公开(公告)号：US07226524B2

公开(公告)日：2007-06-05

申请号：US10498672

申请日：2002-11-25

申请人： Shigeru Kasai ,  Nobuhiko Yamamoto ,  Hikaru Adachi ,  Yuki Osada

发明人： Shigeru Kasai ,  Nobuhiko Yamamoto ,  Hikaru Adachi ,  Yuki Osada

IPC分类号： C23C16/00 ,  H01L21/306 ,  C23F1/00

CPC分类号： H01J37/32256 ,  H01J37/32192 ,  H01J37/32568 ,  H01P5/103

摘要： A plasma processing apparatus includes an evacuatable processing vessel; a workpiece mount base for mounting thereon an object to be processed; a microwave transmitting plate provided in an opening of a ceiling of the processing vessel; a planar antenna member for supplying a microwave into the processing vessel via the microwave transmitting plate; a shield lid grounded to cover a top of the planar antenna member; a waveguide for guiding the microwave to the planar antenna member; a member elevating mechanism for relatively varying a vertical distance between the planar antenna member and the shield lid; a tuning rod insertable into the waveguide; a tuning rod driving mechanism for moving the tuning rod to adjust an insert amount thereof; and a matching control section for controlling an elevation amount of the planar antenna member and the insert amount of the tuning rod to obtain a matching adjustment.

摘要翻译： 等离子体处理装置包括可抽空处理容器; 用于在其上安装待处理物体的工件安装基座; 设置在处理容器的天花板的开口中的微波传输板; 平面天线构件，用于经由微波发射板向处理容器提供微波; 屏蔽盖，其接地以覆盖所述平面天线构件的顶部; 用于将微波引导到平面天线构件的波导; 用于相对改变平面天线构件和屏蔽盖之间的垂直距离的构件升降机构; 调谐杆可插入到波导中; 调节杆驱动机构，用于移动调音杆以调节其插入量; 以及匹配控制部分，用于控制平面天线部件的仰角量和调节杆的插入量以获得匹配调整。

公开(公告)号：US07176634B2

公开(公告)日：2007-02-13

申请号：US10951049

申请日：2004-09-27

申请人： Toshiaki Kitamura ,  Koichi Rokuyama ,  Shigeru Kasai ,  Takashi Ogino ,  Yuki Osada

发明人： Toshiaki Kitamura ,  Koichi Rokuyama ,  Shigeru Kasai ,  Takashi Ogino ,  Yuki Osada

IPC分类号： H01J7/24 ,  H03H7/38

CPC分类号： H01J37/32174 ,  H01J37/32082 ,  H01J37/32183 ,  H01P5/026 ,  H01P5/04

摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.

摘要翻译： 等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。 等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号 产生等离子体的功率到处理室。

公开(公告)号：US06950596B2

公开(公告)日：2005-09-27

申请号：US10716904

申请日：2003-11-19

申请人： Akira Yahagi ,  Shigeru Kasai ,  Tatsumi Ide ,  Michikazu Kondo

发明人： Akira Yahagi ,  Shigeru Kasai ,  Tatsumi Ide ,  Michikazu Kondo

IPC分类号： G02B26/02 ,  B81B3/00 ,  B81B7/04 ,  G02B6/26 ,  G20B6/26

CPC分类号： G02B6/266

摘要： A variable optical attenuator comprises an incoming fiber for propagating an incoming light beam, a mirror for reflecting the incoming light beam as a reflected light beam and an outgoing fiber for propagating as an outgoing light beam at least one part of the reflected light beam. The light intensity of the outgoing light beam is determined by the angle of reflection at the mirror. The angle of reflection at the mirror is adjusted by an actuator for rotating the mirror. The actuator comprises a plate, a coil, a housing and permanents magnets. The mirror and the coil are fixed on the plate. The housing supports the plate so that the plate is able to rotate around a rotation axis, which is included on a predetermined plane. The permanent magnets are fixed on the housing and generate predetermined magnetic flux density along the predetermined plane. When a driving current is supplied to the coil under the predetermined magnetic flux density, a Lorentz force occurs at the coil so as to rotate the coil. Together with the coil, the mirror rotates so that the light intensity of the outgoing light beam can be adjusted.

摘要翻译： 可变光衰减器包括用于传播入射光束的入射光纤，用于反射作为反射光束的入射光束的反射镜和用于作为输出光束传播至少一部分反射光束的输出光纤。 出射光束的光强度由反射镜的反射角决定。 通过用于旋转镜子的致动器来调节镜子处的反射角度。 致动器包括板，线圈，壳体和永磁体。 镜子和线圈固定在板上。 壳体支撑板，使得板能够绕包含在预定平面上的旋转轴线旋转。 永久磁铁被固定在壳体上并沿预定平面产生预定的磁通密度。 当以预定的磁通密度向线圈提供驱动电流时，在线圈处产生洛仑兹力以使线圈旋转。 与线圈一起，镜子旋转，从而可以调节出射光束的光强度。

公开(公告)号：US20050160987A1

公开(公告)日：2005-07-28

申请号：US11088811

申请日：2005-03-25

申请人： Shigeru Kasai ,  Yuki Osada ,  Takashi Ogino

发明人： Shigeru Kasai ,  Yuki Osada ,  Takashi Ogino

IPC分类号： C23C16/00 ,  C23F1/00

CPC分类号： H05B6/705

摘要： A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microwave introducing unit includes a microwave oscillator for outputting a plurality of microwaves having specified outputs, and an antenna section having a plurality of antennas to which the microwaves outputted from the microwave oscillator are respectively transmitted.

摘要翻译： 等离子体处理装置包括用于容纳待处理基板的室，用于将处理气体供应到室中的气体供给单元和用于将等离子体产生微波引入室的微波引入单元。 微波引入单元包括微波振荡器，用于输出具有特定输出的多个微波，以及具有分别从微波振荡器输出微波的多个天线的天线部分。

公开(公告)号：US20050057164A1

公开(公告)日：2005-03-17

申请号：US10951049

申请日：2004-09-27

申请人： Toshiaki Kitamura ,  Koichi Rokuyama ,  Shigeru Kasai ,  Takashi Ogino ,  Yuki Osada

发明人： Toshiaki Kitamura ,  Koichi Rokuyama ,  Shigeru Kasai ,  Takashi Ogino ,  Yuki Osada

IPC分类号： H01J37/32 ,  H01J7/24 ,  H05B31/26

CPC分类号： H01J37/32174 ,  H01J37/32082 ,  H01J37/32183 ,  H01P5/026 ,  H01P5/04

摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.

摘要翻译： 等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。 等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号 产生等离子体的功率到处理室。

公开(公告)号：US06436193B1

公开(公告)日：2002-08-20

申请号：US09534342

申请日：2000-03-24

申请人： Shigeru Kasai ,  Teruo Iwata ,  Taro Komiya ,  Tomihiro Yonenaga

发明人： Shigeru Kasai ,  Teruo Iwata ,  Taro Komiya ,  Tomihiro Yonenaga

IPC分类号： C23C1600

CPC分类号： C23C16/45565 ,  C23C16/455 ,  C23C16/45514 ,  H01J37/3244

摘要： A gas processing apparatus is disclosed, that comprises a processing chamber that is airtightly structured, a gas delivery pipe connected to the processing chamber, a gas supply source for supplying gas to the processing chamber through the gas delivery pipe, a holding table for holding a workpiece loaded to the processing chamber, a shower member disposed at a gas outlet of the gas delivery pipe connected to the processing chamber, a spray plate structured as a partition wall of the shower member that faces the holding plate, the spray plate having a plurality of spray holes, and a baffle member disposed between the spray plate in the shower member and the gas outlet and having a plurality of through-holes formed perpendicular to the surface of the baffle member, wherein each of the through-holes of the baffle member has a first opening portion and a second opening portion facing the gas outlet, the second opening portion facing the spray plate, the opening area of the second opening portion being larger than the opening portion of the first opening portion. Thus, a gas processing apparatus and a gas processing method that allow gas to be uniformly supplied to the entire surface of a workpiece are provided. In addition, a baffle member for use with the gas processing apparatus and the gas processing method is provided.

摘要翻译： 公开了一种气体处理装置，其包括气密结构的处理室，连接到处理室的气体输送管，用于通过气体输送管向处理室供应气体的气体供给源，用于保持 装载到处理室的工件，设置在连接到处理室的气体输送管的气体出口处的喷淋构件，构成为与保持板相对的淋浴构件的分隔壁的喷射板，喷射板具有多个 的喷孔，以及设置在淋浴构件中的喷射板和气体出口之间的挡板构件，并且具有垂直于挡板构件的表面形成的多个通孔，其中挡板构件的每个通孔 具有面向气体出口的第一开口部分和第二开口部分，面向喷射板的第二开口部分，第二开口的开口区域 部分大于第一开口部分的开口部分。 因此，提供了允许气体均匀地供应到工件的整个表面的气体处理装置和气体处理方法。 此外，提供了一种与气体处理装置一起使用的挡板部件和气体处理方法。

公开(公告)号：US5783884A

公开(公告)日：1998-07-21

申请号：US811920

申请日：1997-03-05

申请人： Makoto Fujishima ,  Shigeru Kasai ,  Noriyuki Kawahara

发明人： Makoto Fujishima ,  Shigeru Kasai ,  Noriyuki Kawahara

IPC分类号： G11B17/028 ,  G11B19/20 ,  H02K5/173 ,  H02K7/14 ,  H02K29/08 ,  H02K29/14 ,  H02K5/16 ,  H02K7/08

CPC分类号： G11B19/2009 ,  H02K29/08 ,  H02K29/14 ,  H02K5/1735 ,  H02K7/14

摘要： A driving motor comprises a rotor having a rotatably supported shaft, a rotor case rotating together with the shaft, a hub seat attached to the rotor case for mounting a disk hub and a chucking magnet for magnetically attracting the disk hub and a thrust ball bearing having a washer, a plurality s of balls and a retainer for holding the balls and supporting the load in the thrust direction of the rotor. The motor also includes a flatness control section which passes through the rotor case to contact the washer of the thrust ball bearing and controls the flatness of the washer and a position control section which passes through the rotor case to contact an inner circle surface of the washer of the thrust ball bearing and controls the washer in the thrust direction. The chucking magnet, flatness control section and position control section are integrally molded of resin.

摘要翻译： 驱动电动机包括具有可旋转地支撑的轴的转子，与轴一起旋转的转子壳体，安装在用于安装盘毂的转子壳体上的轮毂座和用于磁吸引盘毂的卡盘磁铁和具有 一个垫圈，多个滚珠和一个保持器，用于保持滚珠并在转子的推力方向上支撑负载。 电动机还包括一个平直度控制部分，该平面度控制部分通过转子壳体以接触推力球轴承的垫圈并控制垫圈的平整度;以及位置控制部分，其通过转子壳体以接触垫圈的内圆面 的推力球轴承，并在推力方向上控制垫圈。 夹紧磁体，平直度控制部和位置控制部由树脂一体成型。

公开(公告)号：US08945342B2

公开(公告)日：2015-02-03

申请号：US13410957

申请日：2012-03-02

申请人： Taro Ikeda ,  Shigeru Kasai ,  Yuki Osada

发明人： Taro Ikeda ,  Shigeru Kasai ,  Yuki Osada

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01J37/32 ,  C23C16/27

CPC分类号： H01J37/3222 ,  C23C16/274

摘要： A surface wave plasma generating antenna serves to generate a surface wave plasma in a chamber by radiating into the chamber a microwave transmitted from a microwave output section through a coaxial waveguide including an outer conductor and an inner conductor. The surface wave plasma generating antenna is formed in a planar shape and has a plurality of slots arranged in a circumferential direction, and each joint portion between two adjacent slots in the circumferential direction is overlapped with at least one of the slots in a diametrical direction.

摘要翻译： 表面波等离子体产生天线用于通过将包括外部导体和内部导体的同轴波导从微波输出部分发射的微波辐射到室中，从而在室内产生表面波等离子体。 表面波等离子体发生天线形成为平面形状，并且具有沿圆周方向排列的多个狭槽，并且沿圆周方向的两个相邻狭槽之间的每个接合部分沿直径方向与至少一个狭槽重叠。

公开(公告)号：US08907259B2

公开(公告)日：2014-12-09

申请号：US13231546

申请日：2011-09-13

申请人： Shigeru Kasai ,  Mitsutoshi Ashida

发明人： Shigeru Kasai ,  Mitsutoshi Ashida

IPC分类号： H05B6/68 ,  H05B6/80 ,  H01L21/324 ,  H01L21/67

CPC分类号： H05B6/68 ,  H01L21/324 ,  H01L21/67115 ,  H05B6/806 ,  H05B2206/04 ,  Y02B40/143

摘要： A microwave irradiation device includes a chamber for accommodating an object to be processed; a plurality of magnetrons for generating microwaves and irradiating the microwaves to the object to be processed in the chamber; and a power supply unit for supplying a pulse-shaped voltage to each magnetron. The power supply unit supplies the pulse-shaped voltage to the magnetrons while preventing temporal overlap of voltage pulses of the pulse-shaped voltage supplied to the respective magnetrons with each other.

摘要翻译： 微波照射装置包括容纳待处理物体的室， 多个磁控管，用于产生微波并将微波照射到所述腔室中待处理物体; 以及用于向每个磁控管提供脉冲状电压的电源单元。 电源单元将脉冲形电压提供给磁控管，同时防止提供给相应磁控管的脉冲状电压的电压脉冲的时间重叠。

公开(公告)号：US08608121B2

公开(公告)日：2013-12-17

申请号：US12167509

申请日：2008-07-03

申请人： Takeshi Maehara ,  Hideshi Iwasa ,  Yuusuke Watanabe ,  Kunihiko Kinugasa ,  Hajime Mori ,  Kiyofumi Saiki ,  Ken Okuda ,  Tsuyoshi Hagiwara ,  Noboru Saito ,  Masanobu Watanabe ,  Shigeru Kasai

发明人： Takeshi Maehara ,  Hideshi Iwasa ,  Yuusuke Watanabe ,  Kunihiko Kinugasa ,  Hajime Mori ,  Kiyofumi Saiki ,  Ken Okuda ,  Tsuyoshi Hagiwara ,  Noboru Saito ,  Masanobu Watanabe ,  Shigeru Kasai

IPC分类号： A47B96/06 ,  E04G5/06 ,  A47F5/08

CPC分类号： G21C13/032 ,  F16L3/02 ,  G21C15/25 ,  G21C17/032 ,  G21Y2002/303 ,  G21Y2004/301 ,  Y02E30/40

摘要： A reactor metering pipe fixing device fixes a reactor metering pipe disposed in a reactor to a cylindrical outer surface of a jet pump diffuser and reduces stress that may be induced in a weld zone in the reactor metering pipe. An outer holding member 41 is held on the cylindrical outer surface 18a of a jet pump diffuser 18 by a C-shaped holding member 30. The reactor metering pipe 19 is clamped from radial directions by the outer holding member 41 and inner holding members 42 and 43. Wedges 44 and 45 are wedged into a gap between the cylindrical outer surface 18a and the inner holding member 42 and a gap between the cylindrical outer surface 18a and the inner holding member 43 to fix the reactor metering pipe 19 firmly to the cylindrical outer surface 18a.

摘要翻译： 反应器计量管固定装置将设置在反应器中的反应器计量管固定到喷射泵扩散器的圆柱形外表面，并减少可能在反应器计量管中的焊接区域中引起的应力。 外保持构件41通过C形保持构件30保持在喷射泵扩散器18的圆筒形外表面18a上。反应器计量管19通过外保持构件41和内保持构件42沿径向夹紧， 楔形件44和45楔入圆柱形外表面18a和内保持构件42之间的间隙以及圆柱形外表面18a和内保持构件43之间的间隙，以将反应器计量管19牢固地固定到圆柱形外 表面18a。