公开(公告)号：US08158959B2

公开(公告)日：2012-04-17

申请号：US12705287

申请日：2010-02-12

申请人： Takeshi Asayama ,  Kouji Kakizaki ,  Akira Endo ,  Shinji Nagai

发明人： Takeshi Asayama ,  Kouji Kakizaki ,  Akira Endo ,  Shinji Nagai

IPC分类号： G01N21/00 ,  G01N21/33 ,  H05G2/00

CPC分类号： H05G2/008 ,  H05G2/003 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.

摘要翻译： 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。

公开(公告)号：US20100243922A1

公开(公告)日：2010-09-30

申请号：US12705287

申请日：2010-02-12

申请人： Takeshi Asayama ,  Kouji Kakizaki ,  Akira Endo ,  Shinji Nagai

发明人： Takeshi Asayama ,  Kouji Kakizaki ,  Akira Endo ,  Shinji Nagai

IPC分类号： H05G2/00 ,  G01J3/10

CPC分类号： H05G2/008 ,  H05G2/003 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.

摘要翻译： 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。

公开(公告)号：US20100090132A1

公开(公告)日：2010-04-15

申请号：US12559977

申请日：2009-09-15

申请人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US20100078579A1

公开(公告)日：2010-04-01

申请号：US12566170

申请日：2009-09-24

申请人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

发明人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/001 ,  H05G2/008

摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.

摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

公开(公告)号：US20080285602A1

公开(公告)日：2008-11-20

申请号：US11631463

申请日：2005-07-07

申请人： Shinji Nagai ,  Osamu Wakabayashi ,  Koji Kakizaki ,  Takayuki Yabu ,  Takahito Kumazaki

发明人： Shinji Nagai ,  Osamu Wakabayashi ,  Koji Kakizaki ,  Takayuki Yabu ,  Takahito Kumazaki

IPC分类号： H01S3/10 ,  H01S3/13

CPC分类号： H01S3/2366 ,  H01S3/134 ,  H01S3/225

摘要： A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.

摘要翻译： 通过光谱纯度范围测量装置测量从放大激光器件（300）输出的激光束的光谱纯度范围（E 95）。 为了使测量的光谱纯度范围（E 95）在目标光谱纯度范围（E 950）的允许范围E 950±dE 95内，从通过振荡激光装置（100）开始放电的时间到 由放大激光装置（300）开始放电的时间被控制，光谱纯度范围（E 95）被控制为稳定。

公开(公告)号：US20080095209A1

公开(公告)日：2008-04-24

申请号：US11903111

申请日：2007-09-19

申请人： Osamu Wakabayashi ,  Tsukasa Hori ,  Takanobu Ishihara ,  Shinji Nagai ,  Hakaru Mizoguchi ,  Kouji Kakizaki

发明人： Osamu Wakabayashi ,  Tsukasa Hori ,  Takanobu Ishihara ,  Shinji Nagai ,  Hakaru Mizoguchi ,  Kouji Kakizaki

IPC分类号： H01S3/22

CPC分类号： H01S3/2333 ,  H01S3/005 ,  H01S3/036 ,  H01S3/0384 ,  H01S3/0385 ,  H01S3/073 ,  H01S3/08009 ,  H01S3/08045 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2316 ,  H01S3/2366

摘要： A high efficiency injection device 4, which injects oscillation stage laser light into an optical stable resonator of an amplification stage laser 20, is provided. A discharge electrode 1a is disposed in an oscillation stage laser 10, and is connected to a 12 kHz power supply 15 for discharging the discharge electrode 1a, and also a plurality of pairs of discharge electrodes 2a, 2b are disposed within the optical stable resonator of the amplification stage laser 20, and are connected to 6 kHz power supplies 25a, 25b for discharging the respective electrode pairs 2a, 2b. Discharge voltages are applied alternately to the two pairs of electrodes 2a, 2b in synchronization with the injected light to cause discharge.

摘要翻译： 提供了将振荡级激光注入到放大级激光器20的光稳定谐振器中的高效率注入装置4。 放电电极1a设置在振荡级激光器10中，并且连接到用于放电放电电极1a的12kHz电源15，并且多对放电电极2a，2b布置在 放大级激光器20的光稳定谐振器，并且连接到用于对各个电极对2a，2b进行放电的6kHz电源25a，25b。 与注入的光同步地将放电电压交替地施加到两对电极2a，2b，以引起放电。

公开(公告)号：US20070069123A1

公开(公告)日：2007-03-29

申请号：US11508323

申请日：2006-08-23

申请人： Shinji Nagai ,  Hiroyuki Yasuda ,  Tetsuya Nishida

发明人： Shinji Nagai ,  Hiroyuki Yasuda ,  Tetsuya Nishida

IPC分类号： H01J49/00

CPC分类号： H01J49/424 ,  H01J49/0009 ,  H01J49/0027

摘要： An ion resonance condition is corrected accurately in an ion trapping device. Measurements are repeated by alternately applying and not applying a resonance frequency voltage while spectral data is obtained continuously. Data obtained in the absence of the resonance frequency voltage is used as reference data to correct the set data of a resonance condition. As a result, calibration can be made while taking into consideration the variations in the amount of ions that are introduced into the ion trap.

摘要翻译： 在离子捕获装置中精确校正离子共振条件。 通过在连续获得光谱数据的同时交替地施加并不施加共振频率电压来重复测量。 在没有谐振频率电压的情况下获得的数据被用作参考数据，以校正谐振条件的设定数据。 结果，可以考虑到引入到离子阱中的离子量的变化来进行校准。

公开(公告)号：US07075069B2

公开(公告)日：2006-07-11

申请号：US10448385

申请日：2003-05-30

申请人： Kiyomi Yoshinari ,  Yoshiaki Kato ,  Katsuhiro Nakagawa ,  Shinji Nagai

发明人： Kiyomi Yoshinari ,  Yoshiaki Kato ,  Katsuhiro Nakagawa ,  Shinji Nagai

IPC分类号： H01J49/42

CPC分类号： H01J49/4285 ,  H01J49/424

摘要： Depending on the RF driving voltage amplitude value and the frequency of each frequency component of wideband auxiliary AC voltages, the wideband auxiliary AC voltage comprising plural different frequency components is optimized so that undesired ions having mass-to-charge ratios within the required range will be resonantly ejected from the ion trap electrodes.

公开(公告)号：US20060130810A1

公开(公告)日：2006-06-22

申请号：US10542645

申请日：2004-04-08

申请人： Nobutaka Takeuchi ,  Shinji Nagai

发明人： Nobutaka Takeuchi ,  Shinji Nagai

IPC分类号： F02D11/10

CPC分类号： F02D11/105 ,  F02D41/10 ,  F02D2200/1002

摘要： Limitation of the opening rate of the throttle valve is prohibited unless the following conditions have been all satisfied: (i) the engine speed detected at starting opening the throttle valve is below a prescribed speed; (ii) the throttle angle detected at starting opening the throttle valve is below a prescribed throttle angle; (iii) the target throttle-open angle is above a prescribed throttle-open angle; and (ix) the target opening rate of the throttle valve is above a prescribed opening rate.

摘要翻译： 除非满足以下条件，否则禁止限制节流阀的打开速度：（i）在开启节气门时检测到的发动机转速低于预定速度; （ii）在开始打开节气门时检测到的节气门角度低于规定的节气门角度; （iii）目标节气门开度角高于规定的节气门开度角; 和（ix）节气门的目标打开速度高于规定的打开速度。

公开(公告)号：US5252580A

公开(公告)日：1993-10-12

申请号：US947169

申请日：1992-09-18

申请人： Toshihiro Takahashi ,  Hitoshi Inoue ,  Masato Horigome ,  Kenichi Momose ,  Masanori Sugita ,  Kouichi Katsuyama ,  Chikako Suzuki ,  Shinji Nagai ,  Masao Nagase ,  Koichi Nakamaru

发明人： Toshihiro Takahashi ,  Hitoshi Inoue ,  Masato Horigome ,  Kenichi Momose ,  Masanori Sugita ,  Kouichi Katsuyama ,  Chikako Suzuki ,  Shinji Nagai ,  Masao Nagase ,  Koichi Nakamaru

IPC分类号： A61K31/395 ,  A61K31/435 ,  A61K31/437 ,  A61P1/04 ,  C07D471/04 ,  C07D471/14 ,  C07D487/04 ,  C07D519/00 ,  A61K31/445 ,  C07D401/06

CPC分类号： C07D471/04

摘要： Disclosed are indole derivatives of formula (I) ##STR1## wherein Y represents H, C.sub.1 -C.sub.6 alkyl, C.sub.1 -C.sub.6 alkoxy or halogen;Z represents --CH.sub.2 N(R.sub.5)--;R represents H or --CH.sub.2 CH.sub.2 X where X represents pyridyl, aralkyloxy or substituted amino of NR.sub.6 R.sub.7 where R.sub.6 represents H, C.sub.1 -C.sub.6 alkyl, aralkyl, C.sub.1 -C.sub.6 alkoxycarbonyl, aralkyloxycarbonyl or halogenated C.sub.1 -C.sub.6 alkoxycarbonyl and R.sub.7 represents H, C.sub.1 -C.sub.6 alkyl or aralkyl, or together with R.sub.2 may form a ring of --(CH.sub.2).sub.n -- (n is 1-4) or ##STR2## R.sub.1 represents H, C.sub.1 -C.sub.6 alkyl, aralkyl or arylsulfonyl; R.sub.2 represents C.sub.1 -C.sub.6 alkyl, hydroxy, C.sub.1 -C.sub.6 alkoxy or aralkyloxy;R.sub.3 represents H, C.sub.1 -C.sub.6 alkyl, aralkyl or halogenated C.sub.1 -C.sub.6 alkyl;R.sub.4 and R.sub.5 may be the same or different and each represents H, C.sub.1 -C.sub.6 alkyl or aralkyl or both may together form a ring of --(CH.sub.2).sub.m -- (m is 3 or 4);or pharmaceutically acceptable acid addition salts thereof. They are useful as an antiulcer agent.