公开(公告)号：US20060114441A1

公开(公告)日：2006-06-01

申请号：US11335681

申请日：2006-01-20

Applicant: Vadim Banine ,  Levinus Bakker ,  Jeroen Jonkers ,  Erik Loopstra

Inventor： Vadim Banine ,  Levinus Bakker ,  Jeroen Jonkers ,  Erik Loopstra

IPC: G03B27/72

CPC classification number: G03F7/70008 ,  G03F7/7005

Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

公开(公告)号：US20060109442A1

公开(公告)日：2006-05-25

申请号：US10995536

申请日：2004-11-24

Applicant: Erik Loopstra ,  Petrus Bartray ,  Antonius Van Dijsseldonk ,  Paulus Liebregts

Inventor： Erik Loopstra ,  Petrus Bartray ,  Antonius Van Dijsseldonk ,  Paulus Liebregts

IPC: G03B27/52

CPC classification number: G03F7/70141 ,  G03F7/70091

Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.

Abstract translation: 光刻设备包括被配置为提供辐射束和投影系统的照明系统，其配置成将辐射束投影到基板的目标部分上。 照明系统和投影系统中的至少一个包括用于反射或折射光束的聚焦元件。 提供了多个止动盘，每个具有穿过其中的孔，以及配置成将止动盘中的一个邻近聚焦元件放置的盘定位器，以控制投影系统或照明系统的数值孔径（NA）。 该装置还包括一个换盘器，其被配置为选择一个停止盘并将所选择的停止盘提供给盘定位器，换盘器位于投影系统或照明系统的外部。

公开(公告)号：US20060060799A1

公开(公告)日：2006-03-23

申请号：US11263012

申请日：2005-11-01

Applicant: Dominicus Jacobus Franken ,  Erik Loopstra ,  Pertrus Bartray ,  Marc Van Der Wijst ,  Michael Jozefa Renkens ,  Gerard Van Schothorst ,  Johan Dries

Inventor： Dominicus Jacobus Franken ,  Erik Loopstra ,  Pertrus Bartray ,  Marc Van Der Wijst ,  Michael Jozefa Renkens ,  Gerard Van Schothorst ,  Johan Dries

IPC: G21K5/10

CPC classification number: G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.

Abstract translation: 光刻设备包括安装在参考框架上的投影系统，投影系统又安装在支撑设备的基座上。 基座中的振动和位移误差通过两组隔离安装件在基座和参考框架之间以及参考框架和投影系统的投影框架之间进行过滤，因此减小了投影系统的干扰。

公开(公告)号：US20060023189A1

公开(公告)日：2006-02-02

申请号：US11239493

申请日：2005-09-30

Applicant: Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

Inventor： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

公开(公告)号：US20050157285A1

公开(公告)日：2005-07-21

申请号：US10848586

申请日：2004-05-19

Applicant: Gerard Schothorst ,  Fransiscus Van Deuren ,  Jan Eijk ,  Erik Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Peters

Inventor： Gerard Schothorst ,  Fransiscus Van Deuren ,  Jan Eijk ,  Erik Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Peters

IPC: G03B27/72 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70066 ,  G03F7/70191

Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

Abstract translation: 一种光刻设备，包括用于在将图案化的投影光束成像到衬底上之前选择性地透射投影光束的装置。 该装置可以包括以下任何一种：在投影光束的方向上布置在图案形成装置的下游的选择性发射装置，扫描系统中的固定的和可移动的掩蔽刀片组，或可切换元件的阵列。 该装置可以提供给掩模台/保持器或光刻投影装置的框架或结构。

公开(公告)号：US20050134820A1

公开(公告)日：2005-06-23

申请号：US10740830

申请日：2003-12-22

Applicant: Heine Mulder ,  Antonius Johannes Van Dijsseldonk ,  Erik Loopstra ,  Uwe Mickan ,  Johannes Catharinus Mulkens ,  Harm-Jan Voorma

Inventor： Heine Mulder ,  Antonius Johannes Van Dijsseldonk ,  Erik Loopstra ,  Uwe Mickan ,  Johannes Catharinus Mulkens ,  Harm-Jan Voorma

IPC: G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70075 ,  G03F7/701 ,  G03F7/70425 ,  G03F7/70566

Abstract: A method using a lithographic apparatus comprising a reflective integrator is claimed that optimizes the exposure of features on a target area of a substrate, when the features make an angle between 5 and 85 degrees with respect to the target area. The method comprises rotating the reflective integrator with respect to the target area providing a rotated mirror-symmetric pupil shape, which is implemented by either rotating the substrate or rotating the reflective integrator with respect to the machine or the patterning device. The patterning device comprises a maximum usable area and a patterned area which are rotated with respect to each other if a rotated substrate is employed. The method can be used in single exposure or double exposure mode. A further advantage of the method of using a rotated wafer is that it can be used for exposing features on a substrate in any direction even when the projection system of the lithographic apparatus shows a preferred polarization direction.

Abstract translation: 要求使用包括反射积分器的光刻设备的方法，当特征相对于目标区域形成5至85度的角度时，可优化基板目标区域上的特征的曝光。 该方法包括使反射积分器相对于目标区域旋转，从而提供旋转的对称瞳孔形状，其通过旋转基底或相对于机器或图案形成装置旋转反射积分器来实现。 如果使用旋转的衬底，则图案形成装置包括相对于彼此旋转的最大可用面积和图案化区域。 该方法可用于单次曝光或双曝光模式。 使用旋转晶片的方法的另一个优点是，即使当光刻设备的投影系统显示优选的偏振方向时，其可以用于在任何方向上曝光衬底上的特征。

公开(公告)号：US20050078286A1

公开(公告)日：2005-04-14

申请号：US10924192

申请日：2004-08-24

Applicant: Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

Inventor： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

IPC: B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

Abstract translation: 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。

公开(公告)号：US20050018155A1

公开(公告)日：2005-01-27

申请号：US10873647

申请日：2004-06-23

Applicant: Henrikus Herman Cox ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Helmar Santen

Inventor： Henrikus Herman Cox ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Helmar Santen

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/709 ,  G03F7/70341

Abstract: A lithographic projection apparatus wherein a liquid supply system provides a space between a projection system and a substrate with liquid. The liquid supply system comprises a member. A liquid seal is formed between the member and the substrate by a flow of liquid. In an embodiment, the liquid seal is formed by a flow of liquid from an inlet to an outlet of the member.

Abstract translation: 一种光刻投影装置，其中液体供应系统在投影系统和具有液体的基板之间提供空间。 液体供应系统包括一个构件。 通过液体流在构件和基板之间形成液体密封。 在一个实施例中，液体密封由液体从构件的入口到出口形成。

公开(公告)号：US20050018154A1

公开(公告)日：2005-01-27

申请号：US10844570

申请日：2004-05-13

Applicant: Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

Inventor： Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

IPC: G21K1/06 ,  G02B7/182 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G21K5/00

CPC classification number: G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

Abstract: A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

Abstract translation: 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。

公开(公告)号：US09354529B2

公开(公告)日：2016-05-31

申请号：US13561502

申请日：2012-07-30

Applicant: Dirk Heinrich Ehm ,  Maarten van Kampen ,  Stefan-Wolfgang Schmidt ,  Vadim Yevgenyevich Banine ,  Erik Loopstra

Inventor： Dirk Heinrich Ehm ,  Maarten van Kampen ,  Stefan-Wolfgang Schmidt ,  Vadim Yevgenyevich Banine ,  Erik Loopstra

IPC: G03B27/52 ,  G03B27/54 ,  G03F7/20 ,  G01J1/58 ,  G02B5/08

CPC classification number: G03F7/70891 ,  G01J1/58 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70558 ,  G03F7/7085 ,  G03F7/70958

Abstract: An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).

Abstract translation: 用于微光刻的投影曝光工具（100）中的布置包括反射光学元件（10; 110）和辐射检测器（30; 32; 130）。 反射光学元件（10; 110）包括保证光学元件（10; 110）的机械强度的载体元件（12）和设置在载体元件（12）上的反射涂层（18），用于反射使用辐射 20a）。 载体元件（12）由与使用辐射（20a）相互作用发射其波长与使用辐射（20a）的波长不同的次级辐射（24）和辐射检测器（30）的材料制成 ; 32; 130）被配置为检测所述次级辐射（24）。