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    Photoacid generator and photoresist comprising same
    77.
    发明授权
    Photoacid generator and photoresist comprising same 有权
    光生酸产生剂和包含其的光致抗蚀剂

    公开(公告)号：US09146470B2

    公开(公告)日：2015-09-29

    申请号：US14532134

    申请日：2014-11-04

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Emad Aqad ,  Cheng-Bai Xu ,  Mingqi Li ,  Shintaro Yamada ,  William Williams, III

    IPC: G03F7/30 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/038 ,  C07D313/08 ,  C07D327/04 ,  C07C309/65 ,  C07C311/09 ,  C07D493/18 ,  C07D497/18 ,  C07D313/10

    CPC classification number: G03F7/30 ,  C07C309/65 ,  C07C311/09 ,  C07C2603/74 ,  C07D313/08 ,  C07D313/10 ,  C07D327/04 ,  C07D493/18 ,  C07D497/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/2041

    Abstract: A photoacid generator compound has the formula (I): [A-(CHR1)p]k-(L)-(CH2)m—(C(R2)2)nSO3−Z+  (I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R1 is H, a single bond, or a substituted or unsubstituted C1-30 alkyl group, wherein when R1 is a single bond, R1 is covalently bonded to a carbon atom of A, each R2 is independently H, F, or C1-4 fluoroalkyl, wherein at least one R2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10, k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.

    Abstract translation: 光生酸化合物具有式（I）：其中A是取代或未取代的（A）（A）所示的[A-（CHR1）p] k-（L） - （CH2）m-（C（R2）2）nSO3-Z + ，任选包含O，S，N，F或包含至少一个前述的组合的单环，多环或稠合多环C 5或更多脂环族基团，其中R 1为H，单键或取代或未取代的C1-30 烷基，其中当R 1为单键时，R 1与A的碳原子共价键合，每个R 2独立地为H，F或C 1-4氟代烷基，其中至少一个R 2不是氢，L是连接基团 包括磺酸酯基，磺酰胺基或含C 1〜30磺酸酯或磺酰胺的基团，Z为有机或无机阳离子，p为0〜10的整数，k为1或2，m为0的整数 以上，n为1以上的整数。 还公开了光致酸产生剂的前体化合物，包含光致酸产生剂的光致抗蚀剂组合物和涂有光致抗蚀剂组合物的基材。

    Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article
    78.
    发明授权
    Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article 有权
    包含光生酸化合物和包含其的光致抗蚀剂组合物，包含光致抗蚀剂的涂覆制品和制造制品的方法

    公开(公告)号：US09029065B2

    公开(公告)日：2015-05-12

    申请号：US13661553

    申请日：2012-10-26

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Emad Aqad ,  Cheng-Bai Xu ,  Cong Liu ,  Mingqi Li ,  Shintaro Yamada

    IPC: G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  C07C381/12 ,  C07C309/06 ,  C07C309/04 ,  C07C303/32 ,  C07C309/12 ,  C07C309/17

    CPC classification number: C07C381/12 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325

    Abstract: A compound having the formula (I): wherein a is an integer of from 1 to 10, and x is an integer of from 1 to 3, X1 comprises a fluoroalcohol, fluorinated ester, or fluorinated anhydride, Y is a single bond, C1-20 alkylene group, O, S, NR, ester, carbonate, sulfonate, sulfone, or sulfonamide, wherein R is H or C1-20 alkyl, and wherein the C1-20 alkylene group is structurally only carbon, or one or more structural carbon atoms in the C1-20 alkylene group is replaced by oxygen, carbonyl, ester, or a combination comprising at least one of the foregoing, Ar is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic cycloalkyl; or a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic aryl group, wherein the cycloalkyl or aryl is a carbocycle or comprises a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, each R1 is independently a substituted C5-40 aryl, substituted C5-40 heteroaryl, C1-40 alkyl, a C3-40 cycloalkyl, wherein when x is 1, the two groups R1 are separate or bonded to each other to form a C4-40 ring structure, and Z− is a carboxylate, sulfate, sulfonate, sulfamate, or the anion of a sulfonimide, wherein when Y is a single bond, Z− is not sulfonate.

    Abstract translation: 具有式（I）的化合物：其中a是1至10的整数，x是1至3的整数，X 1包括氟代醇，氟化酯或氟化酐，Y是单键，C1 -20亚烷基，O，S，NR，酯，碳酸酯，磺酸酯，砜或磺酰胺，其中R是H或C 1-20烷基，其中C 1-20亚烷基在结构上仅为碳，或一个或多个结构 C 1-20亚烷基中的碳原子被氧，羰基，酯或包含至少一个前述的组合代替，Ar是取代或未取代的C5或更大单环，多环或稠合的多环环烷基; 或取代或未取代的C5或更大单环，多环或稠合多环芳基，其中环烷基或芳基是碳环或包含含O，S，N，F的杂原子，或包含至少一个上述 ，每个R 1独立地为取代的C 5-40芳基，取代的C 5-40杂芳基，C 1-40烷基，C 3-40环烷基，其中当x为1时，两个基团R1彼此分离或键合形成C4 -40环结构，Z-是羧酸盐，硫酸盐，磺酸盐，氨基磺酸盐或磺酰亚胺的阴离子，其中当Y是单键时，Z-不是磺酸盐。

    PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE
    80.
    发明申请
    PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE 有权
    光电发生器，光电元件，涂覆基板和形成电子器件的方法

    公开(公告)号：US20150064620A1

    公开(公告)日：2015-03-05

    申请号：US14012577

    申请日：2013-08-28

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Irvinder Kaur ,  Emad Aqad ,  Cong Liu ,  Cheng Bai Xu

    IPC: C07D317/72 ,  G03F7/20 ,  G03F7/004

    CPC classification number: C07D317/72 ,  C07D319/04 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2002

    Abstract: A photoacid generator compound has formula (1) wherein n is zero or 1; and R1-R6 are each independently hydrogen, halogen, or unsubstituted or substituted C1-20 linear or branched alkyl, C1-20 cycloalkyl, C6-20 aryl, C3-20 heteroaryl, or an acid-generating group having the structure *L-Z−M+] wherein L is an unsubstituted or substituted C1-50 divalent group; Z− is a monovalent anionic group; and M+ is an iodonium or sulfonium cation. Geminal R groups can combine to form a ring with the carbon to which they are attached, as long as no more than two such rings are formed. At least one of R1-R6 includes the acid-generating group or two germinal R groups combine to form the acid-generating group. Also described are a photoresist composition incorporating the photoacid generator compound, a coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using a layer of the photoresist composition.

    Abstract translation: 光酸产生剂化合物具有式（1），其中n为0或1; 和R 1 -R 6各自独立地为氢，卤素或未取代或取代的C 1-20直链或支链烷基，C 1-20环烷基，C 6-20芳基，C 3-20杂芳基或具有结构* LZ -M +]其中L是未取代或取代的C 1-50二价基团; Z-是一价阴离子基团; 而M +是碘鎓或锍阳离子。 只要不超过两个这样的环形成，Geminal R基团可以结合形成与它们所连接的碳的环。 R1-R6中的至少一个包括产酸基团或两个生发R基团结合形成产酸基团。 还描述了包含光致酸产生剂化合物的光致抗蚀剂组合物，包括光致抗蚀剂组合物层的涂布基材，以及使用光致抗蚀剂组合物层形成电子器件的方法。

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