公开(公告)号：US07141806B1

公开(公告)日：2006-11-28

申请号：US11237649

申请日：2005-09-27

申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  William Oldham

发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  William Oldham

IPC分类号： G01J1/00

CPC分类号： G21K1/062 ,  B82Y10/00 ,  H05G2/003 ,  H05G2/005

摘要： An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma, is disclosed which may comprise including within an EUV plasma source material a replacement material. The replacement material may comprise the same material as the capping material of the multilayered mirror. The replacement material may comprise a material that is essentially transparent to light in a selected band of EUV light, e.g., a spectrum of EUV light generated in a plasma of a plasma source material. The replacement material may comprise a material not susceptible to being etched by an etching material used to remove deposited plasma source material from the collector, e.g., a halogen etchant.

摘要翻译： 公开了一种用于收集器的EUV光源收集器侵蚀缓解方法和装置，其包括多层反射镜收集器，其包括由由与在EUV发光等离子体中产生的材料的去除相互作用而被去除的封盖材料组成的收集器外表面。 可以包括在EUV等离子体源材料内包括替换材料。 替代材料可以包括与多层反射镜的封盖材料相同的材料。 替代材料可以包括对EUV光的选定频带中的光基本上透明的材料，例如在等离子体源材料的等离子体中产生的EUV光的光谱。 替代材料可以包括不易被蚀刻材料蚀刻的材料，用于从集电体例如卤素蚀刻剂去除沉积的等离子体源材料。

公开(公告)号：US07164144B2

公开(公告)日：2007-01-16

申请号：US10900839

申请日：2004-07-27

申请人： William N. Partlo ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  Ian Roger Oliver ,  John Viatella ,  Robert N. Jacques

发明人： William N. Partlo ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  Ian Roger Oliver ,  John Viatella ,  Robert N. Jacques

IPC分类号： H01J35/20

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.

摘要翻译： 激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统包括适于传送移动等离子体引发目标的目标传送系统和具有定义所需等离子体起始位置的焦点的EUV光收集光学元件，靶 跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出;以及流轨道误差检测器，其检测目标流轨迹在大致垂直于目标的至少一个轴上的位置的误差 来自与期望的等离子体起始位点相交的所需流道的流轨道。

公开(公告)号：US08462425B2

公开(公告)日：2013-06-11

申请号：US13077757

申请日：2011-03-31

申请人： Kai-Chung Hou ,  Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov

发明人： Kai-Chung Hou ,  Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov

IPC分类号： H01S3/00 ,  G02F1/33 ,  G02B5/22 ,  H05G2/00 ,  G06K7/10

CPC分类号： H01S3/117 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0064 ,  H01S3/076 ,  H01S3/0812 ,  H01S3/2232 ,  H01S3/2383 ,  H05G2/005 ,  H05G2/008

摘要： As disclosed herein, in a first aspect, a device may comprise: an oscillator producing a light output on a beam path; a target material for interaction with light on the beam path at an irradiation site; a beam delay on the beam path the beam delay having a beam folding optical arrangement; and a switch positioned along the beam path and interposed between the oscillator and the beam delay; the switch closable to divert at least a portion of light on the beam path from the beam path, the switch having close time, t1 and the beam path having a length, L1, along the path from the switch to the irradiation site; with t1

摘要翻译： 如本文所公开的，在第一方面中，一种装置可以包括：在光束路径上产生光输出的振荡器; 用于在照射部位与光束路径上的光相互作用的目标材料; 在光束路径上的光束延迟具有光束折叠光学布置的光束延迟; 以及沿光束路径定位并且介于振荡器和光束延迟之间的开关; 所述开关可关闭以使所述光束路径上的至少一部分光从所述光束路径转移，所述开关具有接近时间t1，并且所述光束路径具有沿着从所述开关到所述照射部位的路径的长度L1; 与t1

公开(公告)号：US08654438B2

公开(公告)日：2014-02-18

申请号：US13077236

申请日：2011-03-31

申请人： Kai-Chung Hou ,  Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov

发明人： Kai-Chung Hou ,  Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov

IPC分类号： H01S3/03

CPC分类号： H01S3/0078 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70908 ,  G03F7/70933 ,  H01S3/076 ,  H01S3/1055 ,  H01S3/117 ,  H01S3/2232 ,  H05G2/008

摘要： A device is described herein which may comprise an optical amplifier having a gain band including wavelengths λ1 and λ2, with λ1≠λ2; a pre-pulse seed laser having a tuning module for tuning a pre-pulse output to wavelength λ1; a main pulse seed laser generating a laser output having wavelength, λ2; and a beam combiner for directing the pre-pulse output and the main pulse output on a common path through the optical amplifier.

摘要翻译： 本文描述了可以包括具有包括λ1>λ2的波长λ1和λ2的增益带的光放大器的装置; 具有用于将预脉冲输出调谐到波长λ1的调谐模块的预脉冲种子激光器; 产生具有波长λ2的激光输出的主脉冲种子激光器; 以及用于将预脉冲输出和主脉冲输出引导到通过光放大器的公共路径上的光束组合器。

公开(公告)号：US06586757B2

公开(公告)日：2003-07-01

申请号：US09875719

申请日：2001-06-06

申请人： Stephan T. Melnychuk ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard M. Ness ,  Daniel L. Birx late of ,  Richard L. Sandstrom ,  John E. Rauch

发明人： Stephan T. Melnychuk ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard M. Ness ,  Daniel L. Birx late of ,  Richard L. Sandstrom ,  John E. Rauch

IPC分类号： H01J3520

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater. Gas flows in the vacuum chamber are controlled to assure desired concentration of active gas in the discharge region and to minimize active gas concentration in the beam path downstream of the pinch region. In a preferred embodiment, active gas is injected downstream of the pinch region and exhausted axially through the center of the anode. In another preferred embodiment a laser beam generates metal vapor at a location close to but downstream of the pinch region and the vapor is exhausted axially through the anode.

公开(公告)号：US08653437B2

公开(公告)日：2014-02-18

申请号：US13157233

申请日：2011-06-09

申请人： William N. Partlo ,  Richard L. Sandstrom ,  Daniel J. W. Brown ,  Igor V. Fomenkov

发明人： William N. Partlo ,  Richard L. Sandstrom ,  Daniel J. W. Brown ,  Igor V. Fomenkov

IPC分类号： H05G2/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H01S3/117 ,  H01S3/2232 ,  H01S3/2308 ,  H05G2/008

摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.

摘要翻译： 本文公开的装置可包括产生目标材料的液滴的液滴发生器; 当液滴到达预选位置时提供拦截时间信号的传感器; 与所述传感器耦合的延迟电路，所述延迟电路产生从截取时间信号延迟的触发信号; 响应于触发信号产生激光脉冲的激光源; 以及控制所述延迟电路的系统，以提供从截取时间延迟第一延迟时间的触发信号，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生 不聚焦在液滴上的光脉冲。

公开(公告)号：US06532247B2

公开(公告)日：2003-03-11

申请号：US09794782

申请日：2001-02-27

申请人： Ronald L. Spangler ,  Robert N. Jacques ,  George J. Everage ,  Stuart L. Anderson ,  Frederick A. Palenschat ,  Igor V. Fomenkov ,  Richard L. Sandstrom ,  William N. Partlo ,  John M. Algots ,  Daniel J. W. Brown

发明人： Ronald L. Spangler ,  Robert N. Jacques ,  George J. Everage ,  Stuart L. Anderson ,  Frederick A. Palenschat ,  Igor V. Fomenkov ,  Richard L. Sandstrom ,  William N. Partlo ,  John M. Algots ,  Daniel J. W. Brown

IPC分类号： H01S322

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/1312 ,  H01S3/134 ,  H01S3/137 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

摘要： An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.

公开(公告)号：US06566668B2

公开(公告)日：2003-05-20

申请号：US09875721

申请日：2001-06-06

申请人： John E. Rauch ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard M. Ness ,  Daniel L. Birx ,  Richard L. Sandstrom ,  Stephan T. Melnychuk

发明人： John E. Rauch ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard M. Ness ,  Daniel L. Birx ,  Richard L. Sandstrom ,  Stephan T. Melnychuk

IPC分类号： H05H104

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.

公开(公告)号：US07471708B2

公开(公告)日：2008-12-30

申请号：US11095293

申请日：2005-03-31

申请人： Herve A. Besaucele ,  Igor V. Fomenkov ,  William N. Partlo ,  Fedor B. Trintchouk ,  Hao Ton That

发明人： Herve A. Besaucele ,  Igor V. Fomenkov ,  William N. Partlo ,  Fedor B. Trintchouk ,  Hao Ton That

IPC分类号： H01S3/13 ,  H01S3/00 ,  H01S3/22

CPC分类号： H01S3/036 ,  H01S3/038 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/134

摘要： A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loop; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.

摘要翻译： 公开了一种窄气体放电激光系统和操作方法，其可以包括：振荡器腔; 激光室，包括容纳激光介质气体的腔室; 至少一个峰值电容器电连接到所述腔室壳体和一对电极中的第一电极; 所述一对电极中的第二个连接到所述至少一个峰值电容器的相对端子; 连接到所述腔室壳体的电流返回路径; 一个端子，电极中的第一个，激光介质气体，第二个电极，电流返回路径和第二端子，形成具有特定头电流感应环路特有的电感的磁头电流感应环路; 光谱质量调谐机构包括用于改变特定头电流电感回路的特定头电流感应环电感值的机构。

公开(公告)号：US09516730B2

公开(公告)日：2016-12-06

申请号：US13156188

申请日：2011-06-08

申请人： Vladimir B. Fleurov ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov

发明人： Vladimir B. Fleurov ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov

IPC分类号： G21K5/00 ,  H05G2/00

CPC分类号： H05G2/005 ,  H05G2/008

摘要： An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.

摘要翻译： 一种极紫外（EUV）光源，包括光学元件，目标材料和沿着光束路径通过所述光学元件以照射所述目标材料的激光束。 EUV光源还包括沿着所述光束路径产生朝向所述目标材料的气流的系统，所述系统具有包围体积和多条气体管线的锥形构件，每条气体管线将气流输送到所述体积中。