公开(公告)号：US20060221474A1

公开(公告)日：2006-10-05

申请号：US10546517

申请日：2004-09-07

Applicant: Kyoko Imai ,  Kenji Ando ,  Hidehiro Kanazawa

Inventor： Kyoko Imai ,  Kenji Ando ,  Hidehiro Kanazawa

IPC: G02B5/08

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/283 ,  G03F7/70891 ,  G03F7/70958 ,  G03F7/70983 ,  G21K2201/065

Abstract: To provide an optical thin film structure capable of efficiently dissipating heat in an optical thin film which is generated upon irradiating a surface of an X-ray mirror made up of the optical thin film with an X-ray. The optical thin film having an isotope purity higher than a natural isotope abundance ratio is formed on a mirror to increase heat conductivity of the optical thin film itself and quickly dissipate heat accumulated in the thin film to the outside of an optical system. Consequently, the mirror having high reflectively can be obtained, in which a fine structure of the optical thin film is by no means broken.

Abstract translation: 提供能够在用X射线照射由该光学薄膜构成的X射线镜的表面上产生的光学薄膜中有效散发热的光学薄膜结构。 在反射镜上形成具有高于天然同位素丰度比的同位素纯度的光学薄膜，以提高光学薄膜本身的导热性，并将薄膜中累积的热量迅速地散发到光学系统的外部。 因此，可以获得高反射率的反射镜，其中光学薄膜的精细结构绝不破裂。

公开(公告)号：US20050199829A1

公开(公告)日：2005-09-15

申请号：US10900839

申请日：2004-07-27

Applicant: William Partlo ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  David Myers ,  Ian Oliver ,  John Viatella ,  Robert Jacques

Inventor： William Partlo ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  David Myers ,  Ian Oliver ,  John Viatella ,  Robert Jacques

IPC: G03F7/20 ,  G21K1/06 ,  H01J35/20 ,  H05G2/00 ,  H01J65/04

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

公开(公告)号：US20050073663A1

公开(公告)日：2005-04-07

申请号：US10647376

申请日：2003-08-26

Applicant: Yoshikazu Miyajima

Inventor： Yoshikazu Miyajima

IPC: G02B5/10 ,  G02B17/00 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  G03B27/52

CPC classification number: G21K1/06 ,  G02B7/1815 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

Abstract: A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for radiation-cooling provided in positions away from an outer surface of the mirror. The radiation plates are provided so as to ensure a passage area for the exposure light incident on and reflected from the reflection surface of the mirror. Further, the respective radiation plates are temperature-controlled by cooling liquid flowing through cooling pipes. Thus the temperature rise of the mirror used in the reflection optical system of the exposure apparatus can be suppressed, and the accuracy of surface form of the mirror reflection surface can be maintained.

Abstract translation: 用于通过反射引导曝光来进行曝光处理的曝光装置的反射光学系统的反射镜装置具有反射面，以反射曝光光的反射镜和设置在远离位置的辐射冷却用辐射板 从镜子的外表面。 辐射板被设置成确保入射到反射镜的反射表面上并从其反射的曝光光的通过区域。 此外，通过冷却流经冷却管的液体对各个辐射板进行温度控制。 因此，可以抑制在曝光装置的反射光学系统中使用的反射镜的温度升高，并且可以保持镜面反射面的表面形状的精度。

公开(公告)号：US06806006B2

公开(公告)日：2004-10-19

申请号：US10064441

申请日：2002-07-15

Applicant: Michael J. Lercel ,  Dhirendra Prasad Mathur

Inventor： Michael J. Lercel ,  Dhirendra Prasad Mathur

IPC: G03F900

CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/38 ,  G03F7/70875 ,  G21K2201/065 ,  Y10T428/1317

Abstract: The current invention provides a method and apparatus that minimizes the destructive effects of non-reflected energy during lithography. More specifically, a cooling system is located within the mask. In one example, a cooling module is integrated into the EUV mask. The cooling module may be thermoelectric. The EUV mask comprises a substrate structure as a base for a reticle, a cooling layer, which is formed on the substrate structure and a planarizing layer deposited on the cooling layer. In another example, a cooling channel is formed within the mask.

Abstract translation: 本发明提供了一种在光刻期间使无反射能量的破坏作用最小化的方法和装置。 更具体地，冷却系统位于掩模内。 在一个示例中，将冷却模块集成到EUV掩模中。 冷却模块可以是热电。 EUV掩模包括作为掩模版的基底的衬底结构，形成在衬底结构上的冷却层和沉积在冷却层上的平坦化层。 在另一示例中，在掩模内形成冷却通道。

公开(公告)号：US20040065817A1

公开(公告)日：2004-04-08

申请号：US10625254

申请日：2003-07-23

Applicant: Carl Zeiss SMT AG

Inventor： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Jochen Wietzorrek ,  Frank Melzer ,  Johannes Wangler

IPC: G01J001/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B5/09 ,  G02B17/006 ,  G02B19/0014 ,  G02B19/0019 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70825 ,  G21K2201/065 ,  G21K2201/067

Abstract: There is provided a collector for illumination systems for light having a wavelength null193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract translation: 提供了一种用于具有波长<= 193nm的光的照明系统的收集器。 收集器包括（a）第一反射镜壳体，其围绕公共旋转轴线邻近第二反射镜壳体并位于其内部，其中第一和第二反射镜壳体旋转对称，以及（b）区域中的部件 在第一和第二镜壳之间。 收集器用于经由物体侧孔口接收来自光源的光并且用于照射图像侧平面中的区域，并且该区域不被光使用。

公开(公告)号：US20180307142A1

公开(公告)日：2018-10-25

申请号：US16011019

申请日：2018-06-18

Applicant: Carl Zeiss SMT GmbH

Inventor： Peter Huber

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/7015 ,  G03F1/24 ,  G03F1/84 ,  G03F7/70316 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/065

Abstract: A reflective optical element, in particular for a microlithographic projection exposure apparatus or a mask inspection apparatus. According to one aspect, the reflective optical element has an optically effective surface, a substrate (405, 505), a reflection layer system (410, 510) and at least one porous outgassing layer (450, 550), which at least intermittently releases particles adsorbed in the outgassing layer (450, 550) when the optically effective surface (400a, 500a) is irradiated by electromagnetic radiation.

公开(公告)号：US09635749B2

公开(公告)日：2017-04-25

申请号：US14995398

申请日：2016-01-14

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sung-Joo Kim ,  Jin-Seok Heo ,  Do-Hyun Seo ,  Da-Hae Lee ,  Jae-Pil Lee ,  Sung-Jo Hwang

IPC: H05G2/00 ,  H01S3/223

CPC classification number: H05G2/006 ,  G21K2201/065 ,  H01S3/2232 ,  H05G2/005 ,  H05G2/008

Abstract: An apparatus for generating extreme ultraviolet light includes a droplet generator which provides a droplet to react with light from a light source to generate extreme ultraviolet light, a droplet collector which collects the droplet, and a droplet detector which includes a plurality of pressure sensors, the pressure sensors detect a position of the droplet provided to the droplet collecting unit.

公开(公告)号：US09544985B2

公开(公告)日：2017-01-10

申请号：US14803920

申请日：2015-07-20

Applicant: Jin-Seok Heo ,  Jin-Hong Park

Inventor： Jin-Seok Heo ,  Jin-Hong Park

IPC: A61N5/06 ,  H05G2/00 ,  G21K1/06 ,  G03F7/20 ,  B05B12/12

CPC classification number: H05G2/008 ,  B05B12/12 ,  G03F7/70033 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  H05G2/005

Abstract: Provided is an apparatus for generating extreme ultraviolet light. The apparatus includes a collector mirror unit, a gas supply unit configured to supply a processing gas to the collector mirror unit, a gas supply nozzle arranged in at least one area of the collector mirror unit and configured to supply the processing gas to a surface of the collector mirror unit, and a controller configured to adjust a shape of a spray hole of the gas supply nozzle. The shape of the spray hole may be changed according to a control operation of the controller.

Abstract translation: 提供一种用于产生极紫外光的装置。 该装置包括收集反射镜单元，被配置为向收集反射镜单元供应处理气体的气体供给单元，设置在收集反射镜单元的至少一个区域中并被配置为将处理气体供应到 收集器反射镜单元和被配置为调节气体供应喷嘴的喷射孔的形状的控制器。 可以根据控制器的控制操作来改变喷孔的形状。

公开(公告)号：US09105367B2

公开(公告)日：2015-08-11

申请号：US14514277

申请日：2014-10-14

Applicant: Phoseon Technology, Inc.

Inventor： Doug Childers

IPC: G21K5/00 ,  C03C25/12 ,  F26B13/00 ,  G21K1/06

CPC classification number: G21K5/00 ,  C03C25/12 ,  F26B3/28 ,  F26B13/00 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065

Abstract: A device for UV curing a coating or printed ink on a workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

Abstract translation: 用于在诸如光纤的工件上UV涂覆或印刷油墨的装置包括布置成具有共同定位焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。

公开(公告)号：US08258485B2

公开(公告)日：2012-09-04

申请号：US12807165

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: H01J37/20

CPC classification number: G21K1/067 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract translation: 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束照射目标部分中的氙液体。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。