公开(公告)号：US20140377040A1

公开(公告)日：2014-12-25

申请号：US14477783

申请日：2014-09-04

申请人： Intevac, Inc.

发明人： Stuart Scollay

IPC分类号： H01L21/677 ,  H01L21/673

CPC分类号： H01L21/67742 ,  G11B5/8404 ,  H01L21/67346 ,  H01L21/67709 ,  H01L21/67748 ,  H01L21/67751 ,  H01L2221/67 ,  Y10S414/139

摘要： Disclosed is a substrate processing system with a magnetic conduit configuration to improve the movement of a substrate carrier within the system. The configuration specifically provides for safe, secure movement of a carrier between multiple levels of a substrate processing system by using magnetic conduits to redirect magnetic forces created by a linear motor, permitting the linear motor to be positioned outside of the system and in a location that will not interfere with the movement of the carrier.

摘要翻译： 公开了一种具有磁导管结构以改善衬底载体在系统内的运动的衬底处理系统。 该配置专门提供载体在基底处理系统的多个级别之间的安全，可靠的运动，其中通过使用磁导管来重定向由线性马达产生的磁力，允许线性马达位于系统外部，并且位于 不会干扰载体的移动。

公开(公告)号：US20140311893A1

公开(公告)日：2014-10-23

申请号：US14185859

申请日：2014-02-20

申请人： Intevac, Inc.

发明人： Vinay Shah ,  Alexandru Riposan ,  Terry Bluck ,  Vladimir Kudriavtsev

IPC分类号： C23C14/35 ,  H01J37/34

CPC分类号： C23C14/35 ,  C23C14/56 ,  H01J37/32669 ,  H01J37/32779 ,  H01J37/32899 ,  H01J37/3405 ,  H01J37/3417 ,  H01J37/3452 ,  H01J37/3455

摘要： A sputtering system having a processing chamber with an inlet port and an outlet port, and a sputtering target positioned on a wall of the processing chamber. A movable magnet arrangement is positioned behind the sputtering target and reciprocally slides behind the target. A conveyor continuously transports substrates at a constant speed past the sputtering target, such that at any given time, several substrates face the target between the leading edge and the trailing edge. In certain embodiments, the movable magnet arrangement slides at a speed that is at least several times faster than the constant speed of the conveyor. A rotating zone is defined behind the leading edge and trailing edge of the target, wherein the magnet arrangement decelerates when it enters the rotating zone and accelerates as it reverses direction of sliding within the rotating zone. In certain embodiments, magnet power and/or speed varies as function of direction of magnet travel.

摘要翻译： 一种溅射系统，具有具有入口和出口的处理室和位于处理室的壁上的溅射靶。 可移动磁体布置位于溅射靶的后面并在目标之后往复滑动。 输送机以恒定速度连续输送基板通过溅射靶，使得在任何给定时间，几个基板在前缘和后缘之间面对目标。 在某些实施例中，可动磁体装置以比传送带的恒定速度快至少几倍的速度滑动。 旋转区域被限定在目标的前缘和后缘之后，其中磁体装置进入旋转区域时减速，并且当其在旋转区域内反转滑动方向时加速。 在某些实施例中，磁体功率和/或速度随着磁铁行进方向的变化而变化。

公开(公告)号：US20130105087A1

公开(公告)日：2013-05-02

申请号：US13666917

申请日：2012-11-01

申请人： Intevac, Inc.

发明人： Young Kyu Cho ,  Karthik Janakiraman ,  Terry Bluck ,  Diwakar Kedlaya

IPC分类号： H02N13/00 ,  H01L31/18

CPC分类号： H02N13/00 ,  H01J2237/16 ,  H01L21/6833 ,  H01L31/18 ,  Y10T29/49117

摘要： An electrostatic chuck is disclosed, which is especially suitable for fabrication of substrates at high throughput. The disclosed chuck may be used for fabricating large substrates or several smaller substrates simultaneously. For example, disclosed embodiments can be used for fabrication of multiple solar cells simultaneously, providing high throughput. An electrostatic chuck body is constructed using aluminum body having sufficient thermal mass to control temperature rise of the chuck, and anodizing the top surface of the body. A ceramic frame is provided around the chuck's body to protect it from plasma corrosion. If needed, conductive contacts are provided to apply voltage bias to the wafer. The contacts are exposed through the anodization.

摘要翻译： 公开了一种静电卡盘，其特别适用于以高产量制造基板。 所公开的卡盘可以用于同时制造大的基板或几个较小的基板。 例如，所公开的实施例可以同时用于制造多个太阳能电池，从而提供高通量。 使用具有足够热质量的铝体来控制卡盘的温度升高并且阳极氧化主体的顶表面构成静电卡盘体​​。 在卡盘的主体周围设置陶瓷框架，以防止其等离子体腐蚀。 如果需要，提供导电触点以向晶片施加电压偏压。 触点通过阳极氧化暴露。

公开(公告)号：US20220185726A1

公开(公告)日：2022-06-16

申请号：US17589498

申请日：2022-01-31

申请人： INTEVAC, INC.

发明人： Terry Bluck ,  Wendell Thomas Blonigan

IPC分类号： C03C17/34 ,  C23C14/34 ,  C23C14/54 ,  C23C14/00 ,  C23C14/10 ,  C23C14/08 ,  C23C14/50 ,  C08J7/04 ,  B05D5/06 ,  B32B17/10 ,  C03C17/42 ,  G02B1/111 ,  G02B1/116

摘要： A processing system for forming an optical coating on a substrate is provided, wherein the optical coating including an anti-reflective coating and an oleophobic coating, the system comprising: a linear transport processing section configured for processing and transporting substrate carriers individually and one at a time in a linear direction; at least one evaporation processing system positioned in the linear transport processing system, the evaporation processing system configured to form the oleophobic coating; a batch processing section configured to transport substrate carriers in unison about an axis; at least one ion beam assisted deposition processing chamber positioned in the batch processing section, the ion beam assisted deposition processing chamber configured to deposit layer of the anti-reflective coating; a plurality of substrate carriers for mounting substrates; and, means for transferring the substrate carriers between the linear transport processing section and the batch processing section without exposing the substrate carrier to atmosphere.

公开(公告)号：US20210366972A1

公开(公告)日：2021-11-25

申请号：US16881946

申请日：2020-05-22

申请人： INTEVAC, INC.

发明人： Kenneth Costello ,  Kevin Roderick ,  Verle Aebi

IPC分类号： H01L27/146 ,  H01J31/26

摘要： An image sensor has a photocathode window assembly, an anode assembly, and a malleable metal seal. The photocathode window assembly has a photocathode layer. The anode assembly includes a silicon substrate that has an electron sensitive surface. The malleable metal seal bonds the photocathode window assembly and the silicon substrate to each other. A vacuum gap separates the photocathode layer from the electron sensitive surface. A first electrical connection and a second electrical connection are for a voltage bias of the photocathode layer relative to the electron sensitive surface.

公开(公告)号：US20210087674A1

公开(公告)日：2021-03-25

申请号：US16583165

申请日：2019-09-25

申请人： Intevac, Inc.

发明人： Terry Bluck

IPC分类号： C23C14/56 ,  C23C14/34 ,  C23C14/50 ,  H01L21/67 ,  H01L21/677

摘要： A processing system is provided, including a vacuum enclosure having a plurality of process windows and a continuous track positioned therein; a plurality of processing chambers attached sidewalls of the vacuum enclosures, each processing chamber about one of the process windows; a loadlock attached at one end of the vacuum enclosure and having a loading track positioned therein; at least one gate valve separating the loadlock from the vacuum enclosure; a plurality of substrate carriers configured to travel on the continuous track and the loading track; at least one track exchanger positioned within the vacuum enclosure, the track exchangers movable between a first position, wherein substrate carriers are made to continuously move on the continuous track, and a second position wherein the substrate carriers are made to transfer between the continuous track and the loading track.

公开(公告)号：US20200350188A1

公开(公告)日：2020-11-05

申请号：US15929378

申请日：2020-04-29

申请人： INTEVAC, INC.

发明人： Terry Bluck ,  Arun Karamcheti

IPC分类号： H01L21/67 ,  H01L21/677 ,  H01L21/203

摘要： A substrate processing system, including a processing module having at least one sputtering source; a first buffer module positioned on a first side of the processing module; a second buffer module positioned on a second side of the processing module directly opposite the first side; a first cooling module attached to the first buffer module; a second cooling module attached to the second buffer module; a transport system transporting substrate carriers in a straight line through the first cooling module, the first buffer module, the processing module, the second buffer module and the second cooling module; wherein the system is arranged linearly in the order: first cooling module, the first buffer module, the processing module, the second buffer module and the second cooling module.

公开(公告)号：US10559710B2

公开(公告)日：2020-02-11

申请号：US16040423

申请日：2018-07-19

申请人： Intevac, Inc.

发明人： William Eugene Runstadler, Jr. ,  Babak Adibi ,  Terry Bluck

IPC分类号： H01J37/20 ,  H01J37/18 ,  H01J37/317 ,  H01L31/18

摘要： A system for transporting substrates and precisely alignment the substrates to shadow masks. The system decouples the functions of transporting the substrates, vertically aligning the substrates, and horizontally aligning the substrates. The transport system includes a carriage upon which plurality of pedestals are loosely positioned, each of the pedestals includes a base having vertical alignment wheels to place the substrate in precise vertical alignment. Two sidebars are configured to freely slide on the base. Each of the sidebars includes a set of horizontal alignment wheels that precisely align the substrate in the horizontal direction. Substrate support claws are attached to the sidebars in precise alignment to the vertical alignment wheels and the horizontal alignment wheels.

公开(公告)号：US20190383977A1

公开(公告)日：2019-12-19

申请号：US16442133

申请日：2019-06-14

申请人： Intevac, Inc.

发明人： Terry Bluck ,  Arun Karamcheti

IPC分类号： G02B5/08 ,  C03C17/34 ,  H01L51/52 ,  H01L27/32

摘要： A multi-color dielectric coating is formed using interleaved layers of dielectric material, having alternating refractive index, to create reflections at selected wavelengths, thus appearing as different colors. Etching of selected layers at selected locations changes the color appearance of the etched locations, thus generating a coating having multiple colors. The thicknesses of the layers are chosen such that the path-length differences for reflections from different high-index layers are integer multiples of the wavelength for which the coating is designed. Inkjet printer is used to print a design and the design is cured using UV radiation.

公开(公告)号：US10425589B2

公开(公告)日：2019-09-24

申请号：US15663362

申请日：2017-07-28

申请人： Intevac, Inc.

发明人： Simeon Su-Ming Trieu ,  Emil Abraham Wilke

IPC分类号： H04N5/235 ,  H04N5/355 ,  G06T5/50 ,  G06T5/00

摘要： Dynamic range of a photosensor is controlled dynamically improving image detail especially in dark and bright areas of the image. At least one reset threshold and one reset value are set. At the end of the frame integration the value of the average pixel and the value of the brightest pixel that was not reset are determined and, based on that, at least one of the reset threshold and the reset value are changed. The change may reduce/increase the reset threshold such that more/less pixels are being reset, may reduce/increase the reset value thereby causing the pixels to be reset to a lower/higher value, or change the timing of the reset. In some embodiments, a calculated value for the reset threshold and the reset value are averaged with calculated values of prior N frames, and the result is applied to the next frame.