公开(公告)号：US6157758A

公开(公告)日：2000-12-05

申请号：US253724

申请日：1999-02-22

Applicant: Jun Abe ,  Masayasu Nagaoka ,  Nobuyasu Mantoku ,  Kazuo Koya

Inventor： Jun Abe ,  Masayasu Nagaoka ,  Nobuyasu Mantoku ,  Kazuo Koya

IPC: G02B6/02 ,  C03B37/012 ,  C03B37/014 ,  C03C13/04 ,  G02B6/34

CPC classification number: C03C13/045 ,  C03B37/01211 ,  C03B37/01413 ,  C03B37/01446 ,  G02B6/021 ,  C03B2201/12 ,  C03B2201/31 ,  C03B2203/22 ,  C03B2203/23 ,  C03B2203/26

Abstract: A grating optical fiber comprises a core, a first clad layer formed around the core, and a second clad layer formed around the first clad. Germanium is doped in the core, while germanium and fluorine are doped in the first clad layer. Gratings are formed on both the core and the first clad layer. The difference between the indexes of refraction between the first and second clad layers is smaller than the difference between the indexes of refraction between the core and the first clad layer.

公开(公告)号：US6057081A

公开(公告)日：2000-05-02

申请号：US935033

申请日：1997-09-22

Applicant: Takashi Yunogami ,  Shunji Sasabe ,  Kazuyuki Suko ,  Jun Abe ,  Takao Kumihashi ,  Fumio Murai

Inventor： Takashi Yunogami ,  Shunji Sasabe ,  Kazuyuki Suko ,  Jun Abe ,  Takao Kumihashi ,  Fumio Murai

IPC: G03F7/26 ,  G03F7/40 ,  H01L21/02 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/3213 ,  H01L21/822 ,  H01L21/8242 ,  H01L27/04 ,  H01L27/10 ,  H01L27/108

CPC classification number: H01L21/02071 ,  H01L21/31122 ,  H01L21/31144 ,  H01L21/32139 ,  G03F7/40 ,  H01L21/0274

Abstract: In order that reaction products of low vapor pressure may be prevented from being deposited on the side wall of a predetermined pattern when this pattern is to be formed by dry-etching a Pt film or a PZT film, a resist mask 54 having a rounded outer periphery at its head is used when the Pt film 53 deposited on a semiconductor substrate 50 is to be dry-etched. After this dry-etching, moreover, an overetching of a proper extent is performed to completely remove the side wall deposited film 55 which is left on the side of the pattern. The resist mask 54 is formed by exposing and developing a benzophenone novolak resist and subsequently by heating to set it while irradiating it, if necessary, with ultraviolet rays.

公开(公告)号：US5887233A

公开(公告)日：1999-03-23

申请号：US895556

申请日：1997-07-16

Applicant: Jun Abe ,  Noriaki Yamazaki ,  Akihiko Noda ,  Shinichi Kuramoto ,  Shota Oba

Inventor： Jun Abe ,  Noriaki Yamazaki ,  Akihiko Noda ,  Shinichi Kuramoto ,  Shota Oba

IPC: G03G15/08 ,  G03G15/02

CPC classification number: G03G15/0812 ,  G03G15/0806

Abstract: A photographic developing apparatus which visualizes a latent image formed on an image carrier is disclosed which includes:a developing powder carrier provided so as to be opposite to the image carrier;a layer forming member for forming a thin layer of developing powder over a circumferential surface of the developing powder carrier;a charge imparting member which is provided so as to be opposite to the developing powder carrier and causes an electric field between the charge imparting member and the developing powder carrier; andan electrification control member which is interposed between the charge imparting member and the developing powder carrier, and limits an ionization area caused by electric discharge in the electric field by receiving an intermediate electric potential between the electric potential of the charge imparting member and the electric potential of the developing powder carrier.

Abstract translation: 公开了一种使形成在图像载体上的潜像可视化的照相显影装置，其包括：设置成与图像载体相对的显影粉末载体; 用于在显影粉末载体的圆周表面上形成显影粉末薄层的层形成部件; 电荷赋予构件，其设置成与显影粉末载体相对，并且在电荷施加构件和显影粉末载体之间引起电场; 以及带电控制构件，其插入在电荷施加构件和显影剂载体之间，并且通过在电荷赋予构件的电位和电荷赋予构件之间接收中间电位来限制由电场中的放电引起的电离区域 显影粉末载体的潜力。

公开(公告)号：US5463452A

公开(公告)日：1995-10-31

申请号：US195049

申请日：1994-02-14

Applicant: Shigeru Inaba ,  Masaaki Fukuhara ,  Makoto Hirota ,  Mitsuo Yamamoto ,  Jun Abe ,  Hideaki Miyata ,  Takayuki Sunaga ,  Toru Ishikawa ,  Yoshio Shiina ,  Toru Isosu ,  Makoto Kanno

Inventor： Shigeru Inaba ,  Masaaki Fukuhara ,  Makoto Hirota ,  Mitsuo Yamamoto ,  Jun Abe ,  Hideaki Miyata ,  Takayuki Sunaga ,  Toru Ishikawa ,  Yoshio Shiina ,  Toru Isosu ,  Makoto Kanno

IPC: G03G15/08 ,  G03G15/06 ,  G03G15/09 ,  G03G21/00

CPC classification number: G03G15/065 ,  G03G15/0907

Abstract: A single-component developing apparatus comprising a developer holding member having a peripheral surface, a power supply section applying an AC developing bias voltage to the developer holding member, the AC developing bias voltage having a waveform with predetermined minimum value, maximum value and period, an electrostatic latent image receiving member opposing the developer holding member across a gap having predetermined width, a developer supplying section supplying a developer to the developer holding member, and a developer regulating member forming developer into a thin layer on the peripheral surface of the developer holding member by pressing on the developer holding member.In this arrangement the developer holding member transports the thin layer of developer towards the electrostatic latent image receiving member, and the transported thin layer of developer flies from the developer holding member across the gap to the electrostatic latent image receiving member in accordance with the AC developing bias voltage. The waveform of the AC developing bias voltage satisfies the inequality:t.sub.A /T.ltoreq.0.4wherein t.sub.A is rise time from minimum value to maximum value, and T is the period.

Abstract translation: 一种单组分显影装置，包括具有外围表面的显影剂保持构件，向显影剂保持构件施加AC显影偏压的电源部分，具有预定最小值，最大值和周期的波形的AC显影偏压， 静电潜像接收部件，其跨越具有预定宽度的间隙与显影剂保持部件相对;将显影剂供给到显影剂保持部件的显影剂供给部;以及将显影剂调整部件形成为显影剂保持部件的外周面上的薄层 通过按压显影剂保持构件。 在这种布置中，显影剂保持构件将薄的显影剂传送到静电潜像接收构件，并且所输送的显影剂薄层根据AC显影剂从显影剂保持构件跨越间隙飞往静电潜像接收构件 偏压。 AC显影偏压的波形满足不等式：tA / T

公开(公告)号：US08986494B2

公开(公告)日：2015-03-24

申请号：US12698616

申请日：2010-02-02

Applicant: Tatsuo Matsudo ,  Chishlo Koshimizu ,  Jun Abe

Inventor： Tatsuo Matsudo ,  Chishlo Koshimizu ,  Jun Abe

IPC: C23C16/00 ,  G01J5/08 ,  H01L21/67 ,  G01J5/00 ,  G01J5/04 ,  G01K11/00

CPC classification number: H01L21/67248 ,  G01J5/0003 ,  G01J5/0007 ,  G01J5/041 ,  G01J5/045 ,  G01J5/048 ,  G01J5/08 ,  G01J5/0803 ,  G01J5/0806 ,  G01J5/0821 ,  G01J5/0846 ,  G01K11/00 ,  H01J2237/2001

Abstract: A plasma processing apparatus includes a temperature measuring unit; airtightly sealed temperature measuring windows provided in a mounting table, for optically communicating to transmit a measurement beam through a top surface and a bottom surface of the mounting table; and one or more connection members for connecting the mounting table and a base plate, which is provided in a space between the mounting table and the base plate. In the plasma processing apparatus, a space above the mounting table is set to be maintained under a vacuum atmosphere, and a space between the mounting table and the base plate is set to be maintained under a normal pressure atmosphere, and each collimator is fixed to the base plate at a position corresponding to each temperature measuring window, thereby measuring a temperature of the substrate via the temperature measuring windows by the temperature measuring unit.

Abstract translation: 一种等离子体处理装置，包括：温度测量单元; 设置在安装台上的气密密封温度测量窗，用于光学连通以将测量光束穿过安装台的顶表面和底表面传播; 以及用于连接安装台和设置在安装台和基板之间的空间中的基板的一个或多个连接构件。 在等离子体处理装置中，将安装台上方的空间设定为保持在真空气氛下，将安装台和基板之间的间隔设定为保持在常压气氛下，将每个准直器固定在 基板在与各温度测量窗对应的位置处，由温度测量单元通过温度测量窗测量基板的温度。

公开(公告)号：US08959703B2

公开(公告)日：2015-02-24

申请号：US11629739

申请日：2005-06-17

Applicant: Ken Machida ,  Masaru Fujiwara ,  Ryu Ikezawa ,  Jun Abe ,  Yasuo Ohashi ,  Mineya Fukushi ,  Yukiho Murata

Inventor： Ken Machida ,  Masaru Fujiwara ,  Ryu Ikezawa ,  Jun Abe ,  Yasuo Ohashi ,  Mineya Fukushi ,  Yukiho Murata

IPC: B60S1/38

CPC classification number: B60S1/3893 ,  B60S1/38 ,  B60S2001/3812 ,  B60S2001/382 ,  B60S2001/3822

Abstract: A wiper blade 11 linked to a wiper arm 14 has a blade rubber 16 and a rubber holder 15 with a U-shaped section, wherein the rubber holder 15 is formed shorter in axial length than the blade rubber 16 and surrounds an intermediate portion of the blade rubber 16. Both end portions in a longitudinal direction of the rubber holder 15 are provided with a pair of holding portions 31 and 32, wherein the holding portion 31 has a holding claw 33 engaged with a stopper portion 36 provided in a holding groove 35 of the blade rubber 16 and the holding portion 32 has a holding claw 37 engaged slidably with the holding groove 35 of the blade rubber 16 and the rubber holder 15 is linked to the blade rubber 16 by two position of these holding portions 31 and 32.

Abstract translation: 连接到刮水器臂14的刮水片11具有叶片橡胶16和具有U形截面的橡胶保持件15，其中橡胶保持件15形成为比叶片橡胶16更短的轴向长度，并且包围 橡胶保持件15的长度方向两端部设置有一对保持部31,32，其中保持部31具有与设置在保持槽35中的止动部36卡合的保持爪33 刀片橡胶16和保持部32具有与刀片橡胶16的保持槽35可滑动地卡合的保持爪37，并且橡胶保持件15通过这些保持部31和32的两个位置连接到刀片橡胶16。

公开(公告)号：US08745811B2

公开(公告)日：2014-06-10

申请号：US12223058

申请日：2007-01-26

Applicant: Masaru Fujiwara ,  Jun Abe ,  Ken Machida

Inventor： Masaru Fujiwara ,  Jun Abe ,  Ken Machida

IPC: B60S1/40

CPC classification number: B60S1/4009 ,  B60S1/4019 ,  B60S2001/4012

Abstract: A connection member that includes right and left side walls; a shaft support portion that is swingably fitted onto a support shaft that is provided at the blade main body; upper and lower pieces that are formed so as to be continuous from the shaft support portion; and projections that come into sliding contact with inner side surfaces at the opening are formed on outer side surfaces of the right and left side walls, wherein: the shaft support portion and the upper piece are integrally formed so as to bridge the right and left side walls, the lower piece is formed so as to be separated from the right and left side walls by a groove, and outward projection amounts of the projections are larger at the lower piece than at the upper piece.

Abstract translation: 包括右侧壁和左侧壁的连接构件; 轴支撑部，其可摆动地安装在设置在所述叶片主体上的支撑轴上; 形成为从轴支撑部连续的上下片; 并且在左右侧壁的外侧面形成有与开口部的内侧面滑动接触的突起，其中：轴支撑部和上部片整体形成为使左右侧 壁部分形成为通过凹槽与左右侧壁分离，并且突出部的向外突出量比下部件处于较大的部分。

公开(公告)号：US08708386B2

公开(公告)日：2014-04-29

申请号：US13406909

申请日：2012-02-28

Applicant: Jun Abe ,  Kazuya Matsuda

Inventor： Jun Abe ,  Kazuya Matsuda

IPC: B60N3/02

CPC classification number: B60N3/02 ,  B60N2/245 ,  B60N3/023 ,  B60N3/026

Abstract: An assist grip for a vehicle to which a force can be easily applied from above when a passenger gets in and out of the vehicle, facilitating the movement of the passenger at that time. The assist grip includes a grip main body 4 vertically provided along a door opening of a vehicle 2. The grip main body 4 includes the grip head portion 6. The passenger can vertically apply a force to the grip head portion 6 when getting in and out of the vehicle, and thus he/she is allowed to easily get in and out of the vehicle. Moreover, a supporting member 5 is provided in the grip head portion 6 and an attachment position of the grip head is adjustable in relation to the grip main body 4, enabling the attachment position to be adjusted according to a passenger's physical size, further improving its convenience.

Abstract translation: 当乘客进出车辆时，能够从上方容易地施加力的车辆的辅助把手，便于当时乘客的移动。 辅助把手包括沿着车辆2的门开口垂直设置的把手主体4.握柄主体4包括抓握头部6.乘客可以在进入和退出时垂直地向夹头部6施加力 的车辆，因此他/她被允许容易地进出车辆。 此外，在把手头部6中设置有支撑部件5，并且把持头的安装位置相对于把手主体4是可调节的，能够根据乘客的身体尺寸调节安装位置，进一步改善其 方便。

公开(公告)号：US08568606B2

公开(公告)日：2013-10-29

申请号：US12750015

申请日：2010-03-30

Applicant: Takeshi Ohse ,  Shinji Himori ,  Jun Abe ,  Norikazu Yamada

Inventor： Takeshi Ohse ,  Shinji Himori ,  Jun Abe ,  Norikazu Yamada

IPC: C03C15/00

CPC classification number: H01J37/02 ,  H01J37/32091 ,  H01J37/32146 ,  H01J37/32165

Abstract: A substrate processing method uses a substrate processing apparatus including a chamber for accommodating a substrate, a lower electrode to mount the substrate, a first RF power applying unit for applying an RF power for plasma generation into the chamber, and a second RF power applying unit for applying an RF power for bias to the lower electrode. The RF power for plasma generation is controlled to be intermittently changed by changing an output of the first RF power applying unit at a predetermined timing. If no plasma state or an afterglow state exists in the chamber by a control of the first RF power applying unit, an output of the second RF power applying unit is controlled to be in an OFF state or decreased below an output of the second RF power applying unit when the output of the first RF power applying unit is a set output.

Abstract translation: 基板处理方法使用基板处理装置，其包括用于容纳基板的室，用于安装基板的下电极，用于将用于等离子体产生的RF功率施加到室中的第一RF功率施加单元和第二RF功率施加单元 用于向下电极施加用于偏压的RF功率。 通过在预定的定时改变第一RF功率施加单元的输出来控制等离子体产生的RF功率间歇地改变。 如果通过第一RF功率施加单元的控制在腔室中不存在等离子体状态或余辉状态，则第二RF功率施加单元的输出被控制为处于OFF状态或降低到低于第二RF功率的输出 当第一RF功率施加单元的输出为设定输出时，施加单元。

公开(公告)号：US08331832B2

公开(公告)日：2012-12-11

申请号：US12875598

申请日：2010-09-03

Applicant: Miho Ikeda ,  Makoto Hirota ,  Jun Abe ,  Shota Oba ,  Takashi Ochi

Inventor： Miho Ikeda ,  Makoto Hirota ,  Jun Abe ,  Shota Oba ,  Takashi Ochi

IPC: G03G15/09

CPC classification number: G03G15/09 ,  G03G15/0812 ,  G03G2215/0648

Abstract: A developing device includes: a first-developer-holding-member facing a surface of a rotating latent image carrier, it rotating such that a moving direction thereof is opposite to that of the carrier at a portion where they face; a second-developer-holding-member provided at a downstream-side of the first-developer-holding-member in a direction in which the carrier rotates, and facing the surface of the carrier, it rotating such that a moving direction thereof is the same as that of the carrier at a portion where they face; a ratio of circumferential speeds of the first-developer-holding-member and the second-developer-holding-member being variable; a splitting member that splits a developer for the first-developer-holding-member and the second-developer-holding-member by hitting against the developer located between the first-developer-holding-member and the second-developer-holding-member; a moving unit that moves the splitting member; and a control unit that controls the moving unit to move the splitting member to vary split ratio of the developer.

Abstract translation: 显影装置包括：面向旋转潜像载体的表面的第一显影剂保持构件，其旋转使得其移动方向与其在它们所面对的部分处的方向相反; 第二显影剂保持构件，其沿着所述载体旋转的方向设置在所述第一显影剂保持构件的下游侧，并且与所述载体的表面相对地旋转，使得其的移动方向为 与承运人面对的部分相同; 第一显影剂保持部件和第二显影剂保持部件的圆周速度的比率是可变的; 分割构件，其通过撞击位于第一显影剂保持构件和第二显影剂保持构件之间的显影剂而分离用于第一显影剂保持构件和第二显影剂保持构件的显影剂; 使分离构件移动的移动单元; 以及控制单元，其控制所述移动单元移动所述分割构件以改变所述显影剂的分流比。