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公开(公告)号：US20050219493A1
公开(公告)日：2005-10-06
申请号：US10506540
申请日：2003-07-02
IPC分类号： G02B3/00 , G02B19/00 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70075 , G02B3/005 , G02B3/0062 , G02B19/0014 , G02B19/0057 , G03F7/7005
摘要： The present invention provides a light exposure apparatus, and its method, comprising: an illumination optical system including: a light source array formed of a plural separate light sources arranged one-dimensionally or two-dimensionally; condensing optical system for condensing light emitted from each light source of the light source array; a light integrator for spatially decomposing the light condensed by the condensing optics, and thus generating a multitude of pseudo-secondary light sources; and a condenser lens for overlapping the light rays emitted from the multitude of pseudo-secondary light sources generated by the light integrator, and thus illuminating an illumination target region having a pattern to be exposed; and a projection optical system for projecting transmitted or reflected light onto an exposure target region of an exposure target object in order to expose the pattern to be exposed that is illuminated by the illumination optical system.
摘要翻译： 本发明提供一种曝光装置及其方法，包括：照明光学系统，包括：由一维或二维排列的多个单独的光源形成的光源阵列; 聚光光学系统，用于聚集从光源阵列的每个光源发射的光; 光积分器，用于空间分解由聚光光学器件聚光的光，从而产生大量的伪二次光源; 以及聚光透镜，用于将由光积分器产生的多个伪二次光源发射的光线重叠，从而照射具有待曝光图案的照明目标区域; 以及投影光学系统，用于将透射或反射的光投射到曝光目标物体的曝光目标区域上，以暴露由照明光学系统照射的待曝光图案。
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公开(公告)号：US6016187A
公开(公告)日：2000-01-18
申请号：US3141
申请日：1998-01-06
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： G03F1/84 , G03F7/20 , H01L21/027 , H01L21/30 , G03B27/42
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： An exposure apparatus and method wherein a mask is illuminated with light and light one of transmitted through and reflected from the illuminated mask is imaged onto a substrate. At least during imaging transmission of light one of transmitted and reflected from the illuminated mask is partially inhibited. More particularly, a spatial filter is utilized for inhibiting at least a portion of O-order diffraction light.
摘要翻译： 一种曝光装置和方法，其中用光和光照射掩模，将透射通过和从照射的掩模反射的透镜装置成像到基板上。 至少在光的成像传输期间，被照射的掩模的透射和反射之一被部分抑制。 更具体地，利用空间滤波器来抑制O级衍射光的至少一部分。
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公开(公告)号：US5767949A
公开(公告)日：1998-06-16
申请号：US727762
申请日：1996-10-08
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： An exposure apparatus and method wherein a mask is illuminated with light and light one of transmitted through and reflected from the illuminated mask is imaged onto a substrate. At least during imaging transmission of light one of transmitted and reflected from the illuminated mask is partially inhibited. More particularly, a spatial filter is utilized for inhibiting at least a portion of O-order diffraction light.
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公开(公告)号：US5414239A
公开(公告)日：1995-05-09
申请号：US24643
申请日：1993-03-01
CPC分类号： G03F7/70358 , B23K26/066
摘要： A laser-machining optical apparatus designed to efficiently work an object through a large area thereof by projecting an image of a mask to the object through a laser beam having a small sectional area and a high energy density. The apparatus has a laser head for oscillating laser light for working the specimen, a mask provided in the optical path of the laser light beam between the specimen and the laser head and having a working pattern formed on its surface, an objective provided in the optical path of the laser-light beam between the mask and the specimen, a mechanism on which the mask and the specimen are placed so that an optical imaging relationship is maintained therebetween with the objective interposed therebetween, and a two-dimensional scanning device provided in the optical path of the laser light beam between the laser head and the mask to two-dimensionally scan the surface of the mask with the laser light beam from the laser head.
摘要翻译： 一种激光加工光学装置，其被设计为通过将具有小截面积和高能量密度的激光束将掩模的图像投射到物体上，通过其大面积有效地对物体进行加工。 该装置具有用于振荡激光的激光头用于加工样品，设置在激光束的光路中的试样和激光头之间并具有在其表面上形成的工作图案的掩模，设置在光学器件中的物镜 掩模和试样之间的激光束的路径，其中放置掩模和试样的机构，以便在它们之间保持光学成像关系，并且设置在其中的二维扫描装置 在激光头和掩模之间的激光束的光路用激光头的激光二维扫描掩模的表面。
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公开(公告)号：US5227862A
公开(公告)日：1993-07-13
申请号：US623438
申请日：1990-12-14
CPC分类号： G03F9/7026 , G01B11/0608 , G01B11/26 , G01B9/02022 , G01B9/02084 , G03F9/7049
摘要： A projection exposure apparatus (1) comprises an incident light optical system for causing the light emitted from a light source 1 to enter an object of exposure (4) in diagonal direction, a detection apparatus (3) for causing an interference between the light reflected from the object of exposure (4) and a reference light and detecting the resultant interference fringe, a processing circuit for determining the inclination and height of the surface of the object of exposure (4) from the optical information on the interference fringe, and a stage (7) for supporting the object of exposure (4). The object of exposure (4) is subjected to projection exposure by driving the stage (7) according to the calculated inclination and height of the object of exposure (4).
摘要翻译： PCT No.PCT / JP90 / 00520 Sec。 371 1990年12月14日第 102（e）1990年12月14日的PCT PCT 1990年4月20日提交PCT公布。 WO90 / 13000 PCT出版物 投影曝光装置（1）包括入射光学系统，用于使从光源1发射的光在对角线方向上进入曝光对象（4）;检测装置（3），用于 导致从曝光对象物（4）反射的光与基准光之间的干涉，并检测合成的干涉条纹;处理电路，用于根据光学信息确定曝光物体（4）的表面的倾斜度和高度 在干涉条纹上，以及用于支撑曝光对象的阶段（7）（4）。 曝光对象（4）通过根据计算出的曝光对象的倾斜度和高度来驱动舞台（7）进行投影曝光（4）。
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公开(公告)号：US5209813A
公开(公告)日：1993-05-11
申请号：US781879
申请日：1991-10-24
申请人： Yoshitada Oshida , Genya Matsuoka , Teruo Iwasaki , Toshio Kaneko , Hiroyuki Takahashi , Hiroyoshi Ando , Hidenori Yamaguchi , Katsuhiro Kawasaki
发明人： Yoshitada Oshida , Genya Matsuoka , Teruo Iwasaki , Toshio Kaneko , Hiroyuki Takahashi , Hiroyoshi Ando , Hidenori Yamaguchi , Katsuhiro Kawasaki
IPC分类号： H01J37/304 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , H01J2237/30433 , H01J2237/30455 , H01J2237/31796
摘要： A lithographic method and a lithographic apparatus ar disclosed in which the height of a silicon wafer making up an object of lithography is accurately measured. A lithographic apparatus such as an electron beam apparatus having a height-measuring instrument built therein is effectively used for forming a pattern on the order of submicrons.
摘要翻译： 公开了一种光刻方法和光刻设备，其中精确地测量了构成光刻对象的硅晶片的高度。 诸如其中内置有高度测量仪的电子束装置的光刻设备有效地用于形成亚微米级的图案。
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47.发明授权Pattern position detecting method and apparatus for detecting the position of an alignment direction of a wafer target pattern 失效用于检测晶片靶图案的取向方向的位置的图案位置检测方法和装置
公开(公告)号：US4777374A
公开(公告)日：1988-10-11
申请号：US868601
申请日：1986-05-30
CPC分类号： G03F9/70
摘要： A pattern position detecting method and an apparatus comprises spatial coherence variable means for illuminating a two-dimensional pattern formed on a wafer and its vicinity through a projection lens under the state that spatial coherence of pattern illumination light is elevated in one direction with respect to said two-dimensional pattern and lowered in the other direction perpendicular to said one direction. Two-dimensional reflection images from the pattern and its vicinity obtained through the lens are image-formed by an image-formation optical system. The intensity distribution of the two-dimensional reflection light is detected by light-intensity-distribution detection means so that a detection signal produced from this detection means indicates the position of the two-dimensional pattern.
摘要翻译： 图案位置检测方法和装置包括空间相干可变装置，用于在图案照明光的空间相干相对于所述图案照明光的一个方向升高的状态下通过投影透镜照射形成在晶片及其附近的二维图案 二维图案并且在垂直于所述一个方向的另一个方向上降低。 通过透镜获得的来自图案及其附近的二维反射图像由图像形成光学系统图像形成。 通过光强分布检测装置检测二维反射光的强度分布，使得从该检测装置产生的检测信号指示二维图案的位置。
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公开(公告)号：US4744666A
公开(公告)日：1988-05-17
申请号：US886044
申请日：1986-07-16
IPC分类号： G01N21/88 , G01N21/956 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/66 , H01L21/67 , H01L21/68 , G01B11/27
CPC分类号： G03F9/7065 , G03F9/7049
摘要： In an alignment detection optical system designed to observe an alignment pattern of a mask and an image of an alignment pattern of a wafer formed on the alignment pattern of the mask by a projection lens in a projection type aligner, there is provided a spatial filter designed to select only the reflected light having a desired reflection angle from the light reflected by the alignment pattern composed of steps formed on a surface of the wafer.
摘要翻译： 在设置成通过投影型对准器中的投影透镜观察掩模的对准图案和形成在掩模的取向图案上的晶片的对准图案的图像的对准检测光学系统中，设置有空间滤波器， 仅从由在晶片的表面上形成的台阶构成的对准图案反射的光仅选择具有期望的反射角的反射光。
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公开(公告)号：US4701050A
公开(公告)日：1987-10-20
申请号：US702329
申请日：1985-08-05
CPC分类号： G03F9/7049
摘要： A semiconductor focusing exposure apparatus in which an opposite face of a mask to a face to be illuminated by exposure light is illuminated with alignment light so that the light reflected from said opposite face may be used for alignment and which is equipped with a second moving arrangement which is separate from a moving arrangement for an x-y moving table supporting a wafer, for aligning the mask and the wafer in an orthogonal direction with respect to the optical axis of a focusing lens.Moreover, the center of the flux of alignment pattern light for illuminating the wafer is made incident upon a line of intersection on which a plane containing the optical axis of an alignment optical system and the optical axis of said focusing lens and the incident plane of said focusing lens intersect with each other.Still moreover, the optical path of the alignment light beam is aligned in parallel with a straight line joining an alignment mark formed on the diffraction pattern and the center of the entrance pupil of said focusing lens.
摘要翻译： 一种半导体聚焦曝光装置，其中掩模与被曝光的照明面相反的面被对准光照射，使得从所述相对面反射的光可以用于对准并且配备有第二移动装置 其与用于支撑晶片的xy移动台的移动装置分离，用于使掩模和晶片相对于聚焦透镜的光轴在正交方向上对准。 此外，用于照射晶片的对准图案光的光通量的中心入射到其中包含对准光学系统的光轴和所述聚焦透镜的光轴的平面与所述聚焦透镜的入射平面的交线上 聚焦镜片相互交叉。 此外，对准光束的光路与连接形成在衍射图案上的对准标记和聚焦透镜的入射光瞳的中心的直线平行排列。
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公开(公告)号：US4458302A
公开(公告)日：1984-07-03
申请号：US384679
申请日：1982-06-02
申请人： Masataka Shiba , Yoshitada Oshida
发明人： Masataka Shiba , Yoshitada Oshida
CPC分类号： G03F7/70358 , G02B19/0023 , G02B19/0047 , G02B19/0095
摘要： A reflection-type optical focusing apparatus comprising an optical focusing system including at least two 4th-degree surface reflectors with their revolving symmetric axis formed by a line connecting the position of a point source and the point source focusing position, said reflectors being used in combination so that the light emitted from a point source placed at the point source position is focused to form a virtual point source at the point source focusing position, and a 4th-degree surface reflector with its cross-section, on a plane including the revolving symmetric axis, forming a part of an ellipse with its major axis having a certain inclination with respect to the revolving symmetric axis, said virtual point source being located at one focal point of the ellipse so that a light image in the shape of an arc band is obtained.
摘要翻译： 一种反射型光学聚焦装置，包括光学聚焦系统，该光学聚焦系统包括至少两个4度的表面反射器，其旋转对称轴由连接点源的位置和点源聚焦位置的线形成，所述反射器被组合使用 使得从放置在点源位置的点源发射的光被聚焦以在点源聚焦位置处形成虚拟点源，并且在包括旋转对称的平面的平面上具有其横截面的4度表面反射器 轴，形成椭圆的一部分，其长轴相对于旋转对称轴具有一定倾角，所述虚拟点源位于椭圆的一个焦点处，使得弧形形状的光图像为 获得。
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