PATTERN TRANSFER APPARATUS AND PATTERN TRANSFER METHOD
    4.
    发明申请
    PATTERN TRANSFER APPARATUS AND PATTERN TRANSFER METHOD 审中-公开
    图案转印装置和图案转印方法

    公开(公告)号:US20120256353A1

    公开(公告)日:2012-10-11

    申请号:US13414959

    申请日:2012-03-08

    摘要: A pattern transfer apparatus for pressing a mold having a fine concave/convex pattern onto a transferred material, peeling off the mold from the transferred material, and transferring the concave/convex pattern onto a surface of the transferred material includes: a pretreatment mechanism configured to perform a predetermined surface treatment to at least one of the mold and the transferred material before the concave/convex pattern is transferred; an information recording mechanism configured to record information of the surface treatment performed by the pretreatment mechanism at a position associated with an area of the transferred material where the concave/convex pattern is transferred onto the area; an interpretation mechanism configured to read the recorded information; and an after-treatment mechanism configured to perform a predetermined after-treatment to the area where the concave/convex pattern is transferred, based on the information interpreted by the interpretation mechanism.

    摘要翻译: 一种图案转印装置,用于将具有精细凹凸图案的模具压印到转印材料上,从转印材料上剥离模具,并将凹凸图案转印到转印材料的表面上,包括:预处理机构,被配置为 在传递凹凸图案之前,对模具和转印材料中的至少一个进行预定的表面处理; 信息记录机构,被配置为将所述预处理机构执行的表面处理的信息记录在与将所述凹凸图案转印到所述区域上的被转印材料的区域相关联的位置处; 解释机构,被配置为读取所记录的信息; 以及后处理机构,其被配置为基于由所述解释机构解释的信息对所述凹凸图案被传送的区域进行预定的后处理。

    IMPRINT APPARATUS AND METHOD FOR FINE STRUCTURE LITHOGRAPHY
    5.
    发明申请
    IMPRINT APPARATUS AND METHOD FOR FINE STRUCTURE LITHOGRAPHY 有权
    用于精细结构光刻的印刷装置和方法

    公开(公告)号:US20090166914A1

    公开(公告)日:2009-07-02

    申请号:US12343550

    申请日:2008-12-24

    IPC分类号: B29C59/04

    摘要: An imprint apparatus for forming fine structure lithography comprises: a belt-like mold having a fine structure for imprint lithography formed on a surface of the belt-like mold; a cylindrical pressurizing mechanism including a pair of opposed rolls for pressurizing the belt-like mold against the surface of the imprinting object; and a supporting member for supporting the imprinting object at a position between the rolls of the cylindrical pressurizing mechanism. The belt-like mold, the imprinting object and the supporting member are configured to move to the cylindrical pressurizing mechanism in a mutually non-contact state, and then at the position between the rolls, be pressurized by the cylindrical pressurizing mechanism in a state where the imprinting object is positioned between the belt-like mold and the supporting member.

    摘要翻译: 用于形成精细结构光刻的压印装置包括:在带状模具的表面上形成具有用于压印光刻的精细结构的带状模具; 圆柱形加压机构,包括一对相对的辊,用于将带状模具压靠在压印对象的表面上; 以及用于将压印对象支撑在圆筒形加压机构的辊之间的位置处的支撑构件。 带状模具,压印对象物和支撑构件被构造成在相互非接触状态下移动到圆柱形加压机构,然后在辊之间的位置被圆柱形加压机构加压, 压印对象位于带状模具和支撑构件之间。

    Semiconductor film formation device
    8.
    发明授权
    Semiconductor film formation device 有权
    半导体成膜装置

    公开(公告)号:US07740703B2

    公开(公告)日:2010-06-22

    申请号:US10803087

    申请日:2004-03-18

    CPC分类号: C23C16/46 C30B25/10 C30B25/16

    摘要: A semiconductor film formation device has: a reaction vessel that includes a gas flow path to allow source gas to pass through and a substrate mount site provided in the gas flow path to mount a substrate; a temperature control means that is disposed opposite to the substrate mount site and close to the reaction vessel to control the internal temperature of the reaction vessel; and a thermal conductivity adjusting member that is disposed between the reaction vessel and the temperature control means. The thermal conductivity adjusting member has a section with a thermal conductivity different from the other section along the gas flow path.

    摘要翻译: 半导体膜形成装置具有:包括允许源气体通过的气体流路和设置在气体流路中的基板安装位置以安装基板的反应容器; 温度控制装置,其与基板安装位置相对设置并且靠近反应容器以控制反应容器的内部温度; 以及设置在反应容器和温度控制装置之间的导热性调节构件。 导热性调节构件具有沿着气体流动路径具有不同于另一部分的热导率的截面。

    Imprint apparatus and method for fine structure lithography
    10.
    发明授权
    Imprint apparatus and method for fine structure lithography 有权
    用于精细结构光刻的印刷装置和方法

    公开(公告)号:US08147234B2

    公开(公告)日:2012-04-03

    申请号:US12343550

    申请日:2008-12-24

    IPC分类号: B29C59/04

    摘要: An imprint apparatus for forming fine structure lithography comprises: a belt-like mold having a fine structure for imprint lithography formed on a surface of the belt-like mold; a cylindrical pressurizing mechanism including a pair of opposed rolls for pressurizing the belt-like mold against the surface of the imprinting object; and a supporting member for supporting the imprinting object at a position between the rolls of the cylindrical pressurizing mechanism. The belt-like mold, the imprinting object and the supporting member are configured to move to the cylindrical pressurizing mechanism in a mutually non-contact state, and then at the position between the rolls, be pressurized by the cylindrical pressurizing mechanism in a state where the imprinting object is positioned between the belt-like mold and the supporting member.

    摘要翻译: 用于形成精细结构光刻的压印装置包括:在带状模具的表面上形成具有用于压印光刻的精细结构的带状模具; 圆柱形加压机构,包括一对相对的辊,用于将带状模具压靠在压印对象的表面上; 以及用于将压印对象支撑在圆筒形加压机构的辊之间的位置处的支撑构件。 带状模具,压印对象物和支撑构件被构造成在相互非接触状态下移动到圆柱形加压机构,然后在辊之间的位置被圆柱形加压机构加压, 压印对象位于带状模具和支撑构件之间。