公开(公告)号：US20080135754A1

公开(公告)日：2008-06-12

申请号：US11939121

申请日：2007-11-13

Applicant: Yoshiyuki Eto

Inventor： Yoshiyuki Eto

IPC: G21K5/04 ,  G01N23/08

CPC classification number: G01N23/2251 ,  H01J37/244 ,  H01J37/252 ,  H01J2237/24564 ,  H01J2237/24592

Abstract: A charged-particle beam system capable of reliably detecting defects in an interconnect pattern, which is formed, for example, on a semiconductor device. The system uses an electron source for producing an electron beam. A specimen on which the interconnect pattern is formed is scanned with the electron beam in two dimensions. An image of the specimen is created based on a signal obtained from the specimen in response to the scanning, and the image is displayed on a display portion. Two probes are brought into contact with arbitrary locations on the interconnect pattern. Absorption currents obtained via the probes are applied to a differential current-voltage converter. Thus, the difference between the absorption currents is converted into a voltage signal. An absorption current image is created based on the voltage signal and displayed on the display portion.

Abstract translation: 一种能够可靠地检测例如在半导体器件上形成的布线图案中的缺陷的带电粒子束系统。 该系统使用电子源来产生电子束。 在其上形成有互连图案的样本在两个维度上用电子束扫描。 基于从样本获得的响应于扫描的信号创建样本的图像，并且将图像显示在显示部分上。 两个探针与互连图案上的任意位置接触。 通过探头获得的吸收电流被施加到差分电流 - 电压转换器。 因此，吸收电流之间的差被转换为电压信号。 基于电压信号产生吸收电流图像并显示在显示部分上。

公开(公告)号：US07348566B2

公开(公告)日：2008-03-25

申请号：US11364299

申请日：2006-02-28

Applicant: Rudolf M. Tromp

Inventor： Rudolf M. Tromp

IPC: G01J1/42

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/252 ,  H01J37/295 ,  H01J2237/055 ,  H01J2237/1534 ,  H01J2237/2538 ,  H01J2237/2544

Abstract: An aberration-correcting microscopy instrument is provided. The instrument has a first magnetic deflector disposed for reception of a first non-dispersed electron diffraction pattern. The first magnetic deflector is also configured for projection of a first energy dispersed electron diffraction pattern in an exit plane of the first magnetic deflector. The instrument also has an electrostatic lens disposed in the exit plane of a first magnetic deflector, as well as a second magnetic deflector substantially identical to the first magnetic deflector. The second magnetic deflector is disposed for reception of the first energy dispersed electron diffraction pattern from the electrostatic lens. The second magnetic deflector is also configured for projection of a second non-dispersed electron diffraction pattern in a first exit plane of the second magnetic deflector. The instrument also has an electron mirror configured for correction of one or more aberrations in the second non-dispersed electron diffraction pattern. The electron mirror is disposed for reflection of the second non-dispersed electron diffraction pattern to the second magnetic deflector for projection of a second energy dispersed electron diffraction pattern in a second exit plane of the second magnetic deflector.

Abstract translation: 提供了一种像差校正显微镜仪器。 仪器具有设置用于接收第一非分散电子衍射图案的第一磁偏转器。 第一磁偏转器还被配置用于在第一磁偏转器的出射平面中投射第一能量分散电子衍射图案。 仪器还具有设置在第一磁偏转器的出射平面中的静电透镜以及与第一磁偏转器基本相同的第二磁偏转器。 第二磁偏转器被设置用于从静电透镜接收第一能量分散电子衍射图案。 第二磁偏转器还被配置用于在第二磁偏转器的第一出射平面中投射第二非分散电子衍射图案。 仪器还具有配置用于校正第二非分散电子衍射图案中的一个或多个像差的电子反射镜。 电子反射镜被设置用于将第二非分散电子衍射图案反射到第二磁偏转器，用于在第二磁偏转器的第二出射平面中投射第二能量分散电子衍射图案。

公开(公告)号：US20080067383A1

公开(公告)日：2008-03-20

申请号：US11820358

申请日：2007-06-19

Applicant: Masayuki Kuribara

Inventor： Masayuki Kuribara

IPC: G21K7/00

CPC classification number: H01J37/20 ,  H01J37/244 ,  H01J37/252 ,  H01J2237/0435 ,  H01J2237/20235 ,  H01J2237/20292 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: An electron-beam size measuring apparatus includes: electron beam irradiating means that irradiates an electron beam on a surface of a sample; detection means that detects electrons emitted from the sample; distance measurement means that measures the distance between the sample and a secondary electron control electrode of the detection means; a stage on which the sample is mounted; and control means which adjusts the height of the stage so that the distance measured by the distance measurement means would be equal to a predetermined fixed distance, which applies a control voltage to the secondary electron control electrode of the detection means, the control voltage predetermined so as to allow the sample surface potential to become constant with the sample positioned at the fixed distance, and which causes the electron beam to be irradiated by applying a predetermined accelerating voltage. The stage may include holding means that does not electrically connect the sample thereto, and moving means that moves the sample up and down.

Abstract translation: 电子束尺寸测量装置包括：电子束照射装置，其在样品的表面上照射电子束; 检测装置，其检测从样品发射的电子; 距离测量装置，用于测量检测装置的样品与二次电子控制电极之间的距离; 安装样品的阶段; 以及控制装置，其调节台的高度，使得由距离测量装置测量的距离将等于预定的固定距离，其将控制电压施加到检测装置的二次电子控制电极，预定的控制电压 为了使样品表面电位变得恒定，样品位于固定距离处，并且通过施加预定的加速电压使得电子束被照射。 舞台可以包括不将样本电连接的保持装置和使样本上下移动的移动装置。

公开(公告)号：US20070200062A1

公开(公告)日：2007-08-30

申请号：US11364298

申请日：2006-02-28

Applicant: Rudolf Tromp

Inventor： Rudolf Tromp

IPC: H01J37/05 ,  H01J49/46 ,  H01J37/26 ,  G01N23/225 ,  G01N23/227

CPC classification number: H01J37/05 ,  H01J37/252 ,  H01J2237/0458 ,  H01J2237/057 ,  H01J2237/2538 ,  H01J2237/2544

Abstract: An energy filtering microscopy instrument is provided. An objective lens is disposed for reception of electrons in order to form an electron diffraction pattern in a backfocal plane of the objective lens. An entrance aperture disposed in the backfocal plane of the objective lens for filtering a slice of the electron diffraction pattern. A magnetic deflector has an entrance plane and an exit plane. The entrance aperture is disposed in the entrance plane. The magnetic deflector is disposed to receive the slice of the electron diffraction pattern and project an energy dispersed electron diffraction pattern to the exit plane. An exit aperture is disposed in the exit plane of the magnetic deflector for selection of desired electron energy of the energy dispersed electron diffraction pattern.

Abstract translation: 提供能量过滤显微镜仪器。 为了在物镜的背面平面中形成电子衍射图案，设置物镜接收电子。 设置在物镜的背面平面中的入口孔，用于过滤电子衍射图案的切片。 导磁板具有入射面和出射面。 入口孔设置在入口平面中。 磁偏转器被设置为接收电子衍射图案的切片并将能量分散的电子衍射图案投射到出射平面。 出口孔布置在磁偏转器的出射平面中，用于选择能量分散的电子衍射图案的期望的电子能量。

公开(公告)号：US20070138388A1

公开(公告)日：2007-06-21

申请号：US11600250

申请日：2006-11-15

Applicant: Billy Ward ,  John Notte ,  Louis Farkas ,  Randall Percival ,  Raymond Hill

Inventor： Billy Ward ,  John Notte ,  Louis Farkas ,  Randall Percival ,  Raymond Hill

IPC: H01J49/00

CPC classification number: H01J37/08 ,  B82Y10/00 ,  B82Y40/00 ,  H01J27/26 ,  H01J37/20 ,  H01J37/252 ,  H01J37/28 ,  H01J37/3056 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/2566 ,  H01J2237/2623 ,  H01J2237/2812 ,  H01J2237/30438 ,  H01J2237/3174 ,  H01J2237/31755

Abstract: Ion sources, systems and methods are disclosed.

公开(公告)号：US07115866B1

公开(公告)日：2006-10-03

申请号：US11116617

申请日：2005-04-28

Applicant: Roger Kroeze ,  David A. Soltz ,  David A. Crewe ,  Gregory W. Grant ,  Chiyan Kuan ,  Thierry H. C. Nguyen ,  Salvatore T. Fahey ,  Edward M. James

Inventor： Roger Kroeze ,  David A. Soltz ,  David A. Crewe ,  Gregory W. Grant ,  Chiyan Kuan ,  Thierry H. C. Nguyen ,  Salvatore T. Fahey ,  Edward M. James

IPC: G21K7/00 ,  G01N23/00

CPC classification number: G01N23/2252 ,  H01J37/252 ,  H01J37/265 ,  H01J2237/24592 ,  H01J2237/2487 ,  H01J2237/2561 ,  H01J2237/30477

Abstract: A method of measuring properties of a sample using an electron beam. Coordinates of a measurement site on the sample, and a diameter of the electron beam are defined. Multiple measurement locations are determined within the measurement site, using the coordinates of the measurement site and the diameter of the electron beam. The measurement locations are selected such that the electron beam when directed at the multiple measurement locations (either through beam deflection or sample movement) substantially covers the measurement site. The electron beam is directed to the measurement locations and properties of the sample are measured at each of the measurement locations.

Abstract translation: 使用电子束测量样品的性质的方法。 定义样品上的测量部位的坐标和电子束的直径。 使用测量部位的坐标和电子束的直径，在测量部位内确定多个测量位置。 选择测量位置使得当指向​​多个测量位置（通过光束偏转或样品移动）时的电子束基本上覆盖测量位置。 电子束被引导到测量位置，并且在每个测量位置处测量样品的性质。

公开(公告)号：US20060163479A1

公开(公告)日：2006-07-27

申请号：US11372057

申请日：2006-03-10

Applicant: Kazutoshi Kaji ,  Takashi Aoyama ,  Shunroku Taya ,  Shigeto Isakozawa

Inventor： Kazutoshi Kaji ,  Takashi Aoyama ,  Shunroku Taya ,  Shigeto Isakozawa

IPC: G21K7/00

CPC classification number: G01N23/2251 ,  H01J37/05 ,  H01J37/244 ,  H01J37/252 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/24495 ,  H01J2237/2487 ,  H01J2237/262 ,  H01J2237/2802 ,  H05H1/0037

Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.

公开(公告)号：US20010045515A1

公开(公告)日：2001-11-29

申请号：US09156431

申请日：1998-09-18

Inventor： YUJI SATO ,  SHIGETO ISAKOZAWA ,  WATARU SHIMOYAMA

IPC: G21K007/00 ,  G01N023/00

CPC classification number: H01J37/252

Abstract: In order to provide an analysis electron microscope which is capable of effectively performing elementary analysis of plural analysis points of a sample, an electron beam 2 discharged from an electronic source 1 irradiates the sample through a condenser lens aperture 3. The electron beam 2 transmitted through the sample 12 is magnified by an objective lens and a plural focussing lens 18 and forms an electron microscope image of the sample 12 on a fluorescent plate 13. A characteristic X-ray emitted from the sample 12 is detected by the elementary analysis device having the elementary analysis detecting element 16 and an elementary analysis control equipment 17 and is analyzed. The position of the analysis points 1 and 2 of the sample and the spot size of the irradiation electron beam is stored in an electron microscope control equipment 14 beforehand, and when the analysis starts, the stored position and size information begin to be read, the analysis points 1 and 2 and the electron beam size are set automatically based on the information, and the elementary analysis of the analysis points 1 and 2 is thereby performed automatically.

Abstract translation: 为了提供能够有效地进行样品的多个分析点的元素分析的分析电子显微镜，从电子源1排出的电子束2通过聚光透镜孔3照射样品。电子束2透过 样品12由物镜和多个聚焦透镜18放大，并在荧光板13上形成样品12的电子显微镜图像。从样品12发射的特征X射线由具有 元素分析检测元件16和基本分析控制设备17进行分析。 样品的分析点1,2的位置和照射电子束的光斑尺寸预先存储在电子显微镜控制装置14中，当分析开始时，开始读取所存储的位置和大小信息， 分析点1和2，并且基于该信息自动设置电子束尺寸，从而自动执行分析点1,2的元素分析。

公开(公告)号：US06323484B1

公开(公告)日：2001-11-27

申请号：US09416780

申请日：1999-10-13

Applicant: Takashi Ide ,  Hiroshi Itoh

Inventor： Takashi Ide ,  Hiroshi Itoh

IPC: H05H302

CPC classification number: H01J37/252

Abstract: An apparatus and a method for sample current spectroscopy surface measurement to inspect crystailnity of a sample surface. An electron beam is irradiated onto a surface of a sample by an electron gun. A variable voltage source supplies an acceleration voltage which is variable to change an acceleration energy of the electron beam irradiated from the electron gun onto the sample surface. A sample current measurement means measures a sample current which flows into a sample when the electron beam is irradiated from the electron gun onto the sample surface. Variation of the sample current is detected by measuring the sample current by the sample current measurement means when the acceleration energy of the electron beam irradiated by the electron gun onto the sample surface is changed by the variable voltage source, thereby crystallinity of the sample surface is inspected.

Abstract translation: 用于样本电流光谱表面测量的装置和方法，以检查样品表面的结晶度。 电子束通过电子枪照射到样品的表面上。 可变电压源提供可变的加速电压，以将从电子枪照射的电子束的加速能量改变到样品表面上。 样本电流测量装置测量当电子束从电子枪照射到样品表面上时流入样品的样品电流。 当由电子枪照射到样品表面上的电子束的加速能量被可变电压源改变时，通过采样电流测量装置测量样品电流来检测样品电流的变化，从而样品表面的结晶度为 检查。

公开(公告)号：US06291823B1

公开(公告)日：2001-09-18

申请号：US09416387

申请日：1999-10-12

Applicant: Barney L. Doyle ,  Gyorgy Vizkelethy ,  Robert A. Weller

Inventor： Barney L. Doyle ,  Gyorgy Vizkelethy ,  Robert A. Weller

IPC: G01N2300

CPC classification number: H01J37/252 ,  G01N23/2258 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/2446 ,  H01J2237/24592 ,  H01J2237/2555 ,  H01J2237/2561 ,  H01J2237/2566 ,  H01J2237/262

Abstract: An ion beam analysis system that creates multidimensional maps of the effects of high energy ions from an unfocussed source upon a sample by correlating the exact entry point of an ion into a sample by projection imaging of the secondary electrons emitted at that point with a signal from a detector that measures the interaction of that ion within the sample. The emitted secondary electrons are collected in a strong electric field perpendicular to the sample surface and (optionally) projected and refocused by the electron lenses found in a photon emission electron microscope, amplified by microchannel plates and then their exact position is sensed by a very sensitive X Y position detector. Position signals from this secondary electron detector are then correlated in time with nuclear, atomic or electrical effects, including the malfunction of digital circuits, detected within the sample that were caused by the individual ion that created these secondary electrons in the fit place.

Abstract translation: 一种离子束分析系统，其通过将在该点处发射的二次电子的投影成像与该点发射的二次电子的投影成像相关联将离子的准确入射点与样品相关联，从而产生来自未聚焦源的高能离子对样品的影响的多维图 测量样品中该离子相互作用的检测器。 发射的二次电子被收集在垂直于样品表面的强电场中，并且（可选地）由在光子发射电子显微镜中发现的电子透镜投射和重新聚焦，由微通道板放大，然后它们的精确位置由非常敏感的 XY位置检测器。 然后，来自该二次电子检测器的位置信号与核，原子或电学效应在时间上相关，包括在合适位置产生这些二次电子的各个离子引起的在样品内检测到的数字电路的故障。