公开(公告)号：US06987348B2

公开(公告)日：2006-01-17

申请号：US10664472

申请日：2003-09-16

Applicant: Steven A. Buhler ,  Karl A. Littau ,  John S. Fitch ,  John R. Andrews ,  Cathie J. Burke ,  Peter J. Nystrom ,  Richard Schmachtenberg, III

Inventor： Steven A. Buhler ,  Karl A. Littau ,  John S. Fitch ,  John R. Andrews ,  Cathie J. Burke ,  Peter J. Nystrom ,  Richard Schmachtenberg, III

IPC: H02K41/08

CPC classification number: B41J2/161 ,  B41J2/14233 ,  B41J2/1623 ,  B41J2/1626 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2/1645 ,  B41J2/1646 ,  H01L41/0973 ,  H01L41/313

Abstract: A system and method of operation for a piezoelectric transducer is described which utilizes a mesa structure interposed between a piezoelectric material element and a chamber diaphragm. The system can be used as a sensor where a net motion to the diaphragm causes a net charge equal to the sum of the charges on each piezoelectric diaphragm. Alternatively, the system can be used as an actuator wherein an applied voltage causes movement of the piezoelectric transducer and the chamber diaphragm.

Abstract translation: 描述了一种用于压电传感器的系统和操作方法，其利用介于压电材料元件和室隔膜之间的台面结构。 该系统可用作传感器，其中对隔膜的净运动导致与每个压电隔膜上的电荷之和相等的净电荷。 或者，该系统可以用作致动器，其中施加的电压引起压电换能器和室隔膜的移动。

公开(公告)号：US6071572A

公开(公告)日：2000-06-06

申请号：US731333

申请日：1996-10-15

Applicant: Roderick C. Mosely ,  Jim Van Gogh ,  Karl A. Littau

Inventor： Roderick C. Mosely ,  Jim Van Gogh ,  Karl A. Littau

IPC: C23C14/00 ,  C23C14/06 ,  C23C16/34 ,  C23C16/44 ,  C23C16/452 ,  H01L21/203 ,  H01L21/28 ,  H01L21/285 ,  H01L21/768 ,  C23C16/00

CPC classification number: H01L21/76841 ,  C23C14/0036 ,  C23C14/0641 ,  C23C16/34 ,  C23C16/452

Abstract: In a vapor deposition chamber which holds a substrate for processing, a method including the steps of forming a layer of material on the surface of the substrate, wherein the layer of material is made of Ti atoms; remotely activating a source gas containing nitrogen so as to produce activated nitrogen gas species; and while forming the layer of material on the substrate, injecting the activated nitrogen species into the processing chamber to increase the population of activated nitrogen species that is incorporated into the layer of material that is being formed.

Abstract translation: 在保持用于处理的基板的气相沉积室中，包括以下步骤的方法：在所述基板的表面上形成材料层，其中所述材料层由Ti原子制成; 远程激活含氮的源气体，以产生活性氮气种; 并且在衬底上形成材料层的同时，将活性氮物质注入到处理室中以增加结合到正在形成的材料层中的活性氮物质的群体。

公开(公告)号：US5766365A

公开(公告)日：1998-06-16

申请号：US472220

申请日：1995-06-07

Applicant: Salvador P. Umotoy ,  Alan F. Morrison ,  Karl A. Littau ,  Richard A. Marsh ,  Lawrence Chung-Lai Lei

Inventor： Salvador P. Umotoy ,  Alan F. Morrison ,  Karl A. Littau ,  Richard A. Marsh ,  Lawrence Chung-Lai Lei

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  H01L21/00 ,  H01L21/205 ,  H01L21/28 ,  H01L21/285 ,  H01L21/68 ,  H01L21/683 ,  H01L21/687 ,  C23C16/00

CPC classification number: C23C16/45521 ,  C23C16/458 ,  C23C16/4583 ,  C23C16/4585 ,  C23C16/46 ,  H01L21/67103 ,  H01L21/68 ,  H01L21/6833 ,  H01L21/68735 ,  H01L21/68792

Abstract: A substrate processing apparatus comprising a processing chamber in which a substrate support is located. The substrate support, which is in the form of a heater pedestal, has a surface dimensioned to receive the substrate, and is circumscribed by a removable purge ring which defines an annulus between itself and the pedestal. At the outer edge of the pedestal is a purge gas manifold, in the form of a cavity between the purge ring and the pedestal. The lower end of the manifold is sealed by means of a mechanical seal that is formed at process temperature as the pedestal expands from heating and comes into contact with the purge ring's lower edge. The upper end of the manifold opens into the annulus defined by the purge ring and the pedestal. The manifold is arranged so that during processing, purge gas is injected into the manifold and projected toward the edge of a substrate received on the surface of the pedestal. This gas moves upwards through the annulus defined between the purge ring and the substrate support. Consequently, processing gas is prevented from contacting the extreme edge portion of the substrate. This reduces unwanted deposition on the peripheral edge and lower surface of the substrate.

Abstract translation: 一种基板处理装置，包括其中位于基板支撑件的处理室。 处于加热器基座形式的衬底支撑件具有尺寸适于接收衬底的表面，并且由可拆卸的清除环限定，该清除环在其与底座之间限定环形空间。 在基座的外边缘处是净化气体歧管，其形式为清洗环和基座之间的空腔。 歧管的下端通过机械密封进行密封，机械密封在工艺温度下形成，因为基座从加热膨胀并与清洗环的下边缘接触。 歧管的上端开口进入由清洗环和基座限定的环形空间。 歧管被布置成使得在处理期间，吹扫气体被注入到歧管中并且朝着接收在基座的表面上的基板的边缘突出。 该气体向上移动通过清洗环和衬底支撑件之间限定的环形空间。 因此，防止处理气体与基板的最外缘部分接触。 这减少了衬底的外围边缘和下表面上的不希望的沉积。

公开(公告)号：US5516367A

公开(公告)日：1996-05-14

申请号：US342670

申请日：1994-11-21

Applicant: Lawrence C. Lei ,  Ilya Perlov ,  Karl A. Littau ,  Alan F. Morrison ,  Mei Chang ,  Ashok K. Sinha

Inventor： Lawrence C. Lei ,  Ilya Perlov ,  Karl A. Littau ,  Alan F. Morrison ,  Mei Chang ,  Ashok K. Sinha

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  H01L21/00 ,  H01L21/68 ,  H01L21/687 ,  C23C16/00

CPC classification number: C23C16/45519 ,  C23C16/4412 ,  C23C16/45521 ,  C23C16/458 ,  C23C16/4583 ,  C23C16/4585 ,  C23C16/46 ,  H01L21/67103 ,  H01L21/68 ,  H01L21/68721 ,  H01L21/68728 ,  H01L21/68735 ,  H01L21/6875 ,  H01L21/68785 ,  H01L21/68792 ,  Y10S438/935

Abstract: Vacuum CVD chambers are disclosed which provide a more uniformly deposited thin film on a substrate. The chamber susceptor mount for the substrate is heated resistively with a single coil firmly contacting the metal of the susceptor on all sides, providing uniform temperatures across the susceptor mount for a substrate. A purge gas line is connected to openings in the susceptor outside of the periphery of the substrate to prevent edge and backside contamination of the substrate. A vacuum feed line mounts the substrate to the susceptor plate during processing. A refractory purge guide, or a plurality of placement pins, maintain a fixed gap passage for the purge gases to pass alongside the edge of the wafer and into the processing area of the chamber. An exhaust pumping plate improves the uniformity of exhaustion of spent gases from the chamber.

Abstract translation: 公开了真空CVD室，其在衬底上提供更均匀地沉积的薄膜。 用于衬底的腔室基座安装件被电阻加热，单个线圈在基座的所有侧面上牢固地接触基座的金属，从而在基座的基座上提供均匀的温度。 吹扫气体管线连接到基座外部的基座上的开口，以防止衬底的边缘和背面污染。 在加工过程中，真空进料管将基板安装到基座板上。 耐火吹扫引导件或多个安置销保持固定的间隙通道，以使净化气体沿着晶片的边缘并入腔室的处理区域中。 排气泵板改善了来自腔室的废气排放的均匀性。

公开(公告)号：US09150966B2

公开(公告)日：2015-10-06

申请号：US12271408

申请日：2008-11-14

Applicant: Baomin Xu ,  Karl A. Littau ,  Scott A. Elrod

Inventor： Baomin Xu ,  Karl A. Littau ,  Scott A. Elrod

IPC: B05D5/12 ,  C25D5/34 ,  H01B13/00 ,  C23C18/16 ,  C23C18/31 ,  H01L31/0224

CPC classification number: C23C18/161 ,  C23C18/1632 ,  C23C18/165 ,  C23C18/1651 ,  C23C18/1653 ,  C23C18/31 ,  H01L31/022425 ,  Y02E10/50

Abstract: Inline methods for forming a photovoltaic cell electrode structure, wherein the photovoltaic cell includes a semiconductor substrate having a passivation layer thereon, includes providing a plurality of contact openings through the passivation layer to the semiconductor substrate, selectively plating a contact metal into the plurality of contact openings by printing electroless plating solution into the plurality of contact openings to deposit the contact metal, depositing a metal containing material on the deposited contact metal, and firing the deposited contact metal and the deposited metal containing material. The metal containing material may include a paste containing a silver or silver alloy along with a glass frit and is substantially free to completely free of lead. The methods may also use light activation of the passivation layer or use seed layers to assist in the plating.

Abstract translation: 用于形成光伏电池电极结构的在线方法，其中所述光伏电池包括其上具有钝化层的半导体衬底，包括提供通过所述钝化层到所述半导体衬底的多个接触开口，选择性地将接触金属电镀到所述多个接触中 通过将化学镀溶液印刷到多个接触开口中以沉积接触金属，在沉积的接触金属上沉积含金属的材料，以及烧结沉积的接触金属和沉积的含金属材料的开口。 含金属的材料可以包括含有银或银合金以及玻璃料的糊状物，并且基本上没有完全不含铅。 所述方法还可以使用钝化层的光激活或使用种子层来辅助镀覆。

公开(公告)号：US08778156B2

公开(公告)日：2014-07-15

申请号：US12969485

申请日：2010-12-15

Applicant: Matthew D. Eisaman ,  Karl A. Littau

Inventor： Matthew D. Eisaman ,  Karl A. Littau

IPC: B01D61/46

CPC classification number: B01D61/422 ,  B01D53/1425 ,  B01D53/1475 ,  B01D61/44 ,  B01D61/445 ,  B01D2257/504 ,  B01D2313/24 ,  C01B17/501 ,  C01B32/05 ,  C01C1/02 ,  Y02P20/152 ,  Y02P20/544

Abstract: A process for producing a gas using an electrodialysis apparatus includes flowing at least two solutions and an electrode solution into the apparatus, pressurizing the apparatus at a stack pressure, applying a voltage to the apparatus's electrodialysis stack so a dissolved gas is generated in the second solution, flowing the second solution out of the apparatus, regenerating the gas out of the second solution, and collecting the gas. A process for generating a product, like a gas, liquid, or supercritical fluid, using an electrodialysis apparatus includes flowing at least two solutions and an electrode solution into the apparatus, adjusting the temperature and pressure so the product will be generated from the second solution, applying a voltage to the electrodialysis stack of the apparatus so that the product is generated in the second solution, flowing the second solution out of the apparatus, and regenerating the product from the second solution.

Abstract translation: 使用电渗析装置制造气体的方法包括将至少两种溶液和电极溶液流入设备中，以叠层压力对设备加压，向设备的电渗析堆叠施加电压，使得在第二溶液中产生溶解的气体 使第二溶液流出设备，将气体从第二溶液中再生出来并收集气体。 使用电渗析装置产生诸如气体，液体或超临界流体的产品的方法包括将至少两种溶液和电极溶液流入设备中，调节温度和压力，使得产物将从第二溶液产生 向设备的电渗析堆施加电压，使得产物在第二溶液中产生，使第二溶液流出设备，并从第二溶液再生产物。

公开(公告)号：US08535502B2

公开(公告)日：2013-09-17

申请号：US12206424

申请日：2008-09-08

Applicant: Karl A. Littau ,  Francisco E. Torres

Inventor： Karl A. Littau ,  Francisco E. Torres

IPC: B01D61/54 ,  B01D61/46

CPC classification number: B01D61/445 ,  B01D53/62 ,  B01D53/77 ,  B01D53/96 ,  B01D2251/306 ,  B01D2251/606 ,  B01D2257/504 ,  C02F1/4693 ,  Y02C10/04

Abstract: A system and method for recovery of CO2 includes an aqueous capture device having a capture solution. The aqueous capture device is arranged to receive gas and to capture components from the gas including at least CO2. An electrodialysis unit in operative connection with the capture device performs an electrodialysis operation on the capture solution including at least the CO2, wherein a CO2 rich process stream and a regenerated capture solution are generated from the capture solution including at least the CO2. The CO2 rich process stream is a pressurized process stream at a pressure which maintains the CO2 substantially within the CO2 rich process stream, while in the electrodialysis unit. In another alternative, at least the pH of the capture stream is controlled.

Abstract translation: 用于回收CO 2的系统和方法包括具有捕获溶液的水性捕获装置。 水性捕获装置被布置成接收气体并从包括至少CO 2的气体中捕获组分。 与采集装置可操作地连接的电渗析装置对包括至少二氧化碳的捕获溶液进行电渗析操作，其中从包含至少二氧化碳的捕获溶液产生富CO 2的工艺流和再生的捕获溶液。 富CO2过程流是在电渗析单元中将CO 2基本维持在富CO2过程流内的压力下的加压工艺流。 在另一个替代方案中，至少捕获流的pH被控制。

公开(公告)号：US20120152744A1

公开(公告)日：2012-06-21

申请号：US12969485

申请日：2010-12-15

Applicant: Matthew D. Eisaman ,  Karl A. Littau

Inventor： Matthew D. Eisaman ,  Karl A. Littau

IPC: B01D61/42

CPC classification number: B01D61/422 ,  B01D53/1425 ,  B01D53/1475 ,  B01D61/44 ,  B01D61/445 ,  B01D2257/504 ,  B01D2313/24 ,  C01B17/501 ,  C01B32/05 ,  C01C1/02 ,  Y02P20/152 ,  Y02P20/544

Abstract: A process for producing a gas using an electrodialysis apparatus includes flowing at least two solutions and an electrode solution into the apparatus, pressurizing the apparatus at a stack pressure, applying a voltage to the apparatus's electrodialysis stack so a dissolved gas is generated in the second solution, flowing the second solution out of the apparatus, regenerating the gas out of the second solution, and collecting the gas. A process for generating a product, like a gas, liquid, or supercritical fluid, using an electrodialysis apparatus includes flowing at least two solutions and an electrode solution into the apparatus, adjusting the temperature and pressure so the product will be generated from the second solution, applying a voltage to the electrodialysis stack of the apparatus so that the product is generated in the second solution, flowing the second solution out of the apparatus, and regenerating the product from the second solution.

Abstract translation: 使用电渗析装置制造气体的方法包括将至少两种溶液和电极溶液流入设备中，以叠层压力对设备加压，向设备的电渗析堆叠施加电压，使得在第二溶液中产生溶解的气体 使第二溶液流出设备，将气体从第二溶液中再生出来并收集气体。 使用电渗析装置产生诸如气体，液体或超临界流体的产品的方法包括将至少两种溶液和电极溶液流入设备中，调节温度和压力，使得产物将从第二溶液产生 向设备的电渗析堆施加电压，使得产物在第二溶液中产生，使第二溶液流出设备，并从第二溶液再生产物。

公开(公告)号：US08023866B2

公开(公告)日：2011-09-20

申请号：US12184116

申请日：2008-07-31

Applicant: Meng H Lean ,  Shu Chang ,  Baomin Xu ,  Karl A Littau ,  David G Duff

Inventor： Meng H Lean ,  Shu Chang ,  Baomin Xu ,  Karl A Littau ,  David G Duff

IPC: G03G15/08

CPC classification number: G03G15/344

Abstract: A marking apparatus including a traveling wave grid toner transport circuit structure for transporting powdered toner along a transport surface, and electromechanical elements for selectively enabling toner patches to be projected to an output medium by a projecting electric field.

Abstract translation: 一种标记装置，包括用于沿着传送表面输送粉状调色剂的行波网格调色剂传送电路结构和用于选择性地使调色剂片通过投射电场投射到输出介质的机电元件。

公开(公告)号：US20100206379A1

公开(公告)日：2010-08-19

申请号：US12611842

申请日：2009-11-03

Applicant: Karl A. Littau ,  Patrick Y. Maeda ,  Patrick C. Cheung

Inventor： Karl A. Littau ,  Patrick Y. Maeda ,  Patrick C. Cheung

IPC: H01L31/00 ,  F24J2/10

CPC classification number: H01L31/0547 ,  F24S23/00 ,  F24S23/74 ,  F24S23/82 ,  F24S30/422 ,  F24S50/20 ,  H02S20/23 ,  H02S20/32 ,  H02S40/22 ,  Y02B10/12 ,  Y02B10/20 ,  Y02E10/44 ,  Y02E10/45 ,  Y02E10/47 ,  Y02E10/52

Abstract: A rotational trough reflector solar-electricity generation device includes a trough reflector that rotates around a substantially vertical axis and includes a solid optical element having a linear parabolic convex surface that serves as a base for automatically positioning a mirror to focus sunlight onto a focal line, and a flat aperture surface that serves to support a strip-type photovoltaic (PV) receiver on the focal line. A tracking system rotates the trough reflector such that the trough reflector is aligned generally parallel to the incident sunlight (e.g., in a generally east-west direction at sunrise, turning to generally north-south at noon, and turning generally west-east at sunset). A disc-shaped support structure is used to distribute the reflector's weight over a larger area and to minimize the tracking system motor size. Multiple trough reflectors are mounted on the disc-shaped support to maximize power generation.

Abstract translation: 旋转槽反射器太阳能发电装置包括：谷底反射器，其围绕基本上垂直的轴线旋转，并且包括具有线性抛物面凸面的固体光学元件，其用作用于自动定位反射镜以将太阳聚焦到焦线上的基座， 以及用于支撑焦线上的带状光伏（PV）接收器的平坦孔径表面。 跟踪系统使槽反射器旋转，使得槽反射器大致平行于入射的阳光对准（例如，在日出时大致向东 - 西方向，中午一般向南 - 南转，并在日落时一般向西东转 ）。 使用盘形支撑结构将反射器的重量分布在更大的面积上并且使跟踪系统电动机尺寸最小化。 多个槽反射器安装在盘形支撑件上以最大限度地发电。