公开(公告)号：US20110309260A1

公开(公告)日：2011-12-22

申请号：US13122354

申请日：2011-03-11

申请人： Toshihiro Nishisaka ,  Yukio Watanabe ,  Tamotsu Abe ,  Osamu Wakabayashi

发明人： Toshihiro Nishisaka ,  Yukio Watanabe ,  Tamotsu Abe ,  Osamu Wakabayashi

IPC分类号： G21K5/00 ,  G01J1/42

CPC分类号： H05G2/008 ,  G03B27/54 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/003

摘要： A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.

摘要翻译： 与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。

公开(公告)号：US20110297852A1

公开(公告)日：2011-12-08

申请号：US13124063

申请日：2011-03-22

申请人： Hidenobu Kameda ,  Osamu Wakabayashi ,  Masato Moriya

发明人： Hidenobu Kameda ,  Osamu Wakabayashi ,  Masato Moriya

IPC分类号： G21K5/00 ,  G02B7/192

CPC分类号： G21K1/062 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70891 ,  G03F7/70983 ,  G21K2201/067

摘要： A mirror is provided which may include: a substrate; a thermal diffusion layer provided on a principal surface of the substrate, the thermal diffusion layer having a higher thermal conductivity than the substrate; and a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.

摘要翻译： 提供了一种可以包括：基底的反射镜; 设置在所述基板的主表面上的热扩散层，所述热扩散层具有比所述基板更高的热导率; 以及设置在所述热扩散层上的反射层，所述反射层具有比所述热扩散层低的热导率。

公开(公告)号：US20100176310A1

公开(公告)日：2010-07-15

申请号：US12385835

申请日：2009-04-21

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

IPC分类号： H01J99/00

CPC分类号： G03F7/70891 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70883 ,  H05G2/008

摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.

摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到 目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

公开(公告)号：US20090232171A1

公开(公告)日：2009-09-17

申请号：US12382109

申请日：2009-03-09

申请人： Tamotsu Abe ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Tamotsu Abe ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/10

CPC分类号： H01S3/2316 ,  H01S3/076 ,  H01S3/10007 ,  H01S3/2232

摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.

摘要翻译： 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。

公开(公告)号：US20070091968A1

公开(公告)日：2007-04-26

申请号：US10554537

申请日：2004-04-16

申请人： Osamu Wakabayashi ,  Tatsuya Ariga ,  Takahito Kumazaki ,  Kotaro Sasano

发明人： Osamu Wakabayashi ,  Tatsuya Ariga ,  Takahito Kumazaki ,  Kotaro Sasano

IPC分类号： H01S3/22 ,  H01S3/093

CPC分类号： H01S3/2308 ,  G03F7/70025 ,  H01S3/083

摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.

摘要翻译： 本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。 用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。 具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器 ）。 谐振器被配置为稳定谐振器。

公开(公告)号：US20060239309A1

公开(公告)日：2006-10-26

申请号：US10568091

申请日：2004-08-09

申请人： Tatsuya Ariga ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Tatsuya Ariga ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/13 ,  H01S3/00 ,  H01S3/22 ,  H01S3/223

CPC分类号： G03F7/70041 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/10007 ,  H01S3/104 ,  H01S3/1301 ,  H01S3/134

摘要： A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor C0 disposed in an amplifying high-voltage pulse generator 32 of an amplifying laser 300 is controlled, and pulse energy Pamp of the amplifying laser 300 is determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.

摘要翻译： 施加到设置在振荡激光器100的振荡高电压脉冲发生器12中的主电容器C 0的充电电压Vosc受到恒定的控制，使得振荡激光器100的脉冲能量Posc成为下限能量Es 0或 更多的是放大饱和区域。 并且，控制施加到放大激光器300的放大高压脉冲发生器32中的主电容器C 0的充电电压Vamp，将放大激光器300的脉冲能量Pamp确定为目标能量Patgt。 因此，控制两级激光器的脉冲能量以稳定脉冲能量。

公开(公告)号：US06879617B2

公开(公告)日：2005-04-12

申请号：US10438737

申请日：2003-05-14

申请人： Tatsuya Ariga ,  Kyohei Seki ,  Osamu Wakabayashi

发明人： Tatsuya Ariga ,  Kyohei Seki ,  Osamu Wakabayashi

IPC分类号： H01S3/131 ,  H01S3/036 ,  H01S3/08 ,  H01S3/134 ,  H01S3/225 ,  H01S3/23 ,  H01S3/22

CPC分类号： H01S3/10092 ,  H01S3/036 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08059 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2316

摘要： The present invention relates to a two stage laser system in which a desired spectral line width can be obtained at high output even when the integrated spectral characteristic of oscillator laser does not have the desired spectral line width, comprising an oscillator laser device 10 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and emits laser beam which is band-narrowed by means of a band narrowing module 3 arranged in a laser resonator, and an amplifier laser device 20 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and amplifies laser pulse injected from said oscillator laser device 10. In the system, a synchronous time interval having a predetermined spectral line width exists in laser pulse from the oscillator laser 10, and the system is set such that a discharge occurs in the amplifier laser 20 within the synchronous time interval.

摘要翻译： 本发明涉及一种二阶段激光系统，其中即使当振荡器激光器的积分光谱特性不具有期望的谱线宽度时，也可以以高输出获得期望的谱线宽度，包括具有放电的振荡器激光装置10 在激光室1内的充满了含有F2的激光气体的激光器2内的电极2，并且发射通过设置在激光谐振器中的带窄化模块3而带宽化的激光束，以及在激光器内具有放电电极2的放大器激光装置20 室1充满含有F2的激光气体，并放大从所述振荡器激光装置10注入的激光脉冲。在该系统中，具有预定光谱线宽的同步时间间隔存在于来自振荡器激光器10的激光脉冲中，并且系统被设置为 在同步时间间隔内在放大器激光器20中发生放电。

公开(公告)号：US06819699B1

公开(公告)日：2004-11-16

申请号：US09518639

申请日：2000-03-03

申请人： Tatsuo Enami ,  Osamu Wakabayashi ,  Katsutomo Terashima ,  Kiwamu Takehisa ,  Tsukasa Hori ,  Hakaru Mizoguchi

发明人： Tatsuo Enami ,  Osamu Wakabayashi ,  Katsutomo Terashima ,  Kiwamu Takehisa ,  Tsukasa Hori ,  Hakaru Mizoguchi

IPC分类号： H01S322

CPC分类号： H01S3/225

摘要： A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping and a Xe gas cylinder are connected, gas exhaust by a gas exhaust module and opening and closing of the valves are controlled by a gas controller to add a trace quantity of xenon gas to the excimer laser gas. Thus, to remedy a burst characteristic and a spike characteristic of the ultraviolet laser device by adding a trace quantity of xenon gas, the xenon gas can be supplied efficiently into the chamber without modifying existing laser gas supply equipment.

摘要翻译： 用于ArF准分子激光器的激光气体中所含的缓冲气体主要由He构成，优选将Xe添加到激光气体中。 由阀门分隔的混合管道设置在从室到准分子激光气瓶的管道上，混合管道和Xe气瓶连接，气体排气模块排气和阀门的打开和关闭由气体 控制器向准分子激光气体添加痕量的氙气。 因此，为了通过添加痕量的氙气来补偿紫外激光装置的突发特性和尖峰特性，可以将氙气有效地供应到腔室中而不改变现有的激光气体供应装置。

公开(公告)号：US06583874B1

公开(公告)日：2003-06-24

申请号：US09680932

申请日：2000-10-10

申请人： Toru Suzuki ,  Osamu Wakabayashi

发明人： Toru Suzuki ,  Osamu Wakabayashi

IPC分类号： G01J328

CPC分类号： G01J3/1809 ,  G01J3/14 ,  G01J3/1838

摘要： A spectrometer has higher resolving power without enlarging a size of the apparatus. This spectrometer has a slit board, a mirror, a collimator lens, a holographic grating, an Echelle grating, a magnifier lens and a line sensor. The holographic grating is arranged to diffract parallel light incident from the collimator lens toward the Echelle grating. The Echelle grating is arranged to reflect the parallel light incident from the holographic grating toward the holographic grating.

摘要翻译： 光谱仪具有更高的分辨能力，而不增加设备的尺寸。 该光谱仪具有狭缝板，反射镜，准直透镜，全息光栅，Echelle光栅，放大镜和行传感器。 全息光栅布置成将从准直透镜入射的平行光衍射到Echelle光栅。 Echelle光栅布置成将从全息光栅入射的平行光反射到全息光栅。

公开(公告)号：US06317203B1

公开(公告)日：2001-11-13

申请号：US09270656

申请日：1999-03-16

申请人： Osamu Wakabayashi ,  Takanori Nakaike

发明人： Osamu Wakabayashi ,  Takanori Nakaike

IPC分类号： G01J2100

CPC分类号： G03F7/70575 ,  G01M11/00

摘要： A light that radiates in the wavelength region of a narrowband laser beam is generated, this light is converted to a collimated beam after passing through a slit, and the converted light is incident on a narrowband module. The outputted light from the narrowband module is condensed, and this condensed light is incident on a light detector. A total reflection mirror is provided in a removable manner on the optical path in front of the narrowband module, the ratio between the output of the light detector in a state in which the total reflection mirror is provided on the optical path, and the output of the light detector in a state in which the total reflection mirror is removed, is determined, and the narrowband efficiency of the above-mentioned narrowband module is inspected based on the determined ratio.

摘要翻译： 产生在窄带激光束的波长区域中发光的光，该光在通过狭缝后转换为准直光束，并且转换的光入射到窄带模块上。 来自窄带模块的输出光被冷凝，并且该会聚的光入射到光检测器上。 在窄带模块前面的光路上以可移动的方式设置全反射镜，在光路上设置全反射镜的状态下的光检测器的输出与输出 确定去除全反射镜的状态下的光检测器，并且基于所确定的比率来检查上述窄带模块的窄带效率。