Fluoropolymer film made by printing
    41.
    发明申请
    Fluoropolymer film made by printing 审中-公开
    含氟聚合物膜通过印刷制成

    公开(公告)号:US20060134323A1

    公开(公告)日:2006-06-22

    申请号:US11312069

    申请日:2005-12-20

    Inventor: William O'Brien

    Abstract: Disclosed is a process for forming a patterned fluoropolymer film on a substrate by raised relief printing a fluoropolymer solution with a patterned raised relief printing plate, and drying the solvent from the solution to form the patterned fluoropolymer film. Such fluoropolymer films are useful as antireflective or hydrophobic layers on substrates used in optical displays.

    Abstract translation: 公开了一种通过用图案化的凸版印刷版凸起印刷含氟聚合物溶液并将溶剂从溶液中干燥以形成图案化的含氟聚合物膜而在基材上形成图案化的氟聚合物膜的方法。 这种含氟聚合物膜可用作光学显示器中使用的基板上的抗反射或疏水层。

    Substrates prepared by chemical amplification of self-assembled monolayers with spatially localized polymer brushes
    42.
    发明授权
    Substrates prepared by chemical amplification of self-assembled monolayers with spatially localized polymer brushes 有权
    通过化学扩增自组装单层与空间局部聚合物刷制备的底物

    公开(公告)号:US06780492B2

    公开(公告)日:2004-08-24

    申请号:US10074395

    申请日:2002-02-11

    Abstract: A method is disclosed for providing a patterned surface wherein predetermined regions of the surface are masked with a self-assembled monolayer (“SAM”) covalently bound to a brush polymer overlayer. The remainder of the substrate surface will generally be functionalized with a second self-assembled monolayer. Preferably, the method involves a microcontact printing technique, wherein a molecular moiety capable of spontaneously forming an SAM upon transfer to a surface is “stamped” onto a substrate surface, followed by growth (or covalent attachment) of a polymer on exposed functional groups within the SAM molecules. Coverage of surface regions with both an SAM and a polymer overlayer provides a number of advantages, particularly with regard to surface masking during etching and the like. The method is useful in the manufacture of microelectronic circuitry, biosensors, high-density assay plates, and the like.

    Abstract translation: 公开了一种用于提供图案化表面的方法,其中表面的预定区域被共价结合到刷式聚合物覆盖层上的自组装单层(“SAM”)掩蔽。 基底表面的其余部分通常将用第二自组装单层进行功能化。 优选地,该方法包括微接触印刷技术,其中能够在转移到表面时自发形成SAM的分子部分被“冲压”到基底表面上,随后在暴露的官能团上的聚合物的生长(或共价附着) SAM分子。 具有SAM和聚合物覆盖层的表面区域的覆盖提供了许多优点,特别是关于在蚀刻等期间的表面掩蔽。 该方法在制造微电子电路,生物传感器,高密度测定板等方面是有用的。

    Sonication of monolayer films
    44.
    发明授权

    公开(公告)号:US06540836B2

    公开(公告)日:2003-04-01

    申请号:US10161480

    申请日:2002-06-03

    CPC classification number: B82Y30/00 B05D1/283 B05D3/12 B82Y40/00

    Abstract: A process and apparatus for processing a monolayer film and transferring the monolayer film to a substrate are provided. In accordance with one embodiment of the present invention, a process for transferring a monolayer film to a substrate is provided comprising the steps of: (i) providing a water-based carrier media defining an upper surface; (ii) introducing process particles on the upper surface of the carrier media, wherein the molecules are dissolved in a solvent and the particles and the solvent are insoluble in the carrier media; (iii) evaporating the solvent such that a non-cohesive monolayer film of the particles is formed on the upper surface of the carrier media; (iv) decreasing a degree of void incorporation in the monolayer film of particles by compressing a dimension of the non-cohesive film along the upper surface of the carrier media, and sonicating the carrier media to form micro-bubbles in the carrier media, wherein the compression and the sonication contribute to a decreased degree of void incorporation in the film of process particles; and (v) transferring the film of particles to a surface of the substrate. The steps of compressing and sonicating may be executed concurrently.

    Substrates prepared by chemical amplification of self-assembled monolayers with spatially localized polymer brushes
    45.
    发明申请
    Substrates prepared by chemical amplification of self-assembled monolayers with spatially localized polymer brushes 有权
    通过化学扩增自组装单层与空间局部聚合物刷制备的底物

    公开(公告)号:US20020071943A1

    公开(公告)日:2002-06-13

    申请号:US10074395

    申请日:2002-02-11

    Abstract: A method is disclosed for providing a patterned surface wherein predetermined regions of the surface are masked with a self-assembled monolayer (nullSMAnull) covalently bound to a brush polymer overlayer. The remainder of the substrate surface will generally be functionalized with a second self-assembled monolayer. Preferably, the method involves a microcontact printing technique, wherein a molecular moiety capable of spontaneously forming an SMA upon transfer to a surface is nullstampednull onto a substrate surface, followed by growth (or covalent attachment) of a polymer on exposed functional groups within the SMA molecules. Coverage of surface regions with both an SMA and a polymer overlayer provides a number of advantages, particularly with regard to surface masking during etching and the like. The method is useful in the manufacture of microelectronic circuitry, biosensors, high-density assay plates, and the like.

    Abstract translation: 公开了一种用于提供图案化表面的方法,其中表面的预定区域被共价结合到刷式聚合物覆盖层上的自组装单层(“SMA”)被掩蔽。 基底表面的其余部分通常将用第二自组装单层进行功能化。 优选地,该方法包括微接触印刷技术,其中能够在转移到表面时自发形成SMA的分子部分被“冲压”到基底表面上,随后在暴露的官能团上的聚合物的生长(或共价附着) SMA分子。 具有SMA和聚合物覆盖层的表面区域的覆盖提供了许多优点,特别是关于在蚀刻等期间的表面掩蔽。 该方法在制造微电子电路,生物传感器,高密度测定板等方面是有用的。

    Method for transferring a nanolayer
    49.
    发明授权
    Method for transferring a nanolayer 有权
    转移纳米层的方法

    公开(公告)号:US08377243B2

    公开(公告)日:2013-02-19

    申请号:US12595314

    申请日:2008-04-11

    Abstract: The invention relates to a method for transferring a nano-layer (1) from a first substrate (5, 105) to a second substrate (30, 130), wherein the nano-layer (1) comprises a self-aggregating monolayer with cross-linked phenyl units and/or a mono-atomic graphite layer (graphene), wherein the method comprises the following steps: a. applying a transfer medium (20, 120) onto nano-layer (1), wherein in this step or afterwards the transfer medium (20, 120) is transformed from a liquid or gaseous phase in a solid phase; b. separating the transfer medium (20, 120) and the nano-layer (1) from the first substrate (5, 105); and c. applying the transfer medium (20, 120) and the nano-layer (1) onto the second substrate (30, 130); and d. removing the transfer medium (20, 120).

    Abstract translation: 本发明涉及一种将纳米层(1)从第一衬底(5,105)转移到第二衬底(30,130)的方法,其中所述纳米层(1)包括具有交叉的自聚集单层 连接的苯基单元和/或单原子石墨层(石墨烯),其中该方法包括以下步骤:a。 将转印介质(20,120)施加到纳米层(1)上,其中在该步骤中或之后,转移介质(20,120)从固相中的液相或气相转化; b。 从所述第一基板(5,105)分离所述转印介质(20,120)和所述纳米层(1); 和c。 将所述转印介质(20,120)和所述纳米层(1)施加到所述第二基板(30,130)上; 和d。 去除所述转印介质(20,120)。

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