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51.
公开(公告)号:US20200243126A1
公开(公告)日:2020-07-30
申请号:US16261617
申请日:2019-01-30
Applicant: GLOBALFOUNDRIES INC.
Inventor: Ajey Poovannummoottil Jacob , Amogh Agrawal
Abstract: A memory structure includes a first memory array with two transistor-two variable resistor memory cells and a second memory array with one transistor-one variable resistor memory cells, which are each selectively operable in read, write and standby modes. The first memory array and the second memory array are interleaved so that, when the second memory operates in the read mode, the first memory array automatically and concurrently operates in a reference mode. A method of operating the memory structure includes, when the second memory array operates in the read mode, automatically and concurrently operating the first memory array in the reference mode so that the first memory array generates and outputs a statistical reference voltage, which is between the low and high voltages of a nominal memory cell within the second memory array and which is employed by the second memory array to sense a stored data value.
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52.
公开(公告)号:US10727327B2
公开(公告)日:2020-07-28
申请号:US15882053
申请日:2018-01-29
Applicant: GLOBALFOUNDRIES Inc.
Inventor: Rahul Mishra , Vibhor Jain , Ajay Raman , Robert J. Gauthier
IPC: H01L29/749 , H01L29/66 , H01L29/74 , H01L27/02 , H01L29/737
Abstract: Fabrication methods and device structures for a silicon controlled rectifier. A cathode is arranged over a top surface of a substrate and a well is arranged beneath the top surface of the substrate. The cathode is composed of a semiconductor material having a first conductivity type, and the well also has the first conductivity type. A semiconductor layer, which has a second conductivity type opposite to the first conductivity type, includes a section over the top surface of the substrate. The section of the semiconductor layer is arranged to form an anode that adjoins the well along a junction.
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公开(公告)号:US10727251B2
公开(公告)日:2020-07-28
申请号:US16207730
申请日:2018-12-03
Applicant: GLOBALFOUNDRIES INC.
Inventor: Stefan Dünkel , Johannes Müller , Lars Müller-Meskamp
IPC: G11C11/22 , G11C5/12 , H01L21/28 , H01L27/1159 , H01L29/423 , H01L29/10 , H01L29/06 , H01L29/66 , H01L29/78 , H01L21/3105 , H01L21/3213 , H01L21/027 , H01L21/762 , H01L21/3065 , G11C11/16
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to rounded shaped transistors and methods of manufacture. The structure includes a gate structure composed of a metal electrode and a rounded ferroelectric material which overlaps an active area in a width direction into an isolation region.
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54.
公开(公告)号:US10726896B1
公开(公告)日:2020-07-28
申请号:US16261617
申请日:2019-01-30
Applicant: GLOBALFOUNDRIES INC.
Inventor: Ajey Poovannummoottil Jacob , Amogh Agrawal
Abstract: A memory structure includes a first memory array with two transistor-two variable resistor memory cells and a second memory array with one transistor-one variable resistor memory cells, which are each selectively operable in read, write and standby modes. The first memory array and the second memory array are interleaved so that, when the second memory operates in the read mode, the first memory array automatically and concurrently operates in a reference mode. A method of operating the memory structure includes, when the second memory array operates in the read mode, automatically and concurrently operating the first memory array in the reference mode so that the first memory array generates and outputs a statistical reference voltage, which is between the low and high voltages of a nominal memory cell within the second memory array and which is employed by the second memory array to sense a stored data value.
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公开(公告)号:US10707206B2
公开(公告)日:2020-07-07
申请号:US16194691
申请日:2018-11-19
Applicant: GLOBALFOUNDRIES INC.
Inventor: Hui Zang , Laertis Economikos , Ruilong Xie
IPC: H01L27/08 , H01L29/66 , H01L27/088 , H01L29/06 , H01L29/78 , H01L21/762 , H01L21/28 , H01L21/306 , H01L21/3105 , H01L21/311
Abstract: A method of forming a gate cut isolation, a related structure and IC are disclosed. The method forms a dummy gate material mandrel having a sidewall positioned between and spaced from a first active region covered by the mandrel and a second active region not covered by the mandrel. A gate cut dielectric layer is formed against the sidewall of the mandrel, and may be trimmed. A dummy gate material may deposited to encase the remaining gate cut dielectric layer. Subsequent dummy gate formation and replacement metal gate processing forms a gate conductor with the gate cut isolation electrically isolating respective first and second portions of the gate conductor. The method creates a very thin, slightly non-vertical gate cut isolation, and eliminates the need to define a gate cut critical dimension or fill a small gate cut opening.
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公开(公告)号:US10700653B2
公开(公告)日:2020-06-30
申请号:US15959514
申请日:2018-04-23
Applicant: GLOBALFOUNDRIES INC.
Inventor: Konstantinos Manetakis , Thomas G. McKay
Abstract: Methods form amplifier device structures that include first-third amplifier devices. The first amplifier device produces an intermediate signal. The second amplifier device is connected to an input of the first amplifier device and produces an amplified inverted output signal. The third amplifier device inverts the intermediate signal to produce an amplified non-inverted output signal that is complementary to the amplified inverted output signal. A resistor feedback loop is connected to the input and output of the first amplifier device. A gain ratio of the gain of the third amplifier device to the gain of the second amplifier device matches a resistance ratio of the source resistance of the input signal to the resistance of the resistor added to the source resistance. Also, DC loop circuits are connected to the first-third amplifier devices, and each of the DC loop circuits connects an amplifier device output to an amplifier device input.
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57.
公开(公告)号:US10699942B2
公开(公告)日:2020-06-30
申请号:US15961337
申请日:2018-04-24
Applicant: GLOBALFOUNDRIES Inc.
Inventor: Ruilong Xie , Chanro Park , Daniel Chanemougame , Steven Soss , Lars Liebmann , Hui Zang , Shesh Mani Pandey
IPC: H01L21/768 , H01L29/66 , H01L23/528 , H01L21/8234 , H01L23/522 , H01L29/78
Abstract: Methods and structures that include a vertical-transport field-effect transistor. First and second semiconductor fins are formed that project vertically from a bottom source/drain region. A first gate stack section is arranged to wrap around a portion of the first semiconductor fin, and a second gate stack section is arranged to wrap around a portion of the second semiconductor fin. The first gate stack section is covered with a placeholder structure. After covering the first gate stack section with the placeholder structure, a metal gate capping layer is deposited on the second gate stack section. After depositing the metal gate capping layer on the second gate stack section, the placeholder structure is replaced with a contact that is connected with the first gate stack section.
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公开(公告)号:US10690845B1
公开(公告)日:2020-06-23
申请号:US16298354
申请日:2019-03-11
Applicant: GLOBALFOUNDRIES INC.
Inventor: Ajey Poovannummoottil Jacob , Abu Thomas , Yusheng Bian
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to three dimensional (3D) optical interconnect structures and methods of manufacture. The structure includes: a first structure having a grating coupler and a first optical waveguide structure; and a second structure having a second optical waveguide structure in alignment with the first optical waveguide structure and which has a modal effective index that matches to the first optical waveguide structure.
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公开(公告)号:US20200186131A1
公开(公告)日:2020-06-11
申请号:US16216369
申请日:2018-12-11
Applicant: MARVELL INTERNATIONAL LTD.
Inventor: Krishnan S. Rengarajan , Alok Chandra , Chethan Ramanna
IPC: H03K3/037 , H03K3/012 , G01R31/317 , G01R31/3185
Abstract: Disclosed are scan flip-flops (SFFs) that reduce the dynamic power consumption of a system-on-chip (SOC) that incorporates them. Each SFF includes a master latch and a slave latch, each having a driver, a feed-forward path and a feedback path. Each SFF further includes at least one shared clock-gated power supply transistor, which is controlled by either a clock signal or an inverted clock signal to selectively and simultaneously connect a voltage rail to both the driver from one latch and the feedback path of the other latch. The different SFF embodiments have different numbers of shared clock-gated power supply transistors and various other different features designed for optimal power and/or performance. For example, the different SFF embodiments have different types of slave latch drivers; different types of transistors; and/or different types of master latch drivers (e.g., a single-stage, multiple clock phase-dependent driver or a multi-stage, single clock phase-dependent driver).
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60.
公开(公告)号:US10680557B2
公开(公告)日:2020-06-09
申请号:US16367113
申请日:2019-03-27
Applicant: GLOBALFOUNDRIES INC.
Inventor: Shafiullah Syed , Abdellatif Bellaouar , Chi Zhang
Abstract: An apparatus, comprising an input transformer; a first differential transistor pair configured to receive a first back gate bias voltage; a second differential transistor pair configured to receive a second back gate bias voltage; a cross-coupled neutralization cap comprising PMOS or NMOS transistors and configured to receive a third back gate bias voltage; and an output transformer. A method of fixing at least one back gate bias voltage to impart a desired capacitance to the transistors of at least one of the first differential transistor pair, the second differential transistor pair, or the neutralization cap. The apparatus and method may provide a power amplifier having improved linearity and efficiency.
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