公开(公告)号：US07154678B2

公开(公告)日：2006-12-26

申请号：US11079225

申请日：2005-03-15

申请人： Karl-Heinz Schuster ,  David R. Shafer ,  Wilhelm Ulrich ,  Helmut Beierl ,  Wolfgang Singer

发明人： Karl-Heinz Schuster ,  David R. Shafer ,  Wilhelm Ulrich ,  Helmut Beierl ,  Wolfgang Singer

IPC分类号： G02B9/00 ,  G02B13/18

CPC分类号： G02B17/0892 ,  G02B3/14 ,  G02B13/143 ,  G02B13/18 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70883 ,  G03F7/70933

摘要： A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0′) which is greater than the maximum lens diameter (D2) of the objective.

摘要翻译： 投影物镜具有至少五个透镜组（G 1至G 5）并且具有多个透镜表面。 至少两个非球面透镜表面被布置成相互相邻。 这些相互相邻布置的透镜表面被表征为双重非球面。 该至少一个双重非球面（21）安装在距物镜的最大透镜直径（D 2）大的图像平面（0'）的最小距离处。

公开(公告)号：US20060208206A1

公开(公告)日：2006-09-21

申请号：US11384636

申请日：2006-03-21

申请人： Joachim Hainz ,  Wolfgang Singer ,  Erich Schubert

发明人： Joachim Hainz ,  Wolfgang Singer ,  Erich Schubert

IPC分类号： G21G4/00

CPC分类号： G03F7/70083 ,  G03F7/70075 ,  G03F7/70116 ,  G21K1/02 ,  G21K1/06 ,  G21K2201/067

摘要： An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

摘要翻译： 一种用于沿扫描方向扫描型微光刻的照明系统，其中发射波长特别<= 193nm的光源。 照明系统包括多个光栅元件。 将多个光栅元件成像为照明系统的图像平面，以产生部分地叠加在图像平面中的场上的多个图像。 该场在扫描方向上定义非矩形强度分布。

公开(公告)号：US07090362B2

公开(公告)日：2006-08-15

申请号：US10841846

申请日：2004-05-07

申请人： Hubert Holderer ,  Andreas Heisler ,  Wolfgang Singer ,  Markus Weiss ,  Andreas Seifert ,  Frank Melzer ,  Heinz Mann

发明人： Hubert Holderer ,  Andreas Heisler ,  Wolfgang Singer ,  Markus Weiss ,  Andreas Seifert ,  Frank Melzer ,  Heinz Mann

IPC分类号： G02B26/08 ,  G02B7/18

CPC分类号： G03F7/70258 ,  G02B5/09 ,  G02B7/1821 ,  G02B7/1824 ,  G02B26/0816 ,  G03F7/70075 ,  G03F7/70141 ,  G03F7/702 ,  G03F7/70275

摘要： In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.

摘要翻译： 在具有多个镜面的小平面镜中，其中镜面设置有反射面，镜面通过轴承装置联合地安装在基体内。 镜面包括通过表面，线或点接触在外周与轴承装置接触的镜体。 小平面镜的优选使用领域是用于制造半导体元件的微光刻中的投影曝光机的投影物镜。

公开(公告)号：US20050280821A1

公开(公告)日：2005-12-22

申请号：US11147931

申请日：2005-06-08

申请人： Damian Fiolka ,  Wolfgang Singer ,  Johannes Wangler

发明人： Damian Fiolka ,  Wolfgang Singer ,  Johannes Wangler

IPC分类号： G01B11/00 ,  G02B27/28 ,  G03F7/20

CPC分类号： G03F7/70583 ,  G02B27/283 ,  G03F7/70075

摘要： An illumination system of a microlithographic projection exposure apparatus contains a light mixer for the homogenization of radiation distributions. The latter may, in one embodiment, comprise at least one plane beam-splitter layer which is arranged between two transparent sub-elements, parallel to an optical axis of the illumination system. An alternative embodiment of a light mixer contains at least one row of beam splitters, wherein the beam splitters in at least one row are arranged mutually parallel, at an inclination angle with respect to an entry-side optical axis of the illumination system, and offset behind one another in a direction perpendicular to the entry-side optical axis.

摘要翻译： 微光刻投影曝光装置的照明系统包含用于辐射分布均匀化的光混合器。 在一个实施例中，后者可以包括布置在平行于照明系统的光轴的两个透明子元件之间的至少一个平面分束器层。 光混合器的替代实施例包含至少一排分束器，其中至少一排中的分束器相对于照明系统的入射侧光轴以倾斜角相互平行地布置，并且偏移 在与入射侧光轴垂直的方向上彼此相邻。

公开(公告)号：US20050275818A1

公开(公告)日：2005-12-15

申请号：US11064594

申请日：2005-02-24

申请人： Wolfgang Singer

发明人： Wolfgang Singer

IPC分类号： G21K1/06 ,  G01J3/18 ,  G02B5/18 ,  G02B19/00 ,  G02B27/44 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70575 ,  G01J3/18 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/4244 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70158 ,  G03F7/70191

摘要： There is provided an attenuator for attenuating electromagnetic radiation of wavelengths unequal to a used wavelength, including a grating element, having i) grating grooves that produce a grating period (p), and ii) a grating plane. The grating period (p) is at least about 150 times higher than the used wavelength.

摘要翻译： 提供了一种衰减器，用于衰减不同于所使用波长的波长的电磁辐射，包括光栅元件，其具有产生光栅周期（p）的光栅槽，以及ii）光栅平面。 光栅周期（p）比使用的波长高至少约150倍。

公开(公告)号：US20050093041A1

公开(公告)日：2005-05-05

申请号：US10930302

申请日：2004-08-31

申请人： Wolfgang Singer ,  Johannes Wangler ,  Eric Sohmen

发明人： Wolfgang Singer ,  Johannes Wangler ,  Eric Sohmen

IPC分类号： G21K1/06 ,  G02B19/00 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H01L29/76

CPC分类号： B82Y10/00 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70108 ,  G03F7/70166

摘要： There is provided an illumination system. The illumination system includes a source for light having a wavelength ≦193 nm, a field plane, and a collector having a mirror shell for receiving a part of the light. The mirror shell is arranged so that a real image of the source is formed and comes to lie in a plane that is defocused relative to the field plane by more than 30 mm, so that the field plane is illuminated in a predetermined region, substantially homogeneously.

摘要翻译： 提供照明系统。 照明系统包括波长<= 193nm的光源，场平面和具有用于接收一部分光的镜壳的收集器。 镜壳布置成使得源的真实图像形成并且位于相对于场平面散焦大于30mm的平面中，使得场平面基本上均匀地被照射在预定区域中 。

公开(公告)号：US06840640B2

公开(公告)日：2005-01-11

申请号：US10060909

申请日：2002-01-30

申请人： Martin Antoni ,  Isabel Escudero-Sanz ,  Wolfgang Singer ,  Johannes Wangler ,  Jörg Schultz

发明人： Martin Antoni ,  Isabel Escudero-Sanz ,  Wolfgang Singer ,  Johannes Wangler ,  Jörg Schultz

IPC分类号： G02B13/18 ,  G02B13/24 ,  G02B17/00 ,  G02B17/06 ,  G02B19/00 ,  G02B27/00 ,  G02B27/09 ,  G03F7/20 ,  G03F7/22 ,  H01L21/027 ,  G02B5/10 ,  G21K5/00

CPC分类号： G02B27/0983 ,  G02B17/0621 ,  G02B19/0023 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/0905 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70233 ,  Y10S359/90

摘要： There is provided a multi-mirror system for an illumination system with wavelengths ≦193 nm. The multi-mirror system includes (a) an imaging system having a first mirror and a second mirror, (b) an object plane, (c) an image plane in which the imaging system forms an image of an object, and (d) an arc-shaped field in the image plane, where a radial direction in a middle of the arc-shaped field defines a scanning direction. The first and second mirrors are arranged such that an edge sharpness of the arc-shaped field is smaller than 5 mm in the scanning direction. Rays traveling from the object plane to the image plane impinge a used area of the first and second mirrors with incidence angles relative to a surface normal of the mirrors ≦30° or ≧60°.

摘要翻译： 为波长<= 193nm的照明系统提供了多镜系统。 多镜系统包括（a）具有第一反射镜和第二反射镜的成像系统，（b）物体平面，（c）成像系统形成物体的图像的图像平面，（d） 在图像平面中的弧形场，其中弧形场的中间的径向方向限定扫描方向。 第一和第二反射镜被布置成使得弧形场的边缘锐度在扫描方向上小于5mm。 从物体行进到图像平面的光线相对于反射镜的表面法线<= 30°或> = 60°的入射角撞击第一和第二反射镜的使用区域。

公开(公告)号：US20050002090A1

公开(公告)日：2005-01-06

申请号：US10876898

申请日：2004-06-25

申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

IPC分类号： G03F7/20 ,  G02B17/00

CPC分类号： B82Y10/00 ,  G03B27/54 ,  G03F7/70083 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G21K2201/061

摘要： There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.

摘要翻译： 提供照明系统。 照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。 光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。 第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

公开(公告)号：US06658084B2

公开(公告)日：2003-12-02

申请号：US10042122

申请日：2001-10-25

申请人： Wolfgang Singer

发明人： Wolfgang Singer

IPC分类号： G21K500

CPC分类号： G03F7/70075 ,  B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70891 ,  G03F7/70983 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04

摘要： An illumination system comprises (a) a first optical element upon which a light beam impinges, where the first optical element has first raster elements that partition said light beam into light channels; (b) a second optical element that receives said light channels, where the second optical element has a second raster elements; (c) an object plane that receives said light channels via said second optical element; and (d) an exit pupil that is provided with an illumination via said object plane. The system is characterized by an assignment of a member of said first raster elements and a member of said second raster elements to each of said light channels to provide a continuous beam path from said first optical element to said object plane for each of said plurality of light channels. The assignment is changeable to provide an adjustment of said illumination in said exit pupil.

公开(公告)号：US08885141B2

公开(公告)日：2014-11-11

申请号：US13088299

申请日：2011-04-15

申请人： Wolfgang Singer ,  Yim-Bun-Patrick Kwan ,  Stefan-Wolfgang Schmidt ,  Dirk Heinrich Ehm ,  Dieter Kraus ,  Stefan Wiesner ,  Stefan Koehler ,  Almut Czap ,  Hin Yiu Anthony Chung

发明人： Wolfgang Singer ,  Yim-Bun-Patrick Kwan ,  Stefan-Wolfgang Schmidt ,  Dirk Heinrich Ehm ,  Dieter Kraus ,  Stefan Wiesner ,  Stefan Koehler ,  Almut Czap ,  Hin Yiu Anthony Chung

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20 ,  G03F1/86 ,  G03F1/82

CPC分类号： G03F7/70925 ,  G03F1/82 ,  G03F1/86 ,  G03F7/70733 ,  G03F7/7085 ,  G03F7/70866

摘要： An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical element (6a), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (27), the processing device (15) includes a particle generator (30) for generating a particle beam, in particular an electron beam (30a), and/or a high-frequency generator.

摘要翻译： 一种EUV光刻设备，包括用于在EUV光刻设备中的照明位置处照射掩模的照明设备和用于将设置在掩模上的结构成像到感光基板上的投影设备。 EUV光刻设备具有处理装置（15），用于在EUV光刻设备中的处理位置优选地以局部分辨的方式处理光学元件（6a），特别是掩模。 为了激活气体流（27）的至少一种气体成分，处理装置（15）包括用于产生粒子束（特别是电子束（30a））和/或高频的粒子发生器（30） 发电机。