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    Nano impression lithographic process which involves the use of a die having a region able to generate heat
    42.
    发明授权
    Nano impression lithographic process which involves the use of a die having a region able to generate heat 有权
    涉及使用具有能够产生热量的区域的模具的纳米压印平版印刷工艺

    公开(公告)号：US08409488B2

    公开(公告)日：2013-04-02

    申请号：US10562014

    申请日：2004-06-22

    Applicant: Tormen Massimo

    Inventor： Tormen Massimo

    IPC: B29C55/00

    CPC classification number: G03F7/0002 ,  B29C33/02 ,  B81C99/0085 ,  B81C2201/0153 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00

    Abstract: A lithographic process for forming a pattern in relief (20) on a mass (10) of polymeric material comprises the steps of: preparing the mass (10) of polymeric material and a die (12) having a surface region (14) facing towards the mass (10) of polymeric material and which reproduces in negative the pattern in relief (20); heating the die (12) and putting the mass (10) of polymeric material into contact with the die (12) in any temporal sequence, in such a way that the part of the mass (10) of polymeric material in contact with the surface zone (14) is subject to softening; and separating the die (12) from the mass (10) of polymeric material on the surface of which the pattern in relief (20) has been formed. The heating of at least one part of the die (12) is obtained by generation of thermal energy upon dissipation of another form of energy in at least one region (16) of the die (12).

    Abstract translation: 用于在聚合物材料（10）上形成浮雕（20）中的图案的平版印刷工艺包括以下步骤：制备聚合物材料块（10）和模具（12），所述模具（12）具有面向 聚合物材料的质量（10）并且以凹凸（20）的形式呈现为负值; 加热模具（12）并将聚合材料的质量块（10）以任何时间顺序与模具（12）接触，使得聚合材料质量（10）的与表面接触的部分 区域（14）容易软化; 以及将模具（12）与形成有凹凸图案（20）的表面上的聚合材料块（10）分离。 模具（12）的至少一部分的加热通过在模具（12）的至少一个区域（16）中消散另一形式的能量时产生热能而获得。

    Nano structure fabrication
    43.
    发明授权
    Nano structure fabrication 有权
    纳米结构制造

    公开(公告)号：US08252189B2

    公开(公告)日：2012-08-28

    申请号：US12468300

    申请日：2009-05-19

    Applicant: Kwangyeol Lee

    Inventor： Kwangyeol Lee

    IPC: B44C1/22 ,  C25F3/00 ,  H01L21/311 ,  B05D1/32

    CPC classification number: B29C33/3857 ,  B81C1/00031 ,  B81C2201/036

    Abstract: A method for manufacturing a nano structure includes forming a stamp having a line pattern on a surface thereof, positioning the stamp upon a substrate, forming at least one protruded portion in the substrate substantially corresponding to the line pattern of the stamp, forming a protective coating layer on at least a portion of the at least one protruded portion, and removing a portion of the substrate by etching at least another portion of the at least one protruded portion not covered with the protective coating layer.

    Abstract translation: 制造纳米结构的方法包括在其表面上形成具有线图案的印模，将印模定位在基板上，基本上对应于印模的线图案在基板上形成至少一个突出部分，形成保护涂层 在所述至少一个突出部分的至少一部分上，并且通过蚀刻所述至少一个未被所述保护涂层覆盖的突出部分的另一部分来移除所述基板的一部分。

    Plastic microchip for microparticle analysis and method for manufacturing the same
    45.
    发明申请
    Plastic microchip for microparticle analysis and method for manufacturing the same 审中-公开
    用于微粒分析的塑料微芯片及其制造方法

    公开(公告)号：US20070238164A1

    公开(公告)日：2007-10-11

    申请号：US11732979

    申请日：2007-04-05

    Applicant: Hyun Jin Kim

    Inventor： Hyun Jin Kim

    IPC: C12M1/34 ,  H01L21/00

    CPC classification number: G01N15/1484 ,  B01L3/502707 ,  B01L2200/12 ,  B81B2201/058 ,  B81C1/00119 ,  B81C2201/019 ,  B81C2201/036 ,  G01N15/1459 ,  G01N15/1463 ,  G01N2015/1486

    Abstract: Disclosed herein is a plastic microchip used in counting the number of microparticles and a method for manufacturing the same and, more particularly, to a plastic microchip including a negative microgrid pattern formed on a lower substrate, a solvent channel and solvent inlets for a solvent welding process, and a method for manufacturing the plastic microchip by injection molding the lower substrate on which a negative microgrid pattern is formed and by injecting a solvent through the solvent inlets so as to fix an upper substrate to the lower substrate.According to the present invention, it is possible to form a microgrid pattern of a relatively narrow width deeply and uniformly as a negative microgrid pattern is formed on the lower substrate and thereby to provide a clear microgrid pattern, thus facilitating accurate observation of microparticles. Moreover, it is also possible to provide a uniform height of an injection chamber by welding an upper substrate and a lower substrate to each other by a solvent welding process, thus ensuring a more accurate analysis result.

    Abstract translation: 本文公开了用于计数微粒数量的塑料微芯片及其制造方法，更具体地，涉及一种塑料微芯片，其包括形成在下基板上的负微阵列图案，溶剂通道和用于溶剂焊接的溶剂入口 工艺，以及通过注射模制形成负微型格栅图案的下基板并通过溶剂入口注入溶剂以将上基板固定到下基板来制造塑料微芯片的方法。 根据本发明，由于在下基板上形成负的微格栅图案，所以可以深度均匀地形成相对较窄宽度的微网格图案，从而提供清晰的微网格图案，从而有助于微粒的准确观察。 而且，也可以通过溶剂焊接工艺将上部基板和下部基板相互焊接来提供喷射室的均匀高度，从而确保更准确的分析结果。

    Microfluidic device and manufacture thereof
    47.
    发明授权
    Microfluidic device and manufacture thereof 有权
    微流控装置及其制造

    公开(公告)号：US06769444B2

    公开(公告)日：2004-08-03

    申请号：US10454985

    申请日：2003-06-04

    Applicant: Guillaume Guzman ,  Jean-Pierre Themont

    Inventor： Guillaume Guzman ,  Jean-Pierre Themont

    IPC: F15C106

    CPC classification number: B81C1/00119 ,  B01L3/5027 ,  B33Y70/00 ,  B33Y80/00 ,  B81B2201/058 ,  B81B2203/0353 ,  B81C1/00071 ,  B81C2201/019 ,  B81C2201/036 ,  C03B19/063 ,  C03B23/20 ,  Y10T137/0391 ,  Y10T137/0402 ,  Y10T137/2224 ,  Y10T137/6416

    Abstract: The present invention relates to microfluidic devices and to their method of manufacture. The microfluidic devices are original by their specific structure (of sandwich type) and by the materials from which they are made (mainly glasses, glass ceramics, ceramics), and also by their specific method of manufacture, which is based on a vacuum-forming operation. The microfluidic device includes a first assembly including a microstructure and a first substrate, wherein the microstructure is constructed and arranged on the substrate under vacuum. A second assembly includes a second substrate positioned on the microstructure after the first assembly is presintered and adhered thereto by heat treatment to form a one-piece microstructure defining at least one recess between the first and second substrates.

    Abstract translation: 本发明涉及微流体装置及其制造方法。 微流体装置通过它们的具体结构（夹心型）和它们制备的材料（主要是玻璃，玻璃陶瓷，陶瓷）以及它们的具体制造方法是原始的，其基于真空成形 操作。 微流体装置包括包括微结构和第一基底的第一组件，其中微结构在真空下构造和布置在基底上。 第二组件包括位于微结构体上的第二衬底，该第一衬底经预热烧结并通过热处理粘附在微结构上，以形成限定第一和第二衬底之间的至少一个凹部的一体式微结构。

    Nano-size imprinting stamp using spacer technique
    48.
    发明授权
    Nano-size imprinting stamp using spacer technique 有权
    使用间隔技术的纳米尺寸印记邮票

    公开(公告)号：US06743368B2

    公开(公告)日：2004-06-01

    申请号：US10062952

    申请日：2002-01-31

    Applicant: Heon Lee

    Inventor： Heon Lee

    IPC: B32B300

    CPC classification number: B29C59/022 ,  B29C2059/023 ,  B81C99/009 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T428/24479 ,  Y10T428/2457 ,  Y10T428/24579 ,  Y10T428/24595

    Abstract: A wide-area nano-size imprinting stamp is disclosed. The wide-area nano-size imprinting stamp includes a substrate having a base surface upon which is formed a plurality of micro-features. Each micro-feature includes a plurality of spacers disposed on opposed side surfaces thereof. The spacers extend laterally outward of the opposed side surfaces and the micro-features and the spacers extend outward of the base surface. The micro-features and the spacers are selectively etched to differing heights to define an imprint stamp having an imprint profile. The imprint stamps can be formed on substantially all of a useable area of the substrate and can have complex shapes that vary among the imprint stamps. The imprint stamps can be used as a template for transferring the imprint profile to a mask layer in which the imprint profile will be replicated.

    Abstract translation: 公开了一种广域纳米尺寸印记。 广域纳米尺寸压印印模包括具有基面的基底，在其上形成多个微特征。 每个微特征包括设置在其相对侧表面上的多个间隔物。 间隔件在相对的侧表面的横向外侧延伸，并且微特征和间隔件从基部表面向外延伸。 微特征和间隔物被选择性地蚀刻到不同的高度以限定具有印记轮廓的压印印模。 压印邮票可以形成在基板的基本上所有的可用区域上，并且可以具有在压印邮票之间变化的复杂形状。 印记戳可用作模板，用于将压印轮廓传送到掩模层，在该掩模层中可以复制压印轮廓。

    Method of patterning the surface of an article using positive microcontact printing
    49.
    发明申请
    Method of patterning the surface of an article using positive microcontact printing 有权
    使用正微接触印刷图案化制品表面的方法

    公开(公告)号：US20040102050A1

    公开(公告)日：2004-05-27

    申请号：US10307069

    申请日：2002-11-27

    Applicant: International Business Machines Corporation

    Inventor： Emmanuel Delamarche ,  Matthias Geissler ,  Heiko Wolf

    IPC: H01L021/461

    CPC classification number: G03F7/0002 ,  B81C1/0046 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C23F1/02

    Abstract: A method is disclosed of patterning the surface of an object. The method comprises the steps of providing an object comprising a substrate having at least one layer formed thereon; forming a first SAM on the layer according to a desired pattern of a first material capable of binding to the layer; forming a second SAM of a second material on a region of the layer that is not covered by the first SAM, in a configuration that is complementary to the desired pattern; and etching the layer through the first SAM. The first material is selected to prevent the formation of the second SAM on the first SAM and to substantially not block the etching of an underlying region of the layer therethrough.

    Abstract translation: 公开了对物体的表面进行图案化的方法。 该方法包括以下步骤：提供包括其上形成有至少一层的基板的物体; 根据能够结合所述层的第一材料的期望图案，在所述层上形成第一SAM; 在所述层的未被所述第一SAM覆盖的区域上形成与所述图案互补的构造的第二材料的第二SAM; 并通过第一SAM蚀刻该层。 选择第一材料以防止在第一SAM上形成第二SAM，并且基本上不阻挡通过其中的层的下部区域的蚀刻。

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