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59 条记录 (耗时 0.053 秒)

    Positive-working photoimageable bottom antireflective coating
    42.
    发明授权
    Positive-working photoimageable bottom antireflective coating 有权
    正面工作的可光成像底部抗反射涂层

    公开(公告)号：US08632948B2

    公开(公告)日：2014-01-21

    申请号：US12570923

    申请日：2009-09-30

    申请人： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

    发明人： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

    IPC分类号： G03F7/039 ,  G03F7/30 ,  C08F20/20

    CPC分类号： G03F7/091

    摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.

    摘要翻译： 本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团， 在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。 本发明还涉及用于对抗反射涂层进行成像的方法。

    Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition
    47.
    发明授权
    Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition 有权
    用于组合物中的抗反射涂层或辐射吸收涂层和化合物的组合物

    公开(公告)号：US06803168B1

    公开(公告)日：2004-10-12

    申请号：US09237125

    申请日：1999-01-26

    申请人： Munirathna Padmanaban ,  Wen-Bing Kang ,  Hatsuyuki Tanaka ,  Ken Kimura ,  Georg Pawlowski

    发明人： Munirathna Padmanaban ,  Wen-Bing Kang ,  Hatsuyuki Tanaka ,  Ken Kimura ,  Georg Pawlowski

    IPC分类号： G03F7004

    CPC分类号： G03F7/091 ,  C08F220/34 ,  C08G18/2825 ,  C08G18/2865 ,  C08G18/728 ,  C08G18/8116 ,  C09D4/00 ,  C09D5/32 ,  G03F7/0045

    摘要： A composition for an anti-reflective coating or a radiation absorbing coating which can form an anti-reflective coating or a radiation absorbing coating having high absorption to exposed radiation in the range of 100 to 450 nm, no diffusion of photo-generated acid to anti-reflective coating and so on, no intermixing of resist and anti-reflective coating layer, good shelf-life stability, and good step coverage and novel compounds and polymers being preferably used in the composition are disclosed. The composition contains an acrylic or methacrylic compound or polymer with an isocyanate or thioisocyanate group bonded through an alkylene group to a side chain thereof or with an amino or hydroxyl group-containing organic chromophore which absorbs radiation in the range of 100 to 450 nm wavelength and is bonded, for example, through an alkylene group to the isocyanate or thioisocyanate group. Resist patters with high resolution are formed on a substrate. A composition for an anti-reflective coating or a radiation absorbing coating are applied on the substrate and baked to form an anti-reflective coating or a radiation absorbing coating layer. Then, a chemically amplified resist is coated thereon and after patternwize exposure, developed. During baking of the anti-reflective coating or radiation absorbing coating, hardening or curing of the coating takes place by the presence of the isocyanate or thioisocyanate group. On the other hand, the exposed radiation having wavelength in the range of 100 to 450 nm is absorbed by organic chromophore.

    摘要翻译： 用于抗反射涂层或辐射吸收涂层的组合物，其可以形成对100至450nm范围内的暴露辐射具有高吸收的抗反射涂层或辐射吸收涂层，而不会将光产生的酸扩散到抗 反射涂层等，公开了抗蚀剂和抗反射涂层的互相混合，良好的保质期稳定性和良好的阶梯覆盖率，并且组合物中优选使用的新型化合物和聚合物。 该组合物含有丙烯酸或甲基丙烯酸类化合物或具有通过亚烷基键合到其侧链上的异氰酸酯或硫代异氰酸酯基团或与吸收在波长为100至450nm范围内的辐射的含氨基或羟基的有机发色团的聚合物，以及 例如通过亚烷基键合到异氰酸酯或硫代异氰酸酯基团。 在基板上形成具有高分辨率的抗蚀剂图案。 将用于抗反射涂层或辐射吸收涂层的组合物施加在基材上并烘烤以形成抗反射涂层或辐射吸收涂层。 然后，将化学放大抗蚀剂涂覆在其上，并经过图案化曝光后显影。 在防反射涂层或辐射吸收涂层的烘烤期间，涂层的硬化或固化通过异氰酸酯或硫代异氰酸酯基团的存在进行。 另一方面，波长在100〜450nm的曝光的辐射被有机发色团吸收。

    Photoresist composition for deep UV radiation
    48.
    发明授权
    Photoresist composition for deep UV radiation 有权
    用于深紫外线辐射的光刻胶组合物

    公开(公告)号：US06365322B1

    公开(公告)日：2002-04-02

    申请号：US09455872

    申请日：1999-12-07

    申请人： Munirathna Padmanaban ,  Ralph R. Dammel

    发明人： Munirathna Padmanaban ,  Ralph R. Dammel

    IPC分类号： G03F7004

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/115 ,  Y10S430/122

    摘要： The present invention relates to a novel photoresist composition sensitive in the deep ultraviolet region, where the photoresist performance is not adversely impacted by basic contaminants in the processing environment of the photoresist. The novel photoresist comprises a polymer, a photoactive compound, a basic compound that is a sulfonium or iodonium compound that is essentially nonabsorbing at the exposure wavelength of the photoresist, and a solvent composition. The invention further relates to a process for imaging such a photoresist in the deep ultraviolet region.

    摘要翻译： 本发明涉及在深紫外区域敏感的新型光致抗蚀剂组合物，其中光致抗蚀剂性能在光致抗蚀剂的加工环境中不受碱性污染物的不利影响。 新型光致抗蚀剂包括聚合物，光活性化合物，碱性化合物，其是在光致抗蚀剂的曝光波长下基本上不吸收的锍或碘鎓化合物和溶剂组合物。 本发明还涉及一种用于在深紫外区域中成像这种光致抗蚀剂的方法。

    Photosensitive Composition
    50.
    发明申请
    Photosensitive Composition 审中-公开
    感光组合

    公开(公告)号：US20100136477A1

    公开(公告)日：2010-06-03

    申请号：US12325627

    申请日：2008-12-01

    申请人： Edward W. Ng ,  Nelson M. Felix ,  Munirathna Padmanaban ,  Srinivasan Chakrapani

    发明人： Edward W. Ng ,  Nelson M. Felix ,  Munirathna Padmanaban ,  Srinivasan Chakrapani

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/091

    摘要： The present invention relates to a novel photosensitive composition comprising a) an organic polymer, b) a photobase generator of structure (1), and c) optionally a photoacid generator, (+A1−O2C)—B—(CO2−A2+)x  (1) where A1+ and A2+ are independently an onium cation, x is an integer greater than or equal to 1, and B is a nonfluorinated hydrocarbon moiety. The photosensitive composition may be used as a photoresist composition or be used as an alkali developable antireflective underlayer coating composition.

    摘要翻译： 本发明涉及一种新颖的光敏组合物，其包含a）有机聚合物，b）结构（1）的光碱产生剂，和c）任选的光酸产生剂，（+ A1-O 2 C）-B-（CO 2 -A 2 +）x （1）其中A1 +和A2 +独立地是鎓阳离子，x是大于或等于1的整数，B是非氟化烃部分。 光敏组合物可以用作光致抗蚀剂组合物或用作碱显影性抗反射底层涂料组合物。