Hand Over Method From Asynchronous Mobile Communication Network to Synchronous Mobile Communication Network
    82.
    发明申请
    Hand Over Method From Asynchronous Mobile Communication Network to Synchronous Mobile Communication Network 失效
    从异步移动通信网络到同步移动通信网络的交接方法

    公开(公告)号:US20090129359A1

    公开(公告)日:2009-05-21

    申请号:US11911840

    申请日:2005-04-19

    IPC分类号: H04B7/216

    CPC分类号: H04W36/14

    摘要: The present invention relates to a method of performing handover from an asynchronous mobile communication network to a synchronous mobile communication network. If the access network of the asynchronous mobile communication network (100) requests handover to an MSC (104) of the asynchronous mobile communication network, the MSC requests/receives subscriber information of the mobile communication terminal from a dual-stack HLR (300), and transmits a handover request message to the synchronous mobile communication network (200). The MSC (203) of the synchronous mobile communication network assigns a forward channel to the mobile communication terminal. The asynchronous mobile communication network (100) transmits a handover instruction message to the asynchronous RF device of the mobile communication terminal. Accordingly, the mobile communication terminal sets up a synchronous RF device, connects to the synchronous mobile communication network through reverse channel assignment and synchronization. The mobile communication terminal transmits a handover completion message to the synchronous mobile communication network.

    摘要翻译: 本发明涉及一种执行从异步移动通信网络到同步移动通信网络的切换的方法。 如果异步移动通信网络(100)的接入网络请求切换到异步移动通信网络的MSC(104),则MSC从双栈HLR(300)请求/接收移动通信终端的用户信息, 并向同步移动通信网络(200)发送切换请求消息。 同步移动通信网络的MSC(203)向移动通信终端分配前向信道。 异步移动通信网络(100)向移动通信终端的异步RF设备发送切换指示消息。 因此,移动通信终端设置同步RF设备,通过反向信道分配和同步连接到同步移动通信网络。 移动通信终端向同步移动通信网络发送切换完成消息。

    Methods of Gate Contact Formation for Vertical Transistors

    公开(公告)号:US20220130963A1

    公开(公告)日:2022-04-28

    申请号:US17122219

    申请日:2020-12-15

    申请人: Sang-Yun Lee Lee

    发明人: Sang-Yun Lee

    摘要: Structures and methods that facilitate the formation of gate contacts for vertical transistors constructed with semiconductor pillars and spacer-like gates are disclosed. In a first embodiment, a gate contact rests on an extended gate region, a piece of a gate film, patterned at a side of a vertical transistor at the bottom of the gate. In a second embodiment, an extended gate region is patterned on top of one or more vertical transistors, resulting in a modified transistor structure. In a third embodiment, a gate contact rests on a top surface of a gate merged between two closely spaced vertical transistors. Optional methods and the resultant intermediate structures are included in the first two embodiments in order to overcome the related topography and ease the photolithography. The third embodiment includes alternatives for isolating the gate contact from the semiconductor pillars or for isolating the affected semiconductor pillars from the substrate.