公开(公告)号：US20130256526A1

公开(公告)日：2013-10-03

申请号：US13801713

申请日：2013-03-13

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

Inventor： Shengwu Chang

IPC: H01J3/18 ,  H01J37/12

CPC classification number: H01J3/18 ,  H01J37/12 ,  H01J37/3171 ,  H01J49/067 ,  H01J2237/121

Abstract: A hybrid electrostatic lens is used to shape and focus an ion beam. The hybrid electrostatic lens comprises an Einzel lens defined by an elongated tube having a first and second ends and a first electrode disposed at the first end and a second electrode disposed at the second end. The elongated tube is configured to receive a voltage bias to create an electric field within the Einzel lens as the ion beam travels through the hybrid electrostatic lens. The hybrid electrostatic lens further includes a quadrupole lens having a first stage and a second stage, where each of the stages is defined by a plurality of electrodes turned 90° with respect to each other to define a pathway in the Z direction through the elongated tube. The Einzel lens focuses the ion beam and the quadrupole lens shapes the ion beam.

公开(公告)号：US08466430B2

公开(公告)日：2013-06-18

申请号：US13633477

申请日：2012-10-02

Applicant: Canon Kabushiki Kaisha

Inventor： Kazuhiro Sando

IPC: H01J3/18 ,  H01J49/22 ,  H01J37/12 ,  H01J29/62 ,  G21K1/08

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/1205

Abstract: An electrostatic lens includes multiple electrodes each having a through hole, and an insulating spacer that is provided between the electrodes and that fixes an interval between the electrodes. Both surfaces of the spacer are bonded with the electrodes opposing each other so that the spacer is integral with both the electrodes. A protective film is disposed on both surfaces of each of the electrodes. The protective film is present on the interior wall of the through hole and in a region around the through hole on the surface of the electrode. The region extends continuously from the interior wall to an end portion of the electrode. The protective film is not present at an interface between the electrode and the spacer.

Abstract translation: 静电透镜包括各自具有通孔的多个电极和设置在电极之间并且固定电极之间的间隔的绝缘间隔物。 间隔物的两个表面与彼此相对的电极接合，使得间隔物与两个电极成一体。 在每个电极的两个表面上设置保护膜。 保护膜存在于通孔的内壁和电极表面上的通孔周围的区域中。 该区域从内壁连续延伸到电极的端部。 保护膜不存在于电极和间隔物之间​​的界面处。

公开(公告)号：US20130087717A1

公开(公告)日：2013-04-11

申请号：US13633477

申请日：2012-10-02

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuhiro Sando

IPC: H01J3/18

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/1205

Abstract: An electrostatic lens includes multiple electrodes each having a through hole, and an insulating spacer that is provided between the electrodes and that fixes an interval between the electrodes. Both surfaces of the spacer are bonded with the electrodes opposing each other so that the spacer is integral with both the electrodes. A protective film is disposed on both surfaces of each of the electrodes. The protective film is present on the interior wall of the through hole and in a region around the through hole on the surface of the electrode. The region extends continuously from the interior wall to an end portion of the electrode. The protective film is not present at an interface between the electrode and the spacer.

Abstract translation: 静电透镜包括各自具有通孔的多个电极和设置在电极之间并且固定电极之间的间隔的绝缘间隔物。 间隔物的两个表面与彼此相对的电极接合，使得间隔物与两个电极成一体。 在每个电极的两个表面上设置保护膜。 保护膜存在于通孔的内壁和电极表面上的通孔周围的区域中。 该区域从内壁连续延伸到电极的端部。 保护膜不存在于电极和间隔物之间​​的界面处。

公开(公告)号：US08399851B2

公开(公告)日：2013-03-19

申请号：US13028190

申请日：2011-02-15

Applicant: John Ruffell

Inventor： John Ruffell

IPC: H01J3/18 ,  H01J3/26 ,  H01J3/14 ,  H01J37/256

CPC classification number: H01L21/68764 ,  H01J37/1474 ,  H01J37/3171 ,  H01J2237/026 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/1503 ,  H01J2237/20207 ,  H01J2237/30472 ,  H01L21/68771

Abstract: Systems and methods of an ion implant apparatus include an ion source for producing an ion beam along an incident beam axis. The ion implant apparatus includes a beam deflecting assembly coupled to a rotation mechanism that rotates the beam deflecting assembly about the incident beam axis and deflects the ion beam. At least one wafer holder holds target wafers and the rotation mechanism operates to direct the ion beam at one of the at least one wafer holders which also rotates to maintain a constant implant angle.

Abstract translation: 离子注入装置的系统和方法包括用于沿入射束轴产生离子束的离子源。 离子注入装置包括耦合到旋转机构的光束偏转组件，其使射束偏转组件围绕入射光束轴线旋转并偏转离子束。 至少一个晶片保持器保持目标晶片，并且旋转机构操作以将离子束引导至至少一个晶片保持器中的一个，其也旋转以保持恒定的注入角度。

公开(公告)号：US20120305798A1

公开(公告)日：2012-12-06

申请号：US13484231

申请日：2012-05-30

Applicant: Aernout Christiaan Zonnevylle ,  Pieter Kruit

Inventor： Aernout Christiaan Zonnevylle ,  Pieter Kruit

IPC: G21K5/04 ,  H01J3/26 ,  H01J3/18 ,  H01J3/14

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/15 ,  H01J2237/1532

Abstract: The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.

Abstract translation: 本发明涉及一种用于在带电粒子多子束装置中操纵多个带电粒子束的一个或多个带电粒子束的方法和装置。 所述操纵器装置包括平面基板，所述平面基板包括在所述基板的平面中的通孔的阵列，这些通孔中的每一个布置成使所述至少一个带电粒子束通过，其中每个所述通孔具有一个或 布置在通孔周围的更多电极和用于向每个通孔的一个或多个电极提供控制信号的电子控制电路，其中电子控制电路被布置用于通过开口提供每个个体的一个或多个电极， 最小的模拟可调电压。

公开(公告)号：US20120155509A1

公开(公告)日：2012-06-21

申请号：US13392569

申请日：2010-08-18

Applicant: Juntaro Ishii ,  Ikuo Kinoshita

Inventor： Juntaro Ishii ,  Ikuo Kinoshita

IPC: H01J47/00 ,  G01K11/00 ,  H01J3/18

CPC classification number: G01N23/227 ,  G01K11/30

Abstract: Disclosed is an electrode member which has spherical sections, each of which configures a part of a sphere, and a plurality of spherical electrode sections wherein the radiuses of the spherical sections are different from each other. The spherical electrode sections are disposed in a state wherein the center points of the respective spheres match each other and the spherical electrode sections are insulated from each other such that voltages can be independently applied thereto. Electron-passing openings for straightly taking out electrons, which are moving from the center point, to the outside of the electrode are formed at positions where the spherical electrode sections and a plurality of straight lines radially extending from the center point intersect each other.

Abstract translation: 公开了一种电极构件，其具有构成球体的一部分的球形部分和多个球形电极部分，其中球形部分的半径彼此不同。 球状电极部分设置在各个球体的中心点彼此匹配的状态，并且球形电极部分彼此绝缘，使得可以独立地施加电压。 在从中心点向径向延伸的球形电极部分和多条直线相交的位置形成从中心点向电极外侧直线取出的电子通过用开口。

公开(公告)号：US20110186743A1

公开(公告)日：2011-08-04

申请号：US13028190

申请日：2011-02-15

Applicant: John Ruffell

Inventor： John Ruffell

IPC: H01J3/18 ,  H01J3/26

CPC classification number: H01L21/68764 ,  H01J37/1474 ,  H01J37/3171 ,  H01J2237/026 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/1503 ,  H01J2237/20207 ,  H01J2237/30472 ,  H01L21/68771

Abstract: Systems and methods of an ion implant apparatus include an ion source for producing an ion beam along an incident beam axis. The ion implant apparatus includes a beam deflecting assembly coupled to a rotation mechanism that rotates the beam deflecting assembly about the incident beam axis and deflects the ion beam. At least one wafer holder holds target wafers and the rotation mechanism operates to direct the ion beam at one of the at least one wafer holders which also rotates to maintain a constant implant angle.

公开(公告)号：US07982183B2

公开(公告)日：2011-07-19

申请号：US12513939

申请日：2007-11-07

Applicant: Alexander Makarov ,  Reinhold Pesch ,  Robert Malek ,  Viacheslav Kozlovskiy

Inventor： Alexander Makarov ,  Reinhold Pesch ,  Robert Malek ,  Viacheslav Kozlovskiy

IPC: H01J49/24 ,  H01J49/04 ,  H01J3/18 ,  H01J37/301

CPC classification number: H01J49/065

Abstract: An ion transfer arrangement for transporting ions between higher and lower pressure regions of a mass spectrometer includes an electrode assembly (120) with a first plurality of ring electrodes (205) arranged in alternating relation with a second plurality of ring electrodes (210). The first plurality of ring electrodes (205) are narrower than the second plurality of ring electrodes (210) in a longitudinal direction, but the first plurality of ring electrodes have a relatively high magnitude voltage of a first polarity applied to them whereas the second plurality of ring electrodes (210) have a relatively lower magnitude voltage applied to them, of opposing polarity to that applied to the first set of ring electrodes (205). In this manner, ions passing through the ion transfer arrangement experience spatially alternating asymmetric electric fields that tend to focus ions away from the inner surface of the channel wall and towards the channel plane or axis of symmetry.

Abstract translation: 用于在质谱仪的较高和较低压力区域之间输送离子的离子传递装置包括具有与第二多个环形电极（210）交替设置的第一多个环形电极（205）的电极组件（120）。 第一多个环形电极（205）在纵向方向上比第二多个环形电极（210）窄，但是第一多个环形电极具有施加到它们的第一极性的相对高的幅度电压，而第二个多个环形电极 环形电极（210）具有相对于施加到第一组环形电极（205）的相反极性的相对较低的施加到它们的幅度电压。 以这种方式，通过离子转移装置的离子经历空间交替的不对称电场，其倾向于将离子聚焦离开通道壁的内表面并朝向通道平面或对称轴线。

公开(公告)号：US07687782B2

公开(公告)日：2010-03-30

申请号：US11806127

申请日：2007-05-30

Applicant: Mitsukuni Tsukihara ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Hiroshi Matsushita

Inventor： Mitsukuni Tsukihara ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Hiroshi Matsushita

IPC: G21K1/087 ,  H01J3/18

CPC classification number: H01J37/153 ,  H01J37/1477 ,  H01J37/3171 ,  H01J2237/30477

Abstract: A beam deflection scanner performs reciprocating deflection scanning with an ion beam or a charged particle beam to thereby periodically change a beam trajectory and comprises a pair of scanning electrodes installed so as to be opposed to each other with the beam trajectory interposed therebetween and a pair of correction electrodes installed in a direction perpendicular to an opposing direction of the pair of scanning electrodes, with the beam trajectory interposed therebetween, and extending along a beam traveling axis. Positive and negative potentials are alternately applied to the pair of scanning electrodes, while a correction voltage is constantly applied to the pair of correction electrodes. A correction electric field produced by the pair of correction electrodes is exerted on the ion beam or the charged particle beam passing between the pair of scanning electrodes at the time of switching between the positive and negative potentials.

Abstract translation: 光束偏转扫描器用离子束或带电粒子束进行往复偏转扫描，从而周期性地改变光束轨迹，并且包括一对扫描电极，其被安装成彼此相对，并且光束轨迹插入其间， 校正电极，其安装在垂直于该对扫描电极的相反方向的方向上，其中光束轨迹插入其间，并且沿着光束移动轴线延伸。 正电位和负电位交替施加到该对扫描电极，同时校正电压不断地施加到该对校正电极。 在正电位和负电位之间切换时，由一对校正电极产生的校正电场施加在通过该对扫描电极的离子束或带电粒子束之间。

公开(公告)号：US20080142723A1

公开(公告)日：2008-06-19

申请号：US11959966

申请日：2007-12-19

Applicant: Kazuya Goto

Inventor： Kazuya Goto

IPC: H01J3/18

CPC classification number: H01J37/153 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/10 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/153 ,  H01J2237/28

Abstract: A charged-particle beam system has a demagnifying lens for reducing the dimensions of an electron beam produced from an electron beam source, an objective lens for focusing the demagnified beam onto the surface of a target, a first deflector located before the demagnifying lens, a second deflector placed such that the deflection field produced by it is totally or partially superimposed on the objective lens field, and a third deflector located in a stage following the second deflector. An image of the light source is created by the demagnifying lens. An image of the light source image is formed on the target by the objective lens.

Abstract translation: 带电粒子束系统具有用于减小从电子束源产生的电子束的尺寸的缩小透镜，用于将缩小的光束聚焦到目标表面上的物镜，位于缩小透镜之前的第一偏转器， 第二偏转器被放置成使得其产生的偏转场全部或部分地叠加在物镜视场上，而第三偏转器位于跟随第二偏转器的阶段中。 光源的图像由缩小透镜产生。 通过物镜在目标上形成光源图像的图像。