摘要:
An optical membrane element for an optical device in lithography, especially EUV (extreme ultraviolet) lithography, includes at least one membrane layer and a frame, which at least partially surrounds the membrane layer and at which at least part of the rim of the membrane layer is mounted. At least one tautening element is provided, which facilitates tautening of the membrane layer and wherein the optical membrane element can be used in a projection exposure system, especially for EUV lithography, such that the membrane layer of the membrane element can be adjustably tautened, such that the membrane layer is flat. A method for manufacturing a corresponding optical membrane element includes generating a tautening element lithographically together with the membrane layer.
摘要:
In a leaf spring arrangement for a chassis of a motor vehicle, a leaf spring includes multiple layers made of a glass fiber composite plastic, a reinforcement made of a carbon composite plastic and being disposed between an upper and a lower one of the layers, and a core made of a different material than the reinforcement and being disposed between the upper and lower layers, wherein the reinforcement is arranged along a longitudinal a side of the core. The leaf spring is coupled at its center region to an axle of the motor vehicle by a center connection and to the vehicle body by bodywork connections, wherein the leaf spring is tilted by an angle relative to the vertical axis of the motor vehicle.
摘要:
The invention relates to a motor vehicle having an operator control element for the operator control of a function of the motor vehicle, wherein the operator control element comprises an upwardly directed surface having a touchpad for the operator control of at least a first function of the motor vehicle, and wherein the operator control element can be displaced in one direction essentially parallel to the upwardly directed surface for the purpose of operator control of at least a second function of the motor vehicle.
摘要:
The present invention relates to an organotemplate-free synthetic process for the production of a zeolitic material having a BEA framework structure comprising YO2 and optionally comprising X2O3, wherein said process comprises the steps of (1) preparing a mixture comprising seed crystals and at least one source for YO2; and (2) crystallizing the mixture; wherein Y is a tetravalent element, and X is a trivalent element, wherein the zeolitic material optionally comprises at least one alkali metal M, wherein when the BEA framework additionally comprises X2O3, the mixture according to step (1) comprises at least one source for X2O3, and wherein the seed crystals comprise zeolitic material having a BEA framework structure, preferably zeolite Beta.
摘要翻译:本发明涉及一种用于生产具有包含YO 2和任选地包含X 2 O 3的BEA骨架结构的沸石材料的无机模板合成方法,其中所述方法包括以下步骤:(1)制备包含晶种和至少一种 来源为YO2; 和(2)使混合物结晶; 其中Y是四价元素,X是三价元素,其中沸石材料任选地包含至少一种碱金属M,其中当BEA骨架另外包含X 2 O 3时,根据步骤(1)的混合物包含至少一种源 X 2 O 3,并且其中所述晶种包含具有BEA骨架结构的沸石材料,优选沸石β。
摘要:
A method for arranging an optical module in a measuring apparatus includes: providing the measuring apparatus with an irradiation system for irradiating the optical module with electromagnetic radiation, a reference component, and a detection element defining a detection surface, the detection element being disposed in a defined position in relation to the reference component, disposing the optical module in the measuring apparatus such that the radiation emitted by the irradiation system passes through the optical module and impinges onto the detection surface as an exit beam, measuring a position of the exit beam in relation to the detection surface, adjusting the position of the optical module within the measuring apparatus such that the position of the exit beam in relation to the detection surface is brought to correspond to a predetermined position, and establishing position parameters defining the position of the optical module in relation to the reference component.
摘要:
In a leaf spring arrangement for a chassis of a motor vehicle, a leaf spring includes multiple layers made of a glass fiber composite plastic, a reinforcement made of a carbon composite plastic and being disposed between an upper and a lower one of the layers, and a core made of a different material than the reinforcement and being disposed between the upper and lower layers, wherein the reinforcement is arranged along a longitudinal a side of the core. The leaf spring is coupled at its center region to an axle of the motor vehicle by a center connection and to the vehicle body by bodywork connections, wherein the leaf spring is tilted by an angle relative to the vertical axis of the motor vehicle.
摘要:
A woven laminate for sound absorption that includes a first woven layer, a second woven layer, and a third woven layer. The first woven layer has a coarse structure. The second woven layer has a fine structure. The third woven layer has a medium structure. Each of the first, second, and third woven layers are composed of metallic wires that are woven to each other or interlaced as a fleece. At least one of the first, the second, and the third woven layers are superimposed in order to form the woven laminate. The woven layers are placed in the layer order fine-coarse-medium. The woven layers are welded together at least partially.
摘要:
The present invention relates to a process for the preparation of a silicate comprising at least silicon and oxygen, comprising (1) mixing of silicon dioxide and/or of a silicon dioxide precursor with an aqueous solution comprising at least one tetraalkylammonium compound comprising R1R2R3R4N+ and at least one base, wherein R1 and R2 are methyl and both R3 and R4 are n-propyl; (2) heating of the colloidal solution obtained according to (1) to a temperature in the range of from greater than the boiling point of the colloidal solution under the chosen pressure to 180° C. at atmospheric pressure to give a suspension comprising at least one silicate, wherein the silicate comprising at least silicon and oxygen is added as a crystallization auxiliary in (1).
摘要:
A process for the preparation of a copper containing zeolitic material having CHA framework structure and a composition comprising the molar ratio (n YO2):X2O3 wherein X is a trivalent element, preferably Al, Y is a tetravalent element, preferably Si, and wherein n is preferably at least 20, the process comprising the preparation of an phosphor-free aqueous solution containing at least one source for X2O3 and at least one source for YO2, at least one structure directing agent suitable for the preparation of a zeolitic material having CHA framework structure, and at least one Cu source, and the process further comprising the hydrothermal crystallization of said aqueous solution obtaining a suspension containing the copper containing zeolitic material having CHA framework structure.
摘要翻译:一种制备具有CHA骨架结构的含铜沸石材料和包含摩尔比(n YO 2):X 2 O 3的组合物的方法,其中X是三价元素,优选Al,Y是四价元素,优选Si,其中n 优选至少为20,该方法包括制备含有至少一种X 2 O 3源和至少一种YO源的无磷水溶液,至少一种适于制备具有CHA骨架的沸石材料的结构导向剂 结构和至少一个Cu源,并且所述方法还包括所述水溶液的水热结晶,得到含有具有CHA骨架结构的含铜沸石材料的悬浮液。
摘要:
A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26. An evaluation device (54) is configured to establish a lateral position of the image of the measurement structure (48) in the area of the detector (52) during the exposure process.