Light emitting device using phosphor powder
    41.
    发明授权
    Light emitting device using phosphor powder 有权
    使用荧光粉的发光装置

    公开(公告)号:US07868535B2

    公开(公告)日:2011-01-11

    申请号:US11808770

    申请日:2007-06-12

    摘要: The present invention is a light emitting device which uses a specific phosphor powder. The phosphor powder is a combination of cerium (Ce) and lithium aluminum oxide (LiAlO2). They are mixed under a specific range of composition ratio. With the specific phosphor powder applied, the light emitting device has advantages in a low cost, a reduced power consumption, an easy production, a long life, and so on. In addition, a transformation efficiency of the phosphor powder is high and so a light emitting efficiency of the light emitting device is enhanced.

    摘要翻译: 本发明是使用特定荧光体粉末的发光装置。 荧光体粉末是铈(Ce)和氧化铝锂(LiAlO 2)的组合。 它们在特定的组成比范围内混合。 通过使用特定的荧光体粉末,发光装置具有成本低廉,功耗降低,生产容易,寿命长等优点。 此外,荧光体粉末的转换效率高,因此发光器件的发光效率提高。

    Method of growing GaN using CVD and HVPE
    42.
    发明授权
    Method of growing GaN using CVD and HVPE 有权
    使用CVD和HVPE生长GaN的方法

    公开(公告)号:US07863164B2

    公开(公告)日:2011-01-04

    申请号:US11808931

    申请日:2007-06-13

    IPC分类号: H01L21/20 H01L21/36 H01L31/20

    摘要: A thick gallium nitride (GaN) film is formed on a LiAlO2 substrate through two stages. First, GaN nanorods are formed on the LiAlO2 substrate through chemical vapor deposition (CVD). Then the thick GaN film is formed through hydride vapor phase epitaxy (HVPE) by using the GaN nanorods as nucleus sites. In this way, a quantum confined stark effect (QCSE) becomes small and a problem of spreading lithium element into gaps in GaN on using the LiAlO2 substrate is mended.

    摘要翻译: 通过两个阶段在LiAlO 2衬底上形成厚的氮化镓(GaN)膜。 首先,通过化学气相沉积(CVD)在LiAlO 2衬底上形成GaN纳米棒。 然后通过使用GaN纳米棒作为核部位,通过氢化物气相外延(HVPE)形成厚的GaN膜。 以这种方式,量子限制效应(QCSE)变小,并且在使用LiAlO 2衬底时将锂元素扩散到GaN中的间隙中的问题被修补。

    Structure of LiAlO2 substrate having ZnO buffer layer
    43.
    发明申请
    Structure of LiAlO2 substrate having ZnO buffer layer 有权
    具有ZnO缓冲层的LiAlO 2衬底的结构

    公开(公告)号:US20080233415A1

    公开(公告)日:2008-09-25

    申请号:US11808564

    申请日:2007-06-11

    IPC分类号: B32B15/04

    摘要: A lithium aluminum oxide (LiAlO2) substrate suitable for a zinc oxide (ZnO) buffer layer is found. The ZnO buffer layer is grown on the LiAlO2 substrate. Because the LiAlO2 substrate has a similar structure to that of the ZnO buffer layer, a quantum confined stark effect (QCSE) is effectively eliminated. And a photoelectrical device made with the present invention, like a light emitting diode, a piezoelectric material or a laser diode, thus obtains an enhanced light emitting efficiency.

    摘要翻译: 发现适用于氧化锌(ZnO)缓冲层的氧化锂铝(LiAlO 2 N 2)衬底。 ZnO缓冲层在LiAlO 2衬底上生长。 由于LiAlO 2衬底具有与ZnO缓冲层类似的结构,因此有效地消除了量子限制的Stark效应(QCSE)。 并且,通过本发明制造的光电器件,如发光二极管,压电材料或激光二极管,从而获得增强的发光效率。

    Method of manufacturing composite wafer structure
    44.
    发明申请
    Method of manufacturing composite wafer structure 有权
    复合晶片结构的制造方法

    公开(公告)号:US20070020873A1

    公开(公告)日:2007-01-25

    申请号:US11245163

    申请日:2005-10-07

    IPC分类号: H01L21/00 H01L21/76 H01L21/30

    CPC分类号: H01L21/76256

    摘要: The invention provides a method of manufacturing a composite wafer structure. In particular, the method, according to the invention, is based on the fracture mechanics theory to actively control fracture induced during the manufacture of the composite wafer structure and to further protect from undesired edge damage. Thereby, the method, according to the invention, can enhance the yield rate of industrial mass production regarding the composite wafer structure.

    摘要翻译: 本发明提供一种制造复合晶片结构的方法。 特别地,根据本发明的方法是基于断裂力学理论来主动控制在复合晶片结构的制造过程中引起的断裂并进一步防止不希望的边缘损伤。 因此,根据本发明的方法可以提高关于复合晶片结构的工业量产的产率。

    METHOD OF MANUFACTURING CRYSTALLINE SILICON INGOT
    48.
    发明申请
    METHOD OF MANUFACTURING CRYSTALLINE SILICON INGOT 有权
    制造晶体硅的方法

    公开(公告)号:US20110303143A1

    公开(公告)日:2011-12-15

    申请号:US13098051

    申请日:2011-04-29

    IPC分类号: C30B11/02 C01B33/021

    摘要: An approach is provided for a method to manufacture a crystalline silicon ingot. The method comprises providing a mold formed for melting and cooling a silicon feedstock by using a directional solidification process, disposing a barrier layer inside the mold, disposing one or more silicon crystal seeds on the barrier layer, loading the silicon feedstock on the silicon crystal seeds, heating the mold to obtain a silicon melt, and cooling the mold by the directional solidification process to solidify the silicon melt into a silicon ingot. The mold is heated until the silicon feedstock is fully melted and the silicon crystal seeds are at least partially melted.

    摘要翻译: 提供了一种制造晶体硅锭的方法。 该方法包括提供通过使用定向凝固方法熔化和冷却硅原料而形成的模具,在模具内设置阻挡层,在阻挡层上设置一个或多个硅晶体种子,将硅原料装载到硅晶种上 ,加热模具以获得硅熔体,并通过定向凝固工艺冷却模具,将硅熔体固化成硅锭。 将模具加热直到硅原料完全熔化,硅晶体晶种至少部分熔化。

    Manufacturing Method of Solar Cell
    49.
    发明申请
    Manufacturing Method of Solar Cell 有权
    太阳能电池制造方法

    公开(公告)号:US20100330730A1

    公开(公告)日:2010-12-30

    申请号:US12493209

    申请日:2009-06-28

    IPC分类号: H01L31/18 H01L21/28

    摘要: The present invention discloses a method of manufacturing a solar cell by forming two electrode layers on the same side of a wafer, and avoiding sunlight incident to another side from being blocked by the electrode layers to enhance the photoelectric conversion efficiency, and each electrode layer is formed by using a mask layer to perform a vapor deposition process, without requiring any mask lithography or etching process. Of course, the issue of a high-temperature process that deteriorates the quality of the wafer no longer exists.

    摘要翻译: 本发明公开了一种太阳能电池的制造方法,其特征在于,在晶片的同一侧形成两个电极层,避免入射到另一侧的太阳光被电极层阻挡,提高光电转换效率, 通过使用掩模层进行气相沉积工艺形成,而不需要任何掩模光刻或蚀刻工艺。 当然,不再存在劣化晶片质量的高温处理的问题。

    Method of fabricating GaN LED
    50.
    发明申请
    Method of fabricating GaN LED 审中-公开
    制造GaN LED的方法

    公开(公告)号:US20080233671A1

    公开(公告)日:2008-09-25

    申请号:US11808565

    申请日:2007-06-11

    IPC分类号: H01L21/02

    CPC分类号: H01L33/007 H01L33/0079

    摘要: A light emitting diode (LED) is made. The LED had a LiAlO2 substrate and a GaN layer. Between them, there is a zinc oxide (ZnO) layer. Because GaN and ZnO have a similar. Wurtzite structure, GaN can easily grow on ZnO. By using the ZnO layer, the GaN layer is successfully grown as a single crystal thin film on the LiAlO2 substrate. Thus, GaN defect density is reduced and lattice match is obtained to have a good crystal interface quality and an enhanced light emitting efficiency of a device thus made.

    摘要翻译: 制造发光二极管(LED)。 LED具有LiAlO 2 N 2衬底和GaN层。 在它们之间,存在氧化锌(ZnO)层。 因为GaN和ZnO有类似的。 纤锌矿结构,GaN可以容易地在ZnO上生长。 通过使用ZnO层,GaN层在LiAlO 2衬底上成功生长为单晶薄膜。 因此,GaN缺陷密度降低,并且获得晶格匹配以具有良好的晶体界面质量和提高的发光效率。