公开(公告)号：US07902701B2

公开(公告)日：2011-03-08

申请号：US12749991

申请日：2010-03-30

申请人： Shinichi Ito ,  Shinji Nishimura ,  Atsushi Hirokado

发明人： Shinichi Ito ,  Shinji Nishimura ,  Atsushi Hirokado

IPC分类号： H02K11/04

CPC分类号： H02K9/06 ,  H02K11/046

摘要： A positive-side heatsink and a negative-side heatsink that constitute a rectifier are disposed inside a case at a rear end of a rotor so as to be separated axially such that front surfaces of a positive-side base portion and a negative-side base portion face each other. The negative-side heatsink is disposed such that radiating fins that are disposed so as to project from a rear surface of the negative-side base portion are positioned radially outside a cooling fan so as to face a coil end of a stator coil.

摘要翻译： 构成整流器的正侧散热片和负极侧散热片配置在转子的后端的壳体的内侧，从而轴向分离，使正极侧基部和负极侧基板 部分面对面。 负侧散热器被布置成使得从负侧基部的后表面突出设置的散热片位于冷却风扇的径向外侧，以面向定子线圈的线圈端。

公开(公告)号：USD632362S1

公开(公告)日：2011-02-08

申请号：US29365168

申请日：2010-07-04

申请人： Shinichi Ito ,  Michihiro Hanada

设计人： Shinichi Ito ,  Michihiro Hanada

公开(公告)号：US07851363B2

公开(公告)日：2010-12-14

申请号：US11034975

申请日：2005-01-14

申请人： Tomoyuki Takeishi ,  Hirokazu Kato ,  Shinichi Ito

发明人： Tomoyuki Takeishi ,  Hirokazu Kato ,  Shinichi Ito

IPC分类号： H01L21/311

CPC分类号： G03F7/094 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/091 ,  G03F7/11 ,  G03F7/162 ,  G03F7/168 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/2022 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/32 ,  G03F7/38 ,  H01L21/02052 ,  H01L21/0276 ,  H01L21/0332 ,  H01L21/31144 ,  H01L21/67023

摘要： A pattern forming method includes forming a spin on dielectric film on a substrate, washing the spin on dielectric film by using a washing liquid, drying a surface of the spin on dielectric film after the washing, forming a photosensitive film on the dried coating type insulation film, emitting energy rays to a predetermined position of the photosensitive film in order to form a latent image on the photosensitive film, developing the photosensitive film in order to form a photosensitive film pattern which corresponds to the latent image, and processing the spin on dielectric film with the photosensitive film pattern serving as a mask.

摘要翻译： 图案形成方法包括在基板上形成电介质膜上的自旋，通过使用洗涤液清洗电介质膜上的自旋，洗涤之后干燥电介质膜上的自旋表面，在干燥的涂层型绝缘上形成感光膜 膜，将能量射线发射到感光膜的预定位置，以在感光膜上形成潜像，使感光膜显影，以形成对应于潜像的感光膜图案，并处理电介质上的自旋 具有感光胶片图案的胶片作为掩模。

公开(公告)号：US20100268098A1

公开(公告)日：2010-10-21

申请号：US12810680

申请日：2009-01-15

申请人： Shinichi Ito ,  Yukiya Sawanoi ,  Shingo Yamashita ,  Mika Eto ,  Takahide Tanaka

发明人： Shinichi Ito ,  Yukiya Sawanoi ,  Shingo Yamashita ,  Mika Eto ,  Takahide Tanaka

IPC分类号： A61B5/02

CPC分类号： A61B5/022 ,  A61B2562/225

摘要： A measurement accuracy check system of a sphygmomanometer includes a sphygmomanometer having a blood pressure measurement mode for measuring a blood pressure based on a change in internal pressure of a cuff attached to a blood pressure measurement site, and an accuracy check mode for checking measurement accuracy in the blood pressure measurement mode, and an accuracy check device communicably connected with the sphygmomanometer for determining the measurement accuracy of the sphygmomanometer in the accuracy check mode. The sphygmomanometer includes an air system piping communicating to the cuff in the blood pressure measurement mode and communicating to an air system of the accuracy check device in the accuracy check mode, a pressurization and depressurization unit for adjusting pressure to be applied to the air system piping, and a first pressure detection unit for detecting pressure in the air system piping.

摘要翻译： 血压计的测量精度检查系统包括：血压计，具有血压计测量模式，用于根据附着于血压测量部位的袖带内压的变化来测量血压;以及精度检查模式，用于检查测量精度 血压测量模式以及与血压计可通信地连接的精度检查装置，用于确定精度检查模式中血压计的测量精度。 血压计包括在血压测量模式下与袖带通信的空气系统管道，并且以精度检查模式与精度检查装置的空气系统通信，用于调节施加到空气系统管道的压力的加压和减压单元 以及用于检测空气系统管道中的压力的​​第一压力检测单元。

公开(公告)号：US07779777B2

公开(公告)日：2010-08-24

申请号：US12466525

申请日：2009-05-15

申请人： Eishi Shiobara ,  Hirokazu Kato ,  Seiro Miyoshi ,  Shinichi Ito

发明人： Eishi Shiobara ,  Hirokazu Kato ,  Seiro Miyoshi ,  Shinichi Ito

IPC分类号： B05B15/02 ,  B05B3/00 ,  B05B1/28 ,  B05B13/02

CPC分类号： H01L21/67253 ,  H01L21/67051 ,  H01L21/6715

摘要： A substrate-processing apparatus includes a sample table which mounts thereon a to-be-processed substrate, a first line which supplies a chemical solution, a second line which supplies a cleaning liquid, a three-way valve connected to the first and second lines and configured to select one of the first and second lines, a filter provided across the first line upstream of the three-way valve, and configured to eliminate a foreign material from the chemical solution, and a nozzle provided downstream of the three-way valve and configured to discharge the chemical solution or the cleaning liquid when the first or second line is selected via the three-way valve. The three-way valve selects the first line when the substrate is coated with the chemical solution, and selects the second line in other cases.

摘要翻译： 基板处理装置包括安装在被处理基板上的样品台，供给化学溶液的第一管线，供给清洗液的第二管线，与第一管路和第二管路连接的三通阀 并且构造成选择第一和第二管线中的一个，设置在三通阀上游的第一线上的过滤器，并且被配置为从化学溶液中除去异物，以及设置在三通阀下游的喷嘴 并且构造成当通过三通阀选择第一或第二管线时，排出化学溶液或清洗液体。 当基材涂有化学溶液时，三通阀选择第一行，在其他情况下选择第二行。

公开(公告)号：US07749665B2

公开(公告)日：2010-07-06

申请号：US11108751

申请日：2005-04-19

申请人： Daisuke Kawamura ,  Shinichi Ito

发明人： Daisuke Kawamura ,  Shinichi Ito

IPC分类号： G03F9/00

CPC分类号： G03F7/70616 ,  G03F7/70341 ,  G03F7/70433 ,  G03F7/70441

摘要： A method of generating a writing pattern is disclosed, which generates, from pattern data, writing pattern data to write a mask pattern in a photomask used in an exposure tool comprising a projection optical system to transfer the mask pattern to a resist film formed on a substrate, an immersion mechanism which forms a liquid film in a local region, and a movement mechanism which moves the substrate with respect to the projection optical system and the immersion mechanism, the method comprising obtaining a typical distribution of contact history values between the resist film and the liquid film in the unit exposure region, dividing a pattern which corresponds to the pattern data into a plurality of regions according to the typical distribution of the contact history values, and carrying out correction of a pattern included in each of the divided regions under a rule according to the contact history values.

摘要翻译： 公开了一种生成写入图案的方法，其从图案数据生成写入图案数据以将掩模图案写入用于包括投影光学系统的曝光工具中的光掩模中，以将掩模图案转印到形成在 基板，在局部区域形成液膜的浸渍机构，以及相对于投影光学系统和浸渍机构移动基板的移动机构，所述方法包括获得抗蚀剂膜之间的接触历史值的典型分布 和单位曝光区域中的液膜，根据接触历史值的典型分布将与图案数据对应的图案分割成多个区域，并对包含在每个分割区域内的图案进行校正 根据联系历史值的规则。

公开(公告)号：US20100140921A1

公开(公告)日：2010-06-10

申请号：US12598773

申请日：2008-03-05

申请人： Shinichi Ito

发明人： Shinichi Ito

IPC分类号： F16L55/00

CPC分类号： F16L15/08 ,  F16L23/032

摘要： An adapter includes a base body including a pair of coupling members and a connecting plug inserted through a hole in the base body and screw-engaged with a port of the two-way valve. In addition, upon threaded engagement of the connecting plug, the base body is mounted with respect to an attachment surface of the two-way valve. Further, a seal member is installed on an end surface of the base body, such that a sealing function is performed by abutment of the seal member against the attachment surface. Moreover, first and second connecting flanges of a connecting apparatus are engaged with respect to the coupling members of the adapter.

摘要翻译： 适配器包括基体，其包括一对联接构件和通过基体中的孔插入并与二通阀的端口螺纹接合的连接塞。 此外，在连接插头的螺纹接合时，基体相对于开闭阀的安装面安装。 此外，密封构件安装在基体的端面上，使得通过密封构件抵靠附接表面进行密封功能。 此外，连接装置的第一和第二连接凸缘相对于适配器的联接构件接合。

公开(公告)号：US20100099036A1

公开(公告)日：2010-04-22

申请号：US12654295

申请日：2009-12-16

申请人： Daisuke Kawamura ,  Shinichi Ito

发明人： Daisuke Kawamura ,  Shinichi Ito

IPC分类号： G03F7/20

CPC分类号： G03F7/11 ,  G03F7/70341 ,  G03F7/7065 ,  G03F7/70958 ,  Y10S430/162

摘要： A pattern forming method includes forming a resist film on a substrate, coating the resist film with a coating solution which forms a cover film on the resist film to form the cover film on the resist film, transferring a pattern onto the resist film by an immersion lithography method using a liquid immersion fluid to form a latent image on the resist film, removing the cover film after the formation of the latent image, conducting a first inspection to inspect whether or not the cover film has a defect between said forming the latent image and said removing the cover film, performing predetermined processing when the defect is found in the first inspection, and developing the resist film to form a resist pattern on the substrate after said removing the cover film.

摘要翻译： 图案形成方法包括在基板上形成抗蚀剂膜，在抗蚀剂膜上形成覆盖膜的涂布溶液涂布抗蚀膜，在抗蚀剂膜上形成覆盖膜，通过浸渍将图案转印到抗蚀剂膜上 使用液浸液体在抗蚀剂膜上形成潜像的光刻方法，在形成潜像后去除覆盖膜，进行第一次检查以检查覆盖膜在形成潜像之间是否存在缺陷 并且在所述第一检查中发现所述缺陷时，移除所述覆盖膜，执行预定处理，以及在除去所述覆盖膜之后，在所述基板上显影所述抗蚀剂膜以形成抗蚀剂图案。

公开(公告)号：US07687227B2

公开(公告)日：2010-03-30

申请号：US11316898

申请日：2005-12-27

申请人： Eishi Shiobara ,  Daisuke Kawamura ,  Yasunobu Onishi ,  Shinichi Ito

发明人： Eishi Shiobara ,  Daisuke Kawamura ,  Yasunobu Onishi ,  Shinichi Ito

IPC分类号： G03F7/26

CPC分类号： G03F7/11 ,  G03F7/2041

摘要： According to an aspect of the invention, there is provided a resist pattern forming method of forming a resist pattern by immersion exposure, comprising forming a resist film on a substrate to be treated, a contact angle between the resist film and an immersion liquid being a first angle, forming a first cover film on the resist film, a contact angle between the first cover film and the immersion liquid being a second angle which is larger than the first angle, forming a second cover film on the first cover film, a contact angle between the second cover film and the immersion liquid being a third angle which is smaller than the second angle, and forming a latent image on the resist film by the immersion exposure.

摘要翻译： 根据本发明的一个方面，提供了一种通过浸渍曝光形成抗蚀剂图案的抗蚀剂图案形成方法，包括在待处理的基底上形成抗蚀剂膜，所述抗蚀剂膜和浸渍液体之间的接触角为 第一角度，在抗蚀剂膜上形成第一覆盖膜，第一覆盖膜和浸渍液体之间的接触角是大于第一角度的第二角度，在第一覆盖膜上形成第二覆盖膜，接触 第二覆盖膜和浸液之间的角度是比第二角度小的第三角度，并且通过浸渍曝光在抗蚀剂膜上形成潜像。

公开(公告)号：US07541136B2

公开(公告)日：2009-06-02

申请号：US11472452

申请日：2006-06-22

申请人： Kyoko Izuha ,  Hideki Kanai ,  Soichi Inoue ,  Shingo Kanamitsu ,  Shinichi Ito

发明人： Kyoko Izuha ,  Hideki Kanai ,  Soichi Inoue ,  Shingo Kanamitsu ,  Shinichi Ito

IPC分类号： G03C5/00

CPC分类号： G03F1/30 ,  G03F1/32 ,  G03F7/70641 ,  G03F7/70683

摘要： Disclosed is a mask comprising a first area including a first surrounding area in which a halftone phase shift film or a stacked film of a halftone phase shift film and an opaque film is provided on a transparent substrate, and a first opening area surrounded by the first surrounding area, and a second area including a second surrounding area in which a halftone phase shift film is provided on the transparent substrate and a second opening area surrounded by the second surrounding area, wherein a transparent film is provided in at least a part of the second opening area, the transparent film being configured to give a predetermined phase difference to exposure light passing through that part of the second opening area in which the transparent film is provided relative to exposure light passing through the second surrounding area.

摘要翻译： 公开了一种掩模，其包括：第一区域，包括第一周围区域，在透明基板上设置有半色调相移膜或半色调相移膜的叠层膜和不透明膜;以及第一开口区域， 以及第二区域，其包括在透明基板上设置半色调相移膜的第二周围区域和由第二周围区域围绕的第二开口区域，其中在至少一部分中设置透明膜 第二开口区域，所述透明膜被配置为相对于穿过所述第二周围区域的曝光光而通过其中设置有所述透明膜的所述第二开口区域的那部分的曝光而给予预定的相位差。