公开(公告)号：US20050037267A1

公开(公告)日：2005-02-17

申请号：US10896538

申请日：2004-07-22

申请人： Kenji Yamazoe ,  Kenji Saitoh

发明人： Kenji Yamazoe ,  Kenji Saitoh

IPC分类号： G03C5/00 ,  G03F1/36 ,  G03F1/68 ,  G03F1/70 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/82 ,  H01L21/822 ,  H01L27/04

CPC分类号： G03F1/36

摘要： A mask manufacturing method suitable for an exposure method wherein a mask on which a desired pattern and a supplementary pattern with formations smaller than those of the desired pattern are arrayed is illuminated, and the light which passed through the mask onto a member to be exposed is projected via a projection optical system, said method comprising a selecting step for selecting one of the following three supplementary patterns, a first supplementary pattern wherein said supplementary pattern is disposed at a position where a line extending in the vertical direction as to the pitch direction from a certain desired pattern hole of said desired pattern, and a line connecting the supplementary pattern hole closest to said certain desired pattern hole in the vertical direction with said certain desired pattern hole, intersect at an angle of 0°, a second supplementary pattern wherein said supplementary pattern is disposed at a position where said angle is 0° or more but less than 45°, and a third supplementary pattern wherein said supplementary pattern is disposed at a position where said angle is 45°.

摘要翻译： 照射适用于曝光方法的掩模制造方法，其中排列有期望图案和具有小于期望图案的图案的辅助图案的掩模，并且将通过掩模的光穿过待暴露的构件是 通过投影光学系统投影，所述方法包括选择步骤，用于选择以下三个补充图案中的一个：第一补充图案，其中所述辅助图案设置在从垂直方向延伸的关于俯仰方向的线的位置 所述期望图案的特定期望图形孔和将所述特定所需图案孔最靠近所述特定期望图案孔的所述图案孔与所述特定所需图案孔连接的线以0°的角度相交，第二辅助图案，其中所述 辅助图案设置在所述角度为0°以上且小于45°的位置 °和第三辅助图案，其中所述辅助图案设置在所述角度为45°的位置。

公开(公告)号：US5846861A

公开(公告)日：1998-12-08

申请号：US740507

申请日：1996-10-30

申请人： Kenji Saitoh

发明人： Kenji Saitoh

IPC分类号： H01L21/8247 ,  H01L27/105 ,  H01L29/788 ,  H01L29/792 ,  H01L21/336

CPC分类号： H01L27/11526 ,  H01L27/105 ,  H01L27/11543

摘要： In a method of manufacturing non-volatile semi-conductor memory including a memory cell transistor and a peripheral transistor, a floating gate and a control gate of the memory cell transistor is formed on a semiconductor substrate and a gate electrode of the peripheral transistor is formed on the semiconductor substrate. The control gate and gate electrode are covered with first and second insulating layers, respectively. A conductive layer is deposited to cover the first and second insulating layers. The conductive layer is etched back until the first and second insulating layers are exposed. An erasing gate of the memory cell transistor is formed by leaving the conductive layer on the insulating layer. A first mask layer on the second insulating layer and a second mask layer on the erasing gate is formed. The conductive layer remaining in the regions outside the masks is removed.

摘要翻译： 在制造包括存储单元晶体管和外围晶体管的非易失性半导体存储器的方法中，在半导体衬底上形成存储单元晶体管的浮置栅极和控制栅极，并且形成外围晶体管的栅电极 在半导体衬底上。 控制栅极和栅电极分别被第一绝缘层和第二绝缘层覆盖。 沉积导电层以覆盖第一和第二绝缘层。 将导电层回蚀刻直到暴露第一​​和第二绝缘层。 通过在绝缘层上留下导电层来形成存储单元晶体管的擦除栅极。 形成第二绝缘层上的第一掩模层和擦除栅极上的第二掩模层。 残留在掩模外的区域中的导电层被去除。

公开(公告)号：US5822389A

公开(公告)日：1998-10-13

申请号：US464038

申请日：1995-06-05

申请人： Shunichi Uzawa ,  Takao Kariya ,  Makoto Higomura ,  Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Kohji Uda ,  Kunitaka Ozawa ,  Mitsuaki Amemiya ,  Eiji Sakamoto ,  Naoto Abe ,  Kenji Saitoh

发明人： Shunichi Uzawa ,  Takao Kariya ,  Makoto Higomura ,  Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Kohji Uda ,  Kunitaka Ozawa ,  Mitsuaki Amemiya ,  Eiji Sakamoto ,  Naoto Abe ,  Kenji Saitoh

IPC分类号： G21K1/06 ,  G03F7/20 ,  G03F9/00 ,  G21K5/02 ,  G21K5/04 ,  G21K5/10 ,  H01L21/027 ,  H01L21/30 ,  H05H13/04 ,  G21K5/00

CPC分类号： G03F7/70008 ,  G03F7/702 ,  G03F7/70691 ,  G03F7/70741 ,  G03F7/70841 ,  G03F7/70866 ,  G03F7/70975 ,  G03F9/70 ,  G21K1/06

摘要： A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.

摘要翻译： 同步加速器曝光包括用于产生同步加速器辐射束的同步加速器辐射源，以及具有用于保持掩模的掩模台和用于保持摇摆的晶片台的曝光单元，用于将辐射束引导到曝光单元的光束端口 具有用于反射辐射束的反射镜的单元，用于使晶片相对于晶片台对准的预对准系统，用于使由晶片台保持的晶片相对于由掩模台保持的掩模对准的精细对准系统， 用于存储掩模的掩模存储装置，用于存储晶片的晶片存储装置，用于在掩模存储装置和掩模台之间传送掩模的掩模传送装置和用于在晶片存储装置和掩模载台之间传送晶片的晶片传送装置 晶圆台。

公开(公告)号：US5523976A

公开(公告)日：1996-06-04

申请号：US388453

申请日：1995-02-14

申请人： Takeshi Okazawa ,  Kenji Saitoh

发明人： Takeshi Okazawa ,  Kenji Saitoh

IPC分类号： G11C17/00 ,  G11C16/04 ,  G11C16/06 ,  G11C29/00 ,  G11C29/04 ,  H01L21/8247 ,  H01L27/115 ,  G11C7/00

CPC分类号： G11C29/808 ,  G11C29/82

摘要： A plurality of semiconductor memory cells are arranged in the form of a matrix and capable of electrically erasing and re-programming. Each of word lines is provided commonly to the memory cells in each row of the matrix and commonly connected to the gates of these memory cells, and each of bit lines is provided commonly to the memory cells in each column of the matrix and commonly connected to the drains of these memory cells. Each of common source lines is commonly connected to the sources of the memory cells in each pair of adjacent rows of the matrix. A memory cell group in a predetermined row or row pair of the matrix is operative as a redundant memory cell group for replacement of the other group.

摘要翻译： 多个半导体存储单元以矩阵的形式布置，并且能够电擦除和重新编程。 每个字线被共同地提供给矩阵的每一行中的存储器单元，并且通常连接到这些存储器单元的栅极，并且每个位线被共同地提供给矩阵的每列中的存储器单元，并且通常连接到 这些记忆单元的下水道。 每个公共源极线通常连接到矩阵的每对相邻行中的存储器单元的源极。 矩阵的预定行或行对中的存储单元组可用作用于替换另一组的冗余存储单元组。

公开(公告)号：US5455679A

公开(公告)日：1995-10-03

申请号：US384221

申请日：1995-02-06

申请人： Sakae Houryu ,  Kenji Saitoh

发明人： Sakae Houryu ,  Kenji Saitoh

IPC分类号： G03F9/00 ,  G01B11/27 ,  G01N21/86

CPC分类号： G03F9/70

摘要： A position detecting system includes a light source for producing a light beam for irradiating a reference mark formed on an object which is relatively displaceable relative to the light beam, a detector for detecting a light quantity distribution of the light from the reference mark, and a circuit for comparing a first light quantity distribution at a first position with a second light quantity distribution at a second position spaced from the first position by a predetermined distance, and for determining a reference position of the object on the basis of the comparison.

摘要翻译： 位置检测系统包括：光源，用于产生用于照射形成在物体上的参考标记的光束，所述参考标记相对于所述光束相对移位;检测器，用于检测来自所述参考标记的光的光量分布;以及 电路，用于将第一位置处的第一光量分布与在与第一位置隔开预定距离的第二位置处的第二光量分布进行比较，并且用于基于比较来确定对象的参考位置。

公开(公告)号：US20090015823A1

公开(公告)日：2009-01-15

申请号：US12171642

申请日：2008-07-11

申请人： Hiroshi Yoshikawa ,  Kenji Saitoh

发明人： Hiroshi Yoshikawa ,  Kenji Saitoh

IPC分类号： G01N21/00

CPC分类号： G01N21/952 ,  G01N21/4738 ,  G06T7/0004

摘要： An inspection apparatus includes a captured image acquiring unit configured to acquire a captured image that is acquired by shooting an inspection target, an acquiring unit configured to acquire from the captured image a first image region and a second image region whose intensity distributions of reflected light with respect to an incident angle of illumination light emitted to the inspection target are different, and an image processing unit configured to perform image processing for performing different surface inspections on the first image region and the second image region respectively.

摘要翻译： 检查装置包括拍摄图像获取单元，被配置为获取通过拍摄检查对象获取的拍摄图像;获取单元，被配置为从拍摄图像获取第一图像区域和第二图像区域，其中反射光的强度分布与 相对于发射到检查对象物的照明光的入射角度是不同的，图像处理单元被配置为执行对第一图像区域和第二图像区域进行不同的表面检查的图像处理。

公开(公告)号：US20070273782A1

公开(公告)日：2007-11-29

申请号：US11738773

申请日：2007-04-23

申请人： Kenji Saitoh ,  Hiroshi Yoshikawa ,  Kenichi Saito

发明人： Kenji Saitoh ,  Hiroshi Yoshikawa ,  Kenichi Saito

IPC分类号： H04N5/225 ,  G02B13/16

CPC分类号： G03B5/06 ,  G02B27/0025

摘要： Provided is an image pickup optical system capable of performing focusing in a wide region without a large increase in tilt angle in the case where an image of an object is picked up from a low angle. The image pickup optical system includes a first optical system and a second optical system, for enlarging an image formed by the first optical system and forming the enlarged image. A principal plane of the first optical system is tilted relative to an image plane of the second optical system.

摘要翻译： 提供一种摄像光学系统，其能够在从低角度拾取物体的图像的情况下在宽的区域中进行聚焦，而不会大幅度地增加倾斜角度。 摄像光学系统包括第一光学系统和第二光学系统，用于放大由第一光学系统形成的图像并形成放大的图像。 第一光学系统的主平面相对于第二光学系统的像平面倾斜。

公开(公告)号：US06839890B2

公开(公告)日：2005-01-04

申请号：US10247947

申请日：2002-09-20

申请人： Mitsuro Sugita ,  Kenji Saitoh ,  Kenji Yamazoe

发明人： Mitsuro Sugita ,  Kenji Saitoh ,  Kenji Yamazoe

IPC分类号： G03F1/42 ,  G03F1/36 ,  G03F1/68 ,  G03F1/70 ,  G03F1/76 ,  G03F7/20 ,  H01L21/027 ,  G06K17/50

CPC分类号： G03F1/36

摘要： A method for forming, on a mask, a mask pattern used for exposure. The mask pattern includes a first pattern that blends plural types of patterns, and second pattern that is smaller in size than the first pattern. The mask pattern is arranged on the mask so that the first pattern may be resolved and the second pattern is restrained from being resolved. The method includes the steps of classifying the first pattern into one of a periodic pattern having at least three elements having two equal intervals in at least one direction among two orthogonal directions, an isolated pair pattern that does not belong to the periodic pattern and includes a pair of elements arranged in at least one direction among the two orthogonal directions, and an isolated element that does not belong to the isolated pair pattern and includes only one element without constituting any pair in any of the two orthogonal directions, arranging the second pattern for the isolated pair pattern, arranging the second pattern for the isolated element, and arranging the second pattern for the periodic pattern.

摘要翻译： 一种在掩模上形成用于曝光的掩模图案的方法。 掩模图案包括混合多种类型的图案的第一图案和尺寸小于第一图案的第二图案。 掩模图案被布置在掩模上，使得可以解析第一图案并且限制第二图案被解析。 该方法包括以下步骤：将第一图案分类为在两个正交方向之间的至少一个方向上具有至少三个具有两个等间隔的元件的周期性图案之一，不属于周期性图案的隔离对图案，并且包括 在两个正交方向上沿至少一个方向布置的一对元件，以及不属于隔离对图案并且仅包含一个元件而不在两个正交方向中的任一个中构成任何对的隔离元件，将第二图案设置为 隔离对图案，布置用于隔离元件的第二图案，并且布置用于周期性图案的第二图案。

公开(公告)号：US06403291B1

公开(公告)日：2002-06-11

申请号：US09340134

申请日：1999-06-28

申请人： Miyoko Kawashima ,  Akiyoshi Suzuki ,  Kenji Saitoh

发明人： Miyoko Kawashima ,  Akiyoshi Suzuki ,  Kenji Saitoh

IPC分类号： G03C500

CPC分类号： G03F7/70575 ,  G03F7/2022 ,  G03F7/70333 ,  G03F7/70408 ,  G03F7/70425 ,  G03F7/7045 ,  G03F7/70466

摘要： A multiple exposure method includes a step of exposing a photosensitive material with a first pattern having a periodic pattern, and a step of exposing the photosensitive material with a second pattern different from the first pattern by using a projection optical system, wherein the step of exposing the photosensitive material with the second pattern is performed in each of a plurality of positions of the photosensitive material in an optical axis direction of the projection optical system relative to a focus position of an image of the second pattern, and wherein a desired pattern is formed in the photosensitive material by a multiple exposure including the step of exposing the photosensitive material with the first pattern and the step of exposing the photosensitive material with the second pattern.

摘要翻译： 多重曝光方法包括以具有周期性图案的第一图案曝光感光材料的步骤，以及通过使用投影光学系统以与第一图案不同的第二图案曝光感光材料的步骤，其中曝光步骤 具有第二图案的感光材料相对于第二图案的图像的焦点位置在投影光学系统的光轴方向上的感光材料的多个位置中的每一个中进行，并且其中形成期望的图案 在感光材料中通过多次曝光，包括用第一图案曝光感光材料的步骤和用第二图案曝光感光材料的步骤。

公开(公告)号：US06221541B1

公开(公告)日：2001-04-24

申请号：US09570936

申请日：2000-05-15

申请人： Makoto Ogusu ,  Kenji Saitoh

发明人： Makoto Ogusu ,  Kenji Saitoh

IPC分类号： G03F900

CPC分类号： G03F7/70425 ,  G03F7/70433 ,  G03F9/70

摘要： A method of manufacturing an element with a concentric pattern by use of a photolithographic process is disclosed, wherein the method includes preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly, and exposing regions of a substrate corresponding to the plural zones, respectively, by using the masks corresponding to the zones, respectively, while rotating the substrate by regular angles.

摘要翻译： 公开了一种通过使用光刻工艺制造具有同心图案的元件的方法，其中该方法包括分别制备具有对应于图案的扇形区域的扇形图案的掩模，该扇形图案可以通过划分扇形区域来限定扇形区域 所述图案与所述图案同心的至少一个圆圈以提供多个区域，然后通过等角度地划分每个区域，并且分别通过使用对应于所述区域的掩模来分别暴露与所述多个区域相对应的基板的区域，同时旋转 基板以规则的角度。