公开(公告)号：US08084929B2

公开(公告)日：2011-12-27

申请号：US12769393

申请日：2010-04-28

Applicant: Artush A. Abgaryan ,  Eli Levi

Inventor： Artush A. Abgaryan ,  Eli Levi

IPC: H01J29/46

CPC classification number: H01J29/62 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J35/14 ,  H01J37/063 ,  H01J37/065 ,  H01J37/3174 ,  H01J2237/0492 ,  H01J2237/0656 ,  H01J2237/28

Abstract: System that focuses electron beams in an electro-static area to a laminar flow of electrons with uniform distribution of current density and extraordinary demagnification includes a body that defines a boundary for an electric field, a field-forming cathode electrode system, a focusing electrode system, and at least one anode electrode system in the electro-static section and a second electric field-free section including an adjustable screen system arranged in an interior of the body. The field-forming near-cathode electrode system includes a cathode electrically connected to a flat part and a curvilinear part electrically connected to a cylindrical part. The anode electrode system includes an opening part, an anode electrically connected to a flat part and a curvilinear part electrically connected to a cylindrical part which is similar or identical to and symmetrical with the cathode electrode system. The system parameters are calculated and created due to the CGMR conceptual method.

Abstract translation: 将静电区域中的电子束聚焦到具有均匀分布的电流密度和非常缩小的电子层流的系统包括限定电场边界的体，场形成阴极电极系统，聚焦电极系统 以及电静电部分中的至少一个阳极电极系统和包括布置在主体内部的可调节屏幕系统的第二无电场部分。 场形成阴极电极系统包括电连接到平坦部分的阴极和与圆筒部分电连接的曲线部分。 阳极电极系统包括开口部分，电连接到平坦部分的阳极和电连接到与阴极电极系统相似或相似的圆柱形部分的曲线部分。 由于CGMR的概念方法，系统参数被计算和创建。

公开(公告)号：US07230251B2

公开(公告)日：2007-06-12

申请号：US11174891

申请日：2005-07-01

Applicant: Sang Kuk Choi ,  Dae Yong Kim

Inventor： Sang Kuk Choi ,  Dae Yong Kim

IPC: H01J37/12

CPC classification number: H01J9/02 ,  H01J3/18 ,  H01J9/14 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31754 ,  Y10T29/49117

Abstract: Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.

Abstract translation: 本发明提供一种微柱电子束装置用电子束透镜及其制造方法。 使用感光性玻璃基板作为基底隔离基板，通过电镀法生长金属薄膜。 在种子金属层上形成形成为孔的抗蚀剂图案并镀覆薄金属膜之后，通过剥离法形成电子束通过的孔。

公开(公告)号：US20050266322A1

公开(公告)日：2005-12-01

申请号：US11174891

申请日：2005-07-01

Applicant: Sang Choi ,  Dae Kim

Inventor： Sang Choi ,  Dae Kim

IPC: G02B3/00 ,  H01J1/02 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12

CPC classification number: H01J9/02 ,  H01J3/18 ,  H01J9/14 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31754 ,  Y10T29/49117

Abstract: Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.

公开(公告)号：US06822241B2

公开(公告)日：2004-11-23

申请号：US10264599

申请日：2002-10-03

Applicant: David Schut ,  Alexander Govyadinov ,  Xioofeng Yang

Inventor： David Schut ,  Alexander Govyadinov ,  Xioofeng Yang

IPC: H01J306

CPC classification number: H01J3/02 ,  H01J3/022 ,  H01J3/18 ,  H01J29/481 ,  H01J29/62 ,  H01J2237/3175

Abstract: An emitter device including a focusing array with plural focusing columns to focus emissions from one or more emitters onto a target medium. Relative movement between the target medium and the focused emissions allows each focusing column to focus emissions over an area of the target medium encompassing the movement range. In a preferred embodiment, separate emitter, focusing array and target medium substrates are used. The focusing array may be moveable, or in a particularly preferred embodiment, is affixed to the emitter substrate, in which case the target medium substrate is movable or the focusing array includes beam direction control.

公开(公告)号：US4704532A

公开(公告)日：1987-11-03

申请号：US839294

申请日：1986-03-13

Applicant: Zhong-yi Hua

Inventor： Zhong-yi Hua

IPC: G01N24/00 ,  G21K1/087 ,  H01J3/18 ,  H01J37/12 ,  H01J37/153 ,  H01J49/42

CPC classification number: H01J3/18 ,  G21K1/087

Abstract: The invention includes a method for obtaining an exact electrostatic quadrupole field by the use of simple structures having high resistance materials of uniform or continuously varied thickness to form closed boundaries. The potential of these boundaries is continuously varied with respect to position in accordance with specified design criteria. The method and structures can be used in electron optical systems and related scientific instruments.

Abstract translation: 本发明包括通过使用具有均匀或连续变化厚度的高电阻材料的简单结构来获得精确的静电四极场的方法以形成闭合边界。 这些边界的潜力根据指定的设计标准而相对于位置而不断变化。 该方法和结构可用于电子光学系统及相关科学仪器。

公开(公告)号：US4338548A

公开(公告)日：1982-07-06

申请号：US116895

申请日：1980-01-30

Applicant: David C. Bono ,  Marvin Fishbein ,  Kenneth J. Harte

Inventor： David C. Bono ,  Marvin Fishbein ,  Kenneth J. Harte

IPC: H01J3/18 ,  H01J37/12 ,  H01J37/305 ,  H01J37/317 ,  H01J29/58

CPC classification number: H01J37/12 ,  H01J3/18

Abstract: A unipotential electrostatic lens and method of operation for charged particle beam tubes of the electron beam, compound fly's eye type having both coarse and fine deflection sections wherein the objective lens assembly may lack coaxial symmetry about the lens axis. The unipotential lens comprises an assembly of axially aligned electrostatic lens elements with each lens element having an array of micro lenslet apertures and with each set of axially aligned micro lenslet apertures forming a micro lenslet. Preferably, there are three such lens elements in the assembly with a high voltage excitation potential supplied to the center lens element. A dynamic focus correction potential derived from the deflection potentials applied to the tube is supplied to the entrance outer lens element closest to the electron gun of the beam tube. The remaining outer lens element is maintained at system ground reference potential. In preferred arrangements, a fixed offset potential is added to the high voltage excitation potential supplied to the center lens element and a compensating offset potential is supplied to the entrance outer lens element along with the dynamic focusing correction potential to thereby distribute and minimize the effect of deflection sweep and astigmatism errors which otherwise might be introduced by the uncompensated dynamic focus correction potential.

Abstract translation: 用于电子束的带电粒子束管的单电位静电透镜和操作方法，具有粗略偏转部分和精细偏转部分的复合蝇眼类型，其中物镜组件可能不具有围绕透镜轴的同轴对称性。 单能透镜包括轴向对准的静电透镜元件的组件，每个透镜元件具有微孔镜孔的阵列，并且每组轴向对准的微小孔小孔形成微小透镜。 优选地，在组件中有三个这样的透镜元件，其具有供给中心透镜元件的高电压激励电位。 从施加到管的偏转电位得到的动态聚焦校正电位被提供给最靠近光束管的电子枪的入射外透镜元件。 剩余的外部透镜元件保持在系统接地参考电位。 在优选的布置中，向提供给中心透镜元件的高电压激励电位添加固定的偏移电位，并且补偿偏移电势与动态聚焦校正电位一起被提供给入射外透镜元件，从而分布并最小化 偏转扫描和散光误差，否则可能由未补偿的动态聚焦校正电位引入。

公开(公告)号：US20170199131A1

公开(公告)日：2017-07-13

申请号：US15314346

申请日：2015-05-27

Applicant: Japan Science and Technology Agency

Inventor： Hiroyuki Yoshida

IPC: G01N21/71 ,  G01J3/02 ,  H01J37/244 ,  G01J3/443

CPC classification number: G01N21/71 ,  G01J3/0208 ,  G01J3/443 ,  G01N21/62 ,  G01N23/2254 ,  G01N2201/0638 ,  G01N2201/068 ,  G01N2223/6116 ,  H01J3/02 ,  H01J3/18 ,  H01J37/244 ,  H01J37/252 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/2445

Abstract: An inverse photoemission spectroscopy apparatus is configured to detect a light generated by the relaxation of electrons to an unoccupied state of a sample. The apparatus includes an electron source for generating electrons with which a sample is irradiated, a wavelength selector for extracting a light having a certain wavelength from the light generated in the sample, a photodetector for detecting the light extracted by the wavelength selector; and a focusing optics disposed between the sample and the photodetector. The electron source contains yttrium oxide as a thermionic emission material.

公开(公告)号：US08987679B2

公开(公告)日：2015-03-24

申请号：US13722873

申请日：2012-12-20

Applicant: Mapper Lithography IP B.V.

Inventor： Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

IPC: H01J37/12 ,  H01J3/18

CPC classification number: H01J3/18 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/15

Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

Abstract translation: 本发明涉及一种用于将多个带电粒子子束引导到位于下游方向的图像平面上的投影透镜组合模块，以及用于组装这种投影透镜组件的方法。 特别地，本发明公开了一种具有增强的结构完整性和/或其最下游电极的放置精度提高的模块化投影透镜组件。

公开(公告)号：US20140346368A1

公开(公告)日：2014-11-27

申请号：US14284128

申请日：2014-05-21

Applicant: NATIONAL UNIVERSITY OF SINGAPORE

Inventor： Anjam KHURSHEED

IPC: H01J3/18 ,  H01J3/20

CPC classification number: H01J3/18 ,  H01J3/021 ,  H01J3/027 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/26 ,  H01J2237/06333 ,  H01J2237/0635 ,  H01J2237/1534

Abstract: A gun configured to generate charged particles, comprising a ring-cathode (200) electrically configured to generate a charged particle beam; a lens arranged to focus the charged particle beam on a specimen; and at least one correction focusing electrode (1406) arranged to generate at least one electrostatic/magnetic field to further divergently/convergently focus the charged particle beam for correcting in-plane geometric aberrations associated with the lens, the focusing being based on the in-plane geometric aberrations associated with the lens. A related method is also disclosed.

Abstract translation: 一种配置成产生带电粒子的枪，包括电气配置以产生带电粒子束的环形阴极（200）; 透镜，布置成将带电粒子束聚焦在样本上; 以及至少一个校正聚焦电极（1406），其布置成产生至少一个静电/磁场，以进一步发散/收敛地聚焦带电粒子束，用于校正与透镜相关联的面内几何像差， 与透镜相关的平面几何像差。 还公开了相关方法。

公开(公告)号：US20140224999A1

公开(公告)日：2014-08-14

申请号：US14348559

申请日：2012-09-27

Applicant: KYOCERA Corporation

Inventor： Yukio Noguchi

IPC: H01J37/12 ,  H01J37/30 ,  H01J3/18

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/1205

Abstract: To provide an electrostatic lens which improves an irradiation accuracy of an electron beam while satisfying the need for higher throughput. An electrostatic lens according to one embodiment of the present invention includes a substrate which includes an insulating plate in which a plurality of first through holes that allow an electron beam to pass through are formed, a plurality of electrodes that are formed on an inner wall of the plurality of first through holes, and a plurality of wirings that are formed on the insulating plate and are electrically connected to each of the electrodes, wherein the plurality of electrodes are electrically independent from each other.

Abstract translation: 提供一种提高电子束的照射精度的静电透镜，同时满足更高的生产量。 根据本发明的一个实施例的静电透镜包括：基板，其包括绝缘板，其中形成有允许电子束穿过的多个第一通孔;多个电极，其形成在 多个第一通孔和多个布线，其形成在绝缘板上并与每个电极电连接，其中多个电极彼此电独立。