公开(公告)号：US06844994B2

公开(公告)日：2005-01-18

申请号：US09956715

申请日：2001-09-19

申请人： Frank Melzer ,  Michael Mühlbeyer ,  Bernhard Gellrich ,  Franz Sorg ,  Stefan Xalter ,  Thomas Ittner

发明人： Frank Melzer ,  Michael Mühlbeyer ,  Bernhard Gellrich ,  Franz Sorg ,  Stefan Xalter ,  Thomas Ittner

IPC分类号： G02B26/00 ,  G02B5/10 ,  G02B13/24 ,  G02B26/06 ,  G02B26/08 ,  G02B27/00 ,  G02B27/18 ,  G03F7/20 ,  H01L21/027 ,  G02B7/02

CPC分类号： G03F7/70258 ,  G02B26/06 ,  G02B27/0068

摘要： In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.

摘要翻译： 在用于成像装置中的光学元件的特定变形的系统中，特别是在具有用于微光刻的投影透镜的投影曝光机中，为了消除图像误差或主动调节，压电元件作为致动器 形式的薄板，薄膜或层到要变形的表面或整合到它们中。 结合具有传感器的自适应伺服回路，通过作为致动器的压电元件的受控激活，力和/或力矩被施加在光学元件上用于其特定变形。

公开(公告)号：US06700715B2

公开(公告)日：2004-03-02

申请号：US10016704

申请日：2001-12-11

申请人： Franz Sorg ,  Stefan Xalter ,  Michael Muehlbeyer ,  Bernhard Gellrich ,  Frank Melzer ,  Thomas Ittner

发明人： Franz Sorg ,  Stefan Xalter ,  Michael Muehlbeyer ,  Bernhard Gellrich ,  Frank Melzer ,  Thomas Ittner

IPC分类号： G02B702

CPC分类号： G03F7/709 ,  F16F15/005 ,  F16F15/02 ,  G02B27/646

摘要： In an oscillation damping system, the oscillations which act on an optical element in an imaging device, in particular on deformation-decoupled mounts and manipulators in a projection illumination arrangement, in particular in a projection objective for microlithographic projection exposure objective lithography, are detected by sensors, by actuators waves with same or at least similar frequencies and amplitudes of anti-phases to the disturbing oscillations are generated and introduced in said mount.

摘要翻译： 在振荡阻尼系统中，作用在成像装置中的光学元件，特别是在投影照明装置中的变形解耦安装件和操纵器上的振荡，特别是用于微光刻投影曝光物镜光刻的投影物镜中的振荡被检测 通过致动器产生具有与干扰振荡相同或至少相似的频率和反相振幅的致动器传感器，并将其引入到所述安装件中。

公开(公告)号：US09817322B2

公开(公告)日：2017-11-14

申请号：US13229114

申请日：2011-09-09

申请人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

发明人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

IPC分类号： G03B27/68 ,  G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70825

摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.

公开(公告)号：US08854602B2

公开(公告)日：2014-10-07

申请号：US10580179

申请日：2004-11-22

申请人： Bernhard Gellrich ,  Andreas Wurmbrand ,  Jens Kugler ,  Armin Schoeppach ,  Christian Zengerling ,  Stephane Bruynooghe

发明人： Bernhard Gellrich ,  Andreas Wurmbrand ,  Jens Kugler ,  Armin Schoeppach ,  Christian Zengerling ,  Stephane Bruynooghe

IPC分类号： G03B27/54 ,  G03B27/68 ,  G03F7/20 ,  G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70891

摘要： A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.

摘要翻译： 另一方面，用于目标中的光学元件的保持装置具有一方面连接到物镜并且至少间接连接到光学元件的安装座。 在安装件和光学元件之间布置的是其热膨胀系数基本上对应于光学元件的热膨胀系数的增强元件。

公开(公告)号：US20120026479A1

公开(公告)日：2012-02-02

申请号：US13229114

申请日：2011-09-09

申请人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

发明人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

IPC分类号： G03B27/42

CPC分类号： G03F7/70883 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70825

摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.

摘要翻译： 提供了一种光学成像装置，特别是用于微光刻，包括至少一个光学元件和与光学元件（109）相关联的至少一个保持装置，其中保持装置保持光学元件和第一部分（109.1） 光学元件接触第一大气，并且光学元件的第二部分（109.2）至少临时接触第二气氛。 提供一种还原装置，至少减少第一大气和第二气氛之间的压差的动态波动。

公开(公告)号：US08027024B2

公开(公告)日：2011-09-27

申请号：US12029165

申请日：2008-02-11

申请人： Bernhard Gellrich ,  Ulrich Weber

发明人： Bernhard Gellrich ,  Ulrich Weber

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70825 ,  G03F7/70308 ,  G03F7/70691

摘要： Replacement devices for at least one replaceable optical element mounted at least indirectly in a lithographic projection exposure apparatus are disclosed. Lithography objectives and illumination systems are also disclosed. Methods for positioning a replaceable optical element within a lithographic projection exposure apparatus of this type, and methods for replacing a replaceable optical element within a lithographic projection exposure apparatus via a replacement device are also disclosed.

摘要翻译： 公开了至少一个至少间接安装在光刻投影曝光装置中的可更换光学元件的替换装置。 还公开了光刻目标和照明系统。 在这种类型的光刻投影曝光装置内定位可更换光学元件的方法以及通过更换装置替代光刻投影曝光装置内的可更换光学元件的方法也被公开。

公开(公告)号：US07760327B2

公开(公告)日：2010-07-20

申请号：US11395719

申请日：2006-03-31

申请人： Hans-Jürgen Scherle ,  Yim-Bun Patrick Kwan ,  Stefan Xalter ,  Johannes Lippert ,  Ulrich Weber ,  Bernhard Geuppert ,  Bernhard Gellrich ,  Jens Kugler ,  Franz Sorg ,  Willi Heintel ,  Harald Kirchner ,  Wolfgang Keller ,  Andreas Frommeyer ,  Fraser G. Morrison

发明人： Hans-Jürgen Scherle ,  Yim-Bun Patrick Kwan ,  Stefan Xalter ,  Johannes Lippert ,  Ulrich Weber ,  Bernhard Geuppert ,  Bernhard Gellrich ,  Jens Kugler ,  Franz Sorg ,  Willi Heintel ,  Harald Kirchner ,  Wolfgang Keller ,  Andreas Frommeyer ,  Fraser G. Morrison

IPC分类号： G03B27/42 ,  G03B27/54 ,  G03B27/32 ,  G02B5/10

CPC分类号： G03F7/70225 ,  G02B17/0812

摘要： There is provided an optical element comprising an optical element body, a reflecting area and an optical passageway. The optical element body defines an axis of rotational symmetry. The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.

摘要翻译： 提供了一种包括光学元件主体，反射区域和光学通道的光学元件。 光学元件主体限定旋转对称轴。 反射区域设置在光学元件主体上并且适于在曝光过程中被光学地使用。 光学通道布置在光学元件主体内并允许光通过光学元件主体，光学通道相对于旋转对称轴线偏心地布置。

公开(公告)号：US20090233233A1

公开(公告)日：2009-09-17

申请号：US12403132

申请日：2009-03-12

申请人： Stephan SIX ,  Michael Lill ,  Ruediger Duesing ,  Bernhard Gellrich ,  Michael Widmann ,  Andreas Schubert ,  Tilmann Von Papen ,  Thomas Ihl

发明人： Stephan SIX ,  Michael Lill ,  Ruediger Duesing ,  Bernhard Gellrich ,  Michael Widmann ,  Andreas Schubert ,  Tilmann Von Papen ,  Thomas Ihl

IPC分类号： G03F7/20 ,  G03B27/54 ,  G03F7/004

CPC分类号： G03F7/70958 ,  G03F7/70341 ,  G03F7/706

摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

摘要翻译： 一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且 至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。 疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。

公开(公告)号：US07545483B2

公开(公告)日：2009-06-09

申请号：US12008879

申请日：2008-01-15

申请人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Schletterer ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Detlev Mueller ,  Dieter Schmerek

发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Schletterer ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Detlev Mueller ,  Dieter Schmerek

IPC分类号： G03B27/54

CPC分类号： G02B27/0006 ,  G02B1/18 ,  G02B7/023 ,  G03B27/52 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70833 ,  G03F7/70933

摘要： An optical element unit is provided comprising an optical element group; a housing receiving said optical element group and having an inner housing part and an exit end; and a purge unit connected to said housing and providing a purge medium to said inner housing part. The optical element group comprises an ultimate optical element. The ultimate optical element is located at the exit end of housing and separates the inner housing part from an environment external to the housing. The ultimate optical element and the housing define a sealing gap. The purge unit provides purge medium to the sealing gap to prevent intrusion of contaminants into the inner housing part.

摘要翻译： 提供一种光学元件单元，包括光学元件组; 接收所述光学元件组并具有内部壳体部分和出口端的壳体; 以及净化单元，其连接到所述壳体并且向所述内壳体部件提供净化介质。 光学元件组包括极限光学元件。 最终的光学元件位于壳体的出口端处，并将内部壳体部件与壳体外部的环境分离。 最终的光学元件和壳体限定了密封间隙。 净化单元向密封间隙提供净化介质，以防止污染物侵入内壳体部分。

公开(公告)号：US20090135385A1

公开(公告)日：2009-05-28

申请号：US12267074

申请日：2008-11-07

申请人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

摘要翻译： 特别是用于微光刻的光学成像装置包括用于接收具有投影图案的掩模的掩模装置，具有光学元件组的投影装置，用于接收基板的基板装置和浸没区。 光学元件组适于将投影图案投影到基板上并且包括具有浸没元件的多个光学元件，基板在工作期间至少临时定位到该浸没元件。 在操作期间，浸没区域位于浸没元件和基底之间，并且至少暂时填充浸渍介质。 提供一种热衰减装置，该热衰减装置适于减少浸入式介质引起的浸没元件的温度分布内的波动。