公开(公告)号：US07341788B2

公开(公告)日：2008-03-11

申请号：US11077804

申请日：2005-03-11

申请人： Jennifer Nam Cha ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Robert Dennis Miller ,  Willi Volksen

发明人： Jennifer Nam Cha ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Robert Dennis Miller ,  Willi Volksen

IPC分类号： B32B27/30

CPC分类号： C08L101/12 ,  C08L53/00 ,  G03F7/0002 ,  Y10T428/24 ,  Y10T428/2495 ,  Y10T428/24975 ,  Y10T428/249921 ,  Y10T428/249953 ,  Y10T428/249958 ,  Y10T428/249975 ,  Y10T428/249978 ,  Y10T428/249979 ,  Y10T428/24998 ,  Y10T428/25 ,  Y10T428/26 ,  Y10T428/31504 ,  Y10T428/31511 ,  Y10T428/31612 ,  Y10T428/31663 ,  Y10T428/31931 ,  Y10T428/31935 ,  Y10T428/31938

摘要： A material and an associated method of formation. A self-assembling block copolymer that includes a first block species and a second block species respectively characterized by a volume fraction of F1 and F2 with respect to the self-assembling block copolymer is provided. At least one crosslinkable polymer that is miscible with the second block species is provided. The self-assembling block copolymer and the at least one crosslinkable polymer are combined to form a mixture. The mixture having a volume fraction, F3, of the crosslinkable polymer, a volume fraction, F1A, of the first block species, and a volume fraction, F2A, of the second block species is formed. A material having a predefined morphology where the sum of F2A and F3 were preselected is formed.

摘要翻译： 一种材料和相关的形成方法。 一种自组装嵌段共聚物，其包括分别以相对于自组装的F 1和F 2的体积分数表征的第一嵌段物质和第二嵌段物质 嵌段共聚物。 提供了与第二嵌段物质混溶的至少一种可交联聚合物。 自组装嵌段共聚物和至少一种可交联聚合物组合形成混合物。 具有第一嵌段物质的可交联聚合物的体积分数F 3 N 3，体积分数F 1 A 1，以及体积分数F _{2A 。 预先选择具有预定形态的材料，其中预先选择F 2 A 2和F 3 3之和。}

公开(公告)号：US08369204B2

公开(公告)日：2013-02-05

申请号：US13275473

申请日：2011-10-18

申请人： Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd Walter Gotsmann ,  Erik Christopher Hagberg ,  James Lupton Hedrick ,  Armin W. Knoll ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Russell Clayton Pratt ,  Charles Gordon Wade ,  Johannes Windeln

发明人： Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd Walter Gotsmann ,  Erik Christopher Hagberg ,  James Lupton Hedrick ,  Armin W. Knoll ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Russell Clayton Pratt ,  Charles Gordon Wade ,  Johannes Windeln

IPC分类号： G11B3/00

CPC分类号： G11B9/149 ,  B82Y10/00 ,  G11B9/1454 ,  Y10T428/265 ,  Y10T428/31721

摘要： An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging.

摘要翻译： 提出了一种用于设计用于纳米级热机械存储装置的聚合物层的方法。 交联聚酰亚胺低聚物用作原子力数据存储装置中的记录层，与先前报道的交联和线性聚合物相比，显着提高了性能。 可以调整聚酰亚胺低聚物的交联以匹配读写擦除周期中所需的热和强度参数。 另外，交联聚酰亚胺低聚物适用于纳米级成像。

公开(公告)号：US08289833B2

公开(公告)日：2012-10-16

申请号：US13275441

申请日：2011-10-18

申请人： Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd Walter Gotsmann ,  Erik Christopher Hagberg ,  James Lupton Hedrick ,  Armin W. Knoll ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Russell Clayton Pratt ,  Charles Gordon Wade ,  Johannes Windeln

发明人： Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd Walter Gotsmann ,  Erik Christopher Hagberg ,  James Lupton Hedrick ,  Armin W. Knoll ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Russell Clayton Pratt ,  Charles Gordon Wade ,  Johannes Windeln

IPC分类号： G11B9/00

CPC分类号： G11B9/149 ,  B82Y10/00 ,  G11B9/1454 ,  Y10T428/265 ,  Y10T428/31721

摘要： An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging.

公开(公告)号：US20120155242A1

公开(公告)日：2012-06-21

申请号：US13345889

申请日：2012-01-09

申请人： Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd Walter Gotsmann ,  Erik Christopher Hagberg ,  James Lupton Hedrick ,  Armin W. Knoll ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Russell Clayton Pratt ,  Charles Gordon Wade ,  Johannes Windeln

发明人： Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd Walter Gotsmann ,  Erik Christopher Hagberg ,  James Lupton Hedrick ,  Armin W. Knoll ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Russell Clayton Pratt ,  Charles Gordon Wade ,  Johannes Windeln

IPC分类号： G11B3/00

CPC分类号： G11B9/149 ,  B82Y10/00 ,  C08G73/101 ,  C08G73/1046 ,  C08G73/105 ,  C08G73/1053 ,  C08G73/1064 ,  G11B9/1409 ,  G11B9/1454 ,  G11B11/007 ,  G11B2005/0021 ,  Y10T428/265 ,  Y10T428/31721

摘要： An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging.

公开(公告)号：US08102753B2

公开(公告)日：2012-01-24

申请号：US11358774

申请日：2006-02-21

申请人： Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd Walter Gotsmann ,  Erik Christopher Hagberg ,  James Lupton Hedrick ,  Armin W. Knoll ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Russell Clayton Pratt ,  Charles Gordon Wade ,  Johannes Windeln

发明人： Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd Walter Gotsmann ,  Erik Christopher Hagberg ,  James Lupton Hedrick ,  Armin W. Knoll ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Russell Clayton Pratt ,  Charles Gordon Wade ,  Johannes Windeln

IPC分类号： G11B3/00

CPC分类号： G11B9/149 ,  B82Y10/00 ,  G11B9/1454 ,  Y10T428/265 ,  Y10T428/31721

摘要： An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging.

摘要翻译： 提出了一种用于设计用于纳米级热机械存储装置的聚合物层的方法。 交联聚酰亚胺低聚物用作原子力数据存储装置中的记录层，与先前报道的交联和线性聚合物相比，显着提高了性能。 可以调整聚酰亚胺低聚物的交联以匹配读写擦除周期中所需的热和强度参数。 另外，交联聚酰亚胺低聚物适用于纳米级成像。

公开(公告)号：US20110245418A1

公开(公告)日：2011-10-06

申请号：US13101014

申请日：2011-05-04

申请人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Willi Volksen

发明人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Willi Volksen

IPC分类号： C08L71/08

CPC分类号： C08G63/66 ,  C08J9/26 ,  C08K5/5419 ,  C08L67/00 ,  C08L83/04 ,  C08L83/00

摘要： Substantially or roughly spherical micellar structures useful in the formation of nanoporous materials by templating are disclosed. A roughly spherical micellar structure is formed by organization of one or more spatially unsymmetric organic amphiphilic molecules. Each of those molecules comprises a branched moiety and a second moiety. The branched moiety can form part of either the core or the surface of the spherical micellar structure, depending on the polarity of the environment. The roughly spherical micellar structures form in a thermosetting polymer matrix. They are employed in a templating process whereby the amphiphilic molecules are dispersed in the polymer matrix, the matrix is cured, and the porogens are then removed, leaving nanoscale pores.

摘要翻译： 公开了用于通过模板形成纳米多孔材料的基本或大致球形的胶束结构。 通过组织一个或多个空间上不对称的有机两亲分子形成大致球形的胶束结构。 这些分子中的每一个包括支链部分和第二部分。 取决于环境的极性，支化部分可以形成球形胶束结构的芯或表面的一部分。 大致球形的胶束结构在热固性聚合物基体中形成。 它们用于模板化过程，由此将两亲分子分散在聚合物基质中，使基质固化，然后去除孔隙原，留下纳米孔。

公开(公告)号：US20100311895A1

公开(公告)日：2010-12-09

申请号：US12857633

申请日：2010-08-17

申请人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

发明人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

IPC分类号： C08L83/06 ,  C08L83/04

CPC分类号： C08L101/12 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/7682 ,  H01L2221/1047

摘要： A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.

摘要翻译： 使用该组合物制造的物质组成和结构。 所述组合物包含：树脂; 分散在树脂中的聚合物纳米颗粒，每个聚合纳米颗粒包含多臂芯聚合物和连接到多臂芯聚合物的悬置聚合物，与树脂不混溶的多臂芯聚合物和可混溶的侧链聚合物 与树脂; 和溶剂，所述溶剂在第一温度下挥发，所述树脂在第二温度下可交联，所述聚合物纳米颗粒在第三温度下可分解，所述第三温度高于所述第二温度，所述第二温度高于所述第一温度 ，其中在从第二温度到第三温度的层之间加热组合物的层的厚度收缩小于约3.5％。

公开(公告)号：US20100055307A1

公开(公告)日：2010-03-04

申请号：US12338692

申请日：2008-12-18

申请人： Jennifer Nam Cha ,  Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Willi Volksen

发明人： Jennifer Nam Cha ,  Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Willi Volksen

IPC分类号： B05D3/10 ,  B05D3/02

CPC分类号： H01L21/3121 ,  G03F7/0002 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/312 ,  H01L21/31695 ,  Y10T428/249953 ,  Y10T428/31663

摘要： A nanoporous material exhibiting a lamellar structure is disclosed. The material comprises three or more substantially parallel sheets of an organosilicate material, separated by highly porous spacer regions. The distance between the centers of the sheets lies between 1 nm and 50 nm. The highly porous spacer regions may be substantially free of condensed material. For the manufacture of such materials, a process is disclosed in which matrix non-amphiphilic polymeric material and templating polymeric material are dispersed in a solvent, where the templating polymeric material includes a polymeric amphiphilic material. The solvent with the polymeric materials is distributed onto a substrate. Organization is induced in the templating polymeric material. The solvent is removed, leaving the polymeric materials in place. The matrix polymeric material is cured, forming a lamellar structure.

摘要翻译： 公开了具有层状结构的纳米多孔材料。 该材料包括由高度多孔的间隔区隔开的三个或更多个基本平行的有机硅酸盐材料片。 片材中心之间的距离介于1nm和50nm之间。 高度多孔的间隔区域可以基本上不含冷凝材料。 为了制造这种材料，公开了一种方法，其中将基质非两亲性聚合物材料和模板聚合物材料分散在溶剂中，其中模板聚合材料包括聚合物两亲性材料。 具有聚合物材料的溶剂分布在基材上。 组织在模板聚合材料中被诱导。 除去溶剂，留下聚合物材料就位。 基体聚合材料固化，形成层状结构。

公开(公告)号：US20080220612A1

公开(公告)日：2008-09-11

申请号：US11682347

申请日：2007-03-06

申请人： Ute Drechsler ,  Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd W. Gotsmann ,  James Lupton Hedrick ,  Armin W. Knoll ,  Tobias Kraus ,  Robert Dennis Miller

发明人： Ute Drechsler ,  Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd W. Gotsmann ,  James Lupton Hedrick ,  Armin W. Knoll ,  Tobias Kraus ,  Robert Dennis Miller

IPC分类号： H01L21/311

CPC分类号： G11B9/149 ,  B82Y10/00 ,  Y10S438/928

摘要： A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process.

摘要翻译： 保护聚合物层免受光致抗蚀剂层污染的方法。 该方法包括：（a）在基底上形成聚合物层; （b）在聚合物层上形成非光敏保护层; （c）在所述保护层上形成光致抗蚀剂层; （d）将光致抗蚀剂层暴露于光化辐射并显影光致抗蚀剂层以形成图案化的光致抗蚀剂层，从而暴露保护层的区域; （e）蚀刻通过保护层和聚合物层，其中保护层不被图案化的光致抗蚀剂层保护; （f）在第一去除过程中去除图案化的光致抗蚀剂层; 和（g）在与第一去除过程不同的第二去除过程中去除保护层。

公开(公告)号：US20080161527A1

公开(公告)日：2008-07-03

申请号：US11618945

申请日：2007-01-02

申请人： Richard Anthony DiPietro ,  Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd Walter Gotsmann ,  Erik Christopher Hagberg ,  James Lupton Hedrick ,  Armin W. Knoll ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Russell Clayton Pratt ,  Charles Gordon Wade

发明人： Richard Anthony DiPietro ,  Urs T. Duerig ,  Jane Elizabeth Frommer ,  Bernd Walter Gotsmann ,  Erik Christopher Hagberg ,  James Lupton Hedrick ,  Armin W. Knoll ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Russell Clayton Pratt ,  Charles Gordon Wade

IPC分类号： C08G8/02 ,  G11B15/18

CPC分类号： C08G65/46 ,  B82Y10/00 ,  C08G65/4012 ,  G11B9/149 ,  G11B11/007

摘要： A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.