公开(公告)号：US09448481B2

公开(公告)日：2016-09-20

申请号：US14848187

申请日：2015-09-08

Applicant: Mentor Graphics Corporation

Inventor： Emile Y. Sahouria ,  Steffen Schulze

IPC: G03F7/20 ,  G03F1/76 ,  G03F1/50 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/317 ,  H01L21/26 ,  H01L21/027

CPC classification number: G03F7/2063 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/50 ,  G03F1/76 ,  G03F1/78 ,  G03F7/2045 ,  G03F7/70466 ,  H01J37/3174 ,  H01L21/0274 ,  H01L21/26

Abstract: Techniques for reducing the number of shots required by a radiation beam writing tool to write a pattern, such as fractured layout design, onto a substrate. One or more apertures are employed by a radiation beam writing tool to write a desired pattern onto a substrate using L-shaped images, T-shaped images, or some combination of both. By reducing the number of shots required to write a pattern onto a substrate, various implementations of the invention may reduce the write time and/or write complexity of the write process.

公开(公告)号：US20160238927A1

公开(公告)日：2016-08-18

申请号：US15044555

申请日：2016-02-16

Applicant: Xiamen Tianma Micro-electronics Co., Ltd. ,  Tianma Micro-electronics Co., Ltd.

Inventor： XIAOMIN LIU ,  LONG ZHANG ,  TING ZHOU ,  POPING SHEN

IPC: G03F1/50 ,  G03F7/32 ,  G03F1/76 ,  G03F7/20 ,  H01L21/027 ,  H01L21/308

CPC classification number: G03F1/50 ,  G03F1/76 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/201 ,  G03F7/32 ,  H01L21/0274

Abstract: A reticle is provided. The reticle comprises a substrate having at least a first region and a second region; and an organic layer aligned in certain directions by an irradiation of a polarized UV light formed on a surface of the substrate. Wherein the organic layer in the first region has a first polarization direction; the organic layer in the second region has a second polarization direction; and the first polarization direction and the second polarization direction have a predetermined angle.

Abstract translation: 提供了掩模版。 所述掩模版包括具有至少第一区域和第二区域的衬底; 以及通过在基板的表面上形成的偏振UV光的照射在某些方向上排列的有机层。 其中第一区域中的有机层具有第一偏振方向; 第二区域中的有机层具有第二偏振方向; 并且第一偏振方向和第二偏振方向具有预定角度。

公开(公告)号：US09377681B2

公开(公告)日：2016-06-28

申请号：US14021489

申请日：2013-09-09

Applicant: Samsung Display Co., Ltd.

Inventor： Doh-Hyoung Lee ,  Jun Ho Jo

IPC: B23K26/00 ,  B23K26/16 ,  G03F1/76 ,  G03F7/20 ,  B23K26/067

CPC classification number: G03F1/76 ,  B23K26/067 ,  G03F7/2053 ,  G03F7/70383 ,  G03F7/70875

Abstract: A mask manufacturing apparatus includes a laser irradiator, a stage, a frame, and a heat spreader sheet. The laser irradiator divides a laser beam into a plurality of sub-laser beams and irradiates the sub-laser beams to a shadow mask material which is placed over a stage. The frame is disposed over the stage to support the shadow mask material. The heat spreader sheet makes contact with the shadow mask material, absorbs heat generated from the shadow mask material, and dissipates the heat to surroundings of the shadow mask material. Accordingly, the shadow mask material is protected from overheating.

Abstract translation: 掩模制造装置包括激光照射器，台架，框架和散热片。 激光照射器将激光束分割成多个子激光束，并将副激光束照射到放置在台上的荫罩材料。 框架设置在舞台上以支撑荫罩材料。 散热片与荫罩材料接触，吸收由荫罩材料产生的热量，并将热量散发到荫罩材料的周围。 因此，防止荫罩材料过热。

公开(公告)号：US20160161839A1

公开(公告)日：2016-06-09

申请号：US15044003

申请日：2016-02-15

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： YEN-CHENG LU ,  SHINN-SHENG YU ,  JENG-HORNG CHEN ,  ANTHONY YEN

IPC: G03F1/24 ,  G03F1/76 ,  G03F7/20

CPC classification number: G03F1/24 ,  G03F1/22 ,  G03F1/26 ,  G03F1/36 ,  G03F1/76 ,  G03F7/2002 ,  G03F7/2004

Abstract: A method of forming a mask for semiconductor fabrication is disclosed. The method includes providing a substrate and forming a first reflective layer over the substrate, wherein the first reflective layer comprises pairs of alternating materials. The method further includes forming a buffer layer over the first reflective layer and forming a second reflective layer over the buffer layer. The second reflective layer has a total thickness less than 90 nanometer (nm). The method further includes patterning the second reflective layer to form a first state and a second state of the mask. A first reflection coefficient of the first state and a second reflection coefficient of the second state have a phase difference of about 180 degrees.

Abstract translation: 公开了一种形成用于半导体制造的掩模的方法。 该方法包括提供衬底并在衬底上形成第一反射层，其中第一反射层包括成对的交替材料。 该方法还包括在第一反射层上形成缓冲层，并在缓冲层上形成第二反射层。 第二反射层的总厚度小于90纳米（nm）。 该方法还包括使第二反射层形成图案以形成掩模的第一状态和第二状态。 第一状态的第一反射系数和第二状态的第二反射系数具有约180度的相位差。

公开(公告)号：US20160154298A1

公开(公告)日：2016-06-02

申请号：US15014699

申请日：2016-02-03

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Chien-Hsuan Liu ,  Jen-Pan Wang

IPC: G03F1/52 ,  G03F1/76

CPC classification number: G03F1/52 ,  G03F1/24 ,  G03F1/50 ,  G03F1/76 ,  G03F7/70058 ,  G03F7/70283 ,  G03F7/703

Abstract: Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a reflective material, and a reticle pattern. The transparent substrate comprises a curved surface. The reflective material adjoins the curved surface of the transparent substrate, and an interface between the reflective material and the transparent substrate is a reflective surface. The reticle pattern is on a second surface of the transparent substrate. A reflectivity of the reticle pattern is less than a reflectivity of the reflective material. Methods for forming similar lithography masks and for using similar lithography masks are disclosed.

公开(公告)号：US09329445B2

公开(公告)日：2016-05-03

申请号：US14416784

申请日：2014-06-26

Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

Inventor： Xiangyang Xu

IPC: G03F1/50 ,  G03F1/80 ,  G02F1/1333 ,  G02F1/1343 ,  H01L21/3213 ,  H01L21/283 ,  H01L21/28 ,  G03F1/76 ,  G02F1/1362 ,  G02F1/1339 ,  G03F7/20

CPC classification number: G02F1/13439 ,  G02F1/1333 ,  G02F1/1339 ,  G02F1/1362 ,  G02F1/136286 ,  G02F2001/136236 ,  G02F2001/136295 ,  G03F1/50 ,  G03F1/76 ,  G03F1/80 ,  G03F7/2002 ,  H01L21/28008 ,  H01L21/283 ,  H01L21/32139

Abstract: The present disclosure discloses a mask plate and processes for manufacturing an ultraviolet mask plate and an array substrate. The present disclosure relates to the field of display technology and can reduce costs for manufacturing ultraviolent mask plates. The mask plate comprises a transparent area, a semi-transparent area, and a non-transparent area, wherein the transparent area and the non-transparent area correspond to a frame glue area and a layer pattern area of a liquid crystal display panel, respectively, and other regions of the mask plate constitute said semi-transparent area. The present disclosure can be used in the manufacture of display devices of liquid crystal display televisions, liquid crystal displays, mobile phones, tablet computers, etc.

Abstract translation: 本公开公开了一种掩模板和用于制造紫外线掩模板和阵列基板的工艺。 本公开涉及显示技术领域，并且可以降低制造超薄面罩板的成本。 掩模板包括透明区域，半透明区域和不透明区域，其中透明区域和不透明区域分别对应于液晶显示面板的框架胶区域和层图案区域 ，掩模板的其他区域构成所述半透明区域。 本公开可以用于液晶显示电视机，液晶显示器，手机，平板电脑等的显示装置的制造。

公开(公告)号：US20160070162A1

公开(公告)日：2016-03-10

申请号：US14668208

申请日：2015-03-25

Applicant: Samsung Display Co., Ltd.

Inventor： Young Gil KWON

IPC: G03F1/50 ,  G03F1/76

CPC classification number: G03F1/50 ,  B41M5/42 ,  B41M5/46 ,  B41M5/48 ,  G03F1/76 ,  G03F7/0005

Abstract: An optical mask, including: a photothermal conversion layer configured to convert optical energy into thermal energy; and an adiabatic pattern layer disposed on the photothermal conversion layer, wherein the photothermal conversion layer includes a thermal acid generator configured to generate an acid in response to the thermal energy.

Abstract translation: 一种光掩模，包括：光热转换层，被配置为将光能转换成热能; 以及设置在光热转换层上的绝热图案层，其中光热转换层包括被配置为响应于热能产生酸的热酸发生器。

公开(公告)号：US20160041417A1

公开(公告)日：2016-02-11

申请号：US14416784

申请日：2014-06-26

Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

Inventor： Xiangyang XU

IPC: G02F1/1343 ,  H01L21/283 ,  G02F1/1362 ,  G03F1/50 ,  G03F1/76 ,  G03F1/80 ,  H01L21/3213 ,  H01L21/28

CPC classification number: G02F1/13439 ,  G02F1/1333 ,  G02F1/1339 ,  G02F1/1362 ,  G02F1/136286 ,  G02F2001/136236 ,  G02F2001/136295 ,  G03F1/50 ,  G03F1/76 ,  G03F1/80 ,  G03F7/2002 ,  H01L21/28008 ,  H01L21/283 ,  H01L21/32139

Abstract: The present disclosure discloses a mask plate and processes for manufacturing an ultraviolet mask plate and an array substrate. The present disclosure relates to the field of display technology and can reduce costs for manufacturing ultraviolent mask plates. The mask plate comprises a transparent area, a semi-transparent area, and a non-transparent area, wherein the transparent area and the non-transparent area correspond to a frame glue area and a layer pattern area of a liquid crystal display panel, respectively, and other regions of the mask plate constitute said semi-transparent area. The present disclosure can be used in the manufacture of display devices of liquid crystal display televisions, liquid crystal displays, mobile phones, tablet computers, etc.

Abstract translation: 本公开公开了一种掩模板和用于制造紫外线掩模板和阵列基板的工艺。 本公开涉及显示技术领域，并且可以降低制造超薄面罩板的成本。 掩模板包括透明区域，半透明区域和不透明区域，其中透明区域和不透明区域分别对应于液晶显示面板的框架胶区域和层图案区域 ，掩模板的其他区域构成所述半透明区域。 本公开可以用于液晶显示电视机，液晶显示器，手机，平板电脑等的显示装置的制造。

公开(公告)号：US09250513B2

公开(公告)日：2016-02-02

申请号：US14019809

申请日：2013-09-06

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chia-Hao Yu ,  Ming-Yun Chen

IPC: G03F1/72 ,  G03F1/22

CPC classification number: G03F1/24 ,  G03F1/22 ,  G03F1/72 ,  G03F1/76 ,  G03F1/80

Abstract: Any defects in the reflective multilayer coating or absorber layer of an EUV mask are problematic in transferring a pattern of the EUV mask to a wafer since they produce errors in integrated circuit patterns on the wafer. In this regard, a method of manufacturing an EUV mask is provided according to various embodiments of the present disclosure. To repair the defect, a columnar reflector, which acts as a Bragg reflector, is deposited according to various embodiments so as to locally compensate and repair the defect. According to the embodiments of the present disclosure, the reflective loss due to the defect can be compensated and recover the phase different due to the defect from, so as to form a desirable wafer printed image.

Abstract translation: EUV掩模的反射多层涂层或吸收层中的任何缺陷在将EUV掩模的图案转印到晶片上是有问题的，因为它们在晶片上产生集成电路图案的错误。 在这方面，根据本公开的各种实施例提供了制造EUV掩模的方法。 为了修复缺陷，根据各种实施例沉积充当布拉格反射器的柱状反射体，以局部补偿和修复缺陷。 根据本公开的实施例，可以补偿由于缺陷引起的反射损耗，并且恢复由于缺陷而导致的相位不同，从而形成期望的晶片印刷图像。

公开(公告)号：US20150219951A1

公开(公告)日：2015-08-06

申请号：US14348738

申请日：2013-06-26

Applicant: HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. ,  BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Huifang Yuan

IPC: G02F1/1339 ,  G03F1/32 ,  G03F1/80 ,  G02F1/1335 ,  G03F1/76

CPC classification number: G02F1/13394 ,  G02F1/133514 ,  G02F2001/13396 ,  G02F2201/503 ,  G03F1/00 ,  G03F1/32 ,  G03F1/76 ,  G03F1/80

Abstract: A display panel and a manufacturing method thereof, a mask and a manufacturing method thereof, and a display device. The display panel includes a first display substrate and a second display substrate arranged to be opposed to each other, and main spacers and assistant spacers arranged between the first display substrate and the second display substrate. The main spacers and the assistant spacers are both arranged on the first display substrate. The main spacers have a height equal to a distance from the first display substrate to the second display substrate to support the first display substrate and the second display substrate. The assistant spacers have a height smaller than that of the main spacers. An end surface of a suspending end of at least one of the assistant spacers is planar and/or an end surface of a suspending end of at least one of the assistant spacers is convex.

Abstract translation: 显示面板及其制造方法，掩模及其制造方法以及显示装置。 显示面板包括布置成彼此相对布置的第一显示基板和第二显示基板，以及布置在第一显示基板和第二显示基板之间的主间隔物和辅助间隔物。 主间隔件和辅助间隔件都布置在第一显示基板上。 主间隔物的高度等于从第一显示基板到第二显示基板的距离，以支撑第一显示基板和第二显示基板。 辅助间隔物的高度小于主间隔物的高度。 至少一个辅助间隔件的悬挂端的端面是平面的，和/或至少一个辅助间隔件的悬挂端的端面是凸形的。