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51.
公开(公告)号:US20240178170A1
公开(公告)日:2024-05-30
申请号:US18401099
申请日:2023-12-29
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou
IPC: H01L23/00
CPC classification number: H01L24/08 , H01L24/03 , H01L24/05 , H01L24/80 , H01L2224/0219 , H01L2224/03821 , H01L2224/05647 , H01L2224/08145 , H01L2224/80895 , H01L2224/80896
Abstract: Conductive buffer layers for semiconductor die assemblies, and associated systems and methods are disclosed. In an embodiment, a semiconductor die assembly includes first and second semiconductor dies directly bonded to each other. The first semiconductor die includes a first copper pad and the second semiconductor die includes a second copper pad. The first and second copper pads form an interconnect between the first and second semiconductor dies, and the interconnect includes a conductive buffer material between the first and second copper pads, where the conductive buffer material includes aggregates of conductive particles. In some embodiments, the first and second copper pads are not conjoined but electrically connected to each other through the conductive buffer material. In some embodiments, the conductive buffer material is porous such that the aggregates of conductive particles can be compressed together in response to the pressure applied to the conductive buffer layer.
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公开(公告)号:US20240071973A1
公开(公告)日:2024-02-29
申请号:US18502389
申请日:2023-11-06
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou
IPC: H01L23/00
CPC classification number: H01L24/16 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/14 , H01L24/81 , H01L24/83 , H01L24/91 , H01L24/29 , H01L24/32 , H01L24/73 , H01L2224/05139 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05166 , H01L2224/05169 , H01L2224/05173 , H01L2224/05176 , H01L2224/05178 , H01L2224/0518 , H01L2224/05181 , H01L2224/05183 , H01L2224/05184 , H01L2224/05541 , H01L2224/11826 , H01L2224/11827 , H01L2224/11845 , H01L2224/11849 , H01L2224/13009 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/13166 , H01L2224/13169 , H01L2224/13173 , H01L2224/13176 , H01L2224/13178 , H01L2224/1318 , H01L2224/13181 , H01L2224/13183 , H01L2224/13184 , H01L2224/13565 , H01L2224/14181 , H01L2224/16146 , H01L2224/2919 , H01L2224/29191 , H01L2224/32145 , H01L2224/73103 , H01L2224/81815 , H01L2224/8185 , H01L2924/0635 , H01L2924/0665 , H01L2924/07025
Abstract: A semiconductor device assembly, comprising a first semiconductor device including a first substrate with a frontside surface, a plurality of solder bumps located on the frontside surface of the first substrate, and a first polymer layer on the frontside surface. The semiconductor device assembly also comprises a second semiconductor device including a second substrate with a backside surface, a plurality of TSVs protruding from the backside surface of the second substrate, and a second polymer layer on the backside surface of the first substrate, the second polymer layer having a plurality of openings corresponding to the plurality of TSVs. The first and second semiconductor devices are bonded such that the first polymer layer contacts the second polymer layer and each of the plurality of solder bumps extends into a corresponding one of the plurality of openings and contacts a corresponding one of the plurality of TSVs.
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公开(公告)号:US20230282605A1
公开(公告)日:2023-09-07
申请号:US17684292
申请日:2022-03-01
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou
IPC: H01L23/00
CPC classification number: H01L24/16 , H01L24/05 , H01L24/13 , H01L24/14 , H01L24/11 , H01L24/81 , H01L24/83 , H01L24/91 , H01L2224/05541 , H01L2224/13009 , H01L2224/14181 , H01L2224/13565 , H01L2224/11826 , H01L2224/11827 , H01L2224/11845 , H01L2224/11849 , H01L2224/16146 , H01L24/32 , H01L2224/32145 , H01L24/73 , H01L2224/73103 , H01L24/29 , H01L2224/2919 , H01L2224/29191 , H01L2224/13147 , H01L2224/13184 , H01L2224/1318 , H01L2224/13155 , H01L2224/13166 , H01L2224/13181 , H01L2224/13169 , H01L2224/13139 , H01L2224/13144 , H01L2224/13176 , H01L2224/13178 , H01L2224/13183 , H01L2224/13173 , H01L2224/05147 , H01L2224/05184 , H01L2224/0518 , H01L2224/05155 , H01L2224/05166 , H01L2224/05181 , H01L2224/05169 , H01L2224/05139 , H01L2224/05144 , H01L2224/05176 , H01L2224/05178 , H01L2224/05183 , H01L2224/05173 , H01L2224/81815 , H01L2224/8185 , H01L2924/0665 , H01L2924/0635 , H01L2924/07025
Abstract: A semiconductor device assembly, comprising a first semiconductor device including a first substrate with a frontside surface, a plurality of solder bumps located on the frontside surface of the first substrate, and a first polymer layer on the frontside surface. The semiconductor device assembly also comprises a second semiconductor device including a second substrate with a backside surface, a plurality of TSVs protruding from the backside surface of the second substrate, and a second polymer layer on the backside surface of the first substrate, the second polymer layer having a plurality of openings corresponding to the plurality of TSVs. The first and second semiconductor devices are bonded such that the first polymer layer contacts the second polymer layer and each of the plurality of solder bumps extends into a corresponding one of the plurality of openings and contacts a corresponding one of the plurality of TSVs.
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公开(公告)号:US20230260876A1
公开(公告)日:2023-08-17
申请号:US17670391
申请日:2022-02-11
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou , Kyle K. Kirby , Bret K. Street , Kunal R. Parekh
IPC: H01L23/48 , H01L23/00 , H01L25/065 , H01L25/00 , H01L21/768
CPC classification number: H01L23/481 , H01L24/16 , H01L25/0657 , H01L25/50 , H01L21/76898 , H01L2225/06541
Abstract: A semiconductor device having monolithic conductive columns, and associated systems and methods, are disclosed herein. The semiconductor device can include a semiconductor substrate, a conductive pad, an opening, a non-conductive liner, and a plug of non-conductive material. The conductive pad may be at a surface of the semiconductor substrate. The opening may extend through the semiconductor substrate from the conductive pad to a second surface and define a side wall. The liner may coat the side wall and the plug may fill the opening. A second opening may be formed through the semiconductor device and the opening and a conductive material sintering therein.
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公开(公告)号:US20230056579A1
公开(公告)日:2023-02-23
申请号:US17408343
申请日:2021-08-20
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou , Thiagarajan Raman
IPC: H01L23/00 , H01L23/29 , H01L23/433 , H01L21/56
Abstract: Semiconductor devices including electrically-isolated extensions and associated systems and methods are disclosed herein. An electrically-isolated extension may be coupled to a corresponding connection pad that is attached to a surface of a device. The electrically-isolated extensions may extend at least partially through one or more layers at or near the surface and toward a substrate or an inner portion thereof.
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公开(公告)号:US20210175194A1
公开(公告)日:2021-06-10
申请号:US17174827
申请日:2021-02-12
Applicant: Micron Technology, Inc.
Inventor: Aibin Yu , Wei Zhou , Zhaohui Ma
IPC: H01L23/00 , H01L23/48 , H01L21/768
Abstract: A bond pad with micro-protrusions for direct metallic bonding. In one embodiment, a semiconductor device comprises a semiconductor substrate, a through-silicon via (TSV) extending through the semiconductor substrate, and a copper pad electrically connected to the TSV and having a coupling side. The semiconductor device further includes a copper element that projects away from the coupling side of the copper pad. In another embodiment, a bonded semiconductor assembly comprises a first semiconductor substrate with a first TSV and a first copper pad electrically coupled to the first TSV, wherein the first copper pad has a first coupling side. The bonded semiconductor assembly further comprises a second semiconductor substrate, opposite to the first semiconductor substrate, the second semiconductor substrate comprising a second copper pad having a second coupling side. A plurality of copper connecting elements extend between the first and second coupling sides of the first and second copper pads.
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公开(公告)号:US10734370B2
公开(公告)日:2020-08-04
申请号:US16396235
申请日:2019-04-26
Applicant: Micron Technology, Inc.
Inventor: Zhaohui Ma , Wei Zhou , Chee Chung So , Soo Loo Ang , Aibin Yu
IPC: H01L21/56 , H01L25/18 , H01L25/065 , H01L25/00 , H01L23/00 , H01L23/31 , H01L23/544 , H01L21/683 , H01L21/78
Abstract: Methods of making semiconductor device packages may involve cutting kerfs in streets between regions of a semiconductor wafer and positioning stacks of semiconductor dice on portions of surfaces of at least some adjacent regions. A protective material may be dispensed only between the stacks of the semiconductor dice, over the exposed remainders of the regions, and in the kerfs. A back side of the semiconductor wafer may be ground to a final thickness, revealing the protective material in the kerfs at a side of the semiconductor wafer opposite the stacks of the semiconductor dice. The protective material between the stacks of the semiconductor dice and within the kerfs may be cut through, leaving the protective material on sides of the semiconductor dice of the stacks and on side surfaces of the regions within the kerfs.
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公开(公告)号:US20200211999A1
公开(公告)日:2020-07-02
申请号:US16236250
申请日:2018-12-28
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou , Bret K. Street , Benjamin L. McClain , Mark E. Tuttle
Abstract: A thermocompression bonding (TCB) apparatus can include a wall having a height measured in a first direction and configured to be positioned between a first pressing surface and a second pressing surface of a semiconductor bonding apparatus. The apparatus can include a cavity at least partially surrounded by the wall, the cavity sized to receive a semiconductor substrate and a stack of semiconductor dies positioned between the semiconductor substrate and the first pressing surface, the stack of semiconductor dies and semiconductor substrate having a combined unpressed stack height as measured in the first direction. In some embodiments, the unpressed stack height is greater than the height of the wall, and the wall is configured to be contacted by the first pressing surface to limit movement of the first pressing surface toward the second pressing surface during a semiconductor bonding process.
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公开(公告)号:US20200083178A1
公开(公告)日:2020-03-12
申请号:US16127769
申请日:2018-09-11
Applicant: Micron Technology, Inc.
Inventor: Bret K. Street , Wei Zhou , Christopher J. Gambee , Jonathan S. Hacker , Shijian Luo
IPC: H01L23/00 , H01L25/065 , H01L25/00
Abstract: A semiconductor device assembly that includes a substrate having a first side and a second side, the first side having at least one dummy pad and at least one electrical pad. The semiconductor device assembly includes a first semiconductor device having a first side and a second side and at least one electrical pillar extending from the second side. The electrical pillar is connected to the electrical pad via solder to form an electrical interconnect. The semiconductor device assembly includes at least one dummy pillar extending from the second side of the first semiconductor device and a liquid positioned between an end of the dummy pillar and the dummy pad. The surface tension of the liquid pulls the dummy pillar towards the dummy pad. The surface tension may reduce or minimize a warpage of the semiconductor device assembly and/or align the dummy pillar and the dummy pad.
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60.
公开(公告)号:US20190267352A1
公开(公告)日:2019-08-29
申请号:US16405935
申请日:2019-05-07
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou , Bret K. Street
IPC: H01L25/065 , H01L23/64 , H01L25/00 , H01L23/495 , H01L23/48
Abstract: A semiconductor device includes a first die; a second die attached over the first die; a first metal enclosure and a second metal enclosure both directly contacting and vertically extending between the first die and the second die, wherein the first metal enclosure peripherally encircles a set of one or more internal interconnects and the second metal enclosure peripherally encircles the first metal enclosure without directly contacting the first metal enclosure; a first enclosure connector electrically connecting the first metal enclosure to a first voltage level; a second enclosure connector electrically connecting the second metal enclosure to a second voltage level; and wherein the first metal enclosure, the second metal enclosure, the first enclosure connector, and the second enclosure connector are configured to provide an enclosure capacitance.
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