METHOD OF MANUFACTURING A SEMICONDUCTOR PACKAGE

    公开(公告)号:US20210020505A1

    公开(公告)日:2021-01-21

    申请号:US16797990

    申请日:2020-02-21

    Abstract: A method of manufacturing a semiconductor package is provided including forming a lower redistribution layer. A conductive post is formed on the lower redistribution layer. A semiconductor chip is mounted on the lower redistribution layer. A molding member is formed on the lower redistribution layer. An upper surface of the molding member is at a level lower than an upper surface of the conductive post. An insulating layer is formed on the molding member. An upper surface of the insulating layer is at a level higher than the upper surface of the conductive post. The insulating layer is etched to expose the upper surface of the conductive post. An upper redistribution layer is formed on the insulating layer. The upper redistribution layer is electrically connected to the conductive post.

    Method of fabricating semiconductor package

    公开(公告)号:US10741518B2

    公开(公告)日:2020-08-11

    申请号:US16698117

    申请日:2019-11-27

    Abstract: A semiconductor package includes: a redistribution substrate; a semiconductor chip on the redistribution substrate; and an external terminal on a bottom surface of the redistribution substrate, wherein the redistribution substrate comprises: a first insulating layer including a first opening; a second insulating layer on the first insulating layer and including a second opening, wherein the second opening is positioned in the first opening in a plan view; a first barrier metal layer disposed along a sidewall of the first opening and along a sidewall of the second opening; a first redistribution conductive pattern on the first barrier metal layer; a third insulating layer on a bottom surface of the first insulating layer; and a pad penetrating the third insulating layer and electrically connecting to the first redistribution conductive pattern, wherein the external terminal is provided on the pad, wherein the second insulating layer at least partially covers a chip pad of the semiconductor chip, and the second opening at least partially exposes the chip pad, wherein, inside the second insulating layer, the first barrier metal layer is in contact with the chip pad through the second opening, and wherein the first redistribution conductive pattern has a surface roughness including protrusions extending in a range of from about 0.01 μm to about 0.5 μm, and the first insulating layer has a surface roughness smaller than the surface roughness of the first redistribution conductive pattern.

    Semiconductor package
    64.
    发明授权

    公开(公告)号:US12300589B2

    公开(公告)日:2025-05-13

    申请号:US17405603

    申请日:2021-08-18

    Abstract: Disclosed are semiconductor packages and methods of fabricating the same. The semiconductor package comprises a first redistribution substrate and a first semiconductor device on the first redistribution substrate. The first redistribution substrate includes a first dielectric layer that includes a first hole, an under-bump that includes a first bump part in the first hole and a second bump part that protrudes from the first bump part onto the first dielectric layer, an external connection terminal on a bottom surface of the first dielectric layer and connected to the under-bump through the first hole, a wetting layer between the external connection terminal and the under-bump, and a first barrier/seed layer between the under-bump and the first dielectric layer and between the under-bump and the wetting layer.

    Semiconductor package
    65.
    发明授权

    公开(公告)号:US12237256B2

    公开(公告)日:2025-02-25

    申请号:US18183062

    申请日:2023-03-13

    Abstract: A semiconductor package includes a redistribution substrate and a semiconductor chip thereon. The redistribution substrate includes a ground under-bump pattern, signal under-bump patterns laterally spaced apart from the ground under-bump pattern, first signal line patterns disposed on the signal under-bump patterns and coupled to corresponding signal under-bump patterns, and a first ground pattern coupled to the ground under-bump pattern and laterally spaced apart from the first signal line pattern. Each of the signal and ground under-bump patterns includes a first part and a second part formed on the first part and that is wider than the first part. The second part of the ground under-bump pattern is wider than the second part of the signal under-bump pattern. The ground under-bump pattern vertically overlaps the first signal line patterns. The first ground pattern does not vertically overlap the signal under-bump patterns.

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