is adjusted during wafer inspection to optimize defect sensitivity and throughput. In other examples, the scan pitch is adjusted to maximize defect sensitivity within the damage limit of a wafer under inspection.

Abstract translation: 提出了具有独立可调的扫描间距和相关操作方法的表面扫描晶片检查系统。 可以独立于晶片表面上的照明区域来调整扫描间距。 在一些实施例中，在照明区域保持恒定的同时调整扫描间距。 例如，通过调整晶片相对于晶片的旋转速率的平移速率来调整缺陷灵敏度，而无需额外的光学调整。 在一些示例中，调整扫描间距以在整个晶片上实现期望的缺陷灵敏度。 在其他示例中，在晶片检查期间调整扫描间距以优化缺陷灵敏度和产量。 在其他示例中，调整扫描间距以使在检查的晶片的损伤极限内的缺陷灵敏度最大化。

公开(公告)号：US09006687B2

公开(公告)日：2015-04-14

申请号：US14378674

申请日：2013-02-20

Applicant: Sharp Kabushiki Kaisha

Inventor： Yukio Watanabe

IPC: G01N21/64 ,  G02B13/18 ,  G02B21/00

CPC classification number: G01N21/645 ,  G01N21/6456 ,  G01N21/6486 ,  G01N2021/6471 ,  G01N2021/6478 ,  G01N2201/06113 ,  G01N2201/10 ,  G01N2201/103 ,  G01N2201/105 ,  G02B19/0028 ,  G02B19/0076 ,  G02B19/008 ,  G02B19/0085 ,  G02B21/0076 ,  G02B2207/113

Abstract: A first lens configured to convert light from the objective lens into parallel light includes a concave lens part having a concave curved face in a center portion of a flat face, and a convex lens part having a convex curved face around a flat face. Further, the first lens includes first and second regions configured to diverge light through the flat face and the concave curved face and a third region configured to collect light through the convex curved face and the concave curved face. When the sample is on a sample table and sealed in a two-dimensional electrophoresis substrate, light totally reflected by a side surface of the objective lens enters the second region. In contrast, when the sample is directly on the sample table, the light enters the third region.

Abstract translation: 第一透镜被配置为将来自物镜的光转换为平行光，包括在平面的中心部分具有凹曲面的凹透镜部分和在平坦表面周围具有凸曲面的凸透镜部分。 此外，第一透镜包括被配置为使光通过平面和凹曲面发散的第一和第二区域和被配置为通过凸曲面和凹曲面收集光的第三区域。 当样品在样品台上并密封在二维电泳基质中时，由物镜的侧表面全反射的光进入第二区域。 相反，当样品直接在样品台上时，光进入第三区域。

公开(公告)号：US20150079585A1

公开(公告)日：2015-03-19

申请号：US14371890

申请日：2013-01-09

Applicant: KONINKLIJKE PHILIPS N.V.

Inventor： Reinhold Wimberger-Friedl ,  Johan Lub ,  Pieter Jan Van Der Zaag

IPC: G01N21/64

CPC classification number: G01N21/6486 ,  B01J2219/00576 ,  B01J2219/00605 ,  B01J2219/00711 ,  B01J2219/00722 ,  C12Q1/6874 ,  C12Q2523/319 ,  C12Q2525/186 ,  C12Q2565/601 ,  G01N21/6428 ,  G01N21/6458 ,  G01N21/648 ,  G01N2021/6439 ,  G01N2201/06113 ,  G01N2201/103

Abstract: The present invention relates to DNA sequencing with reagent cycling on the wiregrid. The sequencing approach suggested with which allows to use a single fluid with no washing steps. Based on strong optical confinement and of excitation light and of cleavage light, the sequencing reaction can be read-out without washing the surface. Stepwise sequencing is achieved by using nucleotides with optically cleavable blocking moietys. After read-out the built in nucleotide is deblocked by cleavage light through the same substrate. This ensures that only bound nucleotides will be unblocked.

Abstract translation: 本发明涉及在丝网上循环试剂的DNA测序。 提出的测序方法允许使用不含洗涤步骤的单一流体。 基于强的光学限制和激发光和裂解光，可以读出测序反应而不洗涤表面。 通过使用具有可光学切割阻断剂的核苷酸来实现逐步测序。 读出后，内含的核苷酸通过裂解光通过相同的底物解封。 这确保只有结合的核苷酸才能被阻止。

公开(公告)号：US20140178861A1

公开(公告)日：2014-06-26

申请号：US14194437

申请日：2014-02-28

Applicant: Reuven DUER

Inventor： Reuven DUER

IPC: G01N21/64 ,  G01N33/543

CPC classification number: G01N33/54373 ,  B01L3/502715 ,  B01L2300/0636 ,  B01L2300/0654 ,  B01L2300/0816 ,  B01L2300/0819 ,  C12Q1/6825 ,  G01N21/6428 ,  G01N21/6454 ,  G01N21/648 ,  G01N33/56988 ,  G01N2021/6439 ,  G01N2201/0696 ,  G01N2201/08 ,  G01N2201/103 ,  G02B6/4226 ,  Y10T436/143333

Abstract: The invention provides methods and devices for generating optical pulses in one or more waveguides using a spatially scanning light source. A detection system, methods of use thereof and kits for detecting a biologically active analyte molecule are also provided. The system includes a scanning light source, a substrate comprising a plurality of waveguides and a plurality of optical sensing sites in optical communication with one or more waveguide of the substrate, a detector that is coupled to and in optical communication with the substrate, and means for spatially translating a light beam emitted from said scanning light source such that the light beam is coupled to and in optical communication with the waveguides of the substrate at some point along its scanning path. The use of a scanning light source allows the coupling of light into the waveguides of the substrate in a simple and cost-effective manner.

Abstract translation: 本发明提供了使用空间扫描光源在一个或多个波导中产生光脉冲的方法和装置。 还提供了检测系统，其使用方法和用于检测生物活性分析物分子的试剂盒。 该系统包括扫描光源，包括多个波导的基板和与基板的一个或多个波导光学通信的多个光学感测位置，耦合到基板并与光学连接的检测器，以及装置 用于空间地平移从所述扫描光源发射的光束，使得所述光束在沿其扫描路径的某点处耦合到所述衬底的波导并与所述衬底的波导光通信。 使用扫描光源允许以简单且成本有效的方式将光耦合到衬底的波导中。

公开(公告)号：US08493557B2

公开(公告)日：2013-07-23

申请号：US13202681

申请日：2010-01-22

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N2201/103

Abstract: A surface inspecting apparatus rotates a semiconductor wafer 100 (inspection object) as a main scan while translating the semiconductor wafer 100 as an auxiliary scan, illuminates the surface of the semiconductor wafer 100 with illuminating light 21, thereby forms an illumination spot 3 as the illumination area of the illuminating light 21, detects scattered or diffracted or reflected light from the illumination spot, and detects a foreign object existing on the surface of the semiconductor wafer 100 or in a part of the semiconductor wafer 100 in the vicinity of the surface based on the result of the detection. In the surface inspecting apparatus, the translation speed of the auxiliary scan is controlled according to the distance from the rotation center of the semiconductor wafer 100 in the main scan to the illumination spot. With this control, the inspection time can be shortened while the deterioration in the detection sensitivity and the increase in the thermal damage during the surface inspection are suppressed.

公开(公告)号：US08477302B2

公开(公告)日：2013-07-02

申请号：US12412776

申请日：2009-03-27

Applicant: Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

Inventor： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/9505 ,  G01N2021/8854 ,  G01N2021/8874 ,  G01N2201/103 ,  G01N2201/1045

Abstract: A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.

Abstract translation: 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台，照射光学系统，其照射激光束以在样品的表面上形成线性照射区域，检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置，用于检测从样品表面的线性照射区域散射的光，并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号，并根据所选择的检测信号检测缺陷。

公开(公告)号：US08268551B2

公开(公告)日：2012-09-18

申请号：US10540224

申请日：2004-01-27

Applicant: William G. Tong

Inventor： William G. Tong

IPC: C12Q1/68

CPC classification number: G01N21/636 ,  G01J3/42 ,  G01N21/253 ,  G01N30/74 ,  G01N2201/103 ,  G01N2201/12746

Abstract: Techniques and systems for using nonlinear four wave mixing to optically measure microarrays with sample cells of biological or chemical materials. Examples of suitable microarrays include but are not limited to DNA microchips and capillary electrophoresis microarrays.

Abstract translation: 使用非线性四波混合的光学测量微阵列与生物或化学材料样品池的技术和系统。 合适的微阵列的实例包括但不限于DNA微芯片和毛细管电泳微阵列。

公开(公告)号：US20090279081A1

公开(公告)日：2009-11-12

申请号：US12412776

申请日：2009-03-27

Applicant: Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

Inventor： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

IPC: G01N21/896

CPC classification number: G01N21/9501 ,  G01N21/9505 ,  G01N2021/8854 ,  G01N2021/8874 ,  G01N2201/103 ,  G01N2201/1045

Abstract: A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.

Abstract translation: 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台，照射光学系统，其照射激光束以在样品的表面上形成线性照射区域，检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置，用于检测从样品表面的线性照射区域散射的光，并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号，并根据所选择的检测信号检测缺陷。