公开(公告)号：US20030071230A1

公开(公告)日：2003-04-17

申请号：US10270068

申请日：2002-10-15

Applicant: Pioneer Corporation

Inventor： Yasumitsu Wada

IPC: H01J037/147

CPC classification number: H01J37/26 ,  H01J2237/153 ,  H01J2237/282

Abstract: An electron beam apparatus for irradiating a target with an electron beam includes a reference sample including at least one reference pattern which has a plurality of lattice structures arranged along the circumference of a circle in a evaluation surface of the reference sample; and an adjustment section for adjusting the electron beam by irradiating the evaluation surface with the electron beam on the basis of electrons generated from the reference sample.

公开(公告)号：US20020186357A1

公开(公告)日：2002-12-12

申请号：US10150153

申请日：2002-05-20

Applicant: Canon Kabushiki Kaisha

Inventor： Susumu Goto

IPC: G03B027/42

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/0492 ,  H01J2237/153

Abstract: A blur and image distortion of an electron beam on a sample are reduced even at a large converging angle of the electron beam. A reduction projection optical system (120) has an immersion lens (108) on the image plane (wafer 111) side. A collimator lens (pupil control optical system) 106 is arranged between the reduction projection optical system (120) and its object plane (mask 104). The collimator lens (106) arranges the entrance pupil (110) of the reduction projection optical system (120) at a finite position from the image plane on the downstream side of the image plane of the reduction projection optical system (120). This can minimize any blur and image distortion of an electron beam on a sample.

Abstract translation: 电子束的电子束的模糊和图像失真甚至在电子束的大的会聚角度被减小。 还原投影光学系统（120）在像面（晶片111）侧具有浸没透镜（108）。 准直透镜（光瞳控制光学系统）106布置在缩小投影光学系统（120）与其物平面（掩模104）之间。 准直透镜（106）将缩小投影光学系统（120）的入射光瞳（110）从缩小投影光学系统（120）的像面的下游侧的像面配置在有限位置。 这可以最小化样品上电子束的任何模糊和图像失真。

公开(公告)号：US20020179851A1

公开(公告)日：2002-12-05

申请号：US10082288

申请日：2002-02-26

Inventor： Mitsugu Sato ,  Tadashi Otaka ,  Makoto Ezumi ,  Atsushi Takane ,  Shoji Yoshida ,  Satoru Yamaguchi ,  Yasuhiko Ozawa

IPC: H01J037/04

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/153

Abstract: An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.

Abstract translation: 本发明的目的是提供一种带电粒子束装置和带电粒子束装置的对准方法，其使得即使当带电粒子束的状态改变时也能够容易地对准带电粒子束的光轴 。 本发明包括用于计算对物镜执行轴对准的对准偏转器的偏转量的计算装置，用于计算偏转量的多种计算方法被存储在计算装置中，以及选择装置，用于至少选择 提供了一种计算方法。

公开(公告)号：US20020008209A1

公开(公告)日：2002-01-24

申请号：US09901766

申请日：2001-07-09

Applicant: Nikon Corporation

Inventor： Hiroyasu Simizu

IPC: H01J027/00

CPC classification number: H01J37/063 ,  H01J2237/153 ,  H01J2237/3175

Abstract: Electron-beam sources are disclosed that exhibit substantially reduced spherical aberration compared to conventional sources. In a beam produced by the cathode of such a source, axially propagating electrons are subjected to a lens action by voltage applied to a Wehnelt electrode and an extraction electrode. The cathode includes a peripheral portion that is nulldrawn backnull (displaced along the axis of the source away from the beam-propagation direction) relative to a center portion of the cathode. With such a cathode, the percentage of dimensions of the crossover involved in spherical aberration of the crossover is reduced. This improves the uniformity of beam current at a lithographic substrate and minimizes location-dependency of the aperture angle. Since the Wehnelt voltage can be reduced, positional changes in the electrical field at the cathode surface are reduced, and the distribution of electrons in the beam propagating from the cathode surface is made more uniform than conventionally.

Abstract translation: 公开了与常规源相比显示出显着降低的球面像差的电子束源。 在由这种源的阴极产生的光束中，轴向传播的电子通过施加到Wehnelt电极和引出电极的电压进行透镜作用。 阴极包括相对于阴极的中心部分被“拉回”（沿源于远离光束传播方向的光轴移动）的周边部分。 对于这样的阴极，交叉点的球面像差所涉及的交叉点的尺寸的百分比减小。 这改善了光刻基片上的束流的均匀性，并使孔径角的位置依赖性最小化。 由于可以减小Wehnelt电压，阴极表面的电场的位置变化减小，并且从阴极表面传播的光束中的电子分布比以往更均匀。

公开(公告)号：US5635719A

公开(公告)日：1997-06-03

申请号：US685278

申请日：1996-07-23

Applicant: Paul F. Petric

Inventor： Paul F. Petric

IPC: H01J37/141 ,  H01J37/153 ,  H01J37/30 ,  H01J37/147

CPC classification number: H01J37/3007 ,  H01J2237/0492 ,  H01J2237/15 ,  H01J2237/153 ,  H01J2237/3175

Abstract: An improved particle lens has an axis which is shifted to follow the central ray as it is deflected through the lens creating, in effect, a variable curvilinear optical axis for the lens. The variable curvilinear optical axis is created for the lens so that the axis varies proportionally to the magnitude of the beam deflection. The optical axis of the lens is shifted by applying a uniform field to the lens to cancel the first term of the radial field with a function that is dependent on the position along the z-axis. This function is the trajectory of the central ray of the electron beam.

Abstract translation: 改进的粒子透镜具有随着偏转穿过透镜的中心射线偏移的轴线，实际上产生用于透镜的可变曲线光轴。 为透镜创建可变曲线光轴，使得轴与光束偏转的大小成比例地变化。 透镜的光轴通过对透镜施加均匀的场来移动，以取决于沿着z轴的位置的函数来抵消径向场的第一项。 该功能是电子束中心射线的轨迹。

公开(公告)号：US20240186105A1

公开(公告)日：2024-06-06

申请号：US18526286

申请日：2023-12-01

Applicant: Katholieke Universiteit Leuven

Inventor： Etienne Brodu

IPC: H01J37/22 ,  H01J37/295

CPC classification number: H01J37/222 ,  H01J37/295 ,  H01J2237/153

Abstract: A set of methods of processing a set of Kikuchi diffraction patterns acquired for a series of incident positions of an electron beam on a sample material are described. One such method involves the steps of identifying a first pattern in the set containing a matrix signal and suspected of additionally containing a secondary phase signal; identifying a second pattern close to the first pattern which contains a matrix signal without containing a secondary phase signal; modifying the contrast and intensity of either the first pattern or the second pattern, the modification depending on a relative property of the first and second patterns, resulting in a modified first or second pattern; and obtaining a secondary phase signal pattern by either i) if the first pattern was modified, subtracting the original second pattern from the modified first pattern; or ii) if the second pattern was modified, subtracting the modified second pattern from the original first pattern.

公开(公告)号：US09916964B1

公开(公告)日：2018-03-13

申请号：US15246421

申请日：2016-08-24

Applicant: CARL ZEISS MICROSCOPY GMBH ,  CARL ZEISS MICROSCOPY LTD.

Inventor： Simon Diemer ,  Janina Schulz ,  Emanuel Heindl ,  David Roddom

IPC: G01N23/00 ,  H01J37/21 ,  H01J37/26 ,  H01J37/22

CPC classification number: H01J37/21 ,  H01J37/222 ,  H01J37/263 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/216

Abstract: A method of operating a charged particle microscope comprises: providing settings of a focus, an x-stigmator and an y-stigmator of the charged particle microscope; and then repeatedly performing adjusting the charged particle microscope to the settings, recording an image of an object using the settings, determining a sharpness measure from the recorded image, and changing at least one of the settings of the focus, the x-stigmator and the y-stigmator based on the sharpness measure until a stop criterion is fulfilled. Herein, the determining of the sharpness measure comprises: determining an orientation of an intensity gradient at each of a plurality of locations within one of the recorded image and a processed image generated by processing the recorded image, and determining the sharpness measure based on the plurality of determined orientations.

公开(公告)号：US09455115B2

公开(公告)日：2016-09-27

申请号：US14574190

申请日：2014-12-17

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Simon Diemer

IPC: H01J37/15 ,  H01J37/147 ,  H01J37/12 ,  H01J37/285

CPC classification number: H01J37/147 ,  H01J37/12 ,  H01J37/15 ,  H01J37/153 ,  H01J37/285 ,  H01J2237/12 ,  H01J2237/15 ,  H01J2237/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/285

Abstract: A method of adjusting a stigmator in a particle beam apparatus comprises directing a particle beam onto a sample wherein the particle beam traverses a quadrupole field 37 generated by energizing at least four field generators of the stigmator; acquiring first and second images of the sample at different field strengths of the quadrupole field while energizing the at least four field generators according to a first setting of a plurality of settings; acquiring third and fourth images of the sample at different field strengths of the quadrupole field 37 while energizing the at least four field generators according to a second setting of the plurality of settings; determining a plurality of image displacements based on the first, second, third and fourth images; determining an optimum setting of the at least four field generators based on the plurality of image displacements and the plurality of settings.

Abstract translation: 调整粒子束装置中的标示器的方法包括将粒子束引导到样品上，其中，粒子束穿过通过对至少四个场效应晶体管的场发生器通电而产生的四极场37; 在所述四极场的不同场强下采集所述样本的第一和第二图像，同时根据多个设置的第一设置激励所述至少四个场发生器; 在所述四极场37的不同场强下采集所述样本的第三和第四图像，同时根据所述多个设置的第二设置激励所述至少四个场发生器; 基于所述第一，第二，第三和第四图像确定多个图像位移; 基于所述多个图像位移和所述多个设置来确定所述至少四个场发生器的最佳设置。

公开(公告)号：US20160181055A1

公开(公告)日：2016-06-23

申请号：US14574190

申请日：2014-12-17

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Simon Diemer

IPC: H01J37/147 ,  H01J37/285 ,  H01J37/12

CPC classification number: H01J37/147 ,  H01J37/12 ,  H01J37/15 ,  H01J37/153 ,  H01J37/285 ,  H01J2237/12 ,  H01J2237/15 ,  H01J2237/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/285

Abstract: A method of adjusting a stigmator in a particle beam apparatus comprises directing a particle beam onto a sample wherein the particle beam traverses a quadrupole field 37 generated by energizing at least four field generators of the stigmator; acquiring first and second images of the sample at different field strengths of the quadrupole field while energizing the at least four field generators according to a first setting of a plurality of settings; acquiring third and fourth images of the sample at different field strengths of the quadrupole field 37 while energizing the at least four field generators according to a second setting of the plurality of settings; determining a plurality of image displacements based on the first, second, third and fourth images; determining an optimum setting of the at least four field generators based on the plurality of image displacements and the plurality of settings.

Abstract translation: 调整粒子束装置中的标示器的方法包括将粒子束引导到样品上，其中，粒子束穿过通过对至少四个场效应晶体管的场发生器通电而产生的四极场37; 在所述四极场的不同场强下采集所述样本的第一和第二图像，同时根据多个设置的第一设置激励所述至少四个场发生器; 在所述四极场37的不同场强下采集所述样本的第三和第四图像，同时根据所述多个设置的第二设置激励所述至少四个场发生器; 基于所述第一，第二，第三和第四图像确定多个图像位移; 基于所述多个图像位移和所述多个设置来确定所述至少四个场发生器的最佳设置。

公开(公告)号：US09208994B2

公开(公告)日：2015-12-08

申请号：US13817086

申请日：2011-07-07

Applicant: Takashi Ohshima ,  Michio Hatano ,  Hideo Morishita

Inventor： Takashi Ohshima ,  Michio Hatano ,  Hideo Morishita

IPC: G01N23/00 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/261 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/153 ,  H01J2237/202 ,  H01J2237/20207 ,  H01J2237/20221

Abstract: The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2, 3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.

Abstract translation: 本发明提供了一种电子束装置，包括用于使延迟电场的轴向位移可视化的装置和用于调节轴向位移的装置。 轴向位移可视化装置包括反射板（6）和用于会聚反射板（6）上的二次电子束（9）的光学系统（2,3），并且轴向位移调节装置包括倾斜旋转机构 （8）用于样品台（5）。 利用这种结构，在诸如SEM等的电子束装置中，存在由物镜（3）和样品（4）之间的电场的轴对称位移引起的视野位移的问题，并且不能测量次级 可以消除提供所需信息的电子和反射电子。