摘要:
A semiconductor device includes a semiconductor substrate, an nMISFET formed on the substrate, the nMISFET including a first dielectric formed on the substrate and a first metal gate electrode formed on the first dielectric and formed of one metal element selected from Ti, Zr, Hf, Ta, Sc, Y, a lanthanoide and actinide series and of one selected from boride, silicide and germanide compounds of the one metal element, and a pMISFET formed on the substrate, the pMISFET including a second dielectric formed on the substrate and a second metal gate electrode formed on the second dielectric and made of the same material as that of the first metal gate electrode, at least a portion of the second dielectric facing the second metal gate electrode being made of an insulating material different from that of at least a portion of the first dielectric facing the first metal gate electrode.
摘要:
It is made possible to provide a method for manufacturing a semiconductor device that includes CMISs each having a low threshold voltage Vth and a Ni-FUSI/SiON or high-k gate insulating film structure. The method comprises: forming a p-type semiconductor region and an n-type semiconductor region insulated from each other in a substrate; forming a first and second gate insulating films on the p-type and n-type semiconductor regions, respectively; forming a first nickel silicide having a composition of Ni/Si
摘要:
A semiconductor device includes a semiconductor substrate, an nMISFET formed on the substrate, the nMISFET including a first dielectric formed on the substrate and a first metal gate electrode formed on the first dielectric and formed of one metal element selected from Ti, Zr, Hf, Ta, Sc, Y, a lanthanoide and actinide series and of one selected from boride, silicide and germanide compounds of the one metal element, and a pMISFET formed on the substrate, the pMISFET including a second dielectric formed on the substrate and a second metal gate electrode formed on the second dielectric and made of the same material as that of the first metal gate electrode, at least a portion of the second dielectric facing the second metal gate electrode being made of an insulating material different from that of at least a portion of the first dielectric facing the first metal gate electrode.
摘要:
A semiconductor device has an n-channel MIS transistor and a p-channel MIS transistor on a substrate. The n-channel MIS transistor includes a p-type semiconductor region formed on the substrate, a lower layer gate electrode which is formed via a gate insulating film above the p-type semiconductor region and which is one monolayer or more and 3 nm or less in thickness, and an upper layer gate electrode which is formed on the lower layer gate electrode, whose average electronegativity is 0.1 or more smaller than the average electronegativity of the lower layer gate electrode. The p-channel MIS transistor includes an n-type semiconductor region formed on the substrate and a gate electrode which is formed via a gate insulating film above the n-type semiconductor region and is made of the same metal material as that of the upper layer gate electrode.
摘要:
A semiconductor device includes: a p-channel MIS transistor including: a first insulating layer formed on a semiconductor region between a source region and a drain region, and containing at least silicon and oxygen; a second insulating layer formed on the first insulating layer, and containing hafnium, silicon, oxygen, and nitrogen, and a first gate electrode formed on the second insulating layer. The first and second insulating layers have a first and second region respectively. The first and second regions are in a 0.3 nm range in the film thickness direction from an interface between the first insulating layer and the second insulating layer. Each of the first and second regions include aluminum atoms with a concentration of 1×1020 cm−3 or more to 1×1022 cm−3 or less.
摘要翻译:半导体器件包括:p沟道MIS晶体管,包括:第一绝缘层,形成在源极区域和漏极区域之间的半导体区域上,并且至少包含硅和氧; 形成在所述第一绝缘层上并且包含铪,硅,氧和氮的第二绝缘层,以及形成在所述第二绝缘层上的第一栅电极。 第一和第二绝缘层分别具有第一和第二区域。 第一和第二区域在从第一绝缘层和第二绝缘层之间的界面的膜厚度方向上为0.3nm的范围内。 第一和第二区域中的每一个包括浓度为1×10 20 cm -3或更多至1×10 22 cm -3的铝原子, 3 SUP>以下。
摘要:
A semiconductor device includes a substrate, a p-channel MIS transistor formed on an n-type well on the substrate, having a first gate dielectric and a first gate electrode formed thereon and formed of a Ta—C alloy wherein a crystal orientation ratio of a TaC (111) face in a film thickness direction [TaC (111) face/{TaC (111) face+TaC (200) face}] is 80% or more, and an n-channel MIS transistor formed on a p-type well on the substrate, having a second gate dielectric and a second gate electrode formed thereon and formed of a Ta—C alloy wherein a crystal orientation ratio of a TaC (111) face in a film thickness direction [TaC (111) face/{TaC (111) face+TaC (200) face}] is 60% or less.
摘要:
Disclosed is a semiconductor device including: a first electrode formed of a conductive material; a p-type first silicon carbide (SiC) semiconductor section and an n-type second SiC semiconductor section 230, connected to the first electrode, containing carbon (C) such that a surface density distribution has a peak at a first interface with the first electrode.
摘要:
A semiconductor device of an embodiment includes: a substrate formed of a single-crystal first semiconductor; a gate insulating film on the substrate; a gate electrode including a layered structure of a semiconductor layer formed of a polycrystalline second semiconductor and a metal semiconductor compound layer formed of a first metal semiconductor compound that is a reaction product of a metal and the second semiconductor; and electrodes formed of a second metal semiconductor compound that is a reaction product of the metal and the first semiconductor, and formed on the substrate with the gate electrode interposed therebetween, and an aggregation temperature of the first metal semiconductor compound on the polycrystalline second semiconductor is lower than an aggregation temperature of the second metal semiconductor compound on the single-crystal first semiconductor, and a cluster-state high carbon concentration region is included in an interface between the semiconductor layer and the metal semiconductor compound layer.
摘要:
According to one embodiment, gate electrodes of a multi-gate field effect transistors and methods of making a gate electrode of a multi-gate field effect transistor are provided. The gate electrode can contain a semiconductor substrate; a dielectric layer over the semiconductor substrate; a fin over the dielectric layer; a gate insulating layer over the side surfaces of the fin; a gate electrode layer over the fin; and a polysilicon layer over the fin. The gate electrode does not contain a gate insulating layer over the upper surface of the dielectric layer except portions of the upper surface of the dielectric layer that contact with the side surfaces of the gate insulating layer formed over the side surface of the fin. In another embodiment, the gate electrode can contain an oxygen diffusion barrier layer or a first oxygen diffusion layer over the upper surface of the dielectric layer.
摘要:
A semiconductor device having an electrode with reduced electrical contact resistance even where either electrons or holes are majority carriers is disclosed. This device has an n-type diffusion layer and a p-type diffusion layer in a top surface of a semiconductor substrate. The device also has first and second metal wires patterned to overlie the n-type and p-type diffusion layers, respectively, with a dielectric layer interposed therebetween, a first contact electrode for electrical connection between the n-type diffusion layer and the first metal wire, and a second contact electrode for connection between the p-type diffusion layer and the second metal wire. The first contact electrode's portion in contact with the n-type diffusion layer and the second contact electrode's portion contacted with the p-type diffusion layer are each formed of a first conductor that contains a metal and a second conductor containing a rare earth metal.