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79 条记录 (耗时 0.027 秒)

    Protective layer for CMP assisted lift-off process and method of fabrication
    51.
    发明申请
    Protective layer for CMP assisted lift-off process and method of fabrication 审中-公开
    CMP辅助剥离工艺的保护层和制造方法

    公开(公告)号：US20070183093A1

    公开(公告)日：2007-08-09

    申请号：US11350345

    申请日：2006-02-07

    申请人： Quang Le ,  Jui-Lung Li ,  Yi Zheng

    发明人： Quang Le ,  Jui-Lung Li ,  Yi Zheng

    IPC分类号： G11B5/147

    CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/3169

    摘要： A magnetic head is disclosed having a write head with an encapsulated protected pole structure, which includes a P3 pole tip. A protective layer surrounds at least a portion of the P3 pole tip, and an encapsulating material layer surrounds a portion of the protective layer. Also disclosed is a method of fabrication for a write head with an encapsulated protected pole structure.

    摘要翻译： 公开了一种具有带有封装保护极结构的写头的磁头，其包括P3极尖。 保护层包围P3极尖的至少一部分，并且封装材料层围绕保护层的一部分。 还公开了一种用于具有封装的保护极结构的写入头的制造方法。

    Method and apparatus for defining leading edge taper of a write pole tip
    54.
    发明申请
    Method and apparatus for defining leading edge taper of a write pole tip 失效
    用于定义写入磁极尖端的前缘锥度的方法和装置

    公开(公告)号：US20060002024A1

    公开(公告)日：2006-01-05

    申请号：US10884368

    申请日：2004-06-30

    申请人： Quang Le ,  Jui-Lung Li ,  Yvette Nga Winton ,  Sue Zhang ,  Yi Zheng

    发明人： Quang Le ,  Jui-Lung Li ,  Yvette Nga Winton ,  Sue Zhang ,  Yi Zheng

    IPC分类号： G11B5/147

    CPC分类号： G11B5/3163 ,  G11B5/1278 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A method and apparatus for defining leading edge taper of a write pole tip is disclosed. The fabrication process uses reactive ion etching to fabricate LET with tight control of the placement of LET's edge and to achieve higher angle for providing a higher effective write field at the pole tip while minimizing ATI for high-density perpendicular recording. The placement of a resist's edge is used to define the LET's edge and a CMP process is used to provide a planar surface for the fabrication of the write pole.

    摘要翻译： 公开了一种用于限定写入磁极尖端的前缘锥形的方法和装置。 制造工艺使用反应离子蚀刻来制造LET，可以严格控制LET的边缘放置，并实现更高的角度，以便在磁极尖端提供更高的有效写入场，同时最大限度地降低ATI用于高密度垂直记录。 使用抗蚀剂边缘的放置来定义LET的边缘，并且使用CMP工艺来提供用于制造写入极的平面。

    Additives for pressure sensitive polishing compositions
    56.
    发明授权
    Additives for pressure sensitive polishing compositions 失效
    用于压敏抛光组合物的添加剂

    公开(公告)号：US06783432B2

    公开(公告)日：2004-08-31

    申请号：US09874177

    申请日：2001-06-04

    申请人： Jui-Lung Li ,  Yuchun Wang ,  Rajeev Bajaj ,  Fred C. Redeker

    发明人： Jui-Lung Li ,  Yuchun Wang ,  Rajeev Bajaj ,  Fred C. Redeker

    IPC分类号： B24B100

    CPC分类号： B24B37/0056 ,  B24B37/044 ,  C09G1/02

    摘要： A method and composition for planarizing a substrate. The composition includes a pressure sensitive solution and one or more chemical agents for complexing with a metal or oxidized metal. The method for removal of a copper containing layer from a substrate surface, comprising applying a composition to a polishing media, the composition comprising a pressure sensitive solution, and one or more chemical agents for complexing with a metal or oxidized metal, and polishing the substrate surface with the polishing media.

    摘要翻译： 一种用于平坦化衬底的方法和组合物。 组合物包括压敏溶液和用于与金属或氧化金属络合的一种或多种化学试剂。 一种从基材表面除去含铜层的方法，包括将组合物施用于抛光介质，所述组合物包含压敏溶液，以及一种或多种与金属或氧化金属络合的化学试剂，以及研磨该基材 表面与抛光介质。

    METHOD FOR MANUFACTURING AN ADVANCED MAGNETIC READ SENSOR
    57.
    发明申请
    METHOD FOR MANUFACTURING AN ADVANCED MAGNETIC READ SENSOR 审中-公开
    制造先进磁性读出传感器的方法

    公开(公告)号：US20120231296A1

    公开(公告)日：2012-09-13

    申请号：US13045724

    申请日：2011-03-11

    申请人： Quang Le ,  Jui-Lung Li ,  Yongchul Ahn ,  Simon H. Liao ,  Guangli Liu ,  Masaya Nishioka

    发明人： Quang Le ,  Jui-Lung Li ,  Yongchul Ahn ,  Simon H. Liao ,  Guangli Liu ,  Masaya Nishioka

    IPC分类号： G11B5/33 ,  B44C1/22

    CPC分类号： G11B5/398 ,  G01R33/0052 ,  G01R33/093 ,  G01R33/098 ,  G11B5/3163 ,  H01L43/08 ,  H01L43/12

    摘要： A method for manufacturing a magnetic sensor that minimizes topography resulting from stripe height defining masking and patterning in order to facilitate definition of track width. The method includes depositing a series of mask layers and then masking and ion milling the series of sensor layers to define a back edge of a sensor. A non-magnetic fill layer is then deposited, the magnetic fill layer being constructed of a material that has an ion mill rate that is similar to that of the series of sensor layers. A second masking and milling process is then performed to define the track width of the sensor and hard bias is deposited. Because the non-magnetic fill layer is removed at substantially the same rate as the sensor material the structure has a very flat topography on which to form the sensor track width.

    摘要翻译： 一种用于制造磁传感器的方法，其使由限定掩模和图案化的条纹高度导致的形貌最小化，以便于轨道宽度的定义。 该方法包括沉积一系列掩模层，然后掩蔽和离子铣削该系列传感器层以限定传感器的后边缘。 然后沉积非磁性填充层，磁性填充层由具有类似于该系列传感器层的离子磨机速率的材料构成。 然后执行第二掩蔽和铣削过程以限定传感器的轨道宽度，并且沉积硬偏置。 由于非磁性填充层以与传感器材料基本相同的速率被去除，所以结构具有非常平坦的形状，以形成传感器轨道宽度。

    MANUFACTURING A NARROW TRACK READ HEAD
    58.
    发明申请
    MANUFACTURING A NARROW TRACK READ HEAD 有权
    制造一个窄幅追踪阅读头

    公开(公告)号：US20100112487A1

    公开(公告)日：2010-05-06

    申请号：US12261241

    申请日：2008-10-30

    申请人： Quang Le ,  Jui-Lung Li

    发明人： Quang Le ,  Jui-Lung Li

    IPC分类号： G03F7/20

    CPC分类号： G01R33/093 ,  B82Y25/00 ,  G11B5/3116 ,  G11B5/398 ,  Y10T29/49032 ,  Y10T29/49043

    摘要： Embodiments of the invention operate to narrow the track width of a read head used in a disk drive. In one embodiment, a magnetic read head has a track width of about 40 nm or less. The read head is fabricated by a method that includes fabricating a film stack from a substrate, a sensor material, a stop material, a first release material, a mask material, and a photo resist material. The mask material may include a masking substrate material and a second release material. The film stack is processed by forming a read head image in the photo resist material, removing portions of the film stack that lie outside the read head image of the photo resist material, stripping the film stack to remove the photo resist, mask and first release materials, and milling the sensor material according to the read head image.

    摘要翻译： 本发明的实施例用于缩小磁盘驱动器中使用的读取头的磁道宽度。 在一个实施例中，磁读头具有约40nm或更小的轨道宽度。 读取头通过包括从基底，传感器材料，止挡材料，第一释放材料，掩模材料和光致抗蚀剂材料制造薄膜叠层的方法制造。 掩模材料可以包括掩蔽衬底材料和第二释放材料。 通过在光致抗蚀剂材料中形成读头图像来处理胶片堆叠，去除位于光致抗蚀剂材料的读取头图像之外的膜堆叠的部分，剥离胶片堆叠以除去光致抗蚀剂，掩模和第一释放 材料，并根据读头图像铣削传感器材料。

    Method for forming a write head having an air bearing surface (ABS)
    59.
    发明授权
    Method for forming a write head having an air bearing surface (ABS) 失效
    用于形成具有空气轴承表面（ABS）的写入头的方法

    公开(公告)号：US07464457B2

    公开(公告)日：2008-12-16

    申请号：US11469132

    申请日：2006-08-31

    申请人： Quang Le ,  Edward Hin Pong Lee ,  Jui-Lung Li ,  Aron Peniek ,  Nian-Xiang Sun

    发明人： Quang Le ,  Edward Hin Pong Lee ,  Jui-Lung Li ,  Aron Peniek ,  Nian-Xiang Sun

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/1278 ,  G11B5/112 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49067

    摘要： Methods for forming write heads. One method includes forming a mask layer above a pole tip layer; forming a layer of resist above the mask layer; patterning the resist; removing portions of the mask layer not covered by the patterned resist; shaping a pole tip from the pole tip layer; depositing a layer of dielectric material above the pole tip and flux shaping layer, wherein the layer of dielectric material extends about adjacent to the mask layer; depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and polishing for forming a substantially planar upper surface comprising the mask layer and stop layer. Another method includes depositing a layer of dielectric material at least adjacent the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer. A further method includes forming dishing in the pole tip.

    摘要翻译： 形成写头的方法 一种方法包括在极尖层上形成掩模层; 在掩模层之上形成抗蚀剂层; 图案化抗蚀剂; 去除未被图案化抗蚀剂覆盖的掩模层的部分; 从极尖层成形极尖; 在极尖和熔剂成形层上沉积介电材料层，其中介电材料层围绕掩模层延伸; 在电介质材料上沉积停止层，停止层邻接掩模层; 以及用于形成包括掩模层和停止层的基本平坦的上表面的抛光。 另一种方法包括沉积至少邻近极尖的介电材料层，其中电介质材料层围绕掩模层延伸。 另一种方法包括在极尖中形成凹陷。