摘要:
The present invention aims to economically implement an ultra-compact semiconductor device having an identification number according to the efficient utilization of an electron-beam writing method. A memory for identifying a 128-bit identification number, which makes use of a transistor, is configured by each contact hole selectively defined by an electron-beam writing method. A plane long-side size of a semiconductor chip is set to 0.5 mm or less. The contact holes are defined simultaneously with contact holes for peripheral circuits. In addition, the plane long-side size of the semiconductor chip is set smaller than the thickness of a wafer prior to the start of its manufacture and set larger than the thickness of the post-thinning wafer. Otherwise, the same data as a barcode is further stored in the memory. Additionally, data obtained by enciphering the identification number is used to test or inspect the semiconductor chip.
摘要:
A semiconductor device is provided which effectively prevents forgery or alteration of IC cards or the like handling important information. Electrodes each having an unshaped irregular surface are provided, respectively, on the IC chip side and the substrate side. The electrodes are connected to each other, with the IC chip facing downward. Connection resistance is employed as a Key code by subjecting the capacitance between the electrodes to A/D conversion. This serves to prevent the duplication of IC cards or the like by employing the connection resistance having a random value as the key code of cryptograph.
摘要:
An IC card strong against bending and with a thin semiconductor chip mounted thereon is disclosed which is further provided with a reinforcing plate to reduce damage of the semiconductor chip caused by a point pressure. The IC card is employable even under a mechanically severe environment and is thus highly reliable.
摘要:
A process of contacting sides of a plurality of chips having semiconductor elements formed in a substrate surface, directly to each other on the same {111} crystal plane.
摘要:
A thin-film semiconductor device comprising at least a semiconductor element and a wiring is disclosed. A thin film of a protective insulating material is formed on the lower surface of the semiconductor element, and a substrate is bonded on the lower surface of the thin film. A method for fabricating the thin-film semiconductor device is also disclosed, in which a thin-film semiconductor circuit is formed on a silicon-on-insulator wafer, the silicon substrate on the reverse side of the silicon-on-insulator wafer is etched off, a thin-film semiconductor chip is formed and attached to the substrate, and the thin-film semi conductor chip and the substrate are wired to each other by printing.
摘要:
Condenser (114), coil (115) and thin-thickness integrated circuit (312) are placed between the upper cover sheet (117) and the lower cover sheet (118), and adhesive (119) is filled into the space among them, whereby a card is fabricated. Because condenser (114), coil (115) and thin-thickness integrated circuit (312) are extremely thin, the resulting semiconductor device is strong to bending and highly reliable at a low cost.
摘要:
Prevention of reduction in the production yield due to the increase in the area of a semiconductor chip permits a sophisticated-performance single-chip semiconductor device to be fabricated. This also permits a many-kind small-amount production of semiconductor devices to be implemented. After plural semiconductor chips 2 and 3 are fabricated separately, only defect-free chips of them are selected. The selected defect-free chips are connected in contact between their side walls of their densest faces of atoms of their substrates so that the surfaces 4a and 4b where elements are to be formed are located in the same plane. Thus, even when the chip area is increased, reduction of the production yield can be prevented, thereby permitting a large-area sophisticated-performance single chip semiconductor device to be fabricated. If many kinds of semiconductor chips are prepared and connected in their combination in a variety of forms, it is possible to realize a many-kind small-amount production of semiconductor devices.
摘要:
In accordance with one aspect of the invention, a semiconductor integrated circuit is provided wherein an input circuit is formed by a phase split circuit having a bipolar transistor which outputs an inverted output from the collector and a non-inverted output from the emitter. The emitter follower output circuit is driven by an inverted output of the phase split circuit. Meanwhile, an emitter load of the emitter follower output circuit is formed by a transistor, and the emitter load transistor is temporarily driven conductively by a charging current of the capacitance to be charged by the rising edge of the non-inverted output of the phase split circuit. As a second aspect of the invention, a logic circuit is formed of a logic portion and an output portion. The output portion includes an emitter follower output transistor receiving an output signal generated by the logic portion and an active pull-down transistor receiving at its base a signal supplied thereto through a capacitance element. The signal received by the active pull-down transistor has a phase reverse to that of the input signal supplied to the base of said output transistor. Between the base and emitter of the active pull-down transistor, there is disposed a bias circuit formed of a transistor receiving at its base a predetermined bias voltage and an emitter resistor. Further, between a junction point of the emitter follower output transistor and the active pull-down transistor and the emitter of the transistor as a constituent of the bias circuit, there is disposed a capacitance element for feeding back the output signal.
摘要:
In accordance with one aspect of the invention, a semiconductor integrated circuit is provided wherein an input circuit is formed by a phase split circuit having a bipolar transistor which outputs an inverted output from the collector and a non-inverted output from the emitter. The emitter follower output circuit is driven by an inverted output of the phase split circuit. Meanwhile, an emitter load of the emitter follower output circuit is formed by a transistor, and the emitter load transistor is temporarily driven conductively by a charging current of the capacitance to be charged by the rising edge of the non-inverted output of the phase split circuit. As a second aspect of the invention, a logic circuit is formed of a logic portion and an output portion. The output portion includes an emitter follower output transistor receiving an output signal generated by the logic portion and an active pull-down transistor receiving at its base a signal supplied thereto through a capacitance element. The signal received by the active pull-down transistor has a phase reverse to that of the input signal supplied to the base of said output transistor. Between the base and emitter of the active pull-down transistor, there is disposed a bias circuit formed of a transistor receiving at its base a predetermined bias voltage and an emitter resistor. Further, between a junction point of the emitter follower output transistor and the active pull-down transistor and the emitter of the transistor as a constituent of the bias circuit, there is disposed a capacitance element for feeding back the output signal.
摘要:
The present invention relates to a logic correction for a random logic IC of a high integration density, and more particularly to an on-chip logic correction method wherein the upper surface of a chip is divided into a large number of macrocells, testing of the macrocells is made and each defective macrocell is corrected by replacement. Testing is performed after a primary wiring process that connects semiconductor elements into macrocells but before a secondary wiring process interconnecting the macrocells. After the testing, defective macrocells are replaced, and thereafter the secondary wiring process is performed. Testing is performed using testing pads in each macrocell, connected to the main circuit portion of the macrocell through shift register circuit portions. The macrocells are arranged in a lattice pattern. Wirings formed in the secondary wiring process have a larger cross-sectional area than wirings formed in the primary wiring process.