公开(公告)号：US5856065A

公开(公告)日：1999-01-05

申请号：US800319

申请日：1997-02-14

Applicant: Sigurd Guenter Hagen

Inventor： Sigurd Guenter Hagen

IPC: G03F7/004 ,  C08K3/10 ,  C08K5/09 ,  C08K5/54 ,  C08L79/08 ,  G03F7/027 ,  G03F7/028 ,  G03F7/037 ,  G03F7/038 ,  G03F7/075 ,  G03F7/40 ,  H01L21/027 ,  G03F7/30

CPC classification number: G03F7/0387 ,  G03F7/037

Abstract: Negative working photoresist compositions containing:a) a polyimide primer containing recurring structural units of formula (I) in the specification as well asb) a photoinitiator for polymerizing olefin double bonds, which are characterized by in that they containat least one other component c), which is selected from the group consisting ofc1) organosilicon compounds with one or more hydroxyl groups,c2) compounds of formula (IIa) in the specification,c3) compounds of formula (IIb) as in the specification,c4) mixtures comprised of two or more components selected from components of c1), c2) and c3),have the advantage that they can be developed with a developer, which comprises up to 50 to 100 wt. % of an aqueous-alkaline medium, whereby the balance to 100 wt. % is formed by one or more organic solvents.

Abstract translation: 负性工作光致抗蚀剂组合物，其包含：a）在说明书中含有式（I）的重复结构单元的聚酰亚胺引物以及b）用于聚合烯烃双键的光引发剂，其特征在于它们含有至少一种其它组分c ），其选自c1）具有一个或多个羟基的有机硅化合物，c2）说明书中式（IIa）化合物，c3）如说明书中的式（IIb）化合物，c4）包含的混合物 的两种或更多种选自c1），c2）和c3）组分的组分具有的优点是它们可以用显影剂显影，显影剂包含至多50至100wt。 ％的水性 - 碱性介质，其中余量为100wt。 ％由一种或多种有机溶剂形成。

公开(公告)号：US5688632A

公开(公告)日：1997-11-18

申请号：US277922

申请日：1994-07-20

Applicant: Shigetora Kashio ,  Katsutoshi Sasashita ,  Tomio Adachi

Inventor： Shigetora Kashio ,  Katsutoshi Sasashita ,  Tomio Adachi

IPC: G03F7/037 ,  G03C1/73

CPC classification number: G03F7/037

Abstract: This invention relates to a photosensitive polymer composition containing as essential components (A) a soluble polymer, (B) a photopolymerizable compound having an ethylenic double bond in the molecule there of and (C) a photopolymerization initiator, the soluble polymer comprising a water-soluble polymer and an alcohol-soluble polymer, the composition having a sea-and-islands structure comprising sea containing the water-soluble polymer as a main component and islands containing the alcohol-soluble polymer as a main component, and the islands are independently in the form of sphere or oval having a diameter of 0.1 to 20 microns. The photosensitive polymer composition affords a printing plate having high image reproducibility and water-developability and capable of withstanding the coating of an aqueous polymer according to a printing method.

Abstract translation: 本发明涉及一种感光性聚合物组合物，其含有（A）可溶性聚合物，（B）在其分子中具有烯属双键的光聚合性化合物，（C）光聚合引发剂，所述可溶性聚合物包含水溶性聚合物， 可溶性聚合物和醇可溶性聚合物，所述组合物具有海岛结构，其包含含有水溶性聚合物作为主要成分的海藻和包含醇可溶性聚合物作为主要成分的岛，岛独立地在 直径为0.1至20微米的球形或卵形的形式。 感光性聚合物组合物提供具有高图像再现性和显色性的印刷版，并能够耐受根据印刷方法的水性聚合物的涂布。

公开(公告)号：US4696876A

公开(公告)日：1987-09-29

申请号：US862022

申请日：1986-05-12

Applicant: John J. Cael

Inventor： John J. Cael

IPC: G03F7/031 ,  G03F7/037 ,  G03C1/70 ,  G03C9/08

CPC classification number: G03F7/031 ,  G03F7/037 ,  Y10S430/12 ,  Y10S430/127 ,  Y10S430/146

Abstract: Novel photopolymerizable compositions are provided which comprise a dye sensitizer, a linear polyethylenimine as a polymerization initiator and a free radical polymerizable ethylenic unsaturated monomer.In the preferred embodiments, the linear polyethylenimine is used in combination with lithium acrylate.

Abstract translation: 提供了新的可光聚合组合物，其包含染料敏化剂，作为聚合引发剂的线性聚乙烯亚胺和可自由基聚合的烯属不饱和单体。 在优选的实施方案中，线性聚乙烯亚胺与丙烯酸锂组合使用。

公开(公告)号：US4661435A

公开(公告)日：1987-04-28

申请号：US828093

申请日：1986-02-10

Applicant: Lourens Minnema ,  Johan M. van der Zande

Inventor： Lourens Minnema ,  Johan M. van der Zande

IPC: G03F7/26 ,  C08F290/00 ,  C08F299/00 ,  C08F299/02 ,  C08G73/00 ,  C08G73/10 ,  G03C5/00 ,  G03F7/037 ,  G03F7/038 ,  G03F7/40 ,  G03C5/16

CPC classification number: G03F7/0387 ,  G03F7/037

Abstract: A photosensitive polyamic acid derivative, compounds used in the manufacture of the derivative, method of manufacturing a polyimide pattern on a substrate, and semiconductor device comprising a polyimide pattern obtained by using the said method.

Abstract translation: 感光性聚酰胺酸衍生物，用于制造衍生物的化合物，在基材上制造聚酰亚胺图案的方法，以及包含通过使用所述方法获得的聚酰亚胺图案的半导体器件。

公开(公告)号：US4369247A

公开(公告)日：1983-01-18

申请号：US334163

申请日：1981-12-24

Applicant: David L. Goff ,  Edward L. Yuan ,  Stephen Proskow

Inventor： David L. Goff ,  Edward L. Yuan ,  Stephen Proskow

IPC: C08F290/14 ,  G03F7/037 ,  H01L21/312 ,  G03C5/00

CPC classification number: C08F290/145 ,  G03F7/037 ,  H01L21/312

Abstract: An improved process for forming relief structures on electrical devices such as capacitors, integrated circuits, printed circuits and semiconductors; a solution of a composition a polymeric heat resistant photopolymerizable composition of a polyamide ester resin containing photopolymerizable groups is applied to substrate such as a coated silicon wafer, which forms the base an electrical device, and is dried to form a film, the film is exposed to radiation through a pattern and photopolymerized; the unexposed and unpolymerized part of the film is dissolved off and the resulting relief structure is converted to a polyimide structure having a sharp definition and good mechanical, chemical and electrical properties; to reduce radiation exposure time and increase the rate of photopolymerization the following constituents are used in the composition:a radiation sensitive polymerizable polyfunctional acrylate compound and a photopolymerization initiator of an aromatic biimidazole.

Abstract translation: 用于在诸如电容器，集成电路，印刷电路和半导体的电气装置上形成浮雕结构的改进方法; 将包含可光聚合基团的聚酰胺酯树脂的聚合物耐热可光聚合组合物的组合物溶液施加到基底上，例如形成基底的电子器件的被覆硅晶片，并干燥以形成膜，该膜暴露 通过图案辐射和光聚合; 将未曝光和未聚合的薄膜部分溶解掉，将得到的浮雕结构转变成具有清晰清晰度和良好机械，化学和电学性能的聚酰亚胺结构; 为了减少辐射暴露时间并增加光聚合速率，在组合物中使用以下成分：辐射敏感的可聚合多官能丙烯酸酯化合物和芳族联咪唑的光聚合引发剂。

公开(公告)号：US4323639A

公开(公告)日：1982-04-06

申请号：US202381

申请日：1980-07-24

Applicant: Kazumasa Chiba ,  Keiichi Egawa ,  Toshio Muraki

Inventor： Kazumasa Chiba ,  Keiichi Egawa ,  Toshio Muraki

IPC: G03F7/037 ,  G03C1/68

CPC classification number: G03F7/037

Abstract: A photosensitive resin composition comprising a polyamide containing 10 to 70% by weight of a polyoxyethylene segment or poly(oxyethylene/oxypropylene) copolymer segment having a number average molecular weight of from 150 to 1,500 in its molecular chain, and a photopolymerizable unsaturated compound. This composition exhibits excellent flexibility and water- and alcohol-developability, and results in a printing plate exhibiting excellent transparency, toughness and printing durability.

Abstract translation: 一种感光性树脂组合物，其包含含有10〜70重量％的分子链中数均分子量为150〜1500的聚氧乙烯链段或聚（氧乙烯/氧丙烯）共聚物链段的聚酰胺和光聚合性不饱和化合物。 该组合物显示出优异的柔软性和水和醇显影性，并且导致显示出优异的透明性，韧性和印刷耐久性的印刷版。

公开(公告)号：US4316974A

公开(公告)日：1982-02-23

申请号：US104050

申请日：1979-12-17

Applicant: Kaoru Ohmura ,  Ichiro Shibasaki ,  Takeo Kimura

Inventor： Kaoru Ohmura ,  Ichiro Shibasaki ,  Takeo Kimura

IPC: C08G73/14 ,  G03F7/037 ,  G03F7/038 ,  C08G73/10 ,  C08F8/00

CPC classification number: C08G73/14 ,  G03F7/037 ,  G03F7/0387

Abstract: An organic polar solvent-soluble aromatic polyamide-imide having therein aromatic nuclei linked at their respective 1 - and 3 - positions and having therein amide linkages and terminal groups unsubstituted or partially substituted with acrylate or methacrylate groups is found to impart excellent heat resistance and insulating property to a photoresist composition produced therefrom.

Abstract translation: 其中具有芳香族核的有机极性溶剂可溶性芳族聚酰胺 - 酰亚胺在其相应的1和3位上连接并且具有未取代或部分被丙烯酸酯或甲基丙烯酸酯基团取代的酰胺键和端基的化合物被发现赋予优异的耐热性和绝缘性 性质由其制备的光致抗蚀剂组合物。

公开(公告)号：US4145222A

公开(公告)日：1979-03-20

申请号：US781307

申请日：1977-03-25

Applicant: Kuniomi Etoh ,  Masaru Nanpei

Inventor： Kuniomi Etoh ,  Masaru Nanpei

IPC: C08F283/04 ,  G03F7/037 ,  G03C1/68

CPC classification number: G03F7/037 ,  Y10S430/107

Abstract: A photosensitive resin composition which comprises a polymer having a basic nitrogen atom in the main or side chain, which is represented by the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are each a hydrogen atom or a substituted or unsubstituted hydrocarbon group, at least one of R.sub.1 to R.sub.3 representing a polymeric chain, a photopolymerizable unsaturated monomer and a photosensitizer.

Abstract translation: 一种感光性树脂组合物，其包含在主链或侧链具有碱性氮原子的聚合物，其由下式表示：其中R 1，R 2和R 3各自为氢原子或取代或未取代的烃基， 代表聚合物链的R1至R3中的至少一个，可光聚合的不饱和单体和光敏剂。

公开(公告)号：US12060317B2

公开(公告)日：2024-08-13

申请号：US17331869

申请日：2021-05-27

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Masahiro Fukushima ,  Satoshi Watanabe ,  Ryosuke Taniguchi ,  Naoya Inoue

IPC: G03F7/004 ,  C07C303/32 ,  C07C309/06 ,  C07C309/19 ,  C07C309/24 ,  C07C381/12 ,  G03F1/22 ,  G03F7/037 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26

CPC classification number: C07C381/12 ,  C07C303/32 ,  C07C309/06 ,  C07C309/19 ,  C07C309/24 ,  G03F1/22 ,  G03F7/0045 ,  G03F7/037 ,  G03F7/0382 ,  G03F7/2004 ,  G03F7/26

Abstract: An onium salt having a partial structure of formula (A) is provided wherein Ra1 and Ra2 are hydrogen or a C1-C10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH2— may be replaced by —O— or —C(═O)—, both Ra1 and Ra2 are not hydrogen at the same time, Ra1 and Ra2 may bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

公开(公告)号：US20230359122A1

公开(公告)日：2023-11-09

申请号：US17919664

申请日：2021-04-19

Applicant: HD Microsystems, Ltd.

Inventor： Atsutaro YOSHIZAWA ,  Akira ASADA

IPC: G03F7/20 ,  G03F7/028 ,  G03F7/037 ,  G03F7/00

CPC classification number: G03F7/037 ,  G03F7/0035 ,  G03F7/028 ,  G03F7/2002

Abstract: A photosensitive resin composition comprising (A) a polyimide precursor having a polymerizable unsaturated bond; (B) a polymerizable monomer having an alicyclic skeleton; (C) a photopolymerization initiator; and (D) one or more compounds selected from the group consisting of tetrazole and a tetrazole derivative.