Abstract:
The efficiency of a semiconductor cathode can be increased by bombarding the electron-emitting regions (8) with an electron beam (8), which frees the surface from adhered oxygen particles. The electron beam preferably originates from a second semiconductor cathode (42), which has an opening (42) for passing the electron beam (20) of the first semiconductor cathode (20). Alternatively, both semiconductor cathodes can be realized in one semiconductor body.
Abstract:
A device for recording or displaying images or for electron lithographic or electron microscopic uses, comprising in an evacuated envelope (1) a target (7) on which at least one electron beam (6) is focussed. This beam is generated by means of a semiconductor device (10) which comprises an electrically insulating layer (42) having an aperture (38) through which the beam passes. The layer carries at least four beam-forming electrodes (43 through 50) which are situated at regular intervals around the aperture (38). Each of the electrodes has such a potential that an n-pole field or a combination of n-pole fields is generated, where n is an even integer from 4 through 16. A suitable choice of the n-pole field will make it possible to impart substantially any desired shape to the beam (6) and thus the focus on the target.
Abstract:
The invention relates to a semiconductor, cathode and a camera tube and a display tube, respectively, having such a cathode, based on avalanche breakdown in a p-n junction extending parallel to the surface of the semiconductor body. The released electrons obtain extra energy by means of an accelerating electrode provided on the device. The resulting efficiency increase makes the manufacture of such cathodes in planar silicon technology practical. Since the depletion zone of the p-n junction upon avalanche breakdown does not extend to the surface, the released electrons show a sharp, narrow energy distribution. This makes such cathodes particularly suitable for camera tubes. In addition they find application, for example, in display tubes and flat displays.
Abstract:
A semiconductor cold emission device comprising at least two different semiconductors and a junction with a first region having n-type conductivity and a second region which is a p-type conductivity and an indirect transition type material whose effective forbidden bandwidth is smaller than that of the first region and means for applying voltage to the junction to cause electrons injected from the first region to the second region to be emitted from the surface of the second region to the exterior.
Abstract:
An electron emitter comprising a body of a wide band gap material using double injection space-charge limited current. By using double injection of carriers to establish space-charge limited currents in high resistivity p-type semiconductors, the number of minority carriers can be increased considerably without raising the Fermi level above mid band gap. By using such double injection space-charge limited current a sufficient amount of large energy minority carriers are placed in the conduction band in a p-type semiconductor. A monoatomic layer of cesium and oxygen is positioned on the positively biased contact. This places a negative electron affinity surface layer on the device. The electrons in the conduction band then have enough energy to impel electrons into a vacuum.
Abstract:
CHARGE CARRIERS ARE EMITTED FROM THE SURFACE OF A HETEROJUNCTION REGION WHICH IS FORMED WITHIN THE FILM-LIKE BODY OF A SEMICONDUCTOR MATERIAL. THE EMITTING REGION IS DEFINED BY AN INTERFACE WHICH IS GENERALLY SEMICIRCULAR IN CROSS-SECTION OR HAS AT LEAST A SUBSTANTIAL PORTION NEITHER PARA LLEL NOR PERPENDICULAR TO THE SURFACE OF THE FILM-LIKE BODY. THE THICKNESS OF THE FILM-LIKE BODY IS SOMEWHAT GREATER THAN THE DEPTH OF THE EMITTING REGION SO THAT CONTINUOUS UNINTERRUPTED AND GENERALLY SEMI-CYLINDRICAL INNER AND OUTER DEPLETION REGIONS EXIST ADJACENT THE INTERFACE. WHEN A VOLTAGE IN APPLIED ACROSS THE FILM-LIKE BODY AND HENCE ACROSS THE EMITTING REGION, THE DEPLETION REGIONS DISTORT IN A PARTICULAR FASHION AND PRODUCE AN ELECTRIC FIELD WITHIN THE EMITTING REGION. ELECTRONS CROSSING THE INTERFACE ARE "HEATED BY THIS FIELD TO A DEGREE PREMITTING ELECTRON EMISSION FROM THE SURFACE OF THE EMITTING REGION. THE ELECTRON EMISSION MAY BE VARIED BY ALTERING THE VOLTAGE APPLIED ACROSS THE JUNCTION.
Abstract:
An electron emission device includes a number of first electrodes and a number of second electrodes intersected with each other to define a number of intersections. An electron emission unit is sandwiched between the first electrode and the second electrode at each of the number of intersections, wherein the electron emission unit includes a semiconductor layer and an insulating layer stacked together, the semiconductor layer defines a number of holes, the carbon nanotube layer covers the number of holes, and a portion of the carbon nanotube layer is suspended on the number of holes.
Abstract:
In an illustrative embodiment, a three electrode circuit element comprises an insulating material, a cavity in the insulating material, first and second electrodes spaced apart in the cavity by a distance small enough that electron emission is caused when suitable operating voltages are applied to the first and second electrodes, and a gate electrode near one of the first and second electrodes. A voltage applied to the gate electrode can control current flow between the first and second electrodes. The circuit element may be realized in a planar structure in which the electrodes are formed in substantially the same plane; or it may be a multi-layer device in which some or all of the electrodes are in separate layers of conductive material. Methods for forming the circuit element are also disclosed. Illustrative applications of the three electrode circuit element to provide standard circuit functions are also disclosed.
Abstract:
A field emission device may comprise: an emitter comprising a cathode electrode and an electron emission source supported by the cathode electrode; an insulating spacer around the emitter, the insulating spacer forming an opening that is a path of electrons emitted from the electron emission source; and/or a gate electrode comprising a graphene sheet covering the opening. A method of manufacturing a gate electrode may comprise: forming a graphene thin film on one surface of a conductive film; forming a mask layer having an etching opening on another surface of the conductive film, wherein the etching opening exposes a portion of the conductive film; partially removing the conductive film through the etching opening to partially expose the graphene thin film; and/or removing the mask layer.